The effect of nitrogen doping on amorphous germanium

The effects of nitrogen doping on the electrical and optical properties of amorphous germanium are investigated. It is found that within the low nitrogen concentrations that cause no appreciable change in the optical energy gap, the room temperature conductivity and the B coefficient in the optical absorption show a maximum at the same nitrogen concentration. This behavior is interpreted by a delocalization of the electronic states in the conduction band due to the nitrogen incorporation.     

Physical properties of ZnSe films prepared by two-source evaporation and a study of post doping effect

Two-source thermal evaporation method was utilized to prepare hard ZnSe thin films, the films were then immersed in silver nitrate solution for different time periods. The optical properties of the films were measured from the transmittance spectra. X-ray pattern of the films were also included. Final compositions of the resulting films were measured by EMPA method and comparisons between compositions by EMPA vs. optical absorbance were also reported. The dc electrical conductivity increased and a small shift in the optical band gap was also observed.     

Initial growth behavior of GaAs on ZnSe in MOVPE

We have used atomic force microscopy to investigate the initial stages of the growth of GaAs on ZnSe by metalorganic vapor phase epitaxy. Underlying ZnSe with an atomically flat surface is achieved by growth at 450°C and post-growth annealing at the same temperature. The growth modes of GaAs on the ZnSe surface strongly depend on growth temperatures. The growth carried out at 450°C is 2-dimensional, while that at 550°C is highly 3-dimensional (3D), where the 3D islands are elongated in the [110] direction. The growth behavior, unlike homoepitaxy, is well interpreted in terms of low sticking coefficient and anisotropic lateral growth rate in the heterovalent heteroepitaxy.     

The growth and characterization of ZnSe epilayers grown by VPE and MOCVD

Zinc selenide (ZnSe) is a useful semiconductor for homojunction or heterojunction optoelectronic devices. In this paper we review the fabrication techniques of vapor phase epitaxy (VPE) and metalorganic chemical vapor deposition (MOCVD) for the growth of ZnSe epilayers. These techniques can play important roles in achieving ZnSe blue light-emitting devices. Recent and future trends in growing these devices are also reviewed and studied.     

Nitrogen as carrier gas for the growth of ZnSe and ZnSe:N in plasma enhanced metalorganic vapor phase epitaxy

For the precursor combination dimethylzinc-triethylamine and ditertiarybutylselenide the use of nitrogen carrier gas was investigated for the metalorganic vapor phase epitaxy (MOVPE) of ZnSe and ZnSe:N. The nitrogen doping was carried out with a separate nitrogen flow which was activated by a dc-plasma. In the photoluminescence spectra of undoped layers grown at 340°C with a VI/II ratio of 0.18 only excitonic emissions, separated into free and donor bound excitons, can be observed. The background carrier concentration was of the order of 1 × 10¹⁶ cm⁻³. The growth rate of epilayers grown in nitrogen is reduced by about 75% in comparison to the value obtained by using hydrogen as carrier gas. The doping can be regulated by the dopant flow and by the total pressure in the reactor. With increasing flow of plasma activated nitrogen and a reduced total pressure, the PL spectra showed broadened DAP emission without excitonic emissions. The electrical and optical properties obtained with nitrogen carrier gas are comparable with the results obtained with hydrogen carrier gas. So far, no p-type conductivity was measured. Therefore, the problem of compensation of p-type conductivity of ZnSe : N doped by dc-plasma enhanced N₂ was not solved by the use of N₂ carrier gas.     

Studies in the growth of ZnSe on GaAs(001)

This paper reports a study of the molecular beam epitaxial (MBE) growth of ZnSe on GaAs substrates using elemental sources. Growth rates of ZnSe as a function of Se:Zn flux ratio for constant Zn flux were determined over a wider range of values than previously reported. Careful measurements of atomic fluxes and sample thickness lead to a determination of the sticking coefficients of Zn and Se which are at variance with many previously reported values. The temperature dependence of the sticking coefficients of Zn and Se has been measured carefully and provides evidence for a greater desorption of Zn from the growing surface than previously thought, an effect which persists at low growth temperatures. Measurements at high flux ratios support the use of a precursor model to describe MBE growth of ZnSe on GaAs substrates.     

Studies on the vapour growth of ZnS,ZnSe and ZnTe single crystals

Large, highly perfect single crystals (up to 10 × 10 × 5 mm³) of ZnS, ZnSe and ZnTe have been grown from the vapour phase by dissociative sublimation and chemical transport with iodine. Good quality crystals were obtained when the growth rate was limited by diffusion of the vapours rather than by thermal convection or by reaction rates at the charge and or the growing surface. The presence of an inert gas and defined iodine concentrations increase the growth stability, especially for charges with slight deviations from stoichiometry. Electronmicrographs, X-ray topographs and etching experiments revealed low dislocation densities and relatively large inclusion-free regions.     

Effect of AlN doping on the growth morphology of SiC

AlN doped SiC films were deposited on on‐axis Si‐face 4H‐SiC (0001) substrates by the physical vapor transport (PVT) method. Thick film in the range of 20 μm range was grown and morphology was characterized. Films were grown by physical vapor deposition (PVD) in a vertical geometry in the nitrogen atmosphere. We observed that nucleation occurred in the form of discs and growth occurred in hexagonal geometry. The X‐ray studies showed (001) orientation and full width of half maxima (FWHM) was less than 0.1° indicating good crystallinity. We also observed that film deposited on the carbon crucible had long needles with anisotropic growth very similar to that of pure AlN. Some of the needles grew up to sizes of 200 μm in length and 40 to 50 μm in width. It is clear that annealing of SiC‐AlN powder or high temperature physical vapor deposition produces similar crystal structure for producing AlN‐SiC solid solution. SEM studies indicated that facetted hexagons grew on the top of each other and coarsened and merged to form cm size grains on the substrate. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

The growth of ZnSe by photo-assisted metalorganic chemical vapor deposition (MOCVD)

ZnSe epitaxy layers were grown on (1 0 0)GaAs substrates by photo-assisted MOCVD using DMZn and DMSe as group II and VI sources, respectively. Irradiation can improve the growth rate efficiently, but the irradiation intensity influences the growth rate and the crystalline quality negligibly in a large range. Due to an oxidation reaction on the surface of ZnSe, the growth rate and the flow ratio of group II and VI sources influence the crystalline quality.     

Growth and annealing effect of high-quality ZnSe:N/ZnSe by MOCVD

The ZnSe : N epitaxial layers were grown on (1 1 0) ZnSe substrates in a low-pressure metalorganic chemical vapor deposition (MOCVD) system using hydrogen as a carrier gas, and using ammonia as a dopant source. In order to obtain highly doped ZnSe : N epitaxial layers, the optimum growth and doping conditions were determined by studying the photoluminescence (PL) spectra from the ZnSe epitaxial layers grown at different ammonia flux and VI/II flux ratio. Furthermore, in order to enhance the concentration of active nitrogen in ZnSe epitaxial layer, a rapid thermal anneal technique was used for post-heat-treating. The results show that the annealing temperature of over 1023 K is necessary. Beside, a novel treatment method to obtain a smooth substrate surface for growing high quality ZnSe epitaxial layers is also described.     

ZnSe微球的制备与性能研究

采用水热法,以ZnSO4·7H2O为Zn源,Na2SeO3为Se源,NaOH溶液为反应介质,N2H4·H2O为还原性助剂,在140℃下反应24 h,合成了直径为1～4μm、分散性较好的ZnSe微球.SEM、XRD和UV-Vis测试发现,NaOH和N2H4·H2O共同控制着ZnSe的形貌,制备的ZnSe微球是由平均尺寸为20.7 nm的ZnSe纳米晶在N2微泡上聚集而成的中空球.     

On the thermal and optical properties of ZnSe and doped ZnSe crystals grown by PVT

Single crystals of ZnSe, phosphorus-doped ZnSe and phosphorus with Gallium-doped ZnSe have been grown by physical vapour transport technique. The thermal properties like thermal diffusivity, effusivity and conductivity are studied using photoacoustic spectroscopy and differential scanning calorimetry, for the use of substrate. Their optical properties are also studied using Raman, photoluminescence and photocurrent for the study of the site symmetry of the phosphorus. Our measurements reveal the possibility of phosphorus going to deep level thus reducing to C_3v level.     

Study of growth and doping of semiconductor films by the method of computer simulation

The possibility of Computer Simulation Monte-Carlo Method for the study of growth and doping regularities of semiconductor films with diamond type lattice and for control of their parameters is considered. The events probabilities of isolation attachment and diffusion displacements of atoms on the growing surface of the basic material and doping impurities are compared. The periodic regional conditions on the boundary of the considered area are presented. It is shown the limitations of the computer simulation methods because of growth processes knowing level and computer possibility. The modeling calculations are made for growth and doping of one-component material films and for growth of two-component compounds. It can be noticed the connection between supersaturation, deposition temperature, time growth rate, surface film roughness (impurity atoms), capture coefficient, doping level, critical thickness of continuous films, defects density. Computer experimental results are compared with experimental data on growth and doping of Si, Ge, GaAs film with the various orientations from vapour or molecular beams in vacuum. The ways of further development of computer simulation method are discussed.     

Low-temperature growth and doping of InP:S single crystals from melt-solution in microgravity

The effect of microgravity on the growth of bulk InP:S single crystals from a melt with an initial equilibrium composition (84 at % In, 16 at % P, and ～2.2 × 10¹⁸ at cm^?3 of S) on board the Foton-11 satellite was investigated. The growth of crystals on board the satellite and on Earth (a reference crystal) was carried out by the traveling heater method. The samples of the grown crystals were investigated by metallography, double-crystal X-ray diffractometry, single-and double-crystal X-ray topography, and secondary-ion mass spectrometry. It is shown that the mass transfer in the melt in microgravity is similar to the diffusion mode. Hence, the mass transfer in the melt results in the following: the formation of a nonstationary boundary layer, depleted in phosphorus; the constitutional supercooling at the crystallization front accompanied with the development of a cellular substructure in the early growth stage; and the hypothetical phase structurization of the transition layer with the formation of In-based associates (clusters), which were found in the grown crystals in the form of spherical defects 10–20 μm in diameter. The coefficients of sulfur distribution k₀ = 0.274 and k_eff = 0.43, the sulfur diffusivity in the melt D_S = 4.2 × 10^?7 cm²/s, and the effective thickness of the transition layer δ = 0.07 cm in terrestrial gravity are determined. The data obtained are necessary to develop a mathematical model of crystallization in zero gravity.     

Kinetical study of the nonstoichiometric vapour growth process in the system ZnSe:I2

We have studied the growth of ZnSe crystals by chemical transport in a closed system in nonstoichiometric conditions, and we have deduced that the interface kinetics is the phenomenon limiting the growth process. The effect on the growth process of the deviation from stoichiometry of the II‐VI compound was investigated using a mathematical model that involves indirect data computed from directly obtained experimental values. The experimental crystallization rate was compared with the maximum value of the transport flux calculated using the Arizumi‐Nishinaga model. The influence of the stoichiometry of the source material and of the variations in the growth parameters (supercooling, geometrical dimension, specific loading of the ampoule and iodine concentration) on the ZnSe crystal growth process has also been studied. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Predicted nitrogen doping concentrations in silicon carbide epitaxial layers grown by hot-wall chemical vapor deposition

A simple quantitative model for the surface adsorption of nitrogen has been developed to simulate the doping incorporation in intentionally doped 4H–SiC samples during epitaxial growth. Different reaction schemes are necessary for the two faces of SiC. The differences are discussed, and implications to the necessary model adjustments are stressed. The simulations are validated by experimental values for a large number of different process parameters with good agreement.     

Photoconductivity of ZnSe:Dy

Nature of dark current has been investigated as a function of different metallic electrodes and the ambient temperature. Photoconductivity rise and decay curves have been investigated as a function of different metallic electrodes, flux and impurity concentrations, ambient temperature and the cell thickness. A maximum increase of 59 times in I_pc has been reported. Possible explanations are given for the observed effects.     

ZnSe红外窗口材料的性能及其制备

ZnSe是一种优秀的红外窗口材料,得到广泛的关注.在本文叙述了ZnSe红外窗口材料的光学特性和力学特性,以及详细地描述ZnSe体单晶熔体法、气相法、溶液法和固相再结晶制备技术及其影响因素.     

On the kinetics of nitrogen incorporation in GaP LPE layers using NH3 vapour doping

The partial substitution of N for P in GaP has a considerable effect on the luminescence quantum efficiency of GaP epitactic layers. The incorporation of N in GaP liquid phase epitactic layers using NH₃ vapour doping has been studied at different H₂ partial pressures in argon gas. It is shown that the incorporation of N in different ambients is conveniently described by just one parameter. The reaction of NH₃ with Ga is found to be an equilibrium process. The N concentration in the layer is directly proportional to the GaN concentration in the melt. From the correlation of the dissociation of NH₃ with the formation of GaN it is concluded that the NH₃ pressure, as measured in the exit gas, is not representative of the NH₃ pressure at the melt. The dissociation of NH₃ is found to be strongly retarded by H₂ owing to adsorption of H₂ on the surface of reactor materials which catalyse the dissociation.