Duplication of photoinduced azo polymer surface-relief gratings through a soft lithographic approach

In this work, a soft lithographic approach has been developed to duplicate photoinduced surface-relief-gratings (SRGs) of azo polymer films to generate the surface pattern replicas composed of different materials on various substrates. For this purpose, thin films of an epoxy-based azo polymer (BP-AZ-CA) were prepared by spin-coating, and SRGs with different structures were inscribed by exposing the films to interference patterns of Ar(+) laser beams at modest intensity (150 mW/cm(2)). Using the azo polymer films as masters, stamps of poly(dimethylsiloxane) (PDMS) were prepared by replica molding. The PDMS stamps were then used to transfer the solutions of poly(3-hexylthiophene) (P3HT), multiwalled carbon nanotube (MWNT), and BP-AZ-CA to different substrates by contact printing. Through this process, surface pattern replicas made of the functional materials were obtained. The pattern formation and quality depended on the factors such as the solution concentration, contacting time in the printing process, and printing pressure. Under the proper conditions, the printed patterns showed the same grating periods as the masters and the same relief depths as the stamps (replicas of the masters). This approach, showing some attractive characteristics such as the easiness of master preparation and the versatility of soft fabrication processes, can be applied to the fabrications of optical functional surfaces, sensors, and photonic devices.     

Versatile Stamps in Microcontact Printing: Transferring Inks by Molecular Recognition and from Ink Reservoirs

Microcontact printing is a heavily used surface modification method in materials and life science applications. This concept article focuses on the development of versatile stamps for microcontact printing that can be used to bind and release inks through molecular recognition or through an ink reservoir, the latter being used for the transfer of heavy inks, such as biomolecules and particles. Conceptually, such stamp properties can be introduced at the stamp surface or by changing the bulk stamp material; both lines of research will be reviewed here. Examples include supramolecular stamps with affinity properties, polymer‐layer‐grafted PDMS stamps, and porous multilayer‐grafted PDMS stamps for the first case, and hydrogel stamps and porous stamps made by phase‐separation micromolding for the second. Potential directions for future advancement of this field are also discussed.     

Hydrophilic elastomers for microcontact printing of polar inks

A moderately hydrophilic, thermoplastic elastomer (poly(ether-ester)) was investigated as a stamp material for microcontact printing of a polar ink: pentaerythritol-tetrakis-(3-mercaptopropionate). Stamps with a relief structure were produced from this polymer by hot embossing, and a comparison was made with conventional poly(dimethylsiloxane) (PDMS) and oxygen-plasma-treated PDMS. It is shown that the hydrophilic stamps can be used for the repetitive printing (without re-inking) of at least 10 consecutive patterns, which preserve their etch resistance, and this in rather sharp contrast to conventional and oxygen plasma-treated PDMS stamps. It is argued that these enhanced printing characteristics of the hydrophilic stamps originate from an improved wetting and solubility of polar inks in the hydrophilic stamp.     

A Simple Method for Fabricating Patterned Curvilinear Microstructures in Poly(dimethylsiloxane) by Selective Wetting

The fabrication of patterned microstructures in poly(dimethylsiloxane) (PDMS) is a prerequisite for soft lithography. Herein, curvilinear surface relief microstructures in PDMS are fabricated through a simple three‐stage approach combining microcontact printing (μCP), selective surface wetting/dewetting and replica molding (REM). First, using an original PDMS stamp (first‐generation stamp) with linear relief features, a chemical pattern on gold substrate is generated by μCP using hexadecanethiol (HDT) as an ink. Then, by a dip‐coating process, an ordered polyethylene glycol (PEG) polymer‐dot array forms on the HDT‐patterned gold substrate. Finally, based on a REM process, the PEG‐dot array on gold substrate is used to fabricate a second‐generation PDMS stamp with microcavity array, and the second‐generation PDMS stamp is used to generate third‐generation PDMS stamp with microbump array. These fabricated new‐generation stamps are utilized in μCP and in micromolding in capillaries (MIMIC), allowing the generation of surface micropatterns which cannot be obtained using the original PDMS stamp. The method will be useful in producing new‐generation PDMS stamps, especially for those who want to use soft lithography in their studies but have no access to the microfabrication facilities.     

Fabrication of fluorescent surface relief patterns using AIE polymer through a soft lithographic approach

A new aggregation‐induced emission (AIE) active polymer (PS‐TPE) with high tetraphenylethene (TPE) loading density was synthesized. The synthesized polymer showed significant AIE properties, good solubility and high thermal stability. Soft‐lithographic contact printing process by using photoinduced surface relief structures on azo polymer film as masters and duplicated PDMS elastomer as stamps was used to fabricate fluorescent PS‐TPE patterns. Various fluorescent structures with high contrast including surface relief gratings, periodically dotted patterns, and quasi‐crystal structures can be easily fabricated through this approach. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1838–1845     

Reactive microCP on ultrathin block copolymer films: investigation of the microCP mechanism and application to sub-microm (bio)molecular patterning

In this paper, the mechanism of the recently introduced soft lithographic patterning approach of reactive microcontact printing on thin substrate-supported polystyrene-block-poly(tert-butyl acrylate) (PS690-b-PtBA1210) films using trifluoroacetic acid (TFA)-inked elastomeric poly(dimethylsiloxane) (PDMS) stamps is investigated in detail. In this approach, solventless deprotection reactions are carried out with very high spatial definition using TFA as a volatile reagent that partitions into the PtBA skin layer. On the basis of a systematic investigation of the process, ink loading was identified as a crucial parameter for obtaining faithful pattern transfer. Using optimized conditions, submicrometer-sized patterns were successfully fabricated. In combination with subsequent wet chemical covalent coupling of various (bio)molecules, reactive microCP is established as an approach to afford positive, as well as negative, images of the features of the stamps used. In addition, the size of the patterned areas was manipulated by exploiting the controlled spreading of the ink; thus, stamps with identical features yield patterns with different sizes, yet identical periodicity, as shown for bovine serum albumin (BSA)-poly(ethylene glycol) patterns. The reactive microCP methodology affords new pathways for submicrometer-scale patterning of bioreactive surfaces.     

A method of printing uniform protein lines by using flat PDMS stamps

In this paper, we report a method of printing uniform protein lines on glass slides by using UV-treated flat PDMS stamps. Unlike traditional microcontact printing (μCP) which requires microstructured PDMS stamps, this μCP method only requires a flat PDMS stamp, an UV lamp and a number of straight needles. Our results show that lines of bovine serum albumin (BSA), immunoglobin (IgG), anti-biotin, anti-human IgG and anti-mouse IgG can be printed evenly on glass slides by using this μCP method. We also demonstrate that the printed protein lines are suitable for applications such as microfluidic immunoassays.     

Bacterial printing press that regenerates its ink: contact-printing bacteria using hydrogel stamps

This paper describes the use of micropatterned agarose stamps prepared by molding against PDMS masters to print patterns of bacteria on agar plates. Topographically patterned agarose stamps were inked with suspensions of bacteria; these stamps generated patterns of bacteria with features as small as 200 microm over areas as large as 50 cm2. Stamps with many small features (>200 microm) were used to study patterns of bacteria growing on media containing gradients of small molecules; stamps with larger features (>750 microm) were used to print different strains of bacteria simultaneously. The stamp transfers only a small percentage of cells that are on its surface to the agar at a time; it is thus possible to replica-pattern hundreds of times with a single inking. The use of soft stamps provides other useful functions. Stamps are easily customized to provide a range of patterns. When culture media is included in the agarose stamp, cells divide and thrive on the surface. The resulting "living stamp" regenerates its "ink" and can be used to pattern surfaces repetitively for a month. This method is rapid, reproducible, convenient, and can be used to control the pattern, spacing, and orientation between colonies of different bacteria.     

Nanoscopic Pd line arrays using nanocontact printed dendrimers

High-density Pd line arrays with 55 nm line-width were obtained using nanocontact-printed dendrimer monolayers. Elastomeric PDMS stamps for nanocontact printing were replicated from silicon master molds which were fabricated by UV nanoimprinting in combination with reactive ion etching. The fabrication method effectively controlled the aspect ratios of high-density lines for resolving the problems encountered in both replicating silicon masters to PDMS stamps and printing with the replicated PDMS stamps. Using the PDMS nanostamp with an optimized aspect ratio, a self-assembled monolayer of dendrimer was patterned on a Pd film via nanocontact printing, which was facilitated by the strong interaction between Pd and amine groups of the dendrimer. The patterned self-assembled monolayer was used as an etch-resist mask against the wet etchant of Pd, leaving behind a high-density Pd line array over large areas. The resulting functional Pd nanopattern is of practical significance in microelectronics and bio- or gas-sensing devices.     

Controlling the magnetic field distribution on the micrometer scale and generation of magnetic bead patterns for microfluidic applications

As is well known, controlling the local magnetic field distribution on the micrometer scale in a microfluidic chip is significant and has many applications in bioanalysis based on magnetic beads. However, it is a challenge to tailor the magnetic field introduced by external permanent magnets or electromagnets on the micrometer scale. Here, we demonstrated a simple approach to controlling the local magnetic field distribution on the micrometer scale in a microfluidic chip by nickel patterns encapsulated in a thin poly(dimethylsiloxane) (PDMS) film under the fluid channel. With the precisely controlled magnetic field, magnetic bead patterns were convenient to generate. Moreover, two kinds of fluorescent magnetic beads were patterned in the microfluidic channel, which demonstrated that it was possible to generate different functional magnetic bead patterns in situ, and could be used for the detection of multiple targets. In addition, this method was applied to generate cancer cell patterns.     

Bifunctional, chemically patterned flat stamps for microcontact printing of polar inks

Different methods to create chemically patterned, flat PDMS stamps with two different chemical functionalities were compared. The best method for making such stamps, functionalized with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (PFDTS) and 3-(aminopropyl)triethoxysilane (APTS), appeared to be full functionalization of a freshly oxidized flat PDMS stamp with either adsorbate, followed by renewed oxidation through a mask and attachment of the other adsorbate. These stamps were used to transfer polar inks (a thioether-functionalized dendrimer and a fluorescent dye) by microcontact printing. The PFDTS monolayer was used as a barrier against ink transfer, while the APTS SAM areas functioned as an ink reservoir for polar inks. The printing results confirmed the excellent transfer of hydrophilic inks with these stamps to gold and glass substrates, even from aqueous solutions. Attachment of a fluorescent dye on the amino-functionalized regions shows the possibility of the further modification of the chemically patterned stamps for tailoring of the stamps' properties.     

Three-dimensional interconnected microporous poly(dimethylsiloxane) microfluidic devices

This technical note presents a fabrication method and applications of three-dimensional (3D) interconnected microporous poly(dimethylsiloxane) (PDMS) microfluidic devices. Based on soft lithography, the microporous PDMS microfluidic devices were fabricated by molding a mixture of PDMS pre-polymer and sugar particles in a microstructured mold. After curing and demolding, the sugar particles were dissolved and washed away from the microstructured PDMS replica revealing 3D interconnected microporous structures. Other than introducing microporous structures into the PDMS replica, different sizes of sugar particles can be used to alter the surface wettability of the microporous PDMS replica. Oxygen plasma assisted bonding was used to enclose the microstructured microporous PDMS replica using a non-porous PDMS with inlet and outlet holes. A gas absorption reaction using carbon dioxide (CO(2)) gas acidified water was used to demonstrate the advantages and potential applications of the microporous PDMS microfluidic devices. We demonstrated that the acidification rate in the microporous PDMS microfluidic device was approximately 10 times faster than the non-porous PDMS microfluidic device under similar experimental conditions. The microporous PDMS microfluidic devices can also be used in cell culture applications where gas perfusion can improve cell survival and functions.     

Microscale features and surface chemical functionality patterned by electron beam lithography: a novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication

Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact printing, yet there are few methods available to pattern a completed PDMS stamp in a single step. It is shown here that electron beam lithography (EBL) is effective in writing patterns directly onto cured PDMS stamps, thus overcoming the need for multiple patterning steps. Not only does this method allow the modification of an existing lithographic pattern, but new 3D features such as cones, pits, and channels can also be fabricated. EBL can also be used to fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a photoresist is achieved. Additionally, direct EBL writing of surface chemical features has been achieved using a PDMS stamp coated with a self-assembled monolayer. An electrostatic mechanism appears to be operative in the EBL patterning process, as supported by calculations, thermogravimetric analysis, time-of-flight secondary ion mass spectroscopy, optical and atomic force microscopy, and chemical functionalization assays.     

Patterning of sol gel thin films by capillary force assisted soft lithographic technique

Patterning of sol gel based silica and silica–titania films has been developed at room temperature by soft lithographic technique. Corresponding metal alkoxides have been utilized for the preparation of precursor sols. Elastomeric stamps of polydimethylsiloxane (PDMS) are used to emboss patterns of a master grating on the as-prepared silica and silica–titania films obtained by sol gel process. Pressure-less capillary force lithography has been used to fabricate both 1-D and 2-D ordered structures of simple stripe patterns. A modified solvent assisted lithography and micro-molding in capillaries yielded stable and high fidelity 1-D structures for silica and silica–titania films over a large area.     

Oxygen plasma-treatment effects on Si transfer

Oxygen plasma-treatment is commonly used to increase the hydrophilicity of poly(dimethylsiloxane) (PDMS) stamps used for microcontact printing (muCP) aqueous-based inks. Review of the literature reveals that a wide range of plasma parameters are currently employed to modify stamp surfaces. However, little is known about the effect of these parameters (e.g., power, chamber pressure, duration) on the undesirable transfer of low-molecular-weight silicon-containing fragments from the stamps that commonly occurs during muCP. To study the effect of oxygen plasma-treatment on Si transfer, unpatterned PDMS stamps were treated with oxygen plasma under various conditions and used to stamp deionized water on plasma-activated poly(methyl methacrylate) (PMMA) substrates. Once stamped, the PMMA substrates were analyzed with X-ray photoelectron spectroscopy (XPS) to quantify and characterize silicon present on the substrate surface. In addition, used PDMS stamps were analyzed with scanning electron microscopy (SEM) to observe topographical changes that occur during oxygen plasma-treatment. XPS results show that all plasma treatments studied significantly reduced the amount of Si transfer from the treated stamps during muCP as compared to untreated PDMS stamps and that the source of transfer is residual PDMS fragments not removed by oxygen plasma. SEM results show that, although the treated stamps undergo a variety of topographical changes, no correlation exists between stamp topography and extent of Si transfer from the stamps.     

Simplest method for creating micropatterned nanostructures on PDMS with UV light

The fabrication of micropatterned structures on PDMS is a critical step in soft lithography, microfluidics, and many other PDMS-based applications. To substitute traditional mold-casting methods, we develop a simple method to create micropatterned nanostructures on PDMS in one step. After exposing a flat PDMS surface to a UV pen lamp through a photomask (such as a TEM grid), micropatterned nanostructures can be formed readily on the PDMS surface. We also demonstrate that fabricated PDMS can be used for the microcontact printing of protein immunoglobulin (IgG) on solid surfaces. This method is probably the simplest method of creating micropatterned nanostructures on PDMS reported so far because it does not need casting, surface coating, or chemical reagents. Only a UV pen lamp and a photomask are required, and this method can be performed under ambient conditions without vacuum. We expect that this method will greatly benefit researchers who use PDMS regularly in various applications such as soft lithography and microfluidics.     

Micro/nanopatterning of proteins via contact printing using high aspect ratio PMMA stamps and nanoimprint apparatus

Micro- and nanoscale protein patterns have been produced via a new contact printing method using a nanoimprint lithography apparatus. The main novelty of the technique is the use of poly(methyl methacrylate) (PMMA) instead of the commonly used poly(dimethylsiloxane) (PDMS) stamps. This avoids printing problems due to roof collapse, which limits the usable aspect ratio in microcontact printing to 10:1. The rigidity of the PMMA allows protein patterning using stamps with very high aspect ratios, up to 300 in this case. Conformal contact between the stamp and the substrate is achieved because of the homogeneous pressure applied via the nanoimprint lithography instrument, and it has allowed us to print lines of protein approximately 150 nm wide, at a 400 nm period. This technique, therefore, provides an excellent method for the direct printing of high-density sub-micrometer scale patterns, or, alternatively, micro-/nanopatterns spaced at large distances. The controlled production of these protein patterns is a key factor in biomedical applications such as cell-surface interaction experiments and tissue engineering.     

Fabrication of photoprocessible azo polymer microwires through a soft lithographic approach

In this work, a soft lithographic approach has been developed to fabricate free-standing azo polymer microwires with unique photoprocessible characteristics. In the process, an epoxy-based azo polymer (BP-AZ-CA) was used to prepare both the soft lithographic masters and the microwires. The masters were prepared by photofabricating surface relief gratings on BP-AZ-CA thin films. Then the elastomeric stamps were prepared by replica molding of poly(dimethylsiloxane) prepolymer against the masters. With use of the stamps and a solution of BP-AZ-CA as "ink", the microwires were prepared by contact printing and wet etching. The microwires possessed a uniform sub-micrometer-scale transverse dimension and macroscopic longitudinal dimension. Those characteristic sizes depended on the adjustable features of the masters and stamps used in the process. The transverse dimension of the microwires could be altered after exposure to a linearly polarized Ar+ laser single beam with the polarization direction perpendicular to the longitudinal axes of the microwires. Upon irradiation of interfering p-polarized Ar+ laser beams, regular surface relief structures could be inscribed on the microwires along the longitudinal direction, which coincided with both the polarization direction of the laser beams and the grating vector direction of the interference pattern. The microwires with photoprocessible properties are potentially usable as sub-micrometer-scale materials in future miniaturized components and devices. The approach reported in this work can be further extended to the fabrication of nano-/microwires from other polymeric materials.     

Azo polymer microspherical cap array: soft-lithographic fabrication and photoinduced shape deformation behavior

In this work, azo polymer microspherical cap arrays possessing unique photoprocessible properties have been fabricated through a soft-lithographic contact printing approach. In the process, hexagonal polystyrene (PS) colloidal arrays, obtained by the vertical deposition method, were used as masters. Poly(dimethylsiloxane) (PDMS) stamps with aligned hemisphere air voids on the surfaces were obtained by casting the precursor against the colloidal arrays. By using the stamps and a solution of an epoxy-based azo polymer (BP-AZ-CA) as "ink", the microspherical cap arrays were fabricated by pressing the "inked" surfaces against substrates. Uniform 2D arrays of the submicrometer spherical caps could be obtained on the substrates after peeling off the stamps and drying. The characteristic sizes of the arrays depended on some adjustable features, such as the diameters of PS spheres and concentrations of the "inks" used in the process. After exposure to a linearly polarized Ar+ laser single beam, the spherical caps could be stretched along the polarization direction, and the arrays were consequently transformed into ellipsoidal cap arrays. Upon irradiation of interfering p-polarized Ar+ laser beams, only the spherical caps in the bright fringes were deformed by the light irradiation, which resulted in more complicated surface relief patterns. The observation gives another well-defined example of the photoinduced mass migration in the submicrometer scale. The approach can potentially be applied to fabrication of microlens arrays with different converging rate in two directions.     

Applying magnetic soft mold imprint technology with ultraviolet light‐emitting‐diode array on the fabrication of microlens arrays

This study proposed a novel technology, which uses exposed technology with ultraviolet light‐emitting‐diode (UV‐LED) arrays and the polydimethylsiloxane (PDMS) magnetic flexible soft mold imprint technology, to develop exposed equipments with UV‐LED arrays. This study used magnetic soft mold imprint technology to replicate the structure of microlens, providing a more effective alternative for imprint technology and application. The measurement results showed that PDMS with magnetic iron powder can precisely cast mold to replicate the structures of microlens. Electromagnetic plates were used to control even imprinting with magnetic force, in order to fill the mold of micro‐structure of the photo‐resist. Magnetic iron powder was added to PDMS to produce composite material, which can effectively avoid the transformation of pure PDMS during soft mold imprinting, and increase mechanical strength. Magnetic PDMS soft mold is easy to make, and the casting time is short, so that costs can be effectively reduced. Also with advantages of less free energy on its surface, and unlikely to adhere to the photo‐resist during imprinting, it can be combined with electromagnetic plates evenly to control the magnetic soft mold. This imprinting technology is a big advantage to the production process of micro‐structures during imprinting. Copyright © 2009 John Wiley & Sons, Ltd.