Optimization of control parameters of cadmium zinc telluride Bridgman single crystal growth

The temperature gradient within a furnace chamber and the crucible pull rate are the key control parameters for cadmium zinc telluride Bridgman single crystal growth. Their effects on the heat and mass transfer in front of the solid‐liquid interface and the solute segregation in the grown crystal were investigated with numerical modeling. With an increase of the temperature gradient, the convection intensity in the melt in front of the solid‐liquid interface increases almost proportionally to the temperature gradient. The interface concavity decreases rapidly at faster crucible pull rates, while it increases at slow pull rates. Moreover, the solute concentration gradient in the melt in front of the solid‐liquid interface decreases significantly, as does the radial solute segregation in the grown crystal. In general, a decrease of the pull rate leads to a strong decrease of the concavity of the solid‐liquid interface and of the radial solute segregation in the grown crystal, while the axial solute segregation in the grown crystal increases slightly. A combination of a low crucible pull rate with a medium temperature gradient within the furnace chamber will make the radial solute segregation of the grown crystal vanish. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Nd:YVO4 crystal growth by Czochralski technique with a submerged plate

This paper is to investigate the growth of Nd:YVO₄ (yttrium vanadate) crystal by the modified Czochralski technique with a submerged plate. Numerical studies are performed to examine melt convection and heat transfer during Nd:YVO₄ growth. The attention is paid to study the effects of initial elevation of the submerged plate, crystal diameter, and melt level on melt inclusions. It is found that the increase in crystal rotation rate and crystal diameter, and the decrease in melt level will increase the axial temperature gradient at the edge and in the center of the crystal, and change the interface shape from convex to flat. The experiments are also carried out to confirm the feasibility of the proposed new technique for controlling melt inclusions in Nd:YVO₄ crystal growth.     

Influence of the crucible bottom shape on the heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth

For the seeding process of oxide Czochralski crystal growth, influence of the crucible bottom shape on the heat generation, temperature and flow field of the system and the seed‐melt interface shape have been studied numerically using the finite element method. The configuration usually used in a real Czochralski crystal growth process consists of a crucible, active afterheater, induction coil with two parts, insulation, melt, gas and seed crystal. At first, the volumetric distribution of heat inside the metal crucible and afterheater inducted by the RF‐coil was calculated. Using this heat generation in the crucible wall as a source the fluid flow and temperature field of the entire system as well as the seed‐melt interface shape were determined. We have considered two cases, flat and rounded crucible bottom shape. It was observed that using a crucible with a rounded bottom has several advantages such as: (i) The position of the heat generation maximum at the crucible side wall moves upwards, compared to the flat bottom shape. (ii) The location of the temperature maximum at the crucible side wall rises and as a result the temperature gradient along the melt surface increases. (iii) The streamlines of the melt flow are parallel to the crucible bottom and have a curved shape which is similar to the rounded bottom shape. These important features lead to increasing thermal convection in the system and influence the velocity field in the melt and gas domain which help preventing some serious growth problems such as spiral growth. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

ACRT forced convection and its effects on solute segregation and heat and mass transfer during single crystal growth

A numerical simulation study was carried out for CdZnTe vertical Bridgman method crystal growth with the accelerated crucible rotation technique (ACRT). The convection, heat and mass transfer in front of the solid‐liquid interface, and their effects on the solute segregation of the grown crystal can be characterized with the following. ACRT brings about a periodic forced convection in the melt, of which the intensity and the incidence are far above the ones of the natural convection without ACRT. This forced convection is of multiformity due to the changes of the ACRT parameters. It can result in the increases of both the solid‐liquid interface concavity and the temperature gradient of the melt in front of the solid‐liquid interface, of which magnitudes vary from a little to many times as the ACRT wave parameters change. It also enhances the mass transfer in the melt in a great deal, almost results in the complete uniformity of the solute distribution in the melt. With suitable wave parameters, ACRT forced convection decreases the radial solute segregation of the crystal in a great deal, even makes it disappear completely. However, it increases both the axial solute segregation and the radial one notably with bad wave parameters. An excellent single crystal could be gotten, of which the most part is with no segregation, by adjusting both the ACRT wave parameters and the crystal growth control parameters, e.g. the initial temperature of the melt, the temperature gradient, and the crucible withdrawal rate. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Global simulation of a Czochralski furnace for silicon crystal growth against the assumed thermophysical properties

In order to understand the effects of the thermophysical properties of the melt on the transport phenomena in the Czochralski (Cz) furnace for the single crystal growth of silicon, a set of global analyses of momentum, heat and mass transfer in small Cz furnace (crucible diameter: 7.2 cm, crystal diameter: 3.5 cm, operated in a 10 Torr argon flow environment) was carried out using the finite‐element method. The global analysis assumed a pseudosteady axisymmetric state with laminar flow. The results show that different thermophysical properties will bring different variations of the heater power, the deflection of the melt/crystal interface, the axial temperature gradient in the crystal on the center of the melt/crystal interface and the average oxygen concentration along the melt/crystal interface. The application of the axial magnetic field is insensitive to this effect. This analysis reveals the importance of the determination of the thermophysical property in numerical simulation. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 2: rotating seed

In this paper, the role of seed rotation on the characteristics of the two‐dimensional temperature and flow field in the oxide Czochralski crystal growth system has been studied numerically for the seeding process. Based on the finite element method, a set of two‐dimensional quasi‐steady state numerical simulations were carried out to analyze the seed‐melt interface shape and heat transfer mechanism in a Czochralski furnace with different seed rotation rates: ω_seed = 5‐30 rpm. The results presented here demonstrate the important role played by the seed rotation for influencing the shape of the seed‐melt interface during the seeding process. The seed‐melt interface shape is quite sensitive to the convective heat transfer in the melt and gaseous domain. When the local flow close to the seed‐melt interface is formed mainly due to the natural convection and the Marangoni effect, the interface becomes convex towards the melt. When the local flow under the seed‐melt interface is of forced convection flow type (seed rotation), the interface becomes more concave towards the melt as the seed rotation rate (ω_seed) is increased. A linear variation of the interface deflection with respect to the seed rotation rate has been found, too. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of crystal growth process of bulk Si and nitrides – a review

Heat and mass transfer during crystal growth of bulk Si and nitrides by using numerical analysis was studied. A three‐dimensional analysis was carried out to investigate temperature distribution and solid‐liquid interface shape of silicon for large‐scale integrated circuits and photovoltaic silicon. The analysis enables prediction of the solid‐liquid interface shape of silicon crystals. The result shows that the interface shape became bevel like structure in the case without crystal rotation. We also carried out analysis of nitrogen transfer in gallium melt during crystal growth of gallium nitride using liquid‐phase epitaxy. The result shows that the growth rate at the center was smaller than that at the center. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

The numerical simulation of heat and mass transfer during growth of a binary system by the travelling heater method

The influence of convection and heat and mass transfer on the shape and position of melt/solid interfaces and on radial composition segregation is analysed numerically for the travelling heater method growth of a binary alloy in a vertical transparent ampoule. Results are presented for crystal and melt with thermophysical properties similar to Cd_xHg_1−xTe with the assumption that the pseudobinary CdTe-HgTe phase diagram is true. The two-dimensional axisymmetric heat transfer equation, hydrodynamical equation and convective diffusion equation are included in the mathematical model. The rates of crystal growth and dissolution are supposed to be proportional to the compositional supercooling in the melt near the interfaces. It is shown for the conditions when convection is absent that the interfaces are asymmetrically positioned respectively to the heater centre line. Intensive convection makes their position more symmetrical but the length of the liquid zone greater. The flow pattern in the melt appears to be greatly influenced by solutal gravitational convection. The nonlinear dependence of the melt density on the temperature and composition are used in the model. The cases when speed of the heater is antiparallel (stable density stratification) or parallel (unstable stratification) to the vector of gravitational acceleration are considered.     

Simulation of temperature and flow fields in an inductively heated melt growth system

The goal of the research presented here is to apply a global analysis of an inductively heated Czochralski furnace for a real sapphire crystal growth system and predict the characteristics of the temperature and flow fields in the system. To do it, for the beginning stage of a sapphire growth process, influence of melt and gas convection combined with radiative heat transfer on the temperature field of the system and the crystal‐melt interface have been studied numerically using the steady state two‐dimensional finite element method. For radiative heat transfer, internal radiation through the grown crystal and surface to surface radiation for the exposed surfaces have been taken into account. The numerical results demonstrate that there are a powerful vortex which arises from the natural convection in the melt and a strong and large vortex that flows upwards along the afterheater side wall and downwards along the seed and crystal sides in the gas part. In addition, a wavy shape has been observed for the crystal‐melt interface with a deflection towards the melt. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of internal radiation on the heat transfer during growth of YAG single crystals by the Czochralski method

Heat and mass transfer taking place during growth of Y₃Al₅O₁₂ (YAG) crystals by the Czochralski method, including inner radiation, is analyzed numerically using a Finite Element Method. For inner radiative heat transfer through the crystal the band approximation model and real transmission characteristics, measured from obtained crystals, are used. The results reveal significant differences in temperature and melt flow for YAG crystals doped with different dopands influencing the optical properties of the crystals. When radiative heat transport through the crystal is taken into account the melt‐crystal interface shape is different from that when the radiative transport is not included. Its deflection remains constant over a wide range of crystal rotation rates until it finally rapidly changes in a narrow range of rotation rates. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Finite element analysis of dislocation density during bulk single crystal growth (effect of doping atoms in InP single crystal)

A computer code for simulation of dislocation density in a bulk single crystal during liquid encapsulated Czochralski (LEC) or Czochralski (CZ) growth process. In this computer code, the shape of crystal–melt interface and the temperature in a crystal at an arbitrary time were determined by linear interpolation of the results that were discretely obtained by heat conduction analysis of a CZ single crystal growth system. A dislocation kinetics model called Haasen–Sumino model was used as a constitutive equation. In this model, creep strain rate is related to dislocation density, and this model extended to multiaxial stress state was incorporated into a finite element elastic creep analysis program for axisymmetric bodies. Dislocation density simulations were performed using this computer code for InP bulk single crystals with about 8″ in diameter. In the analysis, the effect of dopant atoms on the dislocation density was examined. In the case of a low doped InP single crystal, dislocations are distributed in the whole of the crystal. On the other hand, in the case of a highly doped InP single crystal, dislocations are localized at both the central and peripheral regions of the crystal.     

Numerical investigation of the effect of heat shield shape on the oxygen impurity distribution at the crystal–melt interface during the process of Czochralski silicon crystal growth

In this study, a numerical simulation is performed to investigate the effect of the shape of the heat shield on the oxygen concentration in the melt. The results show that the oxygen concentration in the melt can be significantly decreased by increasing the speed of the argon gas near the crucible wall. This can be achieved by enlarging the horizontal length of the heat shield. The oxygen concentration at the melt–crystal interface varies with the length of the crystal growth. In the initial stage, there is a significant decrease in the oxygen concentration as the growth length increases. There is also a significant reduction in the emission of oxygen from the crucible wall due to the lower melt depth and crucible temperature. The transportation of oxygen impurity towards the melt–crystal interface is suppressed by the vortex motion in the melt. When the crystal exceeds a certain length, the oxygen concentration in the melt–crystal interface starts to increase with increasing crystal length, due to the drop in vortex motion in the melt.     

半导体单晶生长过程中的位错研究

阐述了现有的半导体单晶位错模型,即临界切应力模型和粘塑性模型的基本理论及应用状况.分析了熔体法单晶生长过程中影响位错产生、增殖的各种因素,以及抑制位错增殖的措施.与熔体不润湿、与晶体热膨胀系数相近的坩埚材料,低位错密度的籽晶可有效地抑制生长晶体的位错密度;固液界面的形状及晶体内的温度梯度是降低位错密度的关键控制因素,而两因素又受到炉膛温度梯度、长晶速率、气体和熔体对流等晶体生长工艺参数的影响.最后,对熔体单晶生长过程的位错研究进行了展望.     

Modeling analysis of liquid encapsulated Czochralski growth of GaAs and InP crystals

The results of three‐dimensional unsteady modeling of melt turbulent convection with prediction of the crystallization front geometry in liquid encapsulated Czochralski growth of InP bulk crystals and vapor pressure controlled Czochralski growth of GaAs bulk crystals are presented. The three‐dimensional model is combined with axisymmetric calculations of heat and mass transfer in the entire furnace. A comprehensive numerical analysis using various two‐dimensional steady and three‐dimensional unsteady models is also performed to explore their possibilities in predicting the melt/crystal interface geometry. The results obtained with different numerical approaches are analyzed and compared with available experimental data. It has been found that three‐dimensional unsteady consideration of heat and mass transfer in the crystallization zone provides a good reproduction of the solidification front geometry for both GaAs and InP crystal growth.     

The role of inner and internal radiation on the melt growth of sapphire crystal

In this paper, for an inductively heated Czochralski furnace used to grow sapphire single crystal, influence of the inner (wall‐to‐wall) and crystal internal (bulk) radiation on the characteristics of the growth process such as temperature and flow fields, structure of heat transfer and crystal‐melt interface has been studied numerically using the 2D quasi‐steady state finite element method. The obtained results of global analysis demonstrate a strong dependence of thermal field, heat transport structure and crystal‐melt interface on both types of radiative heat transfer within the growth furnace.     

Global analysis of heat transfer in CZ crystal growth of oxide taking into account three-dimensional unsteady melt convection: Effect of meniscus shape

A global model of heat transfer analysis for the Czochralski crystal growth of oxides, in which a three-dimensional unsteady melt flow was taken into account, was developed in our recent study. In the model, however, the focal point was the methodology of formulating the model by coupling a conventional global model of heat transfer, which is based on a pseudosteady axisymmetric assumption, with a model of a three-dimensional, unsteady melt flow via two interface models. Therefore, for simplicity, the shape of the melt free surface was assumed to be flat. In this study, the global model was further developed by considering the meniscus of the melt free surface. It was found that the meniscus of the melt free surface caused the melt flow to be more unstable and shifted the critical Reynolds number at which the melt/crystal interface inversion occurs toward a much lower value.     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 1: non‐rotating seed

For the seeding process of oxide Czochralski crystal growth, the flow and temperature field of the system as well as the seed‐melt interface shape have been studied numerically using the finite element method. The configuration usually used initially in a real Czochralski crystal growth process consists of a crucible, active afterheater, induction coil with two parts, insulation, melt, gas and non‐rotating seed crystal. At first the volumetric distribution of heat inside the metal crucible and afterheater inducted by the RF coil was calculated. Using this heat source the fluid flow and temperature field were determined in the whole system. We have considered two cases with respect to the seed position: (1) before and (2) after seed touch with the melt. It was observed that in the case of no seed rotation (ω_seed = 0), the flow pattern in the bulk melt consists of a single circulation of a slow moving fluid. In the gas domain, there are different types of flow motion related to different positions of the seed crystal. In the case of touched seed, the seed‐melt interface has a deep conic shape towards the melt. It was shown that an active afterheater and its location with respect to the crucible, influences markedly the temperature and flow field of the gas phase in the system and partly in the melt. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Thermal stress relaxation phenomenon through forming the interstitial region in CZ silicon pulled with rapid and slow cooling heat shields

This review article aims to clarify a mechanism of point defects formation in a CZ Si crystal through an experimental arrangement using the two kinds of heat shields with different slow-pulling periods. Point defects in a melt grown silicon crystal have been studied for a long time. The author and his co-researchers have reported about “Mechanism for generating interstitial atoms by thermal stress during silicon crystal growth” [in Progress in Crystal Growth and Characterization of Materials, 66 (2019) 36-46]. The experimental arrangement includes constant growing, changing pulling rate and finally detaching crystals from the melt. The two types of heat shields were used to change the cooling history of the grown crystals, for changing a temperature gradient at a bulk part in the grown crystal, G_b. In order to prove that the formation of an interstitial region or a boundary of vacancies (Vs)/interstitials (Is) in a silicon crystal is a phenomenon of relaxing thermal stress, the author explains that a G_b in a crystal forms thermal stress and causes some silicon atoms at lattice positions to move to the closest interstitial sites to relax the stress. The author defines a new term of metastable interstitial atom, I’, or I's as the plural of I’. The I’ coexists with the metastable vacancy V’ from where the I’ is displaced. The plural of V’ is defined to be V's. The author defines the above state to be a complex (I’+ V’), or (I ’+ V’)s as the plural of (I’+ V’), and explains that the (I’+ V’) s convert to Is and form the Is region. The (I’+ V’) is considered as the Frenkel pair-like complex.The crystals were firstly pulled with a high pulling rate, and the pulling rate was consequently decreased to a slow one. Then the crystals were pulled with the slow constant pulling rate for different periods making different cooling processes. Finally, the grown crystals were detached from the melt and cooled rapidly. Characterization of defects, such as Vs, Is, and defect-free (D-F) regions were identified in X-ray topographs (XAOP(s)). Wafer lifetime mapping (WLTM(s)) allows confirming dislocation loop (DL) regions. The results show that the Is are generated depending on the pulling period of the slow pulling and the shapes of the heat shields. The Is and DL regions are formed in a region at temperatures near the melting point. The Is form an Is region through a defect-free (D-F) region, forming the Vs/Is boundary. When the thermal stress weakens, the DL region changes to the Is region; the Is region changes to the D-F region; and the D-F region changes to the Vs region. Temperature gradient distribution is induced toward various directions at different parts of the growing crystal depending on the different slow-pulling periods. The temperature gradient, G_b, includes a temperature gradient from the cooled region shaded by the heat shield to the growth interface and a temperature gradient from the upper surface cooled during the long-time growth to the growth interface. The G_b exceeding a certain threshold at near the melting point forms thermal stress, generating Is to relax the stress.     

Numerical simulation of the growth of 2″ diameter GaAs crystals by the vertical gradient freeze technique

We present a global two-dimensional model of a multi-zone-furnace for the growth of GaAs using the bottom-seeded vertical gradient freeze (VGF) technique. The finite element code FIDAP was used to perform calculations of the heat transfer due to radiation and conduction in the whole furnace. The numerical results show a good agreement between measured and calculated temperature distributions in the furnace and calculated/measured power consumptions of the heaters. Quasi-steady-state calculations for a typical growth process were performed and the influence of different growth velocities on the interface shape was analyzed.     

Mathematical modeling and experimental investigation of the effect of temperature gradients on crystallization processes under terrestrial and space conditions

Mathematical modeling of the processes of heat and mass transfer during directed crystallization under terrestrial and space conditions is performed on the basis of experimental data on the temperature distribution (boundary conditions). Convective processes are described by the system of Oberbeck-Boussinesq equations together with the heat-conduction equation (the Stefan problem). A dependence of the intensity of thermal gravitational convection on the radial and axial temperature gradients is established. It is shown that one of the necessary conditions for the growth of homogeneous semiconductor crystals under both terrestrial and zero-gravity (on board spacecraft) conditions is the absence of the free surface of a melt (the Marangoni convection) and optimization of the temperature gradients (first of all, the radial gradient).