4H-SiC同质外延生长及Ti/4H-SiC肖特基二极管

利用台阶控制外延生长技术在偏晶向Si-面衬底上进行了4H-SiC的同质外延生长研究,衬底温度为1500℃,在厚度为32μm、载流子浓度为2～5×1015cm-3的外延材料上制备出了反向阻塞电压大于1kV的Ti/4H-SiC肖特基二极管,二极管的正向与反向电流的整流比(定义偏压为±1V时的电流比值)在室温下超过107,在265℃的温度下超过102,在20～265℃的温度范围内,利用电流电压测量研究了二极管的电学特性,室温下二极管的理想因子和势垒高度分别为1.33和0.905eV,开态电流密度在2.0V的偏压下达到150A/cm2,比开态电阻(Ron)为7.9mΩ·cm2,与温度的关系遵守Ron～T2.0规律.     

Growth and electrical properties of epitaxial CuInS2 thin films on GaAs substrates

CuInS₂ thin films with thicknesses in the range of 500 Å were deposited onto semi-insulating (111) A-oriented GaAs substrates by flash evaporation in the substrate temperature range T_sub = 570 … 870 K. Epitaxial growth begins at T_sub = 645 K. The films had always the chalcopyrite structure. Indications to a transition from the chalcopyrite phase to the sphalerite phase were observed at T_sub = 870 K. Films grown at T_sub ≦ 800 K showed n-type conductivity whereas at growth temperatures T_sub ≧ 850 K the films were always p-type conducting. A donor level and an acceptor level with ionization energies of 0.24 eV and 0.22 eV, respectively, were found from an analysis of the electrical measurements.     

6H-SiC单晶(0001)Si-面的表面生长形貌

利用光学显微镜的反射模式观察了升华法生长的6H-SiC单晶(0001)Si-面的生长形貌,应用台阶仪测定了生长台阶高度.实验发现,6H-SiC单晶的生长台阶呈螺旋状,生长台阶呈现出了韵律束合现象.在单晶中间部分,生长台阶稀疏,台面较宽,约80μm左右,台阶高度较小,约20～50nm,比较宽的台面上存在小生长螺旋.外围单晶区域,生长台阶比较密集,其台阶高度较大,约300～700nm,台面宽度较小,约2～5μm.生长台阶在前进过程中受单晶中的微管缺陷影响,在微管的附近出现弯曲.     

Suppression of growth domains in epitaxial ZnO films on structured (0001) sapphire surface

Zinc oxide layers have been grown by magnetron sputtering in an oxygen atmosphere on structured sapphire surfaces. The formation of ZnO islands oriented in two directions (the so-called domains) was observed on (0001) Al₂O₃ surfaces with steps spaced by a distance from several thousands to several tens of thousands of nanometers. The islands formed along steps on (0001) Al₂O₃ surfaces with an ordered terrace-step structure (and, subsequently, ZnO films) have only one orientation. Another method is proposed for suppressing domains during ZnO growth on (0001) Al₂O₃ d.     

Growth of epitaxial TmFeCuO4 thin films by pulsed laser deposition

Epitaxial thin films of TmFeCuO₄ with a two-dimensional triangular lattice structure were successfully grown on yttria-stabilized-zirconia substrates by pulsed laser deposition and ex situ annealing in air. The films as-deposited below 500 °C showed no TmFeCuO₄ phase and the subsequent annealing resulted in the decomposition of film components. On the other hand, as-grown films deposited at 800 °C showed an amorphous nature. Thermal annealing converted the amorphous films into highly (0 0 1)-oriented epitaxial films. The results of scanning electron microscopic analysis suggest that the crystal growth process during thermal annealing is dominated by the regrowth of non-uniformly shaped islands to the distinct uniform islands of hexagonal base.     

Growth of epitaxial thin films of scandium nitride on 100-oriented silicon

A series of 100-oriented ScN films was grown under N-rich conditions on 100-oriented Si using different Sc fluxes. The ScN films grew in an epitaxial cube-on-cube orientation, with [0 0 1]_ScN//[0 0 1]_Si and [1 0 0]_ScN//[1 0 0]_Si, despite the high (11%) lattice mismatch between ScN and Si. The film grain size increases and the film ω-FWHM decreases with increasing Sc flux, but the film roughness increases. Films grown under similar conditions on 111-oriented Si resulted in mixed 111 and 100 orientations, indicating that the 100 orientation is favoured both due to texture inheritance from the substrate and due to the growth conditions used.     

Microstructure and strain relaxation of orthorhombic TmMnO3 epitaxial thin films

Orthorhombic TmMnO₃ (o-TMO) thin films have been epitaxially stabilized on (110) SrTiO₃ substrates by pulsed laser deposition (PLD) technique. The microstructure and strain relaxation mechanism of o-TMO thin films are analyzed using transmission electron microscopy. It is shown that major defects in the films are misfit dislocations with Burgers vectors of type a_p〈010〉 and a_p〈110〉, whereas a_p〈110〉 dislocations tend to dissociate into partial dislocations with Burgers vectors of type 1/2a_p〈110〉. Strain in o-TMO films is relaxed by misfit dislocations as well as surface fluctuations, which is different from most of the previous studies of the perovskite thin films.     

Real structure of the ZnO epitaxial films on (0001) leucosapphire substrates coated by ultrathin gold layers

The real structure of ZnO films formed by magnetron sputtering on (0001) leucosapphire substrates coated by an ultrathin (less than 0.7 nm) Au buffer layer has been studied by high-resolution microscopy. It is shown that modification of the leucosapphire substrate surface by depositing ultrathin Au layers does not lead to the formation of Au clusters at the film–substrate interface but significantly improves the structural quality of ZnO epitaxial films. It is demonstrated that the simplicity and scalability of the technique used to modify the substrate surface in combination with a high (above 2 nm/s) film growth rate under magnetron sputtering make it possible to obtain high-quality (0001) ZnO epitaxial films with an area of 5–6 cm².     

Growth and morphology of 6H-SiC epitaxial layers by CVD

Single crystals of 6H-SiC were epitaxially grown on 6H-SiC substrates in the temperature range of 1500 to 1750°C with gas composition: H₂ ≈ 1 l/min, SiCl₄ ≈ 1 ml/min, C₃H₈ ≈ 0.05 ml/min. The grown layers were transparent and mirror-like. The morphology of the grown layer was strongly influenced by the polarity of the substrate surface. Aggregates of trapezoidal crystals were observed on the (000$\text{1}$)C surface and a mosaic pattern was observed on the (0001)Si surface. By observing the initial stage of the crystal growth, the growth mechanism of 6H-SiC is discussed. On (000$\text{1}$)C surfaces the vertical growth dominates, while on (0001)Si surfaces the lateral growth dominates.     

Growth and characterization of semiconducting cadmium selenide thin films

Semiconducting thin films of cadmium selenide have been grown by conventional thermal evaporation technique. The effect of various growth parameters like rate of deposition and deposition temperature has been studied in detail. Films deposited at room temperature are cadmium rich with segregated selenium globules. A deposition temperature of 453 K has been found to yield stoichiometric, homogeneous films. The films have been analysed for optical band gap and thermal activation energies. Films of low electrical resistivity have been obtained for possible applications.     

Growth and characterization of zirconium oxide thin films on silicon substrate

The growth and characterization of zirconium oxide (ZrO₂) thin films prepared by thermal oxidation of a deposited Zr metal layer on SiO₂/Si were investigated. Uniform ZrO₂ thin film with smooth surface morphology was obtained. The thermal ZrO₂ films showed a polycrystalline structure. The dielectric constant of the ZrO₂ film has been shown to be 23, and the equivalent oxide thickness (EOT) of the ZrO₂ stacked oxide is in the range of 3.38–5.43 nm. MOS capacitors with ZrO₂ dielectric stack show extremely low leakage current density, less than 10^?6 A/cm² at ?4 V. Consequently, using this method, high-quality ZrO₂ films could be fabricated at oxidation temperature as low as 600 °C.     

Hydrothermal synthesis of BaTiO3 thin films on nanoporous TiO2 covered Ti substrates

It is well known that there is an upper limit (<0.25 μm) for the thickness of hydrothermal thin films grown on Ti substrate in the 100–200 °C temperature range, even the reaction time is extended to several weeks. In this paper, BaTiO₃ thin films have been firstly hydrothermally synthesized on titanium substrates covered with a nanoporous TiO₂ layer. By using TiO₂ covered substrates, the thickness of BaTiO₃ films can easily reach ∼1.0 μm at 110 °C after only 2 h hydrothermal treatment. It is found that the large quantity of pores with size at the tens of nanometer range in the oxide layer served as easy paths for the diffusion of Ba²⁺ and OH⁻ and enabled the film grow thicker. SEM and XRD results show that the films are crack-free and in polycrystalline phase.     

Growth control of stoichiometry in LaMnO3 epitaxial thin films by pulsed laser deposition

We have studied structural, magnetic, and optical transport properties of LaMnO₃ (LMO) thin films grown on SrTiO₃. While the stoichiometric LMO is an insulating antiferromagnet, it tends to be a ferromagnetic insulator when grown as thin films. By exploring the majority of growth parameters, we have found that the bulk-like electronic and magnetic phases can be stabilized by growing thin films under reducing atmospheres and by using more energetic laser processes. These conditions are found to reduce the La deficiency in the film resulting in the greatly improved cation stoichiometry. Since oxides are prone to reduce the oxygen content and to alter the cation ratio under such growth conditions, it suggests that the cation and oxygen stoichiometries in complex oxide thin films can be improved by properly optimizing the growth parameters.     

Growth and characterization of ferroelectric‐ferroelastic Tb2(MoO4)3 crystals

Transparent and nearly colorless ferroelectric‐ferroelastic β′‐Tb₂(MoO₄)₃ (TMO) single crystals have been grown by the Czochralski (CZ) method. The single crystal structure was investigated by X‐ray powder diffraction and was shown to be a single phase with the structure similar as the β′‐Gd₂(MoO₄)₃ crystal. The optical transparency of the TMO crystal has been measured and the crystal is almost transparent in the visible and near infrared regions. The defects of TMO crystal were evaluated by etching technique and the ferroelectric domain structures were observed by an optical microscope. A high‐resolution X‐ray diffraction analysis demonstrates that the as‐grown TMO crystal possesses relatively high optical quality. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth,structure, and stoichiometry of epitaxial Cu-III-VI2 films on CaF2 substrates

Thin films of CuInTe₂, CuInSe₂, CuInS₂, CuGaSe₂ and CuGaS₂ were deposited onto (111)-and (100)-oriented CaF₂ substrates by flash evaporation technique. Epitaxial growth occurs at substrate temperatures in the range from 750 to 900 K, dependent on the kind of film material. Contrary to the case of GaAs, GaP and Ge substrates there are always polycrystalline parts. The layers were found to be single phase and crystallizing in the chalcopyrite structure only. The composition of the films varied in dependence on the substrate temperature. In the range of about 700 K a nearly stoichiometric composition was found.     

Growth and characterization of KBi(WO4)2 single crystals

Potassium bismuth tungstate [KBi(WO₄)₂] single crystals with dimensions up to 20 mm × 15 mm × 15 mm have been successfully grown by using the top‐seeded solution growth technique and K₂W₂O₇ as solvent. Experiments show that this crystal is unstable in a strong acid or alkali environment and has a blue fluorescence emission. The density, hardness, melting point, absorption edge, transparency range, prominent Raman shift frequency are 7.57 g/cm³, 238 kg/mm², 800 °C, 380 nm, 400–5450 nm, 868 cm^–1 respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth of boron nitride films on w‐AlN (0001), 4° off‐cut 4H‐SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Deposition

Boron Nitride is a promising group 13–group 15 compound material that exhibits various interesting properties like wide band gap, chemical stability, attractive mechanical properties and other. The growth behavior of this material has not been investigated in sufficient details to tailor properties of the resulting films. In this work we present the results on the growth of turbostratic boron nitride (t‐BN) thin films at a relatively high growth rate of 3 μm/h with the aim to investigate the potential use of boron trichloride in combination with ammonia as precursors for growth. Deposition experiments were conducted in a vertical cold wall high temperature chemical vapor deposition reactor in the temperature range 1000°C–1700°C depending on the substrate used. Templates of w‐AlN (0001), 4° off‐cut 4H‐SiC (0001), Cr (110) and W (110) were employed as substrates for the BN growth. As‐grown BN layers were characterized by Scanning Electron Microscopy, X‐Ray Diffraction, Electron Diffraction and Raman Spectroscopy. The results indicate that temperature and N/B ratio have a great influence on the crystallinity of the deposited films. For AlN and SiC substrates, a temperature of 1600°C and N/B ratio in range between 3 and 7.5 were identified as the best parameters for the growth of a 2 μm thick t‐BN layer with a spacing between basal planes of about 3.36 Å compare to the 3.33 Å spacing between basal planes of hexagonal or rhombohedral BN (h‐BN or r‐BN). For Cr and W substrates which have a lower mismatch with h‐BN (1 and 8.8 %), layers of t‐BN were deposited at much lower temperature (1000°C–1150°C) with a spacing between basal planes of 3.5 Å and morphology similar to that observed on SiC substrates. We obtained t‐BN layers with in plane strong disorder but out of plane orientation (c‐axis normal to the surface).     

Specific features of the growth of A II B VI films on (0001)Al2O3 substrates

The structure and orientation of CdTe and ZnO films on sapphire have been investigated for different techniques of pregrowth substrate treatment. Polycrystalline CdTe films are found to grow of substrates unannealed or annealed in vacuum at a residual pressure P < 0.13 Pa. Epitaxial CdTe films with the sphalerite cubic structure, oriented parallel to the substrate by the (111) plane, grow on substrates annealed in air at a temperature of 1000°C or more and having a system of smooth terraces and steps on the surface. For ZnO films with a wurtzite hexagonal structure obtained by magnetron sputtering, a similar correlation between the structural quality and the regime of treatment of sapphire substrates is observed. It is shown that thermal annealing of (0001) sapphire plates in air is the optimal way of substrate preparation for growing epitaxial ZnO films with the base orientation. The obtained epitaxial CdTe films contain a certain amount of structural defects (mosaicity and twins), while the epitaixal ZnO films treated in the same way are close to perfect.     

Preparation and characterization of SrTiO3/BaTiO3 thin multilayer films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering

SrTiO₃/BaTiO₃ thin films with multilayer structure were deposited on Pt/Ti/SiO₂/Si substrates by a double target radio frequency (RF) magnetron sputtering at 500 °C. The structure and properties of the SrTiO₃/BaTiO₃ thin multilayers have been evaluated by X-ray diffraction (XRD), Auger electron spectrometry (AES), scanning electron microscopy (SEM), scanning transmission electron microscopy (STEM), electron diffraction (ED) and polarization-electric field hysteresis loop. The XRD result reveals that the SrTiO₃/BaTiO₃ thin multilayers with the designed modulation have been accomplished. The lattice strain increases with layer number. According to AES analysis and morphology observation, a discrete interlayer exists at a position between the interface of Pt electrode and SrTiO₃. The remanent polarization (P_r) and coercive field (E_c) of SrTiO₃/BaTiO₃ thin multilayer are 3.0 μC/cm² and 20.0 kV/cm, respectively. In comparison with BaTiO₃, the device containing dual layers of SrTiO₃/BaTiO₃ possesses higher E_c but lower P_r.     

Structural features of epitaxial NiFe2O4 thin films grown on different substrates by direct liquid injection chemical vapor deposition

NiFe₂O₄ (NFO) thin films are grown on four different substrates, i.e., Lead Zinc Niobate–Lead Titanate (PZN–PT), Lead Magnesium Niobate–Lead Titanate (PMN–PT), MgAl₂O₄ (MAO) and SrTiO₃ (STO), by a direct liquid injection chemical vapor deposition technique (DLI-CVD) under optimum growth conditions where relatively high growth rate (～20 nm/min), smooth surface morphology and high saturation magnetization values in the range of 260–290 emu/ cm³ are obtained. The NFO films with correct stoichiometry (Ni:Fe=1:2) grow epitaxially on all four substrates, as confirmed by energy dispersive X-ray spectroscopy, transmission electron microscopy and x-ray diffraction. While the films on PMN–PT and PZN–PT substrates are partially strained, essentially complete strain relaxation occurs for films grown on MAO and STO. The formations of threading dislocations along with dark diffused contrast areas related to antiphase domains having a different cation ordering are observed on all four substrates. These crystal defects are correlated with lattice mismatch between the film and substrate and result in changes in magnetic properties of the films. Atomic resolution HAADF imaging and EDX line profiles show formation of a sharp interface between the film and the substrate with no inter-diffusion of Pb or other elements across the interface. Antiphase domains are observed to originate at the film–substrate interface.