Comparative studies on excitation of nickel ionic lines between argon and krypton glow discharge plasmas

The emission characteristics of nickel ionic lines in a glow discharge plasma are investigated when argon or krypton was employed as the plasma gas. Large difference in the relative intensities of nickel ionic lines which are assigned to the 3d⁸4p–3d⁸4s transition is observed between the krypton plasma and the argon plasma. Different intense Ni II lines appear in the krypton spectrum and in the argon spectrum, such as the Ni II 231.601 nm for Kr and the Ni II 230.009 nm for Ar. The excitation energy of these Ni II emission lines can give a key in considering their excitation mechanisms. The explanation for these experimental results is that charge-transfer collisions between nickel atom and the plasma gas ion play a major role in exciting the 3d⁸4p excited levels of nickel ion. The conditions for energy resonance in the charge-transfer collision determine particular energy levels having much larger population; for example, the 3d⁸4p ⁴D_7/2 level (6.39 eV) for Kr and the 3d⁸4p ⁴P_5/2 level (8.25 eV) for Ar.     

Boltzmann statistical consideration on the excitation mechanism of iron atomic lines emitted from glow discharge plasmas

A Boltzmann plot for many iron atomic lines having excitation energies of 3.3–6.9 eV was investigated in glow discharge plasmas when argon or neon was employed as the plasma gas. The plot did not show a linear relationship over a wide range of the excitation energy, but showed that the emission lines having higher excitation energies largely deviated from a normal Boltzmann distribution whereas those having low excitation energies (3.3–4.3 eV) well followed it. This result would be derived from an overpopulation among the corresponding energy levels. A probable reason for this is that excitations for the high-lying excited levels would be caused predominantly through a Penning-type collision with the metastable atom of argon or neon, followed by recombination with an electron and then stepwise de-excitations which can populate the excited energy levels just below the ionization limit of iron atom. The non-thermal excitation occurred more actively in the argon plasma rather than the neon plasma, because of a difference in the number density between the argon and the neon metastables. The Boltzmann plots yields important information on the reason why lots of Fe I lines assigned to high-lying excited levels can be emitted from glow discharge plasmas.     

Comparative study on emission characteristics of d.c.- and r.f.-powered Grimm glow discharge plasmas. Use of argon spectral lines

Equivalent discharge conditions, where the intensities of the analyte are almost the same between the d.c. and the r.f. power modes, have been investigated in Grimm glow discharge emission spectrometry. The two plasmas have similar emission and sputtering characteristics, enabling the conditions to be found easily. Various emission lines of argon ion are commonly observed from the argon discharges regardless of the power modes. A method to determine the equivalent discharge conditions is suggested, based on intensity analysis of the argon ionic lines.     

Wavelength table of chromium emission lines in argon glow discharge optical emission spectrometry

A wavelength table of chromium lines emitted from an argon glow discharge plasma, which comprises 2049 atomic and ionic emission lines in the wavelength range of 200–440 nm, is presented. The relative intensities are rather different from the data of published wavelength tables based on arc-excited and spark-excited spectra. Emission lines of Ar, Ti, V, Fe, Ni, and Cu in the neighborhood of the prominent Cr emission lines are also compiled as a table. These tables could be employed for the analytical applications in glow discharge optical emission spectrometry. All of the data are presented as Supplementary Electronic Material.     

Wavelength table of chromium emission lines in argon glow discharge optical emission spectrometry

A wavelength table of chromium lines emitted from an argon glow discharge plasma, which comprises 2049 atomic and ionic emission lines in the wavelength range of 200–440 nm, is presented. The relative intensities are rather different from the data of published wavelength tables based on arc-excited and spark-excited spectra. Emission lines of Ar, Ti, V, Fe, Ni, and Cu in the neighborhood of the prominent Cr emission lines are also compiled as a table. These tables could be employed for the analytical applications in glow discharge optical emission spectrometry. All of the data are presented as Supplementary Electronic Material. Recieved: 22 December 1999 / Revised: 25 February 2000 / Accepted: 25 February 2000     

Comparison in the analytical performance between krypton and argon glow discharge plasmas as the excitation source for atomic emission spectrometry

The emission characteristics of ionic lines of nickel, cobalt, and vanadium were investigated when argon or krypton was employed as the plasma gas in glow discharge optical emission spectrometry. A dc Grimm-style lamp was employed as the excitation source. Detection limits of the ionic lines in each iron-matrix alloy sample were compared between the krypton and the argon plasmas. Particular intense ionic lines were observed in the emission spectra as a function of the discharge gas (krypton or argon), such as the Co II 258.033 nm for krypton and the Co II 231.707 nm for argon. The explanation for this is that collisions with the plasma gases dominantly populate particular excited levels of cobalt ion, which can receive the internal energy from each gas ion selectively, for example, the 3d⁷4p ³G₅ (6.0201 eV) for krypton and the 3d⁷4p ³G₄ (8.0779 eV) for argon. In the determination of nickel as well as cobalt in iron-matrix samples, more sensitive ionic lines could be found in the krypton plasma rather than the argon plasma. Detection limits in the krypton plasma were 0.0039 mass% Ni for the Ni II 230.299-nm line and 0.002 mass% Co for the Co II 258.033-nm line. However, in the determination of vanadium, the argon plasma had better analytical performance, giving a detection limit of 0.0023 mass% V for the V II 309.310-nm line.     

Enhancement of intensities in glow discharge mass spectrometry by using mixtures of argon and helium as plasma gases

Glow discharge mass spectrometry (GD-MS) is an excellent technique for fast multi-element analysis of pure metals. In addition to metallic impurities, non-metals also can be determined. However, the sensitivity for these elements can be limited due to their high first ionization potentials. Elements with a first ionization potential close to or higher than that of argon, which is commonly used as discharge gas in GD-MS analysis, are ionized with small efficiency only. To improve the sensitivity of GD-MS for such elements, the influence of different glow-discharge parameters on the peak intensity of carbon, chlorine, fluorine, nitrogen, phosphorus, oxygen, and sulfur in pure copper samples was investigated with an Element GD (Thermo Fisher Scientific) GD-MS. Discharge current, discharge gas flow, and discharge gas composition, the last of which turned out to have the greatest effect on the measured intensities, were varied. Argon–helium mixtures were used because of the very high potential of He to ionize other elements, especially in terms of the high energy level of its metastable states. The effect of different Ar–He compositions on the peak intensity of various impurities in pure copper was studied. With Ar–He mixtures, excellent signal enhancements were achieved in comparison with use of pure Ar as discharge gas. In this way, traceable linear calibration curves for phosphorus and sulfur down to the μg kg⁻¹ range could be established with high sensitivity and very good linearity using pressed powder samples for calibration. This was not possible when pure argon alone was used as discharge gas. This contribution is based on a presentation given at the Colloquium for Analytical Atomic Spectroscopy (CANAS ’07) held March 18–21, 2007 in Constance, Germany.     

Spatially-resolved observation of glow discharge plasma for atomic emission spectrometry.

An imaging spectrograph equipped with a CCD detector was employed to measure two-dimensional emission images from a glow discharge plasma in atomic emission spectrometry. The emission images at Zn I 334.50 nm for a zinc sample and at Cu I 324.75 nm for a copper sample could be obtained. Their emission intensities were not uniform in the radial direction of the plasma region but became weaker at larger distance from the central zone. The two-dimensional distribution would result from a spatial variation in the excitation efficiency of the plasma and thus provide useful information for understanding the excitation processes occurring in the plasma.     

Reduction of supported noble-metal ions using glow discharge plasma

A novel plasma reduction method has been developed to reduce supported noble-metal ions without the use of any reducing chemicals. H2PtCl6, PdCl2, AgNO3, and HAuCl4 supported on nonporous TiO2 and porous gamma-Al2O3 and HZSM-5 were reduced using an Ar glow discharge plasma. Optical absorption spectra and X-ray photoelectron spectroscopy show that the supported metal ions are completely reduced to metallic species. Transmission electron microscopy shows that the prepared metals are amorphous clusters and homogeneously distributed with nanoscale sizes. X-ray diffraction also confirms that the plasma-reduced metals exist as small crystallites or amorphous clusters. Thermal annealing of plasma-reduced samples at elevated temperature transforms the clusters into crystals with a slight increase in particle sizes, but the sizes are still smaller than those of H2-reduced metals. O2 glow discharge plasma can also reduce noble-metal ions, accompanied by production of a small amount of oxides. Plasma reduction is very promising for the preparation of metal nanoparticles and supported metal catalysts.     

Self-absorption and Doppler temperatures of emission lines excited in a glow discharge lamp

The shapes of the emission lines of calcium and chromium emanating from a Grimm type glow discharge lamp have been determined by use of a pressure-scanning Fabry—Perot interferometer using various excitation conditions for different concentrations of these metals in standard matrices. Assuming a certain model for the light source, theoretical line profiles were calculated.The Doppler temperature as a function of current at constant voltage was determined from a comparison of the experimental and theoretical profiles. Also determined was the degree of absorption in emitting and non-emitting layers of the model.It was found that considerable self-absorption and reversal occur in the lamp at higher currents and concentrations.     

Analytical performance of high-voltage neon plasma in glow discharge optical emission spectrometry

In a high-voltage Ne glow discharge plasma (Ne-GDP), calibration factors as well as the limit of determination were compared between atomic resonance lines and singly-ionized lines of copper and aluminium in optical emission spectrometry. These elements have intense ionic lines which are excited by resonance charge-transfer collisions of Ne ions. The ionic lines gave better detection sensitivity in the Ne-GDP, whereas the atomic resonance lines were commonly employed as analytical lines in the other plasma sources such as Ar-GDP and ICP. The limit of determination was 1.3 × 10^–3 mass % for the Cu II 248.58 nm line and 1.0 × 10^–3 mass % Al for the Al II 358.66 nm line at a discharge parameter of 1.60 kV/36 mA.     

Analytical performance of high-voltage neon plasma in glow discharge optical emission spectrometry

In a high-voltage Ne glow discharge plasma (Ne-GDP), calibration factors as well as the limit of determination were compared between atomic resonance lines and singly-ionized lines of copper and aluminium in optical emission spectrometry. These elements have intense ionic lines which are excited by resonance charge-transfer collisions of Ne ions. The ionic lines gave better detection sensitivity in the Ne-GDP, whereas the atomic resonance lines were commonly employed as analytical lines in the other plasma sources such as Ar-GDP and ICP. The limit of determination was 1.3 × 10^–3 mass % for the Cu II 248.58 nm line and 1.0 × 10^–3 mass % Al for the Al II 358.66 nm line at a discharge parameter of 1.60 kV/36 mA. Received: 22 January 1999 / Revised: 15 March 1999 / Accepted: 20 March 1999     

Rotational temperature of nitrogen glow discharge obtained by optical emission spectroscopy

Measurements of rotational temperature as low as several hundred Kelvin have been measured using optical emission spectroscopy (OES) in nitrogen direct current (DC) glow discharge. The strongest band of the first negative system of nitrogen was chosen to deduce the rotational temperature at four different positions in nitrogen DC glow discharge, the back of cathode; cathode sheath; positive column; and anode glow. In positive column the rotational temperature increased apparently with the increasing discharge voltage from 500 to 1000 V when the pressure was 10 Pa. But with pressure of 20 Pa the rotational temperature in positive column increased slightly with the increase of discharge voltage. On the contrary, the rotational temperature in cathode sheath took reverse tendencies when the discharge voltage varies from 500 to 1000 V. As regard the anode glow, the rotational temperature at 10 Pa decreased with the increase of discharge voltage, but that at pressure of 20 Pa increased. We attribute the different tendencies of the rotational temperature to the different discharge statues at different pressures. When the discharge voltage varies from 500 to 1100 V, the discharge with pressure of 10 Pa is normal glow and that with 20 Pa is abnormal glow.     

Emission characteristics of Grimm-style glow discharge plasmas with helium matrix plasma gas containing small amounts of nitrogen

Glow discharge plasmas with helium–(0–16%) nitrogen mixed gas were investigated as an excitation source in optical emission spectrometry. The addition increases the sputtering rate as well as the discharge current, because nitrogen molecular ions, which act as primary ions for the cathode sputtering, are produced through Penning-type ionization collisions between helium metastables and nitrogen molecules. The intensity of a silver atomic line, Ag I 338.29 nm, is monotonically elevated along with the nitrogen partial pressure added. However, the intensities of silver ionic lines, such as Ag II 243.78 nm and Ag II 224.36 nm, gave different dependence from the intensity of the atomic line: Their intensities had maximum values at a nitrogen pressure of 30 Pa when the helium pressure and the discharge voltage were kept at 2000 Pa and 1300 V. This effect is principally because the excitations of these ionic lines are caused by collisions of the second kind with helium excited species such as helium metastables and helium ion, which are quenched through collisions with nitrogen molecules added to the helium plasma. The sputtering rate could be controlled by adding small amounts of nitrogen to the helium plasma, whereas the cathode sputtering hardly occurs in the pure helium plasma.     

Emission characteristics of Grimm-style glow discharge plasmas with helium matrix plasma gas containing small amounts of nitrogen

Glow discharge plasmas with helium–(0–16%) nitrogen mixed gas were investigated as an excitation source in optical emission spectrometry. The addition increases the sputtering rate as well as the discharge current, because nitrogen molecular ions, which act as primary ions for the cathode sputtering, are produced through Penning-type ionization collisions between helium metastables and nitrogen molecules. The intensity of a silver atomic line, Ag I 338.29 nm, is monotonically elevated along with the nitrogen partial pressure added. However, the intensities of silver ionic lines, such as Ag II 243.78 nm and Ag II 224.36 nm, gave different dependence from the intensity of the atomic line: Their intensities had maximum values at a nitrogen pressure of 30 Pa when the helium pressure and the discharge voltage were kept at 2000 Pa and 1300 V. This effect is principally because the excitations of these ionic lines are caused by collisions of the second kind with helium excited species such as helium metastables and helium ion, which are quenched through collisions with nitrogen molecules added to the helium plasma. The sputtering rate could be controlled by adding small amounts of nitrogen to the helium plasma, whereas the cathode sputtering hardly occurs in the pure helium plasma.     

Analysis of graphitized cast irons by optical emission spectroscopy: matrix effects in the glow discharge and the spark excitation

Graphite has a substantially lower sputtering rate in glow discharge than have the other structural components of graphitized cast irons, which leads to a structure-related matrix effect, consisting of an increasing relative surface coverage by graphite of the sample surface during the initial stage of the GD-OES analysis, and, consequently, to an increasing carbon signal intensity. This effect exists inherently in any multicomponent system with different sputtering rates of the components and should be taken into account in GD-OES quantification. A simple theory is presented to describe quantitatively the changes in relative contributions of different phases to the flux of the sputtered material entering the discharge and a formula is presented, expressing elemental intensity changes as a function of sputtering rates and stoichiometry of the structural components.After reaching the steady state, there are no substantial differences in the GD-OES signal response of the analyzed elements between the graphitic and the white cast irons. To reach this steady state, long preburn times and high sputtering rates have to be used. In the spark atomization/excitation, there are very strong and complex structure-related matrix effects, which make the analysis of graphitic cast irons by spark excitation impossible.     

One step multifunctional micropatterning of surfaces using asymmetric glow discharge plasma polymerization

Micropatterning of surfaces with varying chemical, physical and topographical properties usually requires a number of fabrication steps. Herein, we describe a micropatterning technique based on plasma enhanced chemical vapour deposition (PECVD) that deposits both protein resistant and protein repellent surface chemistries in a single step. The resulting multifunctional, selective surface chemistries are capable of spatially controlled protein adhesion, geometric confinement of cells and the site specific confinement of enzyme mediated peptide self-assembly.     

Hydrogen effects on copper,zinc and nickel atomic emission lines in argon radiofrequency glow discharge optical emission spectrometry

The effect of hydrogen (0.5%, 1% and 10% v/v) added to the argon plasma gas on the emission spectra of selected atomic lines for copper, zinc and nickel has been studied by radiofrequency glow discharge optical emission spectrometry (rf-GD-OES). Conductive homogeneous samples containing different concentrations of the elements under study in different matrices have been investigated. Results show different trends of the emission intensity lines with increasing hydrogen concentration in the rf-GD, depending on the line characteristics. In most cases, the emission yields of the lines under study did not change or increased when hydrogen was added to the discharge (no decreases were observed). The emission yields of certain lines showed much higher increases than other lines of the same element (for example, lines 213.86 nm of Zn and 231.10 nm of Ni). Our experiments indicate that such notorious increases could be related with the possible decrease of the self-absorption when hydrogen is added to the discharge. Overall, the results obtained for the emission yield changes of certain lines of a given element in different matrices (with different analyte content) showed that while for resonance emission lines very notorious increases are observed, the values for non-resonance lines do not change significantly (specially if the matrices employed are similar).