Trace analysis of high-purity copper by total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence (TXRF) analysis after the separation of matrix element was studied for the determination of trace impurity elements (Ca, Sc, V, Cr, Mn, Fe, Co, Ni and Zn) in high purity copper. Matrix copper was removed by electrolysis (0.2 A, 8 h) of a nitric acid solution. A 10 μL aliquot of the remaining solution of the electrolysis was dropped on a silicon-wafer sample-carrier and dried in a vacuum. This was repeated five times and the precipitate of five 10 μL-aliquots was analyzed by TXRF using a W-Lβ beam with an incident angle of 0.05?°. TXRF analytical values were obtained by using relative sensitivity factors of the analytes to the internal standard element (Pd). Detection limits of the analytes ranges from 0.077 ng for Zn to 0.785 ng for Ca.     

Total reflection X-ray fluorescence analysis of river waters in its stream across the city of Cordoba,in Argentina

The aim of this work was to analyze the composition of river waters and to study their quality by detecting possible contaminants. The samples were taken at 32 points of the Suquía River in its stream across the city of Córdoba (in the Province of Córdoba, Argentina). The samples were analyzed with total reflection X-ray fluorescence (TXRF) using beam guides. Beam guides made of two Si plate reflectors were used as sample carriers and to guide the X-ray photons to the sample; the measurements were taken using the characteristic configuration that ensures the best excitation and detection conditions (in TXRF). The analyses were carried out by preconcentration of the water samples and by adding an internal standard (Gallium); small amounts of samples (30 μl) were deposited on the Si reflector plate and they were then analyzed in the total reflection regime. Spectra were analyzed with standard methods using conventional programs. The results show interesting behaviors of the concentration of trace elements along the river: elements of low atomic number (such as Ca, Cl, S, K) present higher concentrations as compared to high Z elements (such as Fe, Zn, Br, Sr); the concentrations of light elements follow a similar behavior along the stream, the same situation is observed in the set of elements with high atomic number. Some samples present high concentrations in certain elements indicating possible sources of contamination.     

The use of a portable total reflection X-ray fluorescence spectrometer for field investigation

A newly developed, portable total reflection X-ray fluorescence (TXRF) spectrometer was tested during a field campaign on Chilean lakes and a German river in January 2002. The field measurements were compared with laboratory measurements carried out on a stationary instrument in the German laboratory. For method validation certified reference material (NIST SRM 1640 Trace elements in natural water) and water samples from different freshwater sources were analyzed with both techniques and evaluated statistically. Based on these preliminary results, it could be concluded that the portable TXRF is a useful technique for the quantitative elemental screening of freshwater samples during field campaigns. Future tests with biological samples (e.g. biofilms and zooplankton), and suspended matter will provide information about the suitability of the portable TXRF for these materials.     

Trace analysis of high-purity copper by total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence (TXRF) analysis after the separation of matrix element was studied for the determination of trace impurity elements (Ca, Sc, V, Cr, Mn, Fe, Co, Ni and Zn) in high purity copper. Matrix copper was removed by electrolysis (0.2 A, 8 h) of a nitric acid solution. A 10 μL aliquot of the remaining solution of the electrolysis was dropped on a silicon-wafer sample-carrier and dried in a vacuum. This was repeated five times and the precipitate of five 10 μL-aliquots was analyzed by TXRF using a W-Lβ beam with an incident angle of 0.05 °. TXRF analytical values were obtained by using relative sensitivity factors of the analytes to the internal standard element (Pd). Detection limits of the analytes ranges from 0.077 ng for Zn to 0.785 ng for Ca. Received: 25 December 1997 / Revised: 30 March 1998 / Accepted: 2 April 1998     

Application of ETV-ICPMS in semiconductor process control

Submicron semiconductor manufacturing requires ultra-clean processes and materials to achieve high product yields. It is demonstrated that electrothermal evaporation (ETV) in a graphite furnace coupled with ICPMS offers a new possibility for a fast simultaneous analysis of eight elements with detection limits below 0.2 ng/g in conc. hydrofluoric acid and buffered oxide etch (ammonium fluoride/hydrogen fluoride mixture). ETV-ICPMS also comprises significant improvements in the analysis of metal contamination on silicon wafer surfaces with respect to currently used methods. The contaminants on the surface are usually analyzed by total reflexion X-ray fluorescence spectrometry (TXRF) or dissolved by HF vapour (vapour phase decomposition; VPD) or a mixture of hydrofluoric acid and hydrogen peroxide (droplet surface etching, DSE) and analyzed by GFAA or TXRF. ETV-ICPMS combines the advantages of both analytical methods: the multielemental advantage of TXRF and the possibility to analyze light elements like Al, Mg, Na which may not be analyzed by TXRF. With VPD/DSE-ETV-ICPMS detection limits between 0.2 and 2×10⁹ atoms cm^?2 on a 6″ wafer have been achieved in a simultaneous analysis of eight elements. The main advantage of ETV-ICPMS versus conventional ICPMS in both applications — chemical and surface analysis — is its capability to analyze Fe in the sub-ng/g range. As Fe is one of the most important impurities in semiconductor manufacturing ETV-ICPMS is much more useful for semiconductor applications than low-resolution ICPMS. For the present application potassium iodide was used as a modifier. It enhances the sensitivity by a factor of 3–4 and improves the reproducibility significantly.     

Some aspects of the high-temperature behavior of bismuth,strontium and barium on silicon surfaces studied by total reflection X-ray fluorescence spectrometry

Thin films of novel dielectric and ferroelectric materials, such as barium strontium titanate (BST) and strontium bismuth tantalate (SBT), which are scheduled for short-term implementation into standard microelectronic device technology, contain elements like Bi, Sr and Ba which may involve risks with regard to device yield and reliability. Therefore, the high-temperature behavior of bismuth, strontium and barium impurities on Si (100) substrates was studied. Intentionally contaminated Si substrates were annealed at 1000°C under different ambient (inert, oxidizing) by rapid thermal annealing (RTA) or in a furnace and analyzed by total reflection X-ray fluorescence spectrometry (TXRF), vapor phase decomposition/TXRF (VPD/TXRF) and electrolytic metal tracer (Elymat) technique. Ba and Sr are incorporated in the existing or growing oxide during rapid thermal annealing (RTA). Cross-contamination due to gas phase transport may occur in the case of Bi, in particular under N₂ atmosphere, but is of no concern in the case of Ba and Sr. All three contaminants do not exert an influence on the minority carrier lifetime on their own. The results illustrate that TXRF and VPD/TXRF are appropriate techniques for such studies.     

Total reflection X-ray fluorescence analysis with chemical microchip

A chemical microchip, which has a flat region on the surface, was recently designed for total reflection X-ray fluorescence (TXRF) analysis. A sample solution was introduced from an inlet by a microsyringe and flowed into a microchannel. Finally it overflowed from the well-type microchannel on the flat region. The sample solution on this region was dried, and then measured by TXRF. The TXRF spectra could be measured with a low background level. This preliminary result indicated that the edge of the well-type channel would not cause a serious problem for TXRF analysis. In addition, a good linear relationship was obtained for Zn Kα in Zn standard solution. This suggests that quantitative analysis by TXRF is feasible in combination with a chemical microchip.     

Calibration of reference materials for total-reflection X-ray fluorescence analysis by heavy ion backscattering spectrometry

Total-reflection X-ray fluorescence (TXRF) is widely used for the control of metallic contamination caused by surface preparation processes and silicon materials. At least three companies supply a variety of TXRF systems to the silicon integrated circuit (IC) community, and local calibration of these systems is required for their day to day operation. Differences in local calibration methods have become an issue in the exchange of information between IC manufacturers' different FABs (Fabrication Facility) and also between silicon suppliers and IC FABs. The question arises whether a universal set of fluorescence yield curves can be used by these different systems to scale system sensitivity from a single element calibration for calculation of elemental concentrations. This is emphasized by the variety of experimental conditions that are reported for TXRF data (e.g. different angles of incidence for the same X-ray source, different X-ray sources, etc.). It appears that an instrumental factor is required. We believe that heavy ion backscattering spectrometry (HIBS) provides a fundamental method of calibrating TXRF reference materials, and can be used in calculating this instrumental factor. In this paper we briefly describe the HIBS system at the Sandia National Laboratories HIBS User Facility and its application to the calibration of TXRF reference materials. We will compare HIBS and TXRF mapping capabilities and discuss the issues associated with the restrictions of some older TXRF sample stages. We will also discuss Motorola's cross-calibration of several TXRF systems using different elements as references.     

An electrochemical enrichment procedure for the determination of heavy metals by total-reflection X-ray fluorescence spectroscopy

An electrolytic separation and enrichment technique was developed for the determination of trace elements by total-reflection X-ray fluorescence spectroscopy (TXRF). The elements of interest are electrodeposited out of the sample solution onto a solid, polished disc of pure niobium which is used as sample carrier for the TXRF measurement. The electrochemical deposition leads to a high enrichment of the analytes and at the same time to a removal of the matrix. This results in substantially improved detection limits in the lower picogram per gram region. The deposited elements are directly measured by TXRF without any further sample preparation step. The homogeneous thin layer of the analytes is an ideal sample form for TXRF, because scattered radiation from the sample itself is minimized. The proposed sample preparation method is useful particularly for the analysis of heavy metals in liquid samples with for TXRF disturbing matrices, e.g. sea water.     

不同赋存形态土壤铅同位素比值用于判别地域性差异的研究

由于各地区地质结构不同,造成了铅同位素组成具有地域特征。本研究利用电感耦合等离子体质谱测定了福建不同茶园土壤的铅同位素比值,比较了土壤全消解和残渣态两种赋存形态的铅同位素比值的差异,发现残渣态的铅的地域性特征较强,可用来作为地区土壤的判别依据。     

Investigation of adsorbed mercury distribution in silver coated filters by X-ray fluorescence

We have been working on mercury collection from flue gas by amalgamation and subsequent XRF analysis. Previous results showed unexpectedly high relative standard deviation (30%) in collection efficiency when silver-coated filters were exposed to gas phase mercury in a pilot-scale test chamber. Filters were analyzed by micro-XRF, TXRF and conventional XRF to explore the source of scattering. It was concluded that mercury had inhomogeneously adsorbed in the filter as the cause of this variation, leading to a positive bias of 50% in efficiency value. Results reported in this paper suggest the TXRF method is accurate to within ±10% when X-ray counting statistics are not the limiting factor. Application of this filter in flue gas measurement will be presented.     

基于质子转移反应-飞行时间质谱快速鉴别不同产地闽北水仙茶

采用质子转移反应-飞行时间质谱仪(PTR-TOF-MS), 构建了3个产地(武夷山、建阳、建瓯)113个闽北水仙茶样品香气的化学指纹图谱, 对所得的闽北水仙茶香气指纹图谱进行主成分分析(PCA), 获得了不同产地闽北水仙茶样品的质谱信息特征, 然后采用软独立建模分类法(SIMCA)、K最邻近结点算法(KNN)、偏最小二乘判别分析法(PLS-DA)对闽北水仙茶的质谱信息进行了模式识别.结果表明, PTR-TOF-MS结合分类识别模式能有效区分不同产地的闽北水仙茶.PCA 提取了3个主成分, 累计贡献率为84.66%;3个识别模型的校正集判别正确率分别为89.38%、100.00%和100.00%, 预测集的判别正确率分别为83.18%、 96.46%和95.57%.基于此成功建立了不同产地的闽北水仙茶识别模型.本方法无需样品预处理、分析速度快、灵敏度高、对茶叶无损伤, 为茶叶产地溯源提供了新方法.     

Determination of copper,iron and zinc in spirituous beverages by total reflection X-ray fluorescence spectrometry

The concentration of copper in traditional homemade alcoholic distillates produced in Venezuela (Cocuy de Penca) were determined by total reflection X-ray fluorescence (TXRF) using vanadium as internal standard. The results were compared to those obtained by flame atomic absorption spectrometry (FAAS). Three preparative methods of addition of vanadium were compared: classical internal standard addition, ‘layer on layer’ internal standard addition and in situ addition of internal standard. The TXRF procedures were accurate and the precision was comparable to that obtained by the FAAS technique. Copper levels were above the maximum allowed limits for similar beverages. Zinc and iron in commercial and homemade distilled beverages were also analyzed by TXRF with in situ addition of internal standard demonstrating the usefulness of this technique for trace metal determination in distillates.     

Optimization of the quantitative direct solid total-reflection X-ray fluorescence analysis of glass microspheres functionalized with Zr organometallic compounds

Quantitative determination of Zr in the system constituted by quartz microspheres functionalized with two kinds of organometallic compounds has been studied due to the importance of the correct quantization of the Zr from a catalytic point of view. Two parallel approximations were done, i.e. acid leaching and direct solid quantization. To validate the acid leaching TXRF measures, ICP-MS analysis were carried out. The results obtained by means of the optimization of the quantitative direct solid procedure show that, with a previous particle size distribution modification, TXRF obtain the same analytical results as ICP-MS and TXRF by acid leaching way but without previous chemical acid manipulation. This fact implies an important improvement for the analysis time, reagents costs and analysis facility and it proves again the versatility of TXRF to solve analytical problems in an easy, quick and accurate way. Additionally and for the direct solid TXRF measurements, a deeper study was done to evaluate the intrinsic analytical parameters of the Zr TXRF analysis of this material. So, the influence of the particle size distributions (modified by means of a high power ultrasound probe) with respect to uncertainty and detection limits for Zr were developed. The main analytical conclusion was the strong correlation between the average particle sizes and the TXRF analytical parameters of Zr measurements, i.e. concentration, accuracy, uncertainty and detection limits.     

XRF and TXRF techniques for multi-element determination of trace elements in whole blood and human hair samples

XRF and TXRF were established as useful techniques for multi-element analysis of whole blood and human head hair samples. Direct-XRF with different collimation units and different X-ray excitation modes was successfully used for the determination of S, P, K, Ca, Fe, and Br elements in blood samples and K, Ca, Mn, Fe elements in human hair samples. Direct analysis by TXRF was used for the determination of Rb and Sr in digested blood and human hair samples, respectively, while, the co-precipitation method using APDC for TXRF analysis was used for the determination of Ni, Cu, Zn, and Pb elements in both matrices. As a result, the improved XRF and TXRF methods were applied for multi-element determination of elements in whole blood and human hair samples in non-occupational exposed population living in Damascus city. The mean concentrations of analyzed elements in both matrices were on the reported range values for non-occupational population in other countries.     

Applications of total reflection X-ray fluorescence spectrometry in trace element and surface analysis

Total reflection X-ray fluorescence spectrometry (TXRF) is presented as a genuine surface analytical technique. Its low information depth is shown to be the characteristic feature differentiating it from other energy dispersive X-ray fluorescence methods used for layer and surface analysis. The surface sensitivity of TXRF and its analytical capability together with the limitations of the technique are discussed here using typical applications including the contamination control of silicon wafers, thin layer analysis and trace element determination. For buried interfaces and implantation depth profiles in silicon a combination of TXRF and other techniques has been applied successfully. The TXRF method has the particular advantage of being calibrated without the need for standards. This feature is demonstrated for the example of the element arsenic.     

Novel methods of TXRF analysis for silicon wafer surface inspection

TXRF became a standard, on-line inspection tool for controlling the cleanliness of polished Si wafers for semiconductor use. Wafer makers strive for an all-over metallic cleanliness of < 10¹⁰ atoms · cm^–2. The all-over cleanliness can be analyzed using VPD/TXRF. For VPD preparation and scanning we have developed an automatic system coupled with TXRF. With synchrotron radiation TXRF we were able to detect 13 fg of Ni in a residual microdroplet, i.e.10⁵ atoms · cm^–2. Received: 8 January 1998 / Revised: 13 July 1998 / Accepted: 30 July 1998     

Uranium determination in seawater by total reflection X-ray fluorescence spectrometry

A study regarding uranium determination in seawater by total reflection X-ray fluorescence (TXRF) spectrometry is reported. Uranium, present in seawater in concentration of about 3.3 ng/mL, was selectively extracted in diethyl ether and determined by TXRF after its preconcentration by evaporation and subsequent dissolution in a small volume of 1.5% suprapure HNO₃. Yttrium was used as an internal standard. Before using diethyl ether for selective extraction of uranium from seawater, its extraction behavior for different elements was studied using a multielement standard solution having elemental concentrations in 5 ng/mL levels. It was observed that the extraction efficiency of diethyl ether for uranium was about 100% whereas for other elements it was negligible. The detection limit of TXRF method for uranium in seawater samples after pre-concentration step approaches to 67 pg/mL. The concentrations of uranium in seawater samples determined by TXRF are in good agreement with the values reported in the literature. The method shows a precision within 5% (1σ). The study reveals that TXRF can be used as a fast analytical technique for the determination of uranium in seawater.     

Combining TXRF,FT-IR and GC–MS information for identification of inorganic and organic components in black pigments of rock art from Alero Hornillos 2 (Jujuy,Argentina)

Archaeological samples are complex in composition since they generally comprise a mixture of materials submitted to deterioration factors largely dependent on the environmental conditions. Therefore, the integration of analytical tools such as TXRF, FT-IR and GC–MS can maximize the amount of information provided by the sample. Recently, two black rock art samples of camelid figures at Alero Hornillos 2, an archaeological site located near the town of Susques (Jujuy Province, Argentina), were investigated. TXRF, selected for inorganic information, showed the presence of manganese and iron among other elements, consistent with an iron and manganese oxide as the black pigment. Aiming at the detection of any residual organic compounds, the samples were extracted with a chloroform–methanol mixture and the extracts were analyzed by FT-IR, showing the presence of bands attributable to lipids. Analysis by GC–MS of the carboxylic acid methyl esters prepared from the sample extracts, indicated that the main organic constituents were saturated (C_16:0 and C_18:0) fatty acids in relative abundance characteristic of degraded animal fat. The presence of minor C_15:0 and C_17:0 fatty acids and branched-chain iso-C_16:0 pointed to a ruminant animal source. Figure Rock art painting at Hornillos 2 Cave, Susques, Argentina     

Application of total reflection X-ray fluorescence in angle scan mode to establish the location of arsenic contamination in silicon and silicon oxide,respectively

Experiments have been carried out using total reflection X-ray fluorescence (TXRF) to determine the location of arsenic cross-contamination on or in silicon and silicon oxide, respectively, caused during argon-implantation. TXRF has been applied at varying angles of incidence — the so-called angle scan mode. By comparing the angle scan curves of implanted samples with those of a wafer, spin-coated with arsenic, at which arsenic is certainly located on top of the silicon surface, clear differences are observed. This indicates the presence of arsenic embedded in the subsurface. These observations are confirmed by Rutherford backscattering measurements, by modeling As-implantation profiles for low implantation energies as well as by step-by-step oxide etching followed by standard TXRF analysis. This fast and non-destructive application of TXRF angle scan appears a useful method for qualitative depth profiling.