Hall effect and magnetoresistance of (SN)x films

Hall effect and electrical conductivity have been investigated between 77 K and 300 K and the magnetoresistance at 4.2 K for a number of (SN)_x films deposited at substrate temperatures between — 10 and 50°C. The small magnitude of the Hall mobility (? 1 cm² Vsec^?1 at 300 K) and its activated temperature dependence are interpreted in terms of a heterogenous model for (SN)_x films with thin depletion layers separating highly conductive islands. The hole concentration in these islands (p ≈ 10²¹ cm^?3, the microscopic mobility (μ ≈ 500 cm² Vsec^?1 at 4.2 K) and the temperatures dependence of μ are found to be close to values for (SN)_x crystals.     

Influence of Al concentration on electrical, structural and optical properties of Al-As codoped p-ZnO thin films

We report the influence of Al concentration on electrical, structural, optical and morphological properties of Al-As codoped p-ZnO thin films using RF magnetron sputtering. Al-As codoped p-ZnO films with different Al concentrations were fabricated using As back diffusion from the GaAs substrate and sputtering Al₂O₃ mixed ZnO targets (1, 2 and 4 at%). The grown films were investigated by Hall effect measurement, X-ray diffraction (XRD), electron probe microanalysis (EPMA), energy dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), photoluminescence (PL) and atomic force microscopy (AFM) to study the electrical, structural, optical and morphological properties of the films. From the XRD, it was observed that both full-width at half-maximum (FWHM) and c-axis lattice constant have similar trends with respect to Al concentration. Hall measurements showed that the hole concentration increases as the Al concentration increases from 10¹⁵ to 10²⁰ cm⁻³. The increase in hole concentration upon codoping was supported by the red shift in the near-band-edge (NBE) emission observed from room temperature PL spectra. The proposed p-type mechanism due to As_Zn-2V_Zn complex was confirmed by low temperature PL and XPS analysis. The low FWHM, resistivity and peak-to-valley roughness observed by XRD, Hall measurement and AFM, respectively, suggest that 1 at% Al-doped ZnO:As film is the best codoped film.     

Hall effect of FeTe and Fe(Se1–xTex) thin films

The Hall effect is investigated in thin-film samples of iron–chalcogenide superconductors in detail. The Hall coefficient (R_H) of FeTe and Fe(Se_1–xTe_x) exhibits a similar positive value around 300 K, indicating that the high-temperature normal state is dominated by hole-channel transport. FeTe exhibits a sign reversal from positive to negative across the transition to the low-temperature antiferromagnetic state, indicating the occurrence of drastic reconstruction in the band structure. The mobility analysis using the carrier density theoretically calculated reveals that the mobility of holes is strongly suppressed to zero, and hence the electric transport looks to be dominated by electrons. The Se substitution to Te suppresses the antiferromagnetic long-range order and induces superconductivity instead. The similar mobility analysis for Fe(Se_0.4Te_0.6) and Fe(Se_0.5Te_0.5) thin films shows that the mobility of electrons increases with decreasing temperature even in the paramagnetic state, and keeps sufficiently high values down to the superconducting transition temperature. From the comparison between FeTe and Fe(Se_1–xTe_x), it is suggested that the coexistence of ‘itinerant’ carriers both in electron and hole channels is indispensable for the occurrence of superconductivity.     

Hole transport characteristics in phosphorescent dye-doped NPB films by admittance spectroscopy

Admittance spectroscopy is a powerful tool to determine the carrier mobility. The carrier mobility is a significant parameter to understand the behavior or to optimize the organic light-emitting diode or other organic semiconductor devices. Hole transport in phosphorescent dye, bis[2-(9,9-diethyl-9H-fluoren-2-yl)-1-phenyl-1Hbenzoimidazol-N,C3] iridium(acetylacetonate [(fbi)₂Ir(acac)]) doped into N,N-diphenyl-N,N-bis(1-naphthylphenyl)-1,1-biphenyl-4,4-diamine (NPB) films was investigated by admittance spectroscopy. The results show that doped (fbi)₂Ir(acac) molecules behave as hole traps in NPB, and lower the hole mobility. For thicker films(?300 nm), the electric field dependence of hole mobility is as expected positive, i.e., the mobility increases exponentially with the electric field. However, for thinner films (?300 nm), the electric field dependence of hole mobility is negative, i.e., the hole mobility decreases exponentially with the electric field. Physical mechanisms behind the negative field dependence of hole mobility are discussed. In addition, three frequency regions were divided to analyze the behaviors of the capacitance in the hole-only device and the physical mechanism was explained by trap theory and the parasitic capacitance effect.     

Influence of germanium incorporation on the structural and electrical properties of boron-doped ultrathin poly-Si1−x Ge x films deposited by chemical vapour deposition

A few properties of polycrystalline silicon germanium (poly-Si_1?x Ge _x ) films can be tailored by modulating the germanium incorporation. In this paper, the structural, mechanical and electrical properties of heavily doped ultrathin (~100 nm) poly-Si_1?x Ge _x films (0.84 ≤ x ≤ 0.88) fabricated by low-pressure chemical vapour deposition were investigated. For a boron concentration of ~2.2 × 10²¹ atoms/cm³, a slight increase of germanium fraction significantly enhances the deposition rate, crystallinity and Hall mobility while having negligible influence on the Young’s modulus and hardness. The grain size increases from ~6 to ~12 nm while the grain structure becomes more columnar. In addition, the resistivity decreases from 7.4 to 1.1 m Ω cm with a corresponding increase in the Hall mobility from ~0.9 to ~4.2 cm² V^?1 s^?1. However, the Young’s modulus (~101 GPa) and hardness (~8.8 GPa) are virtually unaffected within the range of germanium fraction explored. In practice, poly-SiGe layer having low resistivity, high modulus, high mobility and low surface roughness can be successfully applied for resonators, biosensors and nanoswitches among others.     

The absence of a measurable hall effect in the superionic conductor RbAg4I5

Thin film samples of RbAg₄I₅ have been prepared by evaporation and several of their electrical properties have been determined. The behavior of the conductivity of these films is identical to that found in bulk RbAg₄I₅. An attempt to reproduce the Hall effect results of Kaneda and Mizuki was unsuccessful, and we conclude that the Hall mobility of silver ions in this material is less than 2 × 10^-3cm²/V·sec.     

Hall mobility of amorphous Ge2Sb2Te5

The electrical conductivity, Seebeck coefficient, and Hall coefficient of three-micron-thick films of amorphous Ge₂Sb₂Te₅ have been measured as functions of temperature from room temperature down to as low as 200 K. The electrical conductivity manifests an Arrhenius behavior. The Seebeck coefficient is p-type with behavior indicative of multi-band transport. The Hall mobility is n-type and low (near 0.07 cm²/V s at room temperature).     

The effect of hydrogen on the electrical properties of n-type Pb0.9Cd0.1Te thin films

Measurements of the Hall coefficient and the d.c. conductivity were made on flash evaporated n-type Pb_0.9Cd_0.1Te epitaxial films exposed to molecular hydrogen gas at high pressures (upto 500 psi) in the temperature range 77–300 K. It has been found that the effect of hydrogen on the films is to reduce the concentration of the extrinsic carriers and to increase their mobility. It is believed that hydrogen gas removes cadmium ions and neutral cadmium atoms from these films.     

Induction of p-type conduction in sputtered deposited Al-N codoped ZnO thin films

Al and N codoped ZnO thin films were grown on n-Si (100) substrate by sputtering technique. Hall effect measurements of as-grown films exhibited n-type conduction, however 500 °C Ar annealed codoped films showed p-type conductivity with a hole concentration of 9.9 × 10¹⁶ cm^− 3, resistivity of 15.95 Ω-cm and hole mobility of 3.95 cm²/Vs, respectively. Codoped ZnO thin films were found to be highly c-axis oriented with good crystal quality. A neutral acceptor-bound exciton and donor-acceptor-pair emissions that appeared at room temperature photoluminescence measurement verify p-type conduction in Al and N codoped ZnO film. The current-voltage characteristics of p-n heterojunction evidently showed a diode like rectifying behaviour.     

Effect of bismuth on the electrical properties of Pb0.8Sn0.2Te thin films

D.C. conductivity and Hall coefficient studies were made on bismuth doped Pb_0.8Sn_0.2Te thin films in the temperature range 77–300 K. Hall coefficient and Hall mobility are found to decrease with the increase in doping density of bismuth. Films doped with even 0.3 at.% Bi changed fromp-type ton-type due to the donor action of bismuth in these films. Analysis of mobility-temperature data revealed that the lattice and defect scattering mechanisms are predominant in these films. Defect limited mobility is calculated for all the films and it is found to decrease with increase in doping concentration of bismuth suggesting the increase in defect density.     

Structural,optical, and electrical properties of boron-doped ZnO1-xSx thin films deposited by MOCVD

Boron-doped ZnO_1-xS_x (ZnO_1-xS_x:B) thin films were fabricated by metalorganic chemical vapor deposition (MOCVD). We investigated the structural, optical, and electrical properties of the ZnO_1-xS_x:B thin films. X-ray diffraction patterns showed that, except for the ZnO:B (x?=?0) and ZnS:B (x?=?1) thin films, the ZnO_1-xS_x:B thin films exhibit amorphous characters. Optical transmittance spectra were analyzed to estimate the band gaps of the thin films with different S content. All thin films showed direct band gaps ranging from 3.34?eV (ZnO:B) to 3.49?eV (ZnS:B). The influence of sulfur content on carrier concentration, electrical resistivity, and Hall mobility of the ZnO_1-xS_x:B thin films were analyzed from Hall effect measurements measured at temperatures ranging from liquid nitrogen temperature to room temperature. The ZnO_1-xS_x:B thin films exhibited n-type electrical conductivity except for ZnS:B, which was not measurable in this study due to its high resistivity (>100?Ω?cm).     

The effect of oxygen on the electrical properties of silicon

Interstitial oxygen present in solution, as detected by the 9 μ absorption band, increases the Hall mobility of electrons in n-type silicon crystals but decreases the Hall mobility of holes in p-type. These results are explained by the lattice strain produced via dissolved interstitial oxygen impurities. Results on samples saturated with oxygen and heat treated to cause precipitation of SiO₂ in the temperature range of 950–1250°C show that the SiO₂ particles decrease the values of Hall mobility compared to the initial values on samples without precipitates. Re-annealing causes the dissolution of the precipitates and recovery nearly to the initial values of the Hall coefficient.     

Formation of p-type ZnMgO thin films by In-N codoping method

In-N codoped ZnMgO films have been prepared on glass substrates by direct current reactive magnetron sputtering. The p-type conduction could be obtained in ZnMgO films by adjusting the N₂O partial pressures. The lowest resistivity was found to be 4.6 Ω cm for the p-type ZnMgO film deposited under an optimized N₂O partial pressure of 2.3 mTorr, with a Hall mobility of 1.4 cm²/V s and a hole concentration of 9.6 × 10¹⁷ cm⁻³ at room temperature. The films were of good crystal quality with a high c-axis orientation of wurtzite ZnO structure. The presence of In-N bonds was identified by X-ray photoelectron spectroscopy, which may enhance the nitrogen incorporation and respond for the realization of good p-type behavior in In-N codoped ZnMgO films. Furthermore, the ZnMgO-based p-n homojunction was fabricated by deposition of an In-doped n-type ZnMgO layer on an In-N codoped p-type ZnMgO layer. The p-n homostructural diode exhibits electrical rectification behavior of a typical p-n junction.     

Multi-carrier transport properties in p-type ZnO thin films

By the aid of temperature- and magnetic-field-dependent Hall effect measurements, we have extracted the multi-carrier transport information in N-doped and N–In codoped p- ZnO thin films grown on Si substrates through mobility spectrum analysis. It is found that owing to the compensation between free electrons and holes, the two-dimensional hole gas from ZnO/Si interface layers becomes determinant and results in the high p-type conductivity and high hole mobility in the ZnO samples. Compared with N-doping, the N–In codoping introduces many In donors and increases acceptor incorporation, as well as enhancing the free hole mobility due to the short-range dipole-like scattering.     

Transport effects in La0.67−x R x Sr0.33MnO3 (R=Eu, Gd)

An experimental study is reported on the temperature dependences of the magnetic susceptibility, electrical resistivity, magnetoresistance, thermo-and magnetothermopower, and on the Hall effect of the polycrystalline lanthanum manganites La_0.67?x R _x Sr_0.33MnO₃ (x=0 and 0.07, R=Eu, Gd) within the 77-to 430-K temperature range. Replacement of a small amount of lanthanum by europium or gadolinium was found to result in a considerable decrease in the resistivity and in a change in the pattern of its temperature dependence. The temperature dependence of both the ordinary and anomalous Hall coefficients near the Curie temperature is shown to be determined by the change in the number of carriers in delocalized states. A method is proposed for separation of the hole and electronic contributions to thermopower in the ferromagnetic region. The conduction mechanisms are discussed in terms of the concept of mobility edge motion.     

Vortex motion in high-Tc films and a micropattern-induced phase transition

A micropattern-induced transition in the mechanism of vortex motion and vortex mobility is observed in high-T_c thin films. The competition between the anomalous Hall effect and the guidance of vortices by rows of microholes (antidots) lead to a sudden change in the direction of vortex motion that is accompanied by a change in the critical current density and microwave losses. The latter effect demonstrates the difference in vortex mobility in different phases of vortex motion in between and within the rows of antidots.     

As-doped p-type ZnO films grown on SiO2/Si by radio frequency magnetron sputtering

p-Type ZnO:As films with a hole concentration of 10¹⁶-10¹⁷ cm⁻³ and a mobility of 1.32-6.08 cm²/V s have been deposited on SiO₂/Si substrates by magnetron sputtering. XRD, SEM, Hall measurements are used to investigate the structural and electrical properties of the films. A p-n homojunction comprising an undoped ZnO layer and a ZnO:As layer exhibits a typical rectifying behavior. Our study demonstrates a simple method to fabricate reproducible p-type ZnO film on the SiO₂/Si substrate for the development of ZnO-based optoelectronic devices on Si-based substrates.     

Anomalous Hall effect in sputter-deposited CoxTi1−xO2–δ films

Hall effect measurements were performed on epitaxial Co_xTi_1−xO_2–δ thin films grown on (0 0 1) LaAlO₃ by reactive RF magnetron co-sputter deposition. Magnetization measurements reveal ferromagnetic behavior in M–H loop at room temperature for Co_xTi_1−xO_2–δ thin films for which x?0.02. An anomalous Hall effect was observed for Co_0.10Ti_0.90O_2−δ films grown with the partial pressure of water P(H₂O)=4×10⁻⁴ Torr or less. These films exhibit a positive ordinary Hall coefficient and a positive magnetoresistance. X-ray diffraction on films grown under these conditions shows evidence for Ti_nO_2n−1 phase due to the deficiency of oxygen. In contrast, Hall measurements taken for undoped and Co-doped TiO₂ thin films grown under more oxidizing conditions show only the ordinary Hall effect with a negative Hall coefficient consistent with n-type conduction. For these films, the magnetoresistance was positive and increased monotonically with increasing magnetic field. The results suggest that Co-doped Ti_nO_2n−1 may be a dilute magnetic semiconducting oxide for which the carriers couple to the spin polarization.     

Preparation and properties of co-evaporated bismuth telluride [Bi2Te3] thin films

Thin films of bismuth telluride have been prepared by the reactive evaporation method. Film properties, such as conductivity, Hall effect, and thermoelectric power were studied in the temperature range from liquid nitrogen to 350 K. The films prepared were of n-type with a carrier concentration of 1.25 x 10²⁰ at room temperature. The temperature dependence of the Hall mobility is found to be T^?1.8 indicating lattice scattering.     

Electrical conduction mechanism in nanocrystalline CdTe (nc-CdTe) thin films

The present paper reports the electrical characterization of nc-CdTe thin films in different temperature ranges. Thin films of nc-CdTe are deposited on the glass substrates by Physical Vapor Deposition (PVD) using the Inert Gas Condensation (IGC) method. The Transmission Electron Microscopy (TEM) studies are made on the CdTe nanocrystals. The surface morphology and structure of the thin films are studied by the Scanning Electron Microscope (SEM) and X-Ray Diffraction (XRD) measurements. Dark conductivity measurements are made on the nc-CdTe thin films in the temperature range 110–370 K in order to identify the conduction mechanism in this temperature range. The obtained results reveal three distinct regions at high, low, and sufficiently low temperature regions with decreasing activation energies. The analysis of the high temperature conductivity data is based on the Seto’s model of thermionic emission. At very low temperatures, dc conductivity (σ _d) obeys the law: lnσT ^1/2∝T ^?1/4, indicating variable-range hopping in localized states near the Fermi level. The density of the localized states N(E _F) and various other Mott’s parameters like the degree of disorder (T _O), hopping distance (R), and hopping energy (W) near the Fermi level are calculated using dc conductivity measurements at low temperatures. Carrier type, carrier concentration, and mobility are determined from the Hall measurements. The transient photoconductivity decay measurements are performed on the nc-CdTe thin films at different intensities in order to know the nature of the decay process.