Optical studies of In0.53Ga0.47As

We present luminescence data obtained as a function of temperature and excitation in In_0.53Ga_0.47As and In_0.7Ga_0.3As_0.63P_0.37. We assign the different lines and correlate the luminescence results with transmission measurements.     

Numerical analysis of In0.53Ga0.47As/InP single photon avalanche diodes

A rigorous theoretical model for In 0.53 Ga 0.47 As/InP single photon avalanche diode is utilized to investigate the dependences of single photon quantum efficiency and dark count probability on structure and operation condition.In the model,low field impact ionizations in charge and absorption layers are allowed,while avalanche breakdown can occur only in the multiplication layer.The origin of dark counts is discussed and the results indicate that the dominant mechanism that gives rise to dark counts depends on both device structure and operating condition.When the multiplication layer is thicker than a critical thickness or the temperature is higher than a critical value,generation-recombination in the absorption layer is the dominative mechanism;otherwise band-to-band tunneling in the multiplication layer dominates the dark counts.The thicknesses of charge and multiplication layers greatly affect the dark count and the peak single photon quantum efficiency and increasing the multiplication layer width may reduce the dark count probability and increase the peak single photon quantum efficiency.However,when the multiplication layer width exceeds 1 μm,the peak single photon quantum efficiency increases slowly and it is finally saturated at the quantum efficiency of the single photon avalanche diodes.     

Electromodulation spectroscopy of In0.53Ga0.47As/In0.53Ga0.23Al0.24As quantum wells

In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As quantum wells (QWs) of various widths have been grown by molecular beam epitaxy on the InP substrate and investigated by electromodulation spectroscopy, i.e. photoreflectance (PR) and contactless electroreflectance (CER). The optical transitions related to the QW barrier and the QW ground and excited states have been clearly observed in PR and CER spectra. The experimental QW transition energies have been compared with theoretical predictions based on an effective mass formalism model. A good agreement between experimental data and theoretical calculations has been observed when the conduction band offset for the In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As interface equals 60%. In addition, it has been concluded that the conduction band offset for the In_0.53Ga_0.23Al_0.24As/InP interface is close to zero. The obtained results show that InGa(Al)As alloys are very promising materials in the band gap engineering for structures grown on InP substrate.     

High Performance (fT~500GHZ) In0.52Al0.48As/In0.53Ga0.47As/InP Quantum Wire MODFETs Employing Asymmetric Coupled-Well Channels

A coupled-well InAlAs/InGaAs quantum wire MODFET structure is proposed, for which simulations predict improved frequency performance (>500 GHz), over a wider range of V_g, as compared to well/wire devices with a standard MODFET heterointerface. A comparison of several transverse potential well profiles, obtained by varying the placement of a thin barrier within a 100 Å finite well, is presented. In all cases, the quantum wires consist of a 0.1 m long channel and a 150 Å finite-square-well lateral profile. It has been found that the peak of the electron distribution for the first confined state, as measured from the heterointerface, changes dramatically depending on the location of the thin barrier. For quantum wire structures, realized in the lattice matched system of In_0.52Al_0.48As/In_0.53Ga_0.47As/InP, a change in the barrier location of 25 Å is accompanied by a shift in the carrier peak of more than 40 Å (~20 Å closer to or farther from the spacer-well interface than in the standard MODFET profile). Implications of this are reflected in the current-voltage characteristics (I_d-V_d) and frequency responses (f_T-V_g) of the proposed structures.     

Electron g-factor in a gated InAs-inserted-channel In0.53Ga0.47As/In0.52Al0.48As heterostructure

We report on electron g-factor in an InAs-inserted In_0.53Ga_0.47As/In_0.52Al_0.48As heterostructure. The gate voltage dependence of g-factor is obtained from the coincidence method. The obtained g-factor values are surprisingly smaller than the g-factor value of bulk InAs, and it is close to the bare g-factor value of In_0.53Ga_0.47As. The large change in g-factor is observed by applying the gate voltage. The obtained gate voltage dependence is not simply explained by the energy dependence of g-factor.     

Femtosecond laser spectroscopy of In0.53Ga0.47As/InP multiple quantum wells: interfacial roughness and photoexcited carrier relaxation

Interfacial properties and relaxation dynamics of photoexcited carriers in In_0.53Ga_0.47As/InP multiple quantum wells (MQWs) have been investigated by means of cross-sectional scanning tunneling spectroscopy and optical spectroscopy methods (luminescence, absorption and pump–probe experiments). The MQW structure consists of 125 periods of 10-nm-wide well layers and 40-nm-wide barrier layers on an InP(0 0 1) substrate. The observed interfacial roughness of the InGaAs-on-InP is 1–2 monolayers (ML), while that of the InP-on-InGaAs is 3–4 ML. The Stokes shift observed in luminescence and absorption spectra at 77 K corresponds well to the well-width distribution observed by the cross-sectional STM. Differential absorption spectra measured by pump–probe spectroscopy show that relaxation of hot carriers in conduction and valence bands followed by exciton formation takes place in 17–30 ps depending on the excitation photon energy. The excitons formed at the band bottom are localized at thicker areas within a quantum well in 500 ps.     

Spatial variation of bandgap energy in In0.53Ga0.47As

We report the observation of spatial variation of the bandgap energy of In_0.53Ga_0.47As in high quality epitaxial samples grown lattice matched to InP. Nine samples grown by three different techniques (LPE, VPE and MBE) were investigated and they all showed this apparently random spatial variation. A bandgap variation as large as 15 meV was observed over distances of the order of 1 mm, an effect corresponding to two percent of bandgap energy.     

In0.53Ga0.47As/In0.52Al0.48As量子阱中的正磁电阻效应

在低温强磁场条件下,对In_0.53Ga_0.47As/In_0.52Al_0.48As量子阱中的二维电子气进行了磁输运测试.在低磁场范围内观察到正磁电阻效应,在高磁场下这一正磁电阻趋于饱和,分析表明这一现象与二维电子气中的电子占据两个子带有关.在考虑了两个子带之间的散射效应后,通过分析低磁场下的正磁电阻,得到了每个子带电子的迁移率,结果表明第二子带电子的迁移率高于第一子带电子的迁移率.进一步分析表明,这主要是由两个子带之间的 关键词： 二维电子气 正磁电阻 子带散射     

Submillimeter wave photoconductivity observation of shallow donors in In0.53Ga0.47As

The hydrogen like 1s 2p (m=–1,0,+1) transitions of two donors have been observed in high intensity magnetic fields up to 8.5T. The m=–1 transitions ocurred between 2 cm^–1 and 25 cm^–1. The signature curves for donors in ternary semiconductor In_0.53Ga_0.47As have now been established.Work supported by the U.s. Air Force Office of Scientific Research under Contract # AFOSR-78-3708-DSupported by the National Science Foundation     

Optimisation of the ammonium sulphide (NH4)2S passivation process on In0.53Ga0.47As

The passivation of III-V semiconductor materials with sulphur is widely reported to reduce interface state defects and improve semiconductor device performance. The most common approach utilises ammonium sulphide ((NH₄)₂S), however there are wide variations in the reported processing parameters involved in this procedure. This study provides a comprehensive review of the various parameters used as well as determining the optimal processing conditions in terms of sample pre-treatments, temperature of the (NH₄)₂S solution, length of time the sample is in the solution and (NH₄)₂S concentration, by measuring the level of residual native oxides and surface roughness by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM), respectively.     

In0.53Ga0.47As/InP量子阱与体材料的1 MeV电子束辐照光致发光谱研究

为获得对In_0.53Ga_0.47As/InP材料在电子束辐照下的光致发光谱变化规律, 开展了1 MeV电子束辐照试验, 注量为 5×10¹²-9×10¹⁴ cm^-2. 样品选取量子阱材料和体材料, 在辐照前后, 进行了光致发光谱测试, 得到了不同结构In_0.53Ga_0.47As/InP材料在1 MeV电子束辐照下的不同变化规律; 对比分析了参数退化的物理机理. 结果显示: 试验样品的光致发光峰强度随着辐照剂量增大而显著退化. 体材料最先出现快速退化, 而五层量子阱在注量达到6×10¹⁴ cm^-2时, 就已经退化至辐照前的9%. 经分析认为原因有: 1)电子束进入样品后, 与材料晶格发生能量传递, 破坏晶格完整性, 致使产生的激子数量减少, 光致发光强度降低; 电子束辐照在材料中引入缺陷, 增加了非辐射复合中心密度, 导致载流子迁移率降低. 2)量子阱的二维限制作用使载流子运动受限, 从而能够降低载流子与非辐射复合中心的复合概率; 敏感区域截面积相同条件下, 体材料比量子阱材料辐射损伤更为严重. 3)量子阱的层数越多, 则异质结界面数越多, 相应的产生的界面缺陷数量也随之增多, 辐射损伤越严重.     

In0.53Ga0.47As/In0.52Al0.48As量子阱中双子带占据的二维电子气的输运特性

研究了不同沟道厚度的In_0.53Ga_0.47As/In_0.52Al_0.48As量子阱中双子带占据的二维电子气的输运特性.在考虑了两个子带电子之间的磁致子带间散射效应后,通过分析Shubnikov-de Haas振荡一阶微分的快速傅里叶变换结果,获得了每个子带电子的浓度、输运散射时间、量子散射时间以及子带之间的散射时间.结果表明,对于所研究的样品,第一子带电子受到的小角散射更强,这与第一子带电子受到了更强的电离杂质散射有 关键词： 二维电子气 散射时间 自洽计算     

Current-voltage characteristics and terahertz emission peculiarities of an In0.53Ga0.47As/In0.52Al0.48As HEMT with 2D electron gas

The characteristics of an In_0.53Ga_0.47As/In_0.52Al_0.48As HEMT with 2D electrons in the channel have been studied. The output characteristics of the transistor exhibit negative differential resistance. The emission spectrum of the system contains two narrow resonance lines at frequencies of 0.87 and 1.36 THz. Original Russian Text ? M.L. Orlov, 2009, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2009, Vol. 73, No. 1, pp. 115–118.     

两个子带占据的In0.53Ga0.47As/In0.52Al0.48As量子阱中填充因子的变化规律

研究了低温(15K)和强磁场(0—13T)条件下, InP基In_053Ga_047As/In_052Al_048As量子阱中电子占据两个子带时填充因子随磁场的变化规律.结果表明,在电子自旋分裂能远小于朗道能级展宽的情况下,如果两个子带分裂能是朗道分裂能的整数倍时,即ΔE₂₁=kω_c(其中k为整数),填充因子为偶数;当两个子带分裂能为朗道分裂能的半奇数倍时,即ΔE₂₁=(2k+1)ω_c/2,填充因子出现奇数. 关键词： 053Ga_047As/In_052Al_048As量子阱')" href="#">In_053Ga_047As/In_052Al_048As量子阱 填充因子 磁输运     

Structural and optical properties of In0.5Ga0.5As/GaAs quantum dots in an In0.1Ga0.9As well using repeated depositions of InAs/GaAs short-period superlattices for the application of optical communication

We report structural and optical properties of In_0.5Ga_0.5As/GaAs quantum dots (QDs) in a 100 Å-thick In_0.1Ga_0.9As well grown by repeated depositions of InAs/GaAs short-period superlattices with atomic force microscope, transmission electron microscope (TEM) and photoluminescence (PL) measurement. The QDs in an InGaAs well grown at 510 °C were studied as a function of n repeated deposition of 1 monolayer thick InAs and 1 monolayer thick GaAs for n=5–10. The heights, widths and densities of dots are in the range of 6–22.0 nm, 40–85 nm, and 1.6–1.1×10¹⁰/cm², respectively, as n changes from 5 to 10 with strong alignment along [1 −1 0] direction. Flat and pan-cake-like shape of the QDs in a well is found in TEM images. The bottoms of the QDs are located lower than the center of the InGaAs well. This reveals that there was intermixing—interdiffusion—of group III materials between the InGaAs QD and the InGaAs well during growth. All reported dots show strong 300 K-PL spectrum, and 1.276 μm (FWHM: 32.3 meV) of 300 K-PL peak was obtained in case of 7 periods of the QDs in a well, which is useful for the application to optical communications.     

Modulated cyclotron resonance in multi-quantum well structure of In0.53Ga0.47As/InP induced by interband and exciton excitation

We report for the first time the modulated cyclotron resonance of electrons in the lattice-matched multi-quantum well structures of In_0.53Ga_0.47As/InP induced by monochromatic light beam of excitation. The resonant enhancement and modulation of the cyclotron resonance of electron due to interband and exciton excitation in the structures have been observed experimentally, which shows the possible prospect of the method for the observation of cyclotron resonances in semiconductors.October 26, 1993     

Photoluminescence of Mn- and Un-doped Ga0.47In0.53As on InP

Photoluminescence measurements on Mn- and Un-doped liquid phase epitaxy Ga_0.47In_0.53As on InP have been made at the temperature range of 4.2–296 K. The Mn acceptor binding energy is estimated to be 45 ± 2 meV. Luminescence due to the Mn acceptor quenches at 60–100 K depending on the doping concentration of Mn in favor of a near-band edge emission.     

生长温度对In0.53Ga0.47As/InP的LPMOCVD生长影响

利用LPMOCVD技术在InP衬底生长了InxGa1-xAs材料，获得表面平整．光亮的In0.53Ga0.47As外延层。研究了生长温度对InxGa1-xAs外延层组分、表面形貌、结晶质量、电学性质的影响。随着生长温度的升高，为了保证铟在固相中组分不变，必须增加三甲基铟在气相中的比例。在生长温度较高时，外延层表面粗糙。生长温度在630℃与650℃之间，X射线双晶衍射曲线半高宽最窄，高于或低于这个温度区间，半高宽变宽。迁移率随着生长温度的升高而增加,在630℃为最大值，然后随着生长湿度的升高反而降低。生长温度降低使载流子浓度增大，在生长温度大于630℃时载流子浓度变化较小。     

1.3 μm range effectively cylindrical In0.53Ga0.47As/In0.52Al0.48As quantum wires grown on (2 2 1)A InP substrates by molecular beam epitaxy

Vertically coupled quantum wires (QWRs) have been made by alternately stacking nominally 3.6 nm thick In_0.53Ga_0.47As self-organized QWR layers and 1 nm thick In_0.52Al_0.48As barrier layers on (2 2 1)A-oriented InP substrates by molecular beam epitaxy. The surface of In_0.53Ga_0.47As QWR layers was corrugated at an amplitude of 1.1 nm and period of 27 nm, and lateral confinement potential is induced by their thickness modulation. The wavelength of photoluminescence (PL) from the stacked QWRs at 15 K becomes longer from 1220 to 1327 nm with increasing total number of stacked QWR layers, N_SL, from 1 to 9, while PL full-width at half-maximum is reduced from 22 to 8.6 meV. The PL intensity with the polarization parallel to the wire direction, I, is 1.30 times larger than that with the normal polarization, I, when N_SL=1. The PL intensity ratio, I/I, reaches as large as 4 when N_SL=9, indicating successful control of relative strength between vertical confinement and lateral confinement of carriers. The value of I/I obtained for the stacked QWRs with N_SL=9 is the same value as cylindrical QWRs have. The results indicate that effectively cylindrical QWRs with the best uniformity and 1.3 μm range emission were realized by stacking of self-organized QWR layers.     

Influence of spacer layer thickness on the current-voltage characteristics of pseudomorphic AlAs/In0.53Ga0.47As/InAs resonant tunnelling diodes

This paper investigates the dependence of current voltage characteristics of AlAs/In0.53Ga0.47As/InAs resonant tunnelling diodes （RTDs） on spacer layer thickness. It finds that the peak and the valley current density J in the negative differential resistance （NDR） region depends strongly on the thickness of the spacer layer. The measured peak to valley current ratio of RTDs studied here is shown to improve while the current density through RTDs decreases with increasing spacer layer thickness below a critical value.