GaAs表面硫化学钝化,CH3CSNH2处理新探

应用同步辐射光电子谱（SRPES）和光致荧光（PL）方法探讨不同钝化条件对GaAs表面键合状态和电子态的影响．发现无论在酸性溶液或碱性溶液条件下，经过CH₃CSNH₂处理的GaAs表面S都与Ga和As成键，形成硫化物钝化层；钝化层形成后，PL谱的强度明显增强，表明GaAs表面复合中心的减少和缺陷态密度的降低 关键词：     

P2S5/NH4OH处理GaAs(100)表面的电子能谱研究

采用俄歇电子能谱(AES)和X射线光电子能谱(XPS)研究了P₂S₅/NH₄OH钝化液处理的GaAs(100)表面的微观特性。AES测量表明,在钝化膜和GaAs衬底之间的界面处无O组分,只有P和S组分。XPS测量分析指出,经过P₂S₅/NH₄OH溶液处理后,GaAs表面处Ga₂O₃和As₂O_{3关键词：}     

中性(NH4)2S溶液钝化GaAs(100)表面的研究

采用同步辐射光电子能谱(SRPES)结合扫描电子显微镜(SEM)和称量法，研究了中性(NH₄)₂S溶液钝化GaAs(100)表面，并与常规(NH₄)₂S碱性溶液钝化方法进行了比较- SRPES结果表明该处理方法可以产生较厚的Ga硫化物层和较强的Ga—S键，Ga的硫化物有好的稳定性-称量法表明该方法有更低的腐蚀速率-SEM结果表明该方法钝化处理的GaAs表面所产生的腐蚀坑数目少，直径小- 关键词：     

CaAs(100)的(NH4)2Sx和P2S5/(NH4)2Sx表面钝化

利用光致发光谱、X射线光电子谱和俄歇电子谱等技术研究了(NH_4)_2S_x和P_2S_5/(NH_4)_2S_5化学钝化GaAs(100)表面.结果表明,(NH_4)_2S_x中S钝化可以完全去除GaAs表面的氧化物.P_2S_5/(NH_4)_2S_x中P_2S_5对降低G_2A_5表面态密度,提高光致发光强度是有效的.钝化表面P氧化物存在对防止GaAs表面初期氧化起重要作用. 关键词：     

CH3CSNH2钝化对铁磁金属与GaAs界面扩散的影响

通过实验对比,研究了CH₃CSNH₂钝化对铁磁金属与GaAs界面处As扩散行为的影响.发现S钝化处理改变了表面As元素的化学环境,减弱了As元素向铁磁金属外延层中的扩散现象,削弱了As与铁磁金属的反应,形成了较窄的反应层,并且改善了界面磁性.初步探讨了S钝化影响As扩散的原因. 关键词： S钝化 半导体界面 电子结构 磁性     

正十八硫醇钝化GaAs(100)表面特性研究

为了有效降低GaAs半导体表面态密度,提出了采用正十八硫醇（ODT,CH₃[CH₂]₁₇SH）进行GaAs表面钝化的方案。首先,分别对GaAs（100）晶片进行了常规硫代乙酰胺（TAM,CH₃CSNH₂）钝化和正十八硫醇钝化,通过X射线光电子能谱（XPS）对比分析了钝化前后晶片表面的化学成分,然后利用光致发光光谱（PL）对正十八硫醇处理的GaAs（100）晶片进行了钝化时间的优化,最后通过扫描电子显微镜（SEM）测试了钝化前后的晶片表面形貌。实验结果表明：采用正十八硫醇钝化的GaAs（100）表面,相比常规硫代乙酰胺钝化方案,具有更低的氧化物含量和更厚的硫化层厚度;室温钝化条件下,钝化时间越长,正十八硫醇的钝化效果越好,但PL强度在钝化超过24 h后基本达到稳定,最高PL强度提高了116%;正十八硫醇钝化的GaAs（100）晶片具有良好的表面形貌,表面形成了均匀、平整的硫化物钝化层。数据表明正十八硫醇是钝化GaAs（100）表面一种非常有效的技术手段。     

Co/S钝化GaAs(100)界面形成的SRPES研究

利用同步辐射光电发射谱研究了Co与CH\-3CSNH\-2处理的S钝化GaAs(100)的界面形成.发现 其界面反应较弱,Co覆盖层达到0.8nm时,形成稳定的界面.GaAs表面上和S原子形成桥 键的Ga原子与Co发生交换反应并扩散到覆盖层中,形成Co—S键.Co覆盖层表面无偏析As的出现,与Co/GaAs(100)界面不同,这表明GaAs表面的S钝化可有效地阻止As原子向覆盖层的扩散. 关键词：     

多种含硫溶液钝化(100)GaAs表面的实验研究

为实现GaAs表面的钝化,以Na2S、(NH4)2S、CH3CSNH2为主要研究对象,通过对比实验研究得出较为理想的湿法钝化液。通过光致发光(PL)谱研究了(NH4)2S 叔丁醇、CH3CSNH2 NH4OH、CH3CSNH2 叔丁醇三种不同含硫溶液钝化(100)GaAs表面后的发光特性。PL谱测试发现,(NH4)2S 叔丁醇饱和溶液处理过的(100)GaAs表面光致发光强度最强,PL谱的相对发光强度是未做钝化处理的10倍左右。因此得出(NH4)2S 叔丁醇饱和溶液是较为理想的(100)GaAs表面钝化液。     

射频等离子硫钝化GaAs(100)的表面特性

采用射频等离子方法,对Ga As(100)衬底片表面进行干法硫等离子体钝化,旨在得到性能稳定含硫钝化层。样品经过360℃温度条件下的快速热退火,光致发光(PL)测试表明,钝化后的样品PL强度上升了71%。同时,钝化样品的稳定性测试结果表明,样品放置在实验室空气中30 d,其PL强度未出现明显变化,说明Ga As的等离子体干法硫钝化具有较好的性能稳定性。     

InSb(111)表面硫处理的研究

本文用俄歇电子能谱、X射线光电子能谱和紫外光电子能谱对用硫化铵溶液处理的InSb表面进行研究。结果表明,硫处理以后在样品表面生成。一层厚度约8?的硫化物钝化层,它对防止表面的氧化和碳沾污有明显的钝化作用。钝化层中,破原子既与锑原子成键,引起Sb3d芯能级发生1.9eV的化学位移;又与铟原子成键,引起In4d芯能级发生0.6—0.7eV的化学位移。350℃的真空退火使锑的硫化物发生分解。500℃退火没能使铟的硫化物完全分解,仍有一部分硫原子以铟的硫化物形式留在样品表面。 关键词：     

A NEW METHOD TO ENHANCE THE MAGNETISM OF Fe OVERLAYER ON GaAs(100): SULFUR PASSIVATION USING CH3CSNH2

Ferromagnetic resonance (FMR) has been used to investigat the magnetism of Fe overlayer on S-passivated GaAs(lO0) pretreated by CH₃CSNH₂. Comparing with the magnetism of Fe overlayer on clean GaAs(100), we find that sulfur passivation can prevent Aa diffusion into Fe overlayer and weaken the interaction of As and Fe. It results in enhancing the magnetism of Fe overlayer on GaAs(100). We also investigate the effects of the pre-annealing of S- pasaivated GaAs(100) substrate on the magnetism of Fe overlayers. The results show that the maximum effective magnetization can be obtained at annealing temperature of 400℃. According to the experimental results of synchrotron radiation photoemission, it can be explained by the change of chemical composition and surface structure of the passivation layer on GaAs(100) surface after the annealing.     

K-shell excitation of CH4, NH3, H2O,CH3OH,CH3OCH3 and CH3NH2 by 2.5 keV electron impact

The regions around the respective carbon, nitrogen and oxygen K-edges of CH₄, NH₃, H₂O, CH₃OH, CH₃OCH₃ and CH₃NH₂ have been investigated by electron energy loss spectroscopy using a beam of 2.5 keV electrons. All spectra show a number of discrete peaks just below the K-shell ionization threshold. These discrete structures have been interpreted as being associated with the promotion of a K-shell electron to Rydberg orbitals which converge to the K-shell ionization threshold.     

PASSIVATION OF THE InP(100) SURFACE USING (NH4)2Sx

InP(100) surface treated with (NH₄)₂S_x has been investigated by using photolumines-cence(PL), Auger electron spectroscopy and X-ray photoelectron spectroscopy, It is found that PL intensity increased by a factor of 3.3 after (NH₄)₂S_x passivation and the sulfur remained on the surface only bonded to indium, not to phosphorus. This suggests that the sulfur atoms replace the phosphorus atoms on the surface and occupy the phosphorus vacancies.     

Magnetic susceptibility studies of (CH2)3(NH3)2FeCl2Br2 and (CH2)6(NH3)2FeCl2Br2

The magnetic susceptibility of the layered compounds (CH₂)₃(NH₃)₂FeCl₂Br₂ and (CH₂)₆(NH₃)₂FeCl₂Br₂ has been measured in the range 80 < T < 300 K. The results follow a Curie-Weiss behavior in the range 120 < T < 300 K but are field dependent for T < 120 K. The results are interpreted in terms of a two-dimensional antiferromagnetic interaction which is canted. A comparison with the corresponding pure chloride compounds is given.     

Sol-gel synthesis of iron(III) oxyhydroxide nanostructured monoliths using Fe(NO3)3·9H2O/CH3CH2OH/NH4OH ternary system

Iron(III) oxyhydroxide xerogels were prepared through sol-gel technology, using iron(III) nitrate nonahydrate as precursor, ethanol as solvent and ammonium hydroxide as gelation agent. This base is used for propylene oxide substitution, which was the gelation agent in previous works. Synthesis of a gel using NH₄OH as a gelation agent is an innovative result with this type of precursor, since with metal salts the addition of a strong base commonly results in precipitation of the solid. The gel synthesis was achieved by controlling the base addition time. The dried material has a residual amount of organic impurities, in contrast with the significant amount detected in xerogels prepared using propylene oxide. The iron phase prevailing in the produced xerogels can be defined as γ-FeO(OH) (lepidocrocite), according to FTIR and Mössbauer analyses. The xerogels are formed by large clusters of well connected nanocrystallites of this phase. XRD revealed a crystalline phase retained inside the iron oxyhydroxide amorphous structure, which corresponds to NH₄NO₃ and results from the combination of NO₃⁻ and NH₄⁺ ions in solution. The produced xerogel has a promising composition to be an oxidizing composite for the energetic materials area.     

Crystal structure and thermal behavior of two new organic monosulfates NH3(CH2)5NH3SO4 1.5H2O and NH3(CH2)9NH3SO4 H2O

The chemical preparation, the calorimetric studies and the crystal structure are given for two new organic sulfates NH₃(CH₂)₅NH₃SO₄ 1.5H₂O (DAP-S) and NH₃(CH₂)₉NH₃SO₄·H₂O (DAN-S). DAP-S is monoclinic P2₁/n with unit cell dimensions: a=11.9330(2) Å; b=10.9290(2) Å; c=17.5260(2) Å; β=101.873(1)°; V=2236.77(6) Å³; and Z=8. Its atomic arrangement is described as inorganic layers of units and water molecules separated by organic chains. DAN-S is monoclinic P2₁/c with unit cell parameters: a=5.768(2) Å; b=25.890(10) Å; c=11.177(5) Å; β=115.70(4)°; V=1504.0(11) Å³ and Z=4. Its structure exhibits infinite chains, parallel to the [100] direction where the organic cations are interconnected. In both structures a network of strong and weak hydrogen bonds connects the different components in the building of the crystal.