亚稳态fcc-Mn薄膜的生长及其同步辐射光电子能谱研究

报道亚稳态fcc-Mn薄膜在衬底温度为400K的GaAs(001)表面成功外延的结果.进而利用同步辐射光电子能谱研究该fcc-Mn薄膜随厚度变化的过程.从实验上得到fcc-Mn占有态的电子态密度分布,比较分析亚稳态的fcc-Mn相与热力学稳定的a-Mn相之间电子结构的显著差别,并给出可能的机制. 关键词：     

两步生长法生长的Inx Ga1-x As/GaAs材料及性质

利用LP-MOCVD技术,采用两步生长法在GaAs(100)单晶衬底上外延生长InxGa1-xAs材料。通过扫描电子显微镜( SEM)与原子力显微镜( AFM)观察了缓冲层厚度对外延层表面形貌、表面粗糙度的影响;利用X射线衍射( XRD)分析了缓冲层厚度对外延层结晶质量的影响;利用拉曼光谱分析了缓冲层厚度对外延层材料合金有序度的影响;通过透射电子显微镜( TEM)观察了外延层材料位错的分布状态,计算了外延层的位错密度。实验结果表明,两步生长法生长的Inx Ga1-x As/GaAs异质结材料的缓冲层厚度存在一个最优值。     

AlN缓冲层对ZnO薄膜质量的影响

采用脉冲激光沉积法以AlN为缓冲层在Si(100)衬底上制备了ZnO薄膜,并测量了样品的XRD谱、SEM图和PL谱.结果表明,AlN缓冲层可以提高Si衬底上外延生长ZnO薄膜的晶体质量.改变缓冲层的生长温度(50～500 ℃)所制备样品的测量结果表明,较低温度下生长的AlN缓冲层有利于制备高质量的ZnO外延层薄膜,其中AlN缓冲层生长温度为100 ℃时外延生长ZnO薄膜晶体质量最好.     

InAs/GaAs和InAs/InxGa1-xAs/GaAs纳米线异质结构的生长研究

利用金辅助金属有机化学气相沉淀法(MOCVD)在GaAs(111)B衬底上分别制备了InAs/GaAs和InAs/In _{x Ga1-xAs/GaAs(0≤x≤1)纳米线异质结构.实验结果显示,直接生长在GaAs纳米线上的InAs纳米线生长方向杂乱或者沿着GaAs纳米线侧壁向衬底方向生长,生长的含有In x Ga1-xAs组分渐变缓冲段的InAs/In x Ga1-x关键词： 纳米线异质结构 xGa1-xAs')" href="#">InxGa1-xAs 组分渐变缓冲层 金属有机化学气相沉淀法}     

缓冲层生长温度对In0.82Ga0.18As 薄膜结构及电学性能的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料。研究缓冲层的生长温度对In_0.82Ga_0.18As薄膜的结构及电学性能的影响。固定外延薄膜的生长条件,仅改变缓冲层生长温度(分别为410,430,450,470 ℃),且维持缓冲层其他生长条件不变。用拉曼散射研究样品的结构性能,测量四个样品的拉曼散射光谱,得到样品的GaAs的纵向光学(LO)声子散射峰的非对称比分别为1.53,1.52,1.39和1.76。测量样品的霍耳效应表明,载流子浓度随缓冲层生长温度变化而改变,同时迁移率也随缓冲层生长温度变化而改变。通过实验得出:缓冲层的生长温度能够影响In_0.82Ga_0.18As薄膜的结构及电学性能。最佳的缓冲层生长温度为450 ℃。     

InAs/GaInSb超晶格薄膜结构与电学性能

采用分子束外延(MBE)方法, 调节生长温度、Ⅴ/Ⅲ束流比等参数在(001)GaAs衬底上生长了InAs/GaInSb超晶格薄膜.结果表明:InAs/GaInSb超晶格薄膜的最佳生长温度在385~395 ℃, Ⅴ/Ⅲ束流比为5.7 :1~8.7 :1.高能电子衍射仪(RHEED)原位观测到清晰的GaAs层(4×2)、GaSb层(1×3)和InAs层(1×2)再构衍射条纹.获得的超晶格薄膜结构质量较好.随着温度的升高, 材料的载流子浓度和迁移率均上升.     

GaAs(001)图形衬底上InAs量子点的定位生长

InAs/GaAs量子点是重要的单光子源,位置可控量子点对实现可寻址易集成的高性能量子点光源具有重要意义.本文详细研究了氢原子条件下GaAs (001)图形衬底的低温脱氧过程,低温GaAs缓冲层生长中沟槽形貌的演化过程,以及沟槽形貌对量子点形核位置的影响.发现GaAs衬底上纳米沟槽侧壁的倾斜角较小时, InAs量子点会优先生长于沟槽底部;当沟槽的侧壁倾斜角较大时, InAs量子点则会优先生长于沟槽两侧的外边沿位置.此外,本文还研究了纳米孔洞侧壁的倾斜角对量子点成核位置的影响,实现了双量子点分子和四量子点分子的定位生长.     

高择优取向铌酸锶钡薄膜的射频磁控溅射制备

采用溶胶-凝胶法在(100)Si单晶上预先制备出掺钾(K)的铌酸锶钡(SBN)缓冲层,利用射频磁控溅射法在缓冲层KSBN上沉积出高择优取向的铌酸锶钡薄膜,获得了磁控溅射法制备择优取向铌酸锶钡薄膜的相关工艺参数,研究发现,KSBN缓冲层能够很有效地克服衬底与SBN薄膜之间较大的晶格失配,在氧气氩气的比例为1∶2,工作气压为10 Pa,溅射功率300 W,衬底温度300℃,退火温度为800℃的工艺条件下,能够获得c轴高度择优取向的铌酸锶钡铁电薄膜.利用X射线衍射仪,原子力显微镜等仪器分析了薄膜 关键词： 磁控溅射 高择优取向 p-n结效应     

缓冲层对InSb/GaAs薄膜质量的影响

InSb是制作3~5μm红外探测器的重要材料。在GaAs衬底上外延生长InSb,存在的主要问题在于两种材料间14.6%的晶格失配度,会引入较大的表面粗糙度以及位错密度,使外延材料的结构和电学性能均会受到不同程度的影响。通过系列实验,研究了在生长过程中缓冲层对薄膜质量的影响。利用高能电子衍射仪(RHHEED)得到了合适的生长速率和Ⅴ/Ⅲ比,研究了异质外延InSb薄膜生长中低温InSb缓冲层对材料生长质量以及不同外延厚度对材料电学性质的影响。采用原子力显微镜(AFM)、透射电子显微镜(TEM)、X射线双晶衍射(DCXRD)等方法研究了InSb/GaAs薄膜的表面形貌、界面特性以及结晶质量。通过生长合适厚度的缓冲层,获得了室温下DCXRD半高峰宽为172″,77 K下迁移率为64300 cm²·V^-1·s^-1的InSb外延层。     

测定GaAs(001)衬底上InAs的生长速率

报道了间接测定InAs生长速率的方法.通过设置不同Ga源温度,固定In源温度;和固定Ga源温度,设置不同In源温度,在GaAs(001)衬底上生长GaAs与InGaAs,用RHEED强度振荡测定GaAs与InGaAs的生长速率.验证了InGaAs的生长速率为GaAs的生长速率与InAs的生长速率之和,得到了In源温度在845～880℃时InAs的生长速率曲线.     

Surface preparation effect of GaAs(110) substrates on the ZnSe epitaxial layer grown by molecular beam epitaxy

The effect of the surface preparation of the GaAs(110) substrate on the ZnSe epitaxial layer grown by molecular beam epitaxy (MBE) was investigated by means of etch-pit density (EPD) measurements, surface morphology observation, and reflection high-energy electron diffraction (RHEED) analysis. The ZnSe epitaxial layer grown on a GaAs(110) surface prepared by cleaving the (001)-oriented wafer in ultrahigh vacuum (UHV) showed about 5×10⁴ cm^-2 of EPD. This value is much lower than that observed from both the samples grown on the mechanically polished surface with and without a GaAs buffer layer. Due to the non-stoichiometric surface after thermal evaporation of the surface oxide, three-dimensional growth can easily occur on the mechanically polished GaAs(110) substrate. These results suggest that the stoichiometric and atomically flat substrate surface is essential for the growth of low-defect ZnSe epitaxial layers on the GaAs(110) non-polar surface. Received: 21 August 1998 / Accepted: 19 October 1998 / Published online: 28 April 1999     

GaAs(111)衬底上生长的GaN的极性与生长方法和生长条件的关系

研究了在GaAs(111)衬底上生长的六角相GaN的极性的相关关系.在高Ⅴ/Ⅲ比的条件下用MOVPE和MOMBE方法生长的GaN的极性和GaAs衬底的极性一致;在(111)A-Ga表面上的生长层呈现Ga的极性,而在(111)B-As表面上的生长层呈现N的极性.然而,在低的Ⅴ/Ⅲ比,或采用一个AIN中间层的条件下,用HVPE和MOMBE方法在GaAs(111)B表面上生长的GaN呈现出Ga的极性.目前,其原因尚不清楚,但是这些结果表明采用HVPE生长方法或用一高温AlN阻挡层可以得到高质量的GaN.     

Stranski–Krastanow growth of multilayer In(Ga)As/GaAs QDs on Germanium substrate

We have described Stranski–Krastanow growth of multilayer In(Ga)As/GaAs QDs on Ge substrate by MBE. The growth technique includes deposition of a thin germanium buffer layer followed by migration-enhanced epitaxy (MEE) grown GaAs layer at 350°C. The MEE layer was overgrown by a thin low-temperature (475°C) grown GaAs layer with a subsequent deposition of a thick GaAs layer grown at 590°C. The sample was characterized by AFM, cross-sectional TEM and temperature-dependent PL measurements. The AFM shows dense formation of QDs with no undulation in the wetting layer. The XTEM image confirms that the sample is free from structural defects. The 8 K PL emission exhibits a 1051 nm peak, which is similar to the control sample consisting of In(Ga)As/GaAs QDs grown on GaAs substrate, but the observed emission intensity is lower. The similar slopes of Arrhenius plot of the integrated PL intensity for the as-grown QD sample grown on Ge substrate as well as for a reference QD sample grown on GaAs substrate are found to be identical, indicating a similar carrier emission process for both the samples. This in turn indicates coherent formation of QDs on Ge substrate. We presume due to the accumulated strain associated with the self-assembled growth of nanostructures on Ge that nonradiative recombination centers are introduced in the GaAs barrier in between the QD layers, which in turn degrades the overall optical quality of the sample.     

Surface morphology of highly mismatched InSb films grown on GaAs substrates by molecular beam epitaxy

InSb films on GaAs(001) substrates with and without GaAs buffer layer have been grown by molecular beam epitaxy. Rather than surface undulations, aligned ripples and pyramidal hillocks along the orthogonal 〈110〉 directions were observed on the surface of InSb films. Both the preferential growth and the termination of ripples were proved to be related to strain‐driven mass transport. A model was proposed to elucidate the formation of the hillocks, which are more efficient to relax strain than ripples. Due to the strain relaxation through hillocks with small bases predominantly, the surfaces of the InSb films grown without a GaAs buffer layer are smoother than those of films grown with a GaAs buffer layer. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

用高分辨透射电镜对MOCVD生长的ZnSe1-xSx-ZnSe应变超晶格结构的研究

本文利用高分辨电子显微镜(TEM)从原子尺度对MOCVD生长的ZnSe_1-xS_x-Znse应变超晶格的精细结构进行了细致观察.通过对缺陷的种类、分布的分析提出缺陷的产生原因与过渡层质量有直接关系,通过改善过渡层的成份及各层间的厚度可制备出结构较完整以及较平整的超晶格薄层材料.     

ZnSe-ZnS超晶格的通光蚀孔及列阵研究

用MOCVD方法在GaAs衬底上生长ZnSe-ZnS超晶格.用化学腐蚀方法在GaAs衬底上开一个通光窗口,使该窗口上仅剩有1～1.8μm厚的生长层.室温下测量了蚀孔后由于化学腐蚀造成生长层表面差异的ZnSe-ZnS超晶格的吸收光谱.研究了带有生长过渡层和无过渡层的超晶格质量对其吸收光谱性能的影响.发现过渡层的存在保护了超晶格激子吸收性能.在此基础上首次采用新工艺在3×3mm2面积上把GaAs衬底金部腐蚀掉,剩下均匀、光滑的ZnSe-ZnS超晶格层,在其上做出了300×300μm2的列阵,为在ZnSe-ZnS超晶格上实现光学双稳的集成化提供了必要条件.     

Long-wavelength IR spectroscopy of ZnTe/CdTe superlattices with quantum dots

This paper reports on the results of investigations of the lattice IR reflection spectra of ZnTe/CdTe multilayer superlattices with CdTe quantum dots grown by molecular-beam epitaxy on a GaAs substrate with a CdTe buffer layer. It is found that the lattice IR reflection spectra of the studied structures exhibit three intense bands associated with vibrational excitations in the GaAs substrate, ZnTe barriers separating the layers with CdTe quantum dots, and the CdTe buffer layer. An analysis of the reflection bands and shifts in the phonon frequencies has revealed internal elastic stresses both in the surface layer of the GaAs substrate and in the ZnTe barriers. It is established that elastic stresses undergo relaxation in the separating ZnTe layers with an increase in their thickness. An additional mode observed in the reflection spectra is explained by manifestations of ZnTe-like vibrations in the ZnCdTe alloy due to interdiffusion of Cd and Zn at the interfaces.     

脉冲激光原位辐照对InAs/GaAs(001)量子点生长的影响

在InAs/GaAs(001)量子点生长过程中, 当InAs沉积量为0.9 ML时, 利用紫外纳秒脉冲激光辐照浸润层表面, 由于高温下In原子的不稳定性, 激光诱导的原子脱附效应被放大, 样品表面出现了原子层移除和纳米孔. 原子力显微镜测试表明纳米孔呈现以[110]方向为长轴(尺寸: 20-50 nm)、[110]方向为短轴(尺寸: 15-40 nm)的表面椭圆开口形状, 孔的深度为0.5-3 nm. 纳米孔的密度与脉冲激光的能量密度正相关. 脉冲激光的辐照对量子点生长产生了显著的影响: 一方面由于纳米孔的表面自由能低, 沉积的InAs优先迁移到孔内, 纳米孔成为量子点优先成核的位置; 另一方面, 孔外的区域因为In原子的脱附, 量子点的成核被抑制. 由于带有纳米孔的浸润层表面具有类似于传统微纳加工技术制备的图形衬底对量子点选择性生长的功能, 该研究为量子点的可控生长提供了一种新的思路.     

Computation of the strain field generated by dislocations with a position-dependent Burgers' vector distribution

A new phenomenon of strain relaxation will be presented. In a series of InxGa1-xAs graded composition buffer layers grown on well cut (001) GaAs substrates, a curvature of the epilayer lattice has been found, i.e. a tilt of the epilayer lattice orientation with respect to the substrate which varies coherently along the sample surface on the scale of several mm. The most recent data analysis performed on a buffer layer compositionally graded with a six-step profile shows also a thickness functional dependence of the curvature. The epilayer lattice curvature has been attributed to a coherent lateral distribution of the Burgers' vectors. An analytical model has been developed in the framework of the continuum elasticity theory to compute the related strain field. The results show small but unexpected contributions to the parallel strain.