原子力显微镜与x射线光电子能谱对LiBq4/ITO和LiBq4/CuPc/ITO的表面分析

利用原子力显微镜对8-羟基喹啉硼化锂(LiBq₄)/铟锡氧化物和8-羟基喹啉硼化锂/酞菁铜(CuPc)/铟锡氧化物表面分别进行了扫描，显示了LiBq₄在不同衬底上的形貌差异，并进一步利用样品表面的x射线光电子能谱图验证了这一差异.实验表明，CuPc层的加入改善了LiBq₄的成膜质量，并将这种改善归因于分子构型与电子亲和势的不同. 关键词： 原子力显微镜 x射线光电子能谱 电子亲和势     

用AFM和XPS研究LiBq4/ITO的表面和界面

用原子力显微镜(AFM)研究了LiBq4／ITO样品表面形貌,结果表明LiBq4层中存在很多裂缝和空隙。用X射线光电子谱(XPS)研究样品表面和界面的电子状态,发现Cls谱在高结合能端出现氧化特征的肩峰,表明真空蒸发沉积的LiBq4分子存在明显的氧化现象;对Bls谱的分析发现,界面处B原子的相对值远低于理论值,说明界面处存在B原子离解,导致了LiBq4分子的更高氧化态;从Cls谱发现,表面污染C的比例很高,而界面处大为下降,原因是表面吸附了气体,从而证实了LiBq4表面存在大量空隙和裂缝。定量研究发现,界面处存在N原子与In、Sn原子的相互作用,这将影响LiBq4的发光颜色。     

新型苯乙烯衍生物掺杂的蓝色及白色有机电致发光器件

研究了新型高效蓝色掺杂剂EBDP的电致发光性能. 分别以EBDP为掺杂剂制备了结构为氧化铟 锡(ITO)/酞菁铜(CuPc)/N,N′-二(1-萘基)-N,N′-二苯基-1,1′-联苯-4-4′-二胺(NPB)/2- 叔丁基-9,10-二-(2-萘基)蒽(TBADN):EBDP/8-羟基喹啉铝(Alq₃)/LiF/Al 与ITO /CuPc/NPB/TBADN:EBDP: 4-二氰亚甲基-2-叔丁基-6-(1,1,7,7-四甲基久咯呢定基-9-烯基)- 4H-吡喃/Alq_{3 关键词： 有机电致发光 蓝色掺杂剂 蓝色电致发光器件 白色电致发光器件}     

蓝色有机发光材料LiBq4的合成及其发光特性

蓝色有机发光材料的开发对于实现有机发光二极管(OLED)的全彩色化具有十分重要的意义.报道了蓝色有机发光材料8-羟基喹啉硼化锂(LiBq₄)的合成及提纯,研究了LiBq₄的光致发光特性,并用LiBq₄作为发光材料制备了蓝色有机发光器件,研究了电子传输层Alq₃的厚度及空穴缓冲层CuPc对器件电流-电压和亮度-电压特性的影响.结果表明,LiBq₄的光致发光峰值波长为452nm,器件ITO/PVK:TPD/LiBq₄/Alq₃/Al的电致发光光谱峰值波长位于475nm处,在25V工作电压下其最高亮度约为430cd/m².但CuPc的加入加剧了器件中载流子的不平衡注入,导致器件性能恶化.通过调整Alq₃的厚度,同时在Alq₃和Al阴极之间加入LiF薄膜以提高电子注入效率,获得了较为理想的实验结果.     

4,4′,4″-三(N-3-甲基苯基-N-苯基氨基)三苯胺掺杂MoOx作为空穴传输层对有机太阳电池性能的影响

通过采用4,4′,4″-三(N-3-甲基苯基-N-苯基氨基)三苯胺 (m-MTDATA)掺入MoO_x作为器件的空穴传输层来提高酞菁铜(CuPc)/C₆₀小分子 有机太阳电池的效率. 采用真空蒸镀的方法制备了一系列器件, 其中结构为铟锡氧化物 (ITO)/m-MTDATA:MoO_x(3:1)(30 nm)/CuPc(20 nm)/C₆₀(40 nm)/4,7-二苯 基-1,10-菲罗啉 (Bphen)(8 nm)/LiF(0.8 nm)/Al(100 nm)的器件, 在AM1.5 (100 mW/cm²)模拟太阳光的照射条件下, 开路电压V_oc=0.40 V, 短路电流J_sc=6.59 mA/cm², 填充因子为0.55, 光电转换效率达1.46%, 比没有空穴传输层的器件ITO/CuPc(20 nm)/C₆₀(40 nm)/Bphen(8 nm)/LiF(0.8 nm)/Al(100 nm) 光电转换效率提高了38%. 研究表明, 加入m-MTDATA:MoO_x(3:1)(30 nm)空穴传输层减小了有机层和ITO电极之间的接触电阻, 从而减小了整个器件的串联电阻, 提高了器件的光电转换效率.     

后退火处理对铟锡氧化物表面等离激元共振特性的影响

近年来,表面等离激元光子学发展迅速,并取得了众多新成果.重掺杂半导体材料的表面等离激元共振性质的研究,也得到了人们越来越多的关注.本文通过纳米球刻印技术制备准三维二氧化硅纳米球阵列,在阵列上沉积铟锡氧化物薄膜,通过不同条件下的后退火处理改变铟锡氧化物薄膜的载流子浓度和载流子迁移率,并研究随着材料性质的改变其相应表面等离激元共振特性的变化规律.结果表明：退火处理均使铟锡氧化物薄膜的晶粒长大,光学透过率增加;在空气中退火会导致铟锡氧化物薄膜的载流子浓度减少,其表面等离激元共振峰红移;而真空退火则使铟锡氧化物薄膜的载流子浓度增加,共振峰蓝移.这些研究结果可为后续铟锡氧化物表面等离激元材料及器件的研究提供科学依据和实际指导.     

ITO退火对GaN基LED电学特性的影响

近些年来,越来越多的发光二极管采用铟锡氧化物(ITO)作为电流扩展层,但是如果不对其进行任何处理,得到的发光二极管的电学特性很差,要得到好的电学特性需要对长有铟锡氧化物的发光二极管进行退火处理.针对不同的退火时间和退火温度对发光二极管的电学特性影响不同的问题,通过测量不同条件下退火得到的发光二极管的理想因子和串联电阻, 根据Shah等人提出的模型进行分析,推测出铟锡氧化物和P型氮化镓的接触特性.结果表明:发光二极管的电学特性开始随着退火温度的升高和时间的增加到达一个优值,如果继续增加温度或者时间都会导致发光二极管电学特性的下降.这样有利于优化退火温度和时间, 得到电学性能较好的器件.     

三元配合物H[Ni（C7H4O4）（C9H6NO）]·2.5H2O的合成与表征

以2,4-二羟基苯甲酸和8-羟基喹啉为配体,以Ni2+作为中心原子,合成了一种新的三元固体配合物H[Ni(C7H4O4)(C9H6NO)]·2.5H2O,并采用元素分析、IR光谱和TG-DSC分析对它的结构进行了表征。结果表明,在该配合物中,2,4-二羟基苯甲酸配体以羧基O原子和一个羟基O原子与中心原子配位,8-羟基喹啉配体以羟基O原子和喹啉N原子与中心原子配位,配合物的配位数为4。     

ITO前驱物氢氧化铟In(OH)Zr3理论研究

分析了铟锡氧化物IT0（Indium Tin Oxide）前驱体氢氧化铟In(OH)3的结构，理论计算了其马德隆常数和晶格能,其值分别为2.9488和-5095.21kJ/mol, 并给出了晶核表面自由能近似公式和晶核生长率的近似表达式,进而计算了采用化学沉淀法制备In(OH)3纳米粉末时的晶核形成参数, In(OH)3晶核生长初期的生长率约为0.012nm/s. 关键词： 纳米粉末 In(OH)3 表面自由能 晶核生长     

高分辨率ITO导电薄膜透明区域缺陷识别

为识别铟锡氧化物导电薄膜透明区域内可能存在的加工型和移交型缺陷,并满足实际应用需求,提出了基于高分辨率视觉系统的自动缺陷识别方法.根据铟锡氧化物薄膜光学特性和空间要求,设计了工作距离为30mm的科勒式同轴光照明模块.此外,为了与照明部分通用光学元件,设计了适用于应用检测的高分辨率成像模块.完成图像采集后,为便于分别检测两类缺陷,采用了两种预处理方法:对图像进行邻域半径r=7的中值滤波并与原图像相减后,获取清晰的划痕缺陷;对图像进行形态学和与阈值处理后,获取对比度为48%的透明电路图案.处理后的图像为缺陷的自动识别提供了可靠的依据,保障了铟锡氧化物薄膜定位的灵敏度和准确度.     

Electrical and optical properties of ITO and ITO/Cr-doped ITO films

In this paper we report on the effects of the insertion of Cr atoms on the electrical and optical properties of indium tin oxide (ITO) films to be used as electrodes in spin-polarized light-emitting devices. ITO films and ITO(80 nm)/Cr-doped ITO(20 nm) bilayers and Cr-doped ITO films with a thickness of 20 nm were grown by pulsed ArF excimer laser deposition. The optical, structural, morphological and electrical properties of ITO films and ITO/Cr-doped structures were characterized by UV–Visible transmission and reflection spectroscopy, transmission electron microscopy (TEM), atomic force microscopy (AFM) and Hall-effect analysis. For the different investigations, the samples were deposited on different substrates like silica and carbon coated Cu grids. ITO films with a thickness of 100 nm, a resistivity as low as ～4×10^?4 Ω?cm, an energy gap of ～4.3 eV and an atomic scale roughness were deposited at room temperature without any post-deposition process. The insertion of Cr into the ITO matrix in the upper 20 nm of the ITO matrix induced variations in the physical properties of the structure like an increase of average roughness (～0.4–0.5 nm) and resistivity (up to ～8×10^?4 Ω?cm). These variations were correlated to the microstructure of the Cr-doped ITO films with particular attention to the upper 20 nm.     

Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films

Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm.In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In₂O₃ or SnO₂. Only a weak diffraction peak for Pt (1 1 1) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3×10⁻⁴ Ω cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.     

ITO/Au/ITO multilayer thin films for transparent conducting electrode applications

Transparent and conducting ITO/Au/ITO multilayered films were deposited without intentional substrate heating on polycarbonate (PC) substrate using a magnetron sputtering process. The thickness of ITO, Au and ITO metal films in the multilayered structure was constant at 50, 10 and 40 nm, respectively.Although the substrate temperature was kept constant at 70 °C, ITO/Au/ITO films were polycrystalline with an (1 1 0) X-ray diffraction peak, while single ITO films were amorphous. Surface roughness analysis indicated ITO films had a higher average roughness of 1.76 nm, than the ITO/Au/ITO film roughness of 0.51 nm. The optoelectrical properties of the ITO/Au/ITO films were dependent on the Au thin film, which affected the ITO film crystallinity. ITO/Au/ITO films on PC substrates were developed with a resistivity as low as 5.6 × 10⁻⁵ Ω cm and a high optical transmittance of 71.7%.     

Enhanced resistance switching stability of transparent ITO/TiO2/ITO sandwiches

We report that fully transparent resistive random access memory(TRRAM) devices based on ITO/TiO2/ITO sandwich structure,which are prepared by the method of RF magnetron sputtering,exhibit excellent switching stability.In the visible region(400-800 nm in wavelength) the TRRAM device has a transmittance of more than 80%.The fabricated TRRAM device shows a bipolar resistance switching behaviour at low voltage,while the retention test and rewrite cycles of more than 300,000 indicate the enhancement of switching capability.The mechanism of resistance switching is further explained by the forming and rupture processes of the filament in the TiO 2 layer with the help of more oxygen vacancies which are provided by the transparent ITO electrodes.     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

Dependence of intermediated noble metals on the optical and electrical properties of ITO/metal/ITO multilayers

Sn doped In₂O₃ (ITO) single layer and a sandwich structure of ITO/metal/ITO (IMI) multilayer films were deposited on a polycarbonate substrate using radio-frequency and direct-current magnetron sputtering process without substrate heating. The intermediated metal films in the IMI structure were Au and Cu films and the thickness of each layer in the IMI films was kept constant at 50 nm/10 nm/40 nm. In this study, the ITO/Au/ITO films show the lowest resistivity of 5.6 × 10⁻⁵ Ω cm.However the films show the lower optical transmission of 71% at 550 nm than that (81%) of as deposited ITO films. The ITO/Cu/ITO films show an optical transmittance of 54% and electrical resistivity of 1.5 × 10⁻⁴ Ω cm. Only the ITO/Au/ITO films showed the diffraction peaks in the XRD pattern. The figure of merit indicated that the ITO/Au/ITO films performed better in a transparent conducting electrode than in ITO single layer films and ITO/Cu/ITO films.     

ITO/Au/ITO multilayer thin films on transparent polycarbonate with enhanced EMI shielding properties

ITO/Au/ITO multilayer thin films were deposited onto polycarbonate substrate via magnetron sputtering technique without intentional heating. The deposition times of both ITO and Au layers were studied to optimize the overall transparency and conductivity. As-prepared thin films were characterized using X-ray diffraction analysis, secondary ion mass spectroscopy, scanning and transmission electron microscopy, atomic force microscopy and physical property measurement system. The optical measurement results revealed that the transmittance of the films were enhanced by increasing the gold deposition time up to 15 s. Beyond this point, further increasing the duration caused a decrease in optical transmittance. Upon optimization of the Au deposition time, the deposition duration of ITO layers was also studied to increase electromagnetic interference (EMI) shielding effectiveness (SE). Maximum EMI SE in this work was measured as 26.8 dB, yielding 99.8% power attenuation, which was verified by simulation results.