Characteristics of the formation of radiation defects in silicon structures

The method of deep-level transient spectroscopy is used to investigate aspects of the formation of radiation defects in silicon p ⁺-n diffusion structures when bombarded by accelerated electrons. It is shown that for base thicknesses of the p ⁺-n structures in the range 0.2–0.6mm a substantial change in the concentration of the radiation defects formed in this way is observed, having a maximum at 0.25 mm. Below 0.2 mm and above 0.6 mm the concentration of radiation defects exhibits a weak dependence on base thickness. The observed effect is explained by variation of the relative concentrations of vacancies and interstitial silicon atoms in the base during formation of p ⁺-n pairs. Zh. Tekh. Fiz. 69, 121–123 (January 1999)     

High-temperature single-hole silicon transistors

We present high-temperature (77 K, 300 K) single-hole n⁺–p⁺–n transistors based on silicon diffusion nanostructures. This is made possible by utilizing a quantum wire with isolated quantum dots, which is naturally formed inside an ultrashallow p⁺-diffusion profile using nonequilibrium diffusion processes.     

Equivalent circuit of silicon diodes subjected to high-fluence electron irradiation

Silicon diodes with a p ⁺-n junction made in a 48-μm-thick phosphorus-doped silicon epilayer (resistivity ρ = 30 Ω cm) grown on antimony-doped Si(111) wafers (ρ = 0.01 Ω cm) are studied. The diodes are irradiated by high-energy (3.5 MeV) electrons with fluences from 5 × 10¹⁵ to 2 × 10¹⁶ cm⁻². It is shown that the conventional equivalent circuit of the diode that consists of a parallel RC network and a series-connected resistor inadequately describes the dependence of the dielectric loss tanδ on variable current frequency f in the range 1 × 10²–3 × 10⁷ Hz. Another equivalent circuit is suggested that includes not only the capacitance and resistance of the n-base (the latter increases because radiation-induced defects are compensated for by shallow donors) but also the f dependence of the capacitance of the space-charge region, which is due to retarded charge exchange between deep-level radiation-induced defects.     

Polycrystalline silicon S-diode fabricated using phosphorus thermal diffusion along grain boundaries

Electrical activity of grain boundaries (GB) in polycrystalline silicon films can stand duty as an additional factor of action on its properties. At present paper it has been studied polycrystalline silicon epitaxial films grown by CVD-method at low-resistivity n ⁺-type poly-Si substrates. A p ⁺-n junction of 0,5 m deep was formed by ion implantation of boron. The effect of thermal annealing (TA) on I-V characteristics of the p ⁺-n-n ⁺ structures was studied. It was founded that the region with negative resistivity is appeared in I-V characteristic after TA in vacuum at 800°C for 1 hour. Investigations by means of C-V and temperature characteristics of samples show that the S-image of the I-V characteristics is caused by phosphorus diffusion along GB that give rise to conduction of the charge carriers along GB. For the first time it was shown the opportunity of the creation of low-cost poly-Si S-diode by TA.     

Assessment of the possibility of determination of the electrophysical characteristics of CdxHg1–xTe p+–n-structures using differential hall measurements

The process of reconstuction of the distribution profile of hole concentration in the p ⁺–n structure by the method of differential Hall measurements upon implantation of ions As⁺ (Е = 190 keV, D = 3.10¹⁴ cm^-2, j = 0.025 μA/cm²) into epitaxial films Cd _x Hg_1–x Te for x ~ 0.2, with the initial electron concentration and mobility n = 10¹⁴ cm^-3 and μ = 2∙10⁵ cm²∙V^–1∙s^–1 is numerically simulated. The dependences of degree of reconstruction of the hole-concentration distribution profile on the depth of a shunting n-layer and magnitude of the magnetic field, at which the electrophysical parameters of the p ⁺–n structure are measured, are calculated. The dependence of the limiting magnetic field determining the magnetic-field range for measurements on the n-layer depth is found. It is shown that in calculations one should use the conduction values measured at the same magnetic fields as the Hall coefficients for determination of the holeconcentration distribution profile using the Petritz model.     

Pulse characteristics of Hg0.8Cd0.2Te n +-p junctions

The pulse characteristics of Hg_0.8Cd_0.2Te n ⁺-p junctions are investigated. It is shown that the shape of the voltage pulse appearing in a junction on passage of a forward (reverse) current is determined by the recombination (generation) of nonequilibrium electrons in the hole region. An increase in the current pulse causes the appearance of an electric field, which draws electrons into the interior of the base region, and leads to variation of their lifetime because of the complex structure of the n ⁺-p junction. Zh. Tekh. Fiz. 67, 130–133 (July 1997     

The characteristics of high current amorphous silicon diodes

Amorphous siliconp−n junctions with various doping profiles have been prepared by the glow discharge technique and the effect of the barrier profile on electrical properties investigated. Current densities of up to 40 A cm⁻² with rectification ratios of 10⁴–10⁵ were obtained withn ⁺−ν−p ⁺ structures. The diode quality factor has also been investigated, both in the dark and under illumination.     

Investigation of temperature-dependent electrical properties of p-VOPc/n-si heterojunction under dark conditions

An organic/inorganic heterojunction p-VOPc/n-Si was fabricated and its electrical properties were investigated. Temperature-dependent dark current–voltage (I–V) characteristics of the heterojunction exhibited rectification behaviour with a rectification ratio of 405 at ±1 V and room temperature. The current–voltage characteristics of the cell showed ohmic conduction at low voltages followed by a space charge-limited current (SCLC) conduction dominated by an exponential trap distribution at higher voltages. At room temperature, the series and shunt resistances were found to be approximately 1.4 and 100 kΩ, respectively. Diode ideality factor n was found to be 3.2 at room temperature and dropped to 1.9 at 363 K. Room temperature mobility of vanadyl phthalocyanine (VOPc) was extracted from the I–V characteristics in the SCLC region and was found approximately 15.5 × 10⁻³ cm² V⁻¹ s⁻¹. The effective barrier height, Ф_B, was estimated as 0.77 eV. The effect of temperature, on various heterojunction parameters was recorded under dark conditions and at temperatures ranging from 300 to 363 K.     

Discrete tunneling of holes in porous silicon

It is pointed out that in the partial oxidation of porous silicon (PS) formed on heavily doped crystals, the topology of the pores can result in the formation of an anisotropic material with strings of nanometersized silicon granules embedded in insulating silicon dioxide SiO₂. In this range of granule sizes the correlation effects in the tunneling of electrons (holes) are strong on account of their Coulomb interaction. This should be manifested as discrete electron and hole tunneling at temperatures comparable to room temperature. The room-temperature current-voltage characteristics of n ⁺-PSp ⁺-p ⁺ diode structures with a PS interlayer on p ⁺-Si, which exhibit current steps on the forward and reverse branches, are presented. The current steps are attributed to discrete hole tunneling along the silicon strings in SiO₂. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 10, 794–797 (25 May 1998)     

Photovoltaic X-ray detectors made of CdTe crystals with a p-n junction

X-ray detectors made of CdTe crystals with a p-n junction obtained by diffusion of In into p-CdTe are investigated. The basic characteristics of such a detector are studied for the first time. It is found that the device is highly sensitive to X rays at a low bias voltage (to −50 V) and the X-ray effective energy in the range 28–72 keV. It is shown that photovoltaic detectors based on CdTe with p-n junctions are superior to Cd_0.9Zn_0.1Te ones.     

Optical absorption behavior of Tl<Superscript>+</Superscript> DOPED Rb(Br<Subscript>1–<Emphasis Type="Italic">x</Emphasis></Subscript>I<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>) system

The optical absorption behavior of Tl⁺ doped Rb(Br_1–x I _x ) mixed crystals (with x = 0.00, 0.05, and 0.10) grown under vacuum by slow cooling from the melt has been studied. Absorption spectra of the mixed crystals recorded at room temperature showed that the characteristic A-absorption band of Tl⁺ ions in the Rb(Br_1–x I _x ) system (0.1 mol. %) with x = 0.00 (i.e., RbBr:Tl⁺) broadened with the iodine content towards the low energy side. Changes in the absorption spectra of the mixed crystals are due to creation of some complex centers involving Tl⁺, Br^–, and I^- ions with energy levels inside the band gap while forming the mixed crystal. The absorption spectra of gamma-irradiated mixed crystals showed the F-band, which shifted towards the low energy side due to the existence of iodine ions in the mixed crystals.     

Improvement of <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-Si photodiodes by embedding of silver nanoparticles

The photo-current of n-ZnO/p-Si heterojunction photodiodes was improved by embedding Ag nanoparticles in the interface (ZnO/nano-P_Ag/p-Si), and the ratio between photo- and dark-current increased by about three orders more than that of a n-ZnO/p-Si specimen. The improvement in the photo-current resulted from the light scattering of embedded Ag nanoparticles. The I–V curve of n-ZnO/p-Si degraded after thermal treatment (A-ZnO/p-Si) because the silicon robbed the oxygen from ZnO to form amorphous silicon dioxide and left an oxygen vacancy. Notably, the properties of ZnO/nano-P_Ag/p-Si were better in the time-dependent photoresponse under 10 V bias. Ag nanoparticles (15–20 nm) scattered the UV light randomly and increased the probability for the absorption of ZnO to enhance the properties of the photodiode.     

Weak-link bi-epitaxial Josephson junctions in a YBa2Cu3O7−δ film on BaZrO3/CeO2/SrTiO3

A bi-epitaxial (001)YBa₂Cu₃O_7−δ /(110)BaZrO₃/(001)CeO₂ three-layer heterostructure has been grown on (100)SrTiO₃ by laser ablation. The epitaxial relations between the layers making up the heterostructure were derived from x-ray diffraction data. The I _cR_n product for the bi-epitaxial Josephson junctions thus obtained was within 1–1.5 mV for 4.2 K, and 30–60 μV for 77 K. The normal resistance R _n=(2–5 Ω) was practically independent of temperature. The magnetic field dependences of I _c had typically a clearly pronounced main maximum, followed by distorted subsequent peaks. Interaction of the Josephson ac current with self-induced electromagnetic waves at the 45° grain boundary and with external microwave radiation (f=11 GHz) produced current steps in the I-V characteristics of the bi-epitaxial junctions at the corresponding voltages. Fiz. Tverd. Tela (St. Petersburg) 39, 1732–1738 (October 1997)     

AC conductivity of porous silicon: A fractal and surface transport mechanism?

Summary In this paper we report on the frequency dependence of the AC conductivity of porous silicon in the range 10 Hz-100 kHz. Two types of testing devices have been fabricated on three different series of samples formed electrochemically using as a starting materialptype,n ⁻-type andn ⁺-type silicon substrates. For frequencies less than 20-40 kHz the conductivity is found to follow a sublinear frequency dependence. This behaviour is typical of a carrier transport mechanism determined by an anomalous diffusion process. At higher frequencies we find that surface states influence the transport mechanism. This suggests a double-channel transport mechanism: one related to porous-silicon “volume” properties and the other more connected to the “surface” itself. Paper presented at the III INSEL (Incontro Nazionale sul Silicio Emettiore di Luce) Torino, 12–13 October 1995.     

Josephson and single-particle currents between partially dielectricized superconductors with charge-density waves

The amplitudes of the nonstationary Josephson current I ¹, the interference current I ², and the quasiparticle current J through symmetric and asymmetric tunnel junctions, including superconductors with charge density waves, are calculated. In the symmetric (s) case the dependence of the Josephson current I _s ¹ on the voltage V on the junction has a logarithmic singularity at |eV|=2Δ, Δ+D, and 2D, where , Δ and Σ are the superconducting and dielectric order parameters, and e is the unit charge. At temperatures T≠0 jumps appear in the current-voltage characteristics I _s ¹ (V) at |eV|=D−Δ. Jumps and singularities are observed in the currents I _s ² and J _s at the same voltages at which singularities and jumps appear in I _s ¹ , respectively. In the nonsymmetric (ns) junctions which include an ordinary superconductor, singularities and jumps occur at |eV|=D+Δ_BCS, Δ+Δ_BCS, and (for T≠0) |D−Δ_BCS| and |Δ−Δ_BCS|, where Δ_BCS is the order parameter of an ordinary superconductor. The quasiparticle current J _ns is an asymmetric function of the voltage V and does not depend on the sign of Σ. The results are compared with experiment. Fiz. Tverd. Tela (St. Petersburg) 39, 991–999 (June 1997)     

Local structure of porous silicon studied by means of X-ray emission spectroscopy

2,3 X-ray emission spectra of porous silicon (P-Si) and of spark-processed silicon (sp-Si). Both types of Si-structure display strong photoluminescence in the visible range of the spectrum. Porous samples were prepared by anodization of n^-- and p⁺-Si-wafers. Whereas for the P-Si processed from p⁺-Si the presence of some amorphous silicon is detected, the X-ray emission spectra of porous Si prepared from n^--Si display a higher content of SiO₂. For spark-processed Si the Si L_2,3 X-ray emission spectra reveal a much stronger degree of oxidation which extends to depths larger than 10000 Å. Furthermore, the chemical state of silicon atoms of sp-Si measured at the center of the processed area is close to that of silicon dioxide, and it has an influence on the photoluminescence energy. Specifically, green photoluminescent sp-Si shows a higher degree of oxidation than the blue luminescent specimen. However, the depth of oxidation consistently decreases in areas with weak or no PL. Possible origins of the observed photoluminescence are discussed. Accepted: 6 March 1997     

Charge transfer mechanism in high-purity silicon-basedn +-π-p + structures

Results of experimental investigations into current-voltage characteristics of n⁺-π-p⁺ structures based on high-purity silicon doped with boron are presented. It is shown that the I–V characteristic at high injection levels is described by Stafeev's theory, when the thickness d of the π-region is smaller than or close to three ambipolar diffusion lengths L_a. For a current density J above (3–50) A/cm² at varying temperatures, the I–V characteristic obeys a relation usually occurring in the case where charge-carrier recombination in the n⁺ and p⁺-regions dominates that found in the π-region. The effect of mutual electron-hole scattering on the behavior of the I–V characteristic is evident at J>630 A/cm³. For d/L_a=9, the I–V characteristic at high injection levels is treated by the theory of double carrier injection into a semiconductor with consideration for diffusion corrections. In the temperature range below 200–276 K, the I–V curve for all samples studied exhibits a linear dependence on J followed by a portion corresponding to a maximum occupancy of recombination levels by injected electrons. Here the Fe or Au donor levels presumably act as recombination levels. The electron and hole capture areas (cross sections) by recombination centers are roughly estimated. Siberian Physicotechnical Institute at Tomsk State University. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 7, pp. 35–45, July 2000.     

Vertical electrical conduction in pentacene polycrystalline thin films mediated by Au-induced gap states at grain boundaries

Vertical electrical conduction in Au/(polycrystal-line pentacene)/Al diode structures and the influence of the kinetic energy of incident Au atoms on the conduction property have been comprehensively studied using current–voltage–temperature (I–V–T) measurements, ultraviolet photoelectron spectroscopy (UPS), atomic-force-microscope (AFM) current imaging, etc. In the I–V characteristics, a symmetrical ohmic current component appeared when a low voltage was applied, and a super-linear one appeared when a high positive voltage was applied to Au. The component in the high-forward-voltage region was concluded to be a thermionic emission of holes from Au with a 0.23-eV injection barrier, which is the normal hole conduction through the highest occupied molecular orbital of pentacene. On the other hand, the ohmic component was concluded to be a metal-like electron transport through high-density gap states at grain boundaries which were induced by the Au penetration into pentacene. UPS and I–V–T measurements clearly indicated the generation of the gap states and the enhancement of their density by the reduction of Au kinetic energy. For vertical-type devices with polycrystalline organic films, the ohmic conduction through the grain boundary will increase the leakage current. On the contrary, it possibly enhances the carrier injection in lateral-type transistors in the case of top-contact configuration.     

Conduction switching in aluminum nitride thin films containing Al nanocrystals

Conduction switching, i.e., a sharp change in the conduction from a lower-conductance state to a higher-conductance state or vice versa in aluminum nitride thin films embedded with Al nanocrystals (nc–Al) has been observed in the ramped-voltage and ramped-current current–voltage (I–V) measurements and the time-domain current measurement as well. Each state is well defined and its I–V characteristic follows a power law. It is observed that the conductance decreases (or increases) with charging (or discharging) in the nc–Al. It is shown that the conduction switching is due to the charging and discharging in the nc–Al at certain strategic sites. With the connecting (or breaking) of some conductive tunneling paths formed by the uncharged nc–Al due to the discharging (or charging) in the nc–Al at the strategic sites, a conduction switching occurs.     

Energy and Oscillator Strength of V20+ Ion

The ionization potentials and fine structure splittings of 1s² nl (l = s, p, and d; n ⩽ 9) states for lithium-like V²⁰⁺ ion are calculated by using the full-core plus correlation (FCPC) method. The quantum defects of these three Rydberg series are determined according to the single-channel quantum defect theory (QDT). The energies of any highly excited states with n ⩾ 10 for these series can be reliably predicted using the quantum defects that are function of energy. The dipole oscillator strengths for the 1s²2s–1s² np and 1s²2p–1s² nd (n ⩽ 9) transitions of V²⁰⁺ ion are calculated with the energies and FCPC wave functions obtained above. Combining the QDT with the discrete oscillator strengths, the discrete oscillator strengths for the transitions from the given initial state to highly excited states (n ⩾ 10) and the oscillator strength density corresponding to the bound-free transitions are obtained. Translated from Chinese Journal of Atomic and Molecular Physics, 2005(2) (in Chinese)