Effect of Mn concentration and growth temperature on nanostructures and magnetic properties of Ge1−xMnx grown on Si

The nanostructures and magnetic properties of Ge_1−xMn_x thin films grown on Si substrates by molecular beam epitaxy, with different nominal Mn concentrations (1−4%) and different growth temperatures, have been systematically investigated by transmission electron microscopy and superconducting quantum interference device. It was discovered that when Ge_1−xMn_x thin films were grown at 70 °C, with increase in Mn concentration, Mn-rich tadpole shaped clusters started to nucleate at 1% Mn and become dominate in the entire film at 4% Mn. While for the thin films grown at 150 °C, tadpoles was firstly seen in the film with 1% Mn and subsequently Mn-rich secondary precipitates became dominant. The magnetic properties show specific features, which are mainly related to the nature and amount of Mn-rich clusters/precipitates within these thin films.     

Growth and structure properties of La1−xSrxMnO3−σ (x=0.2, 0.3, 0.45) thin film grown on SrTiO3 (0 0 1) single-crystal substrate by laser molecular beam epitaxy

La_1−xSr_xMnO_3−σ (LSMO) thin films have been grown on SrTiO₃ (0 0 1) single-crystal substrates using the laser molecular beam epitaxy (MBE) technique. The two-dimensional layer-by-layer growth was in-situ monitored by reflection high-energy electron diffraction (RHEED). Kinetic growth with surface relaxation was also observed, and crystallinity of the thin films was investigated by high-resolution X-ray diffraction. Results of 2θ−ω scans revealed a strong correlation between out-of-plane lattice constant and oxygen content as well as strontium doping concentration. However, further analysis of rocking curve measurements around (0 0 2) plane of thin films grown under different oxygen pressure (P_O2) shown the effects of oxygen content on the crystal structure. An exceptionally low full-width at half-maximum (FWHM) of 0.02° was measured from the sample grown at P_O2 of 5.0 Pa, indicating the almost perfect epitaxial growth of LSMO thin films.     

Calculation of phase diagrams in AlxIn1−xAs/InP,AsxSb1−xAl/InP and AlxIn1−xSb/InSb nano-film systems

The models for calculation of phase diagrams of semiconductor thin films with different substrates were proposed by considering the contributions of strain energy, the self-energy of misfit dislocations and surface energy to Gibbs free energy. The phase diagrams of the Al_xIn_1−xAs and As_xSb_1−xAl thin films grown on the InP (1 0 0) substrate, and the Al_xIn_1−xSb thin films grown on the InSb (1 0 0) substrate at various thicknesses were calculated. The calculated results indicate that when the thickness of film is less than 1 μm, the strain-induced zinc-blende phase appears, the region of this phase extends with decreasing of the layer thickness, and there is small effect of surface energies of liquid and solid phases on the phase diagrams.     

Spectrometric and ellipsometric studies of (1 − x)TiO2 · xLn2O3 (Ln = Nd, Sm, Gd, Er, Yb) thin films

Spectrometric and ellipsometric studies of (1 − x)TiO₂ · xLn₂O₃ (Ln = Nd, Sm, Gd, Er, Yb; x = 0.33, 0.5) thin films at room temperature were performed. The obtained dispersion dependences of refractive indices are successfully described by the optical-refractometric relation. The dependence of optical pseudogap and refractive indices on composition and molar mass of the films is investigated. The influence of compositional disordering on the energy width of the exponential absorption edge is studied.     

Thermal dissolution of Ag(Cu) in amorphous Ge(Sx Se1 − x)2 system

Thermally induced solid state reaction of Ag(Cu) into thin Ge(S_x Se_1 − x)₂ films with x = 0, 0.1, 0.4 and 1.0 was investigated using a step by step technique in order to design films with exact Ag(Cu) concentrations for applications in integrated IR optical devices. A thin film of Ag(Cu) was deposited on top of the host Ge(S_x Se_1 − x)₂ films followed by annealing in vacuum at constant temperature, which resulted in homogeneous films of good optical quality. The variation in Ag(Cu) concentration in the films ranged between 5 and 35 at.%. The kinetics of the diffusion and dissolution of metal in the host films was measured by optically monitoring the change in thickness of doped chalcogenide during consecutive thermal annealing steps. The kinetics studies revealed that the thermal dissolution rate of the Cu is greater than that of Ag. Optical UV-VIS transmission spectra of chalcogenide glass layers, undoped and thermal doped by Ag(Cu), were measured to establish the optical properties of the films. The spectra were analyzed using the technique proposed by Swanepoel and the results show that the addition of metal increases the absorption coefficient in the power-law regime and consequently the optical gap decreases and the refractive index increases. The amorphous character of the films was checked by X-ray diffraction which confirmed the amorphous structure of all Ag(Cu)GeSSe thin films.     

Spectroscopic ellipsometry studies of reactively sputtered nitrogen-rich GaAsN films

Nitrogen-rich GaAsN thin films have been deposited at 500 °C by reactive rf sputtering of GaAs target in argon-nitrogen atmosphere. The arsenic content of the films was varied by changing the nitrogen percentage in the sputtering atmosphere and the As/Ga ratio in the films was estimated by X-ray fluorescence measurements. Spectroscopic ellipsometry measurements have been carried out on these films and the measured ellispometric spectra were fitted with theoretical spectra generated by using suitable model sample structures. From the best fit parameters of the dispersion model, band-gap values and variation of refractive index and extinction coefficient as a function of wavelength have been obtained for films deposited with different percentages of nitrogen in the sputtering atmosphere. The films deposited with 12% to 100% nitrogen in the sputtering atmosphere, which are of hexagonal GaN, exhibit GaN-like optical properties, though effects due to excess arsenic in amorphous phase are seen in the films deposited with less than 40% nitrogen. The films deposited with 5% to 12% nitrogen in sputtering atmosphere are dominantly polycrystalline GaAs_xN_1−x (x ≈ 0.01 to 0.08) and exhibit variations in optical parameters, which are consistent with their structure and composition. The films deposited with less than 5% nitrogen in sputtering atmosphere are arsenic-rich and amorphous.     

Local structural,magnetic, and optical properties of Zn1−xFexO thin films

High quality Zn_1−xFe_xO thin films were deposited on α-sapphire$\alpha \text{-sapphire}$ substrates by RF magnetron sputtering. X-ray absorption fine structure measurements showed that the chemical valence of Fe ions in the films was a mixture of 2+ and 3+ states, and Fe ions substituted mainly for the Zn sites in the films. DC-magnetization measurements revealed ferromagnetic properties from 5 to 300 K. The photoluminescence measurements at 15 K showed a sharp main transition peak at 3.35 eV along with a broad impurity peak at 2.45 eV. The structural and magnetization analyses of the Zn_1−xFe_xO films strongly suggested that the ferromagnetism was the intrinsic properties of the films.     

Effects of high-temperature annealing on electron spin resonance in SiOx films prepared by R. F. sputtering system

Electron spin resonance (ESR) spectra are investigated in order to analyze paramagnetic defects in amorphous SiO_x films with 0.8 ≤ x ≤ 1.87 prepared by a co-sputtering of Si-wafer chips and a SiO₂ disk target. Effects of the thermal annealing at 900 °C and 1100 °C on the ESR spectra are also investigated. Four types of silicon dangling bond centers with forms of •Si ≡ Si_3 − nO_n (n = 0, 1, 2 or 3) are assumed in order to simulate the ESR spectra. The random bonding model appears to describe the network structure of the films with x ~ 2, that is, near the stochiometric composition of SiO₂. It is suggested that the structural fluctuation around silicon dangling bonds is larger in the sputtered SiO_x films used in the present work in comparison with those prepared by plasma-enhanced chemical vapor deposition.     

Electrical properties of a-Ge-Se-In thin films

Steady state and transient photoconductivity has been measured on Ge₂₀Se_80−xIn_x (x = 0, 5, 10, 15, 20) vacuum evaporated thin films. Study of temperature dependent dark conductivity σ_d and photoconductivity σ_ph measurements in the temperature range 303-375 K, shows that the conduction in this glass is through an activated process having single activation energy. The activation energy value of photoconduction is smaller in comparison to activation energy in dark. The photosensitivity shows a maximum value at 10 at.% of In concentration. This is attributed to the decrease in the density of defect states of Ge-Se alloy with increase of In content. The results of intensity dependent steady state photoconductivity σ_ph follow a power law with intensity (F), i.e. σ_ph α F^γ where the value of power γ lies between 0.5 and 1.0, suggesting bimolecular recombination. Rise and decay of photocurrent for different concentration of In shows that photocurrent rises monotonically to the steady state value and the decay of photocurrent is also very fast. An attempt has been made to explain the results on the basis of defects and density of states.     

Optical band gap and refractive index dispersion parameters of In-Se-Te amorphous films

Different compositions of In_x(Se_0.75Te_0.25)_100 − x (where 0 ≤ x ≤ 10 at.%) chalcogenide glasses were prepared by the usual melt quench technique. Chalcogenide thin films of these glasses were prepared by using thermal evaporation method. The film transmittance (T(λ)) at normal incidence for these films was measured in the wavelength range 400-2500 nm using a double beam spectrophotometer. Successfully applying Swanepoel's method helps us to determine the film thickness and the real (n) and imaginary (k) parts of the complex index of refraction with high accuracy. Optical absorption measurements show that, the fundamental absorption is due to the allowed non-direct transitions. It was found that, the addition of In content leads to the increase of the refractive index increases while the optical band gap decreases. The obtained results are well discussed in terms of the chemical bond approach and the cohesive energy.     

Thermal stability of thin InGaN films on GaN

The thermal stability of ∼200-nm-thick InGaN thin films on GaN was investigated using isothermal and isochronal post-growth anneals. The In_xGa_1−xN films (x=0.08–0.18) were annealed in N₂ at 600–1000 °C for 15–60 min, and the resulting film degradation was monitored using X-ray diffraction (XRD) and photoluminescence (PL) measurements. As expected, films with higher indium concentration showed more evidence for decomposition than the samples with lower indium concentration. Also for each alloy composition, decreases in the PL intensity were observed starting at much lower temperatures compared to decreases in the XRD intensity. This difference in sensitivity of the PL and XRD techniques to the InGaN decomposition suggest that defects that quench luminescence are generated prior to the onset of structural decomposition. For the higher indium concentration films, the bulk decomposition proceeds by forming metallic indium and gallium regions as observed by XRD. For the 18% indium concentration film, measurement of the temperature-dependent InGaN decomposition yields an activation energy, E_A, of 0.87±0.07 eV, which is similar to the E_A for bulk InN decomposition. The InGaN integrated XRD signal of the 18% film displays an exponential decrease vs. time, implying InGaN decomposition proceeds via a first-order reaction mechanism.     

Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca₃Co₄O₉ thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the Ca_xCoO₂ secondary phase. Formation of Ca_xCoO₂ was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the Ca_xCoO₂ phase was able to transit into the desired Ca₃Co₄O₉ phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca₃Co₄O₉ thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film.     

Compositional dependence of the optical properties of amorphous Sb2Se3−xSx thin films

Thin films of Sb₂Se_3−xS_x solid solutions (x = 0, 1, 2, and 3) were deposited by thermal evaporation of presynthesized materials on glass substrates held at room temperature. The films compositions were confirmed by using energy dispersive analysis of X-rays (EDAX). X-ray diffraction studies revealed that all the as-deposited films as well as those annealed at T_a < 423 K have amorphous phase. The optical constants (n, k) and the thickness (t) of the films were determined from optical transmittance data, in the spectral range 500-2500 nm, using the Swanepoel method. The dispersion parameters were determined from the analysis of the refractive index. An analysis of the optical absorption spectra revealed an Urbach’s tail in the low absorption region, while in the high absorption region an indirect band gap characterizes the films with different compositions. It was found that the optical band gap energy increases quadratically as the S content increases.     

Electrical conductivity of NbN-SiO2 films obtained by ammonolysis of Nb2O5-SiO2 sol-gel derived coatings

The studies of electrical conductivity of NbN-SiO₂ films are reported. To obtain these films, sol-gel derived xNb₂O₅-(100 − x)SiO₂ (where x = 100, 90, 80, 70, 60, 50 mol%) coatings were nitrided at 1200 °C. The nitridation process leads to the formation of some disordered structures, with NbN metallic grains dispersed in insulating SiO₂ matrix. The structure of the samples was studied using X-ray diffraction (XRD) and atomic force microscopy (AFM). The electrical conductivity was measured with the conventional four-terminal method in the temperature range from 5 to 280 K. The superconducting transition was not observed even for the sample that does not contain silica. All the samples exhibit negative temperature coefficient of resistivity. The results of conductivity versus temperature may be described on the grounds of a model proposed for a weakly disordered system.     

SiOx films prepared using RF magnetron sputtering with a SiO target

In this study, SiO_x thin films were prepared using reactive radio frequency magnetron sputtering at room temperature with a SiO sintered target. The obtained SiO_x films were identified using X-ray diffraction, transmission electron microscopy, infrared absorption spectroscopy, X-ray photoelectron spectroscopy and ultraviolet-visible transmittance measurement. The x in SiO_x film was controlled from 0.98 to 1.70 by changing the oxygen flow ratio at deposition. Increasing the oxygen flow ratio increased the optical gap of the SiO_x films from 3.7 to greater than 6 eV.     

Preparation and characterization of p-type hydrogenated amorphous silicon oxide film and its application to solar cell

Thin film wide band gap p-type hydrogenated amorphous silicon (a-Si) oxide (p-a-SiOx:H) materials were prepared at 175 °C substrate temperature in a radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) and applied to the window layer of a-Si solar cell. We used nitrous oxide (N₂O), hydrogen (H₂), silane (SiH₄), and diborane (B₂H₆) as source gases. Optical band gap of the 1% diborane doped films is in the range of 1.71 eV to 2.0 eV for films with increased oxygen content. Dark conductivity of these films is in the range of 8.7 × 10^− 5 S/cm to 5.1 × 10^− 7 S/cm. The fall in conductivity, that is nearly two orders of magnitude, for about 0.3 eV increase in the optical gap can be understood with the help of Arrhenius relation of conductivity and activation energy, and may not be significantly dependant on defects associated to oxygen incorporation. Defect density, estimated from spectroscopic ellipsometry data, is found to decrease for samples with higher oxygen content and wider optical gap. Few of these p-type samples were used to fabricate p-i-n type solar cells. Measured photo voltaic parameters of one of the cells are as follows, open circuit voltage (V_oc) = 800 mV, short circuit current density (J_sc) = 16.3 mA/cm², fill-factor (FF) = 72%, and photovoltaic conversion efficiency (η) = 9.4%, which may be due to improved band gap matching between p-a-SiOx:H and intrinsic layer. J_sc, FF and V_oc of the cell can further be improved at optimized cell structure and with intrinsic layer having a lower number of defects.     

Mg doping behavior of MOVPE InxGa1−xN (x∼0.4)

The Mg doping behavior of MOVPE indium gallium nitride (InGaN), such as secondary ion mass spectrometry (SIMS) Mg profile, crystalline quality and n–p conversion of the films are described and discussed in this paper. The SIMS analysis reveals that the memory effect of Cp₂Mg as a doping source deteriorates the controllability of Mg doping level and profile, especially for thin (−0.4 μm) InGaN. The high residual donors (10¹⁹–10²⁰ cm⁻³) in InGaN with In content from 0.05 to 0.37 can be compensated by Mg doping and p-type conduction is obtained for those with In content up to 0.2. It is found that a higher Cp₂Mg flow rate is needed to get p-type conduction in InGaN with a higher In content x; for example, Cp₂Mg/(TEG+TMI)≈0.5% for x=0 (GaN), ≈2% for x=0.05 and ≈4% for x=0.2. Such a high Cp₂Mg flow rate is needed due to the high residual donor concentration (10¹⁹–10²⁰ cm⁻³) of InGaN films and the low activation efficiency of Mg. The crystalline quality of InGaN is deteriorated with increasing In content as well as Mg doping level. To achieve a p-type InGaN with a lower Mg doping, it is essential to improve the crystalline quality of non-doped InGaN. For this purpose, the use of a thicker GaN interlayer is effective.     

Influence of hydrogen on structural and optical properties of low temperature polycrystalline Ge films deposited by RF magnetron sputtering

To improve the properties of polycrystalline Ge thin films, which are a candidate material for the bottom cells of low cost monolithic tandem solar cells, ∼300 nm in situ hydrogenated Ge (Ge:H) thin films were deposited on silicon nitride coated glass by radio-frequency magnetron sputtering. The films were sputtered in a mixture of 15 sccm argon and 10 sccm hydrogen at a variety of low substrate temperatures (T_s)≤450 °C. Structural and optical properties of the Ge:H thin films were measured and compared to those of non-hydrogenated Ge thin films deduced in our previous work. Raman and X-ray diffraction spectra revealed a structural evolution from amorphous to crystalline phase with increase in T_s. It is found that the introduction of hydrogen gas benefits the structural properties of the polycrystalline Ge film, sputtered at 450 °C, although the onset crystallization temperature is ∼90 °C higher than in those sputtered without hydrogen. Compared with non-hydrogenated Ge thin films, hydrogen incorporated in the films leads to broadened band gaps of the films sputtered at different T_s.     

Electrical properties of AsxSe1−x (x ≤ 0.05) Mott-barriers

We have experimentally measured the current-voltage and capacitance-voltage characteristics of Au/amorphous As_xSe_1 − x (x ≤ 0.05)/Zr trilayer structures at temperatures from 4 to 295 K. The observed capacitance of structures with an amorphous As_xSe_1 − x (a-As_xSe_1 − x) thickness of ~ 0.4 to ~ 2.8 μm does not significantly change over the entire range of applied bias (− 5 V to 5 V), indicating that the a-As_xSe_1 − x films are fully depleted and thus the structures are Mott barriers. The current-voltage (I-V) characteristics of the a-As_0.03Se_0.97 device at low (< 3000 V/cm) to moderate fields (3000 V/cm-10000 V/cm) follow the predictions of trap limited space charge conduction theory, as they exhibit Ohmic behavior at low fields and trap limited space charge current at moderate fields. According to the trap limited space charge current model of Lampert, the a-As_0.03Se_0.97 film has an effective hole mobility, Θμ (with Θ < 1), of ~ 5 × 10^− 7 cm²/V-sec at 295 K. This value is similar to, but consistently lower than previously reported mobilities inferred from time of flight measurements. The current at high fields (> 10⁴ V/cm) increases rapidly with applied field as a result of carrier emission from localized states and is consistent with transport by the Poole-Frenkel mechanism. A permanent transition to a high conductance state (~ 10^− 3 S) is observed after exposure to very high electric fields (~ 4 × 10⁵V/cm).