InP的多声子红外吸收

利用高分辨的傅里叶光谱仪,在400—4000cm^-1和11—300K范围内,观察到一些其吸收系数为10^-1cm^-1的新弱吸收峰,频率位置为996,965,932,838,806,776,742,718,590,558,538cm^-1。从这些弱吸收峰的频率位置和温度依赖关系,可以认为它们是由于三声子的晶格吸收过程所引起的。对此,我们做了适当的指认。此外,我们首次利用红外吸收法证实,LEC(B₂O₃)-CZInP单晶存在B玷污,其玷污量大约是10¹⁶cm^-3。 关键词：     

Ag离子注入非晶SiO2的光学吸收、拉曼谱和透射电镜研究

能量为200keV的Ag离子，以1×10¹⁶，5×10¹⁶，1×10¹⁷ cm^-2的剂量分别注入到非晶SiO₂玻璃，光学吸收谱显示：注入剂量为1×10¹⁶ cm^-2的样品的光吸收谱为洛伦兹曲线，与Mie理论模拟的曲线形状一致；注入剂量较大的5×10¹⁶，1×10¹⁷ cm^-2的谱线共振吸收增强，峰位红移并出现伴峰. 透射电镜观察分析表明，注入剂量不同的样品中形成的纳米颗粒的大小、形状、分布都不同，注入剂量较大的还会产生明显的表面溅射效应，这些因素都会影响共振吸收的峰形、峰位和峰强. 当注入剂量达到1×10¹⁷ cm^-2时，Ag纳米颗粒内部可能还形成了杂质团簇. 关键词： 离子注入 纳米颗粒 共振吸收 红移     

马达加斯加黄色方柱石的谱学特征研究

利用常规宝石学仪器、电子探针、傅里叶变换红外光谱仪、激光拉曼光谱仪、紫外-可见分光光度计和三维荧光光谱仪等,对马达加斯加黄色方柱石的宝石学性质及谱学特征进行了研究分析。马达加斯加方柱石的宝石学特征与方柱石理论值基本一致;方柱石样品颜色均匀,具有玻璃光泽,原石晶型较为完好且表面普遍可见纵纹及褐红色杂质,部分样品表面可见晕彩效应,样品内部可见多种包裹体,如黑云母、无色晶体包裹体等。红外光谱分析结果表明,样品在指纹区均显示1 039, 1 105和1 196 cm^-1处Si(Al)—O伸缩振动吸收峰;752 cm^-1处Si—Si(Al)伸缩振动吸收峰;551, 687和624 cm^-1处O—Si (Al)—O弯曲振动吸收峰;459 cm^-1处Si—O—Si的弯曲振动与Na(Ca)—O伸缩振动的耦合吸收峰;416 cm^-1处Si—O—Si弯曲振动吸收峰。红外光谱官能团区的诊断性鉴定依据为：3 530和3 592 cm^-1处O—H振动引起的吸收峰;2 499, 2 ...     

退火对Pb辐照Al2O3单晶发光特性的影响

研究了230MeV的²⁰⁸Pb²⁷⁺辐照Al₂O₃样品及随后在600,900,1100K高温条件下退火后的光致发光特性。从辐照样品的测试结果可以清楚地看到在波长为390,450nm处出现了强的发光峰。辐照量为1×10¹³ions/cm²时,样品的发光峰最强。经过600K退火2h后测试结果显示,380nm发光峰剧烈增强,而其他发光峰显示不明显。在900K退火条件下,380nm的发光峰开始减弱,而在360,510nm出现了明显的发光峰,至到1100K退火完毕后380nm的发光峰完全消失,而360,510nm的发光峰相对增强。从被辐照样品的FTIR谱中看到,波数在460~510cm^-1间的吸收是振动模式,经过离子辐照后,吸收带展宽,随着辐照量的增大,Al₂O₃振动吸收峰消失,说明Al₂O₃振动模式被完全破坏。1000~1300cm^-1之间为Al—O—Al桥氧的伸缩振动模式,辐照后吸收带向高波数方向移动,说明其振动模式受到影响。辐照剂量较小的样品,损伤程度相对较低,经退火晶化后,振动模式基本恢复到单晶状态;辐照剂量较高的样品,损伤程度大,退火处理后表面变得较粗糙,振动模式并未出现,说明结构破坏严重。     

n型Bi2Te3基化合物的类施主效应和热电性能

晶粒细化是提高Bi₂Te₃基热电材料力学性能的重要方法,但晶粒细化过程中伴随的类施主效应严重劣化了材料的热电性能,并且一旦产生类施主效应,就很难通过简单的热处理等工艺消除.本文系统研究n型Bi₂Te₃基化合物烧结前粉体颗粒尺寸对材料类施主效应和热电性能的影响规律.随着颗粒尺寸减小,氧诱导的类施主效应明显增强,载流子浓度从10 M烧结样品的3.36×10¹⁹ cm^-3急剧增加到120 M烧结样品的7.33×10¹⁹ cm^-3,严重偏离最佳载流子浓度2.51×10¹⁹ cm^-3,热电性能严重劣化.当粉体颗粒尺寸为1—2 mm时,烧结样品的Seebeck系数为–195 μV/K,载流子浓度为3.36×10¹⁹ cm^-3,与区熔样品沿着ab面方向的Seebeck系数为–203 μV/K和载流子浓度为2.51×10¹⁹     

中子辐照含氢FZ-Si的红外吸收研究

对于中子辐照的n-FZSi(H₂),利用红外吸收光谱研究了由于辐照所产生的各种与氢有关的缺陷态。在未辐照的样品和辐照的样品中分别发现了未曾报道的1992cm^{-1和1857cm-1吸收峰。对于在n-FZSi(H₂)所引起的本征吸收峰和辐照损伤吸收峰,进行了讨论和指派。2150cm-1吸收峰则被认为是由于氢施主所引起的。 关键词：}     

LISICON(锗酸锌锂)单晶的Li+离子电导

本文研究了Lisicon(锗酸锌锂)单晶的Li⁺离子电导率。发现各结晶学方向电导率之间的关系为σ_b≤σ_a≤σ_c≤σ_[110],但各向异性不强。晶体中Li含量对电导率有明显的影响,当Li/Zn比率由6.7变到9.2时,300℃a方向电导率由4.3×10^-2Ω^-1·cm^-1增加到1.25×10^-1Ω^-1·cm^-1,logσT对1/T的曲线显示出三个转变点,分别在～80℃,～140℃和～300℃。电导的激活能分别为0.50—0.58eV(25—80℃),0.92eV(～80—140℃),0.64eV(～140—300℃)和0.36eV(>300℃),极化实验表明单晶的电子电导可以忽略。 关键词：     

CO2激光退火不同外径锗芯光纤的扫描速度研究

对内径为41～43μm,外径约为188μm、251μm和270μm的锗芯光纤进行激光退火实验,研究CO₂激光沿光纤轴向扫描速度对锗芯拉曼峰频率和光传输损耗特性的影响。研究发现,激光扫描速度是决定退火后光纤特性的重要参数。对不同外径的光纤,达到最优退火效果的激光扫描速度不同,188μm、251μm和270μm外径的锗芯光纤分别为10 mm·s^-1、14 mm·s^-1和16 mm·s^-1,光传输损耗分别为3.435 dB·cm^-1、2.147 dB·cm^-1和3.578 dB·cm^-1。使用COMSOL软件对退火过程中纤芯表面固定点的温度变化进行了模拟仿真研究,仿真结果显示激光退火过程中温度呈脉冲形变化。相同外径条件下,激光扫描速度提高,温度脉冲的峰值升高、谷值降低、单脉冲持续时间缩短;相同扫描速度条件下,光纤外径减小,温度脉冲峰值提高,谷值降低。     

掺Er/Er+O的GaN薄膜光学性质的研究

利用Raman散射谱研究了GaN注Er以及Er+O共注样品的振动模，并讨论了共注入O对Er离子发光的影响. 在Raman散射谱中，对于注Er的GaN样品出现了300 cm^-1和670 cm^-1两个新的Raman峰，而对于Er+O共注样品，除了上述两个峰外，在360 cm^-1处出现了另外一个新的峰，其中300 cm^-1峰可以用disorder-activated Raman scattering (DARS)来解释，670 cm^-1峰是由于与N空位相关的缺陷引起的，而360 cm^-1峰是由O注入引起的缺陷络合物产生的. 由于360 cm^-1模的缺陷出现，从而导致Er+O共注入GaN薄膜红外光致发光(PL)强度的下降. 关键词： GaN Er Raman散射 光致发光     

TixY1-xBa2Cu3O7-δ超导体的红外、远红外光谱

本文报道了Ti_xY_1-xBa₂Cu₃O_7-δ(x=0.2和0.4)在4.2—300K的红外、远红外光谱。在50—360cm^-1波段内发现七个反射峰。它们分别与Ba,Cu,O离子团,Y,O离子团。Ti,O离子团,以及Cu—O键的振动有关,对于x=0.2的样品,存在两个反转结构。对于x=0.4的样品,则仅发现一个反转结构。在红外光谱中观察到六个反对峰和三个吸收峰,它们的强度大多随Ti含量的增加而增强。与Y₁Ba₂Cu₃O_7-δ的光谱结果比校,讨论了声子峰及反转结构的物理起因。 关键词：     

µ−spin rotation study of the temperature-dependent relaxation rate of acceptor centers in silicon

Temperature-dependent remanent polarization of negative muons in a silicon crystal doped with phosphorus (3.2 × 10¹², 2.3 × 10¹⁵, and 4.5 × 10¹⁸ cm^?3) and aluminum (2 × 10¹⁴ and 2.4 × 10¹⁸ cm^?3) was examined. Measurements were made over the temperature range 4–300 K in a magnetic field of 2000 G perpendicular to the muon spin. Temperature dependence of the relaxation rate was determined for the magnetic moment of a shallow Al acceptor center in a nondeformed silicon sample, and the hyperfine interaction constant was estimated for the interaction between the magnetic moments of muon and electron shell of the muonic mAl atom in silicon.     

DLTS and PTIS of new donors in oxygen-doped germanium

Two new DLTS bands I and II have been observed in n-type germanium containing 10¹⁶ cm^-3 interstitial oxygen. The signature of II is: E_c?E_II = 0.031 eV, K = 4 × 10⁷ cm^?2s^?1; level I is about half as deep. In addision, the excitation spectrum of I is recorded by PTIS. It is composed of three hydrogenic donor series Ia, b, c with activation energies 17.25, 17.6 and 18.1 meV. The donors I and II are thought to correspond with the well known thermal oxygen donors. Energies for the latter were determined at 0.017 and 0.04 eV from Hall effect by Fuller and Doleiden. The possibility of double donors is examined, in analogy with the case of oxygen donors in silicon.     

Investigation of acceptor centers in semiconductors with the diamond crystal structure by the μ − SR method

The residual polarization of negative muons in crystal silicon samples with phosphorus (P: 1.6×10¹³ cm⁻³) and antimony (Sb: 2×10¹⁸ cm⁻³) impurities is investigated. The measurements are made in a 1000 G magnetic field oriented in a direction transverse to the muon spin in the temperature range 4–300 K. The relaxation rate and shift of the precession frequency in the silicon sample with the phosphorus impurity are measured more accurately than previously. It is found that in antimony-doped silicon the acceptor center _μ A1 at temperatures below 30 K can be in both ionized and neutral states. The experimental data are interpreted on the basis of spin-lattice relaxation of the magnetic moment of an acceptor center, formation of acceptor-donor pairs, and recombination of charge carriers at the acceptor. Preliminary measurements showed a nonzero residual polarization of negative muons in germanium. Pis’ma Zh. éksp. Teor. Fiz. 68, No. 1, 61–66 (10 July 1998)     

半导体中浅杂质的傅里叶变换光热电离光谱

本文报道与快扫描傅里叶变换红外光谱仪相结合的光热电离光谱实验装置和测量系统。采用该系统高分辨率、高灵敏度地研究和测量高纯锗和高纯硅中的剩余浅杂质获得成功。在P型超纯Ge中发现浓度低达10⁸cm^-3的硼受主杂质的光热电离谱线,而探测灵敏度则至少可达10⁷cm^-3;在n型高纯Si中观测到Li-O复合型浅施主中心D(Li,O);施加本征激发光后在P型高纯Si中同时观察到B受主和P施主的跃迁谱线系。此外,在Si,Ge中均观察到 关键词：     

硅的低温电学性质

本文在20°—300°K研究了室温载流子浓度2×10¹²—1×10²⁰cm^-3含硼或磷(砷)Si的电学性质。对一些p-Si样品用弱场横向磁阻法及杂质激活能法进行了补偿度的测定,并进行了比较。从霍尔系数与温度关系的分析指出,对于较纯样品,硼受主能级的电离能为0.045eV,磷施主能级为0.045eV,在载流子浓度为10¹⁸—10¹⁹cm^-3时发现了费米简并,对载流子浓度为2×10¹⁷—1×10¹⁸cm^-3的p-Si及5×10¹⁷—4×10¹⁸cm^-3的n-Si观察到了杂质电导行为。从霍尔系数与电导率计算了非本征的霍尔迁移率。在100°—300°K间,晶格散射迁移率μ满足关系式AT^-a,其中A=2.1×10⁹,α=2.7(对空穴);或A=1.2×10⁸,α=2.0(对电子)。另外,根据我们的材料(载流子浓度在5×10¹¹—5×10²⁰cm^-3间),分别建立了一条电阻率与载流子浓度及电阻率与迁移率的关系曲线,以提供制备材料时参考之用。     

Comparison of theoretical and experimental red and near infrared absorption spectra in overheated potassium vapour

The K₂ molecular spectra have been theoretically and experimentally investigated in the wavelength range between 550 nm and 1100 nm and at the temperatures between 650 K and 1100 K. Semiclassical theoretical simulations were performed using the most recent data for the potential energy curves for the K(4S)+K(4S) and K(4S)+K(4P) systems and the relevant dipole transition moments. The measurements of the corresponding spectra were performed by a spatially resolved absorption method in an inhomogeneous overheated potassium vapour generated in a heat pipe. Both theoretical and experimental investigations confirmed that the reduced absorption coefficients of the potassium diffuse triplet bands at 575 nm, 721.5 nm and 1095 nm are practically independent of temperature in a wide temperature range. The obtained data for the reduced absorption coefficients of these bands can be used for a simple and accurate determination of potassium atom number densities in the range from 5×10¹⁶ cm^-3 to 5× 10¹⁸ cm^-3.     

The relaxation rate of the magnetic moment of a shallow acceptor center as a function of impurity concentration in silicon

A study is made into the temperature dependence of residual polarization of negative muons in crystalline silicon with the concentration of impurity of the n-and p-types ranging from 8.7×10¹³ to 4.1× 10¹⁸ cm^?3. The measurements are performed in a magnetic field of 1000 G transverse to the muon spin, in the temperature range from 4.2 to 300 K. The form of the temperature dependence of the relaxation rate v of the magnetic moment of the μAl⁰ acceptor in silicon is determined. For a nondegenerate semiconductor, the relaxation rate depends on temperature as v ∝ T ^q (q ≈ 3). A variation in the behavior of the temperature dependence and a multiple increase in the relaxation rate are observed in the range of impurity concentration in excess of 10¹⁸ cm^?3. The importance of phonon scattering and spin-exchange scattering of free charge carriers by an acceptor from the standpoint of relaxation of the acceptor magnetic moment is discussed. The constant of hyperfine interaction in an acceptor center formed by an atom of aluminum in silicon is estimated for the first time: |A _hf (Al)/2π| ～ 2.5×10⁶s^?1.     

Electron capture coefficient of neutral indium in silicon

Silicon, doped with indium and phosphorus to 10¹⁶ cm^?3 and well compensated, was illuminated by a halogen lamp, causing neutralization of the indium acceptors. The neutral acceptor concentration was determined by infra-red absorption measurements. From the decay of absorption, after interrupting the exciting illumination, the electron capture coefficient of neutral indium was calculated as 2 × 10^?15 cm³ sec^?1 at 77 K.     

Electrical properties of thermal donors formed in silicon under elastic tensile stress

The electrical properties of thermal donors formed in the bulk and near-surface regions in silicon samples with (3–9) × 10¹⁷ cm⁻³ oxygen concentrations under elastic tensile stress σ of about 1 GPa have been studied. The original method allowing us to control an introduced elastic tensile stress during the thermal donor’s formation at T = 450°C by a double-crystal X-ray diffractometer has been used. The formation of thermal donors in silicon with a high oxygen concentration of 9.3 × 10¹⁷ cm⁻³ under tensile stress has been found to be less effective than in silicon with a low oxygen concentration of (3–5) × 10¹⁷ cm⁻³. Single-charged donors are formed in silicon with a low oxygen concentration under tensile stress while double-charged donors are formed in silicon with a high oxygen concentration.     

Magnetic moment relaxation of a shallow acceptor center in heavily doped silicon

Results of studying the temperature dependence of the residual polarization of negative muons in crystalline silicon with germanium (9×10 ¹⁹ cm ^?3 ) and boron (4.1×10 ¹⁸ , 1.34×10 ¹⁹ , and 4.9×10 ¹⁹ cm ^?3 ) impurities are presented. It is found that, similarly to n-and p-type silicon samples with impurity concentrations up to ～10 ¹⁷ cm ^?3 , the relaxation rate ν of the magnetic moment of a _μ Al acceptor in silicon with a high impurity concentration of germanium (9×10 ¹⁹ cm ^?3 ) depends on temperature as ν～T ^q , q≈3 at T=(5–30) K. An increase in the absolute value of the relaxation rate and a weakening of its temperature dependence are observed in samples of degenerate silicon in the given temperature range. Based on the experimental data obtained, the conclusion is made that the spin-exchange scattering of free charge carriers makes a significant contribution to the magnetic moment relaxation of a shallow acceptor center in degenerate silicon at T?30 K. Estimates are obtained for the effective cross section of the spin-exchange scattering of holes (σ _h ) and electrons (σ _e ) from an Al acceptor center in Si: σ _h ～10^?13 cm² and σ _e ～8×10^?15 cm² at the acceptor (donor) impurity concentration n _a (n _d )～4×10¹⁸ cm^?3.