Comparative Study of the Decomposition of CCl4 in Cold and Thermal Plasma

Decomposition of carbon tetrachloride was studied in an inductively coupled thermal plasma reactor and in a low temperature, non-equilibrium plasma reactor, in neutral and oxidative conditions, respectively. In neutral conditions formation of solid soot, aliphatic- and cyclodienes was observed in equilibrium, and products, such as Cl₂ and C₂Cl₆ were detected in non-equilibrium plasma. Feeding of oxygen into the thermal plasma reactor depressed both soot and dienes formation and induced the formation of oxygen containing intermediates and products. GC-MS analyses of the gaseous products and the extract of the soot referred to as complex decomposition and recombination mechanism at given conditions. Presence of oxygen in the low temperature plasma reactor results in the formation of carbonyl compounds as intermediers. CO₂ and Cl₂ revealed as final products of CCl₄ decomposition in cold plasma.     

PAHs Formation in the Depositions in a Methyl tert-Butyl Ether/Ar,a Methyl tert-Butyl Ether/O2/Ar and a Methyl tert-Butyl Ether/H2/Ar RF Plasma Environment

Contents and distributions of polycyclic aromatic hydrocarbons (PAHs) in the depositions were investigated and discussed in a MTBE/Ar, a MTBE/O₂/Ar and a MTBE/H₂/Ar plasma systems. A radio-frequency (RF) plasma system was used to produce the depositions under the designed operational condition. The identification and quantification of PAHs was accomplished by using a GC with a mass selectivity detector (GC/MS). Results indicated that when the input power controlled at high wattage (70 W) in the three systems, the contents of total-PAH in the MTBE/Ar system are higher than those of total-PAH in other system with adding O₂ or H₂. The comparison of three systems indicated the formation and accumulation of PAHs in the MTBE/Ar system is easier than other systems. At high input power wattage, when the MTBE/Ar mixture added O₂ or H₂, the domain pattern was shifted from both 3- and 4-ring PAH to 2-ring PAH. As far as the total-PAH content is concerned, the MTBE/Ar system at 70 W was found to have the highest mean total-PAH content (1540 g/g), while the MTBE/O₂/Ar system at 20 W had the lowest mean total-PAH content (44.4 g/g).     

Rate Constant for the Reaction of the OH-Radical with CH2F2

The rate constant value of k ₁ = (6.05 ± 0.20)×10⁹ cm³ mol^–1 s^–1 (with ± 1 error) has been determined for the reaction OH + CH₂F₂ (1) by applying the discharge-flow/resonance-fluorescence method at 298 K.     

Deposition of Diamondlike Carbon Film and Mass Spectrometry Measurement in CH4/N2 RF Plasma

The deposition of diamondlike carbon (DLC) film and the measurements of ionic species by means of mass spectrometry were carried out in a CH₄/N₂ RF (13.56 MHz) plasma at 0.1 Torr. The film deposition rate greatly depended on both CH₄/N₂ composition ratio and RF power input. It was decreased monotonically as CH₄ content decreased in the plasma and then rapidly diminished to negligible amounts at a critical CH₄ content, which became large for higher RF power. The rate increased with increasing RF power, reaching a maximum value in 40% CH₄ plasma. The predominant ionic products in CH₄/N₂ plasma were NH⁺ ₄ and CH₄N⁺ ions, which were produced by reactions of hydrocarbon ions, such as CH⁺ ₃, CH⁺ ₂, CH⁺ ₅, and C₂H⁺ ₅ with NH₃ molecules in the plasma. It was speculated that the production of NH⁺ ₄ ion induced the decrease of C₂H⁺ ₅ ion density in the plasma, which caused a reduction in higher hydrocarbon ions densities and, accordingly, in film deposition rate. The N⁺ ₂ ion sputtering also plays a major role in a reduction of film deposition rate for relatively large RF powers. The incorporation of nitrogen atoms into the bonding network of the DLC film deposited was greatly suppressed at present gas pressure conditions.     

Plasma-assisted etching of aluminum in CCl4−Cl2 mixtures

The etching of aluminum has been studied in a diode reactor fed with CCl₄–Cl₂ mixtures. The overall reaction has been found to be influenced by the contemporaneous deposition of low-volatile etch products and/or a chlorocarbon polymer film originating from the polymerization of CCl_x species. A simple approach is described which allows the chemical contribution to the etch process to be distinguished from the physical one of through-film diffusion. The etching of a clean Al surface is shown to be controlled by chlorine chemisorption at low temperature.Work partially supported by Progetto Finalinalizzato Materiali per l'Elettronica a Stato Solido del CNR and by the Italian Ministry of Education (MPI).     

CH2＝CHCl与O(3P)反应的理论研究

用量子化学密度泛函理论和QCISD (Quadratic configuration interaction calculation)方法, 对O(³P)与CH₂CHCl的反应进行了理论研究. 在UB3LYP/6-311＋＋G(d,p), UB3LYP/6-31＋＋G(3df, 3pd)计算水平上, 优化了反应物、产物、中间体和过渡态的几何构型, 并在UQCISD(T)/6-311＋＋G(2df,2pd)水平上计算了单点能量. 为了确证过渡态的真实性, 在UB3LYP/6-311＋＋G(3df,3pd)水平上进行了内禀坐标(IRC)计算和频率分析, 并确定了反应机理. 研究结果表明, 反应主要产物为CH₂CHO和Cl.     

Freezing-point of mixtures of H 2 16 O and H 2 18 O

Freezing-point depression of mixtures of H ₂ ¹⁶ O and H ₂ ¹⁸ O were measured. The results showed that the freezing point of the mixture rose linearly with an increase in the molal concentration of H ₂ ¹⁸ O. The results suggested the formation of a solid solution of H ₂ ¹⁶ O and H ₂ ¹⁸ O by freezing, similar to that formed by H ₂ O–D ₂ O, and that H ₂ ¹⁸ O behaves as a different molecule than H ₂ ¹⁶ O.     

基于密度泛函理论对等离子体中H/CO2相互作用的第一性原理研究

深入理解辐照条件下氢同位素与CO₂反应的微观机制,可为聚变堆氘氚燃料循环工艺的优化设计提供数据支撑。基于此,采用第一性原理计算研究了等离子体放电条件下H₂和CO₂的微观反应机制,研究了不同温度和氢同位素效应对反应过程的影响。通过内禀反应坐标（IRC）算法结合反应过渡态获得4条初始反应路径,并对比研究了生成产物CH₄及CH₃OH的2条路径在热力学上的容易程度,以及不同氢同位素对各个反应的影响。研究发现,氚的自发衰变或等离子体中的高能电子都会诱导氢同位素与CO₂发生反应,形成CO、H₂O、CH₄及CH₃OH等产物;在高能电子诱导CO₂的离解后,由4条初始反应路径组成的复杂反应可以自持发生,且该复杂反应中存在2种倾向;升高反应温度对CO₂转化为有机物（CH₄和CH₃OH）具有一定的促进作用。     

Rate Coefficient for Self-Association Reaction of CF2 Radicals Determined in the Afterglowof Low-Pressure C4F8 Plasmas

We have analyzed decay kinetics of CF₂ radicals in the afterglow of low-pressure, high-density C₄F₈ plasmas. The decay curve of CF₂ density has been approximated by the combination of first- and second-order kinetics. The surface loss probability evaluated from the frequency of the first-order decay process has been on the order of 10^–4. This small surface loss probability has enabled us to observe the second-order decay process. The mechanism of the second-order decay is self-association reaction between CF₂ radicals (CF₂+CF₂C₂F₄). The rate coefficient for this reaction has been evaluated as (2.6–5.3)×10^–14 cm³/s under gas pressures of 2 to 100 mTorr. The rate coefficient was found to be almost independent of the gas pressure and has been in close agreement with known values, which are determined in high gas pressures above 1 Torr.     

Cu_2O(111)催化水煤气变换反应机理的理论研究

采用密度泛函理论结合周期平板模型方法系统地研究了水煤气变换反应在Cu_2O(111)表面上的反应机理,包括氧化还原机理、羧基机理和甲酸根机理.结果表明,在Cu_2O(111)表面,羧基机理和甲酸根机理均可行,且甲酸根机理更为有利,其最佳反应途径为H_2O~*→H~*+OH~*;CO(g)+H~*+OH~*→trans-HCOOH~*(1)→cis-HCOOH~*→CO_2~*+H_2(g).其中trans-HCOOH~*(1)→cis-HCOOH~*为其决速步,该基元反应的能垒仅为59 kJ·mol~(-1).羧基机理的最优反应路径同样是以H_2O的解离反应开始,随后CO(g)+OH~*→cis-COOH~*→trans-COOH~*→CO_2(g)+H~*,最后产生的两个吸附的H原子先迁移再结合生成H_2,整个反应的控速步骤为H原子的迁移,迁移能垒为96 kJ·mol~(-1).氧化还原机理则由于OH解离需要越过一个很高的能垒(254 vs.187 kJ·mol~(-1))而不可行.     

A pseudopotential study of the hydrogen bond in H2O·H2S,H2S·H2S and H2O·H2Se systems

Intermolecular potential energy curves for the hydrogen bonded systems H₂O·H₂S, H₂O·H₂Se and H₂S·H₂S were calculated with nonempirical pseudopotentials using optimized-in-molecules basis sets augmented by polarization functions. The H₂O·H₂O interaction energy curve has been also considered as a test case. The present results for H₂O·H₂S and H₂S·H₂S indicate much weaker intermolecular interactions than those found in previous ab initio calculations. The H₂O·H₂Se interaction was found to be quite similar to H₂O·H₂S.This work was partly supported by the Polish Academy of Sciences within the Project PAN-09, 7.1.1.1On leave from Quantum Chemistry Laboratory, Dept. of Chemistry, University of Warsaw, Pasteura 1, 02-093. Warsaw, Poland     

CRTA Study of the Reduction of UO2F2 into UO2 by Dry H2

The reduction of UO₂F₂ by dry H₂ was studied by Controlled Rate EGA, with a special set-up operating under a gas flow under atmospheric pressure. At the constant transformation rate selected, this reduction apparently takes place in one main step, around 450°C (for a total duration of 100 h), followed by a small exothermic step. The final product is a stoichiometric, well crystallized UO₂. XRD analysis shows the occurrence of two successive intermediates of which one has a structure close to that of UO₂, but with interstitial fluorine atoms. This revised version was published online in August 2006 with corrections to the Cover Date.     

The reaction of MgCl2·4H2O with CCl2F2

A new reaction of MgCl₂·4H₂O with CCl₂F₂ is investigated by DTA and TG from room temperature to 350 °C. It is observed that MgF₂ was obtained between 252 and 350 °C, Below the temperature, MgCl₂·4H₂O dehydrates and hydrolyzes to MgCl₂ and Mg(OH)Cl, which are the real reactants of the reaction with CCl₂F₂. The formation of MgF₂ is ascribed to the reaction of MgCl₂ and Mg(OH)Cl with HF, which forms by decomposition of CCl₂F₂ with the taking part in of H₂O released from dehydration of hydrated magnesium chloride on the surface of MgCl₂ and Mg(OH)Cl, which catalyzes the decomposition of CCl₂F₂ in this case. Consequently, the reactions are tested in the fluid-bed condition. It is found that MgF₂ formed at temperatures down to 200 °C in a fluid-bed reactor. This reaction may be used as a method of disposing of the environmentally sensitive CCl₂F₂ (rather than release into the atmosphere). It is also a method for the preparation of MgF₂.     

Zur Kenntnis von Cr2H2(As2O7)(As4O12)

The crystal structure of Cr₂H₂(As₂O₇)(As₄O₁₂) has been determined by X-ray methods using single crystal diffractometer data (1,152 reflections,R=0.054, orthorhombic,Pmmn,a=1317.7 (7),b=1124.9 (6),c=494.3 (4) pm,Z=2). The crystal structure contains both diarsenate(V) and the hitherto unknown cyclo-tetraarsenate(V)-anions. The magnetic susceptibility follows theCurie-Weiss law (=3.86±0.01 _B/Cr³⁺, =–31 K).

     

Influence of O2 Plasma on Surface Properties of PC-TiO2 Nanocomposite Film

In this work, polycarbonate-TiO₂ nanocomposite films were prepared with different percentages. The aim was to consider the effect of O₂ LF plasma (50 Hz) on the hydrophilicity, surface energy, and surface morphology of polycarbonate and polycarbonate-TiO₂ nanocomposite. Structure of samples was determined by using X-ray diffraction analysis. In comparison with the reference sample, the samples’ structure did not change after plasma treatment. Surface properties of polycarbonate and polycarbonate-TiO₂ nanocomposite films were studied by X-ray photoelectron spectroscopy (XPS), contact angle measurement, atomic force microscopy (AFM), and Vickers microhardness tester. XPS analysis showed that the surface of samples became more oxidized due to plasma treatment. The water contact angle significantly decreased from 88° to 15° after plasma treatment. It was observed that the hardness of the nanocomposite films was not modified after plasma treatment.     

Spin-spin coupling constant 3 J H,F as a reliable criterion for recognition of individual regioisomeric and tautomeric pairs of H(CF2)2-containing isoxazoles and pyrazoles

The spin-spin coupling constant ³ J _H,F of the H(CF₂)₂ group varies within 1.6—3.5 Hz for 5-R^F- and 3.8—4.5 Hz for 3-R^F-isoxazoles and pyrazoles in CDCl₃ and can serve as a reliable criterion for recognition of regioisomeric and tautomeric structures of H(CF₂)₂-containing heterocyclic compounds.     

Supported ruthenium catalysts in hydrodechlorination of CCl2F2 (CFC-12)

Active carbon-and MgF₂-supported ruthenium catalysts characterized by a comparable metal dispersion were investigated in CCl₂F₂ hydrodechlorination. Ruthenium, especially when supported on carbon, exhibits a considerable selectivity to CHClF₂. This propensity and a noticeable activity towards C₂-products differentiate ruthenium from palladium catalysts. Dedicated to Professor Pál Tétényi on the occasion of his 70th birthday     

Direct Synthesis of H2O2 by a H2/O2 Fuel Cell

Direct synthesis of H₂O₂ solutions by a fuel cell method was reviewed. The fuel cell reactor of [O₂, gas-diffusion cathode electrolyte solutions Nafion membrane electrolyte solutions gas-diffusion anode, H₂] is very effective for formation of H₂O₂. The three-phase boundary (O₂(g)–electrode(s)–electrolyte(l)) in the gas-diffusion cathode is essential for efficient formation of H₂O₂. Fast diffusion processes of O₂ to the active surface and of H₂O₂ to the bulk electrolyte solutions are essential for H₂O₂ accumulation. The maxima H₂O₂ concentrations of 1.2 M (3.5 wt%) and 2.4 M (7.0 wt%) were accomplished by the heat-treated Mn-OEP/AC electrocatalyst with H₂SO₄ electrolyte and by the VGCF electrocatalyst with NaOH electrolyte, respectively, under short circuit conditions.     

Facile Preparation of Indolyl-2/3-methylsulfoxides Using HF/H2O2

A variety of indolyl-2/3-methylsulfides tethered with sensitive functionalities were oxidized to the corresponding sulfoxides using a hitherto unexplored HF/H₂O₂ system.