The polymerisation of functionalised methacrylate monomers in supercritical carbon dioxide

This paper describes the homopolymerisations of isobornyl methacrylate (IBMA) and poly(ethylene glycol) methacrylate (PEGMA) in supercritical carbon dioxide (scCO₂) and copolymerisation with methyl methacrylate (MMA). We have used two different stabiliser systems poly(dimethyl siloxane) monomethylacrylate (PDMS-MMA) and Krytox 157FSL, both of which have been shown previously to be highly effective stabilisers for dispersion polymerisation in scCO₂. The effect of initiator concentration and copolymer composition is studied. For the copolymerisation of IBMA and MMA, under optimised conditions it is possible to form discrete particles with diameters in the range 1.4-3.6 μm. The PDMS-MMA macromonomer was found to be less effective as a stabiliser, causing particle aggregation due to the low solubility of this stabiliser in the monomers. The copolymers of PEGMA and MMA are also studied. The materials have interesting solubility properties with a transition in solubility from aqueous to organic media on increasing the MMA content.     

Photocrosslinking of polymethoxymethylstyrene and copolymers containing (2,2-disubstituted-1,3-dioxolan-4-yl)methoxymethylstyrene

Methoxymethylstyrene (MSt), (2,2-dimethyl-1,3-dioxolan-4-yl)methoxymethylstyrene (MMSt), and (2-ethyl-2-methyl-1,3-dioxolan-4-yl)methoxymethylstyrene (EMSt) were synthesized and homopolymerized and copolymerized. The photochemical behavior of resultant homopolymers and copolymers with methyl methacrylate (MMA) and styrene (St) were investigated. The infrared (IR) and ultraviolet (UV) spectra of poly(MSt) showed that new bands ascribed to methyl benzoate residue increase rapidly with irrdiation time in air, but no detectable changes are observed in vacuum. The solubility measurements of poly(MSt) indicate that the main factor in crosslinking is the direct coupling of the benzyl radical generated by UV irradiation, which was confirmed by photopolymerization of MMA by means of benzyl methyl ether. It was also found that copolymers of MMSt or EMSt with MMA or St are easily crosslinked by UV irradiation. From the results of solubility measurements of these copolymers irradiated both in air and in vaccum, it was concluded that not only the 1,3-dioxolane structure but also the benzyl methyl ether structure takes part in photocrosslinking, as we expected.     

Formation of hybrid wormlike micelles upon mixing cetyl trimethylammonium bromide with poly(methyl methacrylate-co-sodium styrene sulfonate) copolymers in aqueous solution

The association of cetyltrimethylammonium bromide, CTAB, with a series of P(MMAx-co-SSNa) random copolymers of sodium styrene sulfonate (SSNa) with methyl methacrylate (MMA) was explored in aqueous solution as a function of the MMA molar content, x, of the copolymers. The polyelectrolyte/surfactant complexation in aqueous solution was verified through pyrene fluorescence probing. In addition, turbidimetry studies in dilute or more concentrated aqueous solutions elucidated the phase separation behavior of the P(MMAx-co-SSNa)/CTAB systems as a function of the copolymer composition x and the surfactant to polyelectrolyte mixing charge ratio. It is found that practically phase separation is completely suppressed within the studied mixing range when the MMA content of the copolymers is ～30-40 mol%. For lower MMA contents the polyelectrolyte/surfactant complex separates out from water, while for higher x values the solubility limits of the copolymers in water are attained. For the intermediate MMA contents, viscoelastic systems are obtained in more concentrated polymer/surfactant solutions provided that the polyelectrolyte is fully complexed with the cationic surfactant ((1)H NMR results). Moreover, the (1)H NMR studies indicate that hybrid P(MMAx-co-SSNa)/CTAB wormlike micelles are formed in water under these conditions. Finally, it is shown that addition of salt prevents syneresis problems and facilitates the rheological investigation.     

Synthesis of acrylic rosin derivatives and application as negative photoresist

Functional monomers containing a rosin moiety, maleopimaric acid anhydride (MPA) and fumaropimaric acid (FPA) were synthesized from gum rosin. Monofunctional acrylic rosin derivatives were synthesized from esterification of MPA and various acrylates, (2-hydroxyethyl acrylate) (HEA), 3-hydroxypropyl acrylate, and 4-hydroxybutyl acrylate. Monofunctional monomers were copolymerized with (methyl methacrylate) (MMA) by radical polymerization. Trifunctional acrylate was synthesized from FPA and HEA. All the monomers and polymers showed good solubility and low absorbance in the UV region (200-400 nm). Negative patterns from rosin derivatives were obtained by two methods, one is a photocuring method using trifunctional acrylate and copolymers, and the other is photocrosslinking of copolymers using a photocrosslinker under UV (I-line) radiation. Negative photoresists containing rosin moiety showed high contrast and minimum linewidth of 2.2 μm.     

Synthesis,characterization, and bulk properties of amphiphilic copolymers containing fluorinated methacrylates from sequential copper‐mediated radical polymerization

The partly fluorinated monomers, 2,2,2‐trifluoroethyl methacrylate (3FM), 2,2,3,3,4,4,5,5‐octafluoropentyl methacrylate (8FM), and 1,1,2,2‐tetrahydroperfluorodecyl methacrylate (17FM) have been used in the preparation of block copolymers with methyl methacrylate (MMA), 2‐methoxyethyl acrylate (MEA), and poly(ethylene glycol) methyl ether methacrylate (PEGMA) by Atom Transfer Radical Polymerization. A kinetic study of the 3FM homopolymerization initiated with ethyl bromoisobutyrate and Cu(I)Br/N‐(n‐propyl)‐2‐pyridylmethanimine reveals a living/controlled polymerization in the range 80–110 °C, with apparent rate constants of 1.6 · 10⁻⁴ s⁻¹ to 2.9 · 10⁻⁴ s⁻¹. Various 3FM containing block copolymers with MMA are prepared by sequential monomer addition or from a PMMA macroinitiator in all cases with controlled characteristics. Block copolymers of 3FM and PEGMA resulted in block copolymers with PDI < 1.22, whereas block copolymers from 3FM and MEA have less controlled characteristics. The block copolymers based on MMA with 8FM and 17 FM have PDI's < 1.30. The glass transition temperatures of the block copolymers are dominated by the majority monomer, as the sequential monomer addition results in too short pure blocks to induce observable microphase separation. The thermal stability of the fluorinated poly((meth)acrylate)s in inert atmosphere is less than that of corresponding nonfluorinated poly((meth)acrylate)s. The presence of fluorinated blocks significantly increases the advancing water contact angle of thin films compared to films of the nonfluorinated poly((meth)acrylate)s. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 8097–8111, 2008     

Release and formation of surface-localized ionic clusters (SLICs) into phospholipid rafts from colloidal solutions during coalescence

Stimuli-responsive behavior of phospholipids in the presence of ionic surfactants utilized in synthesis of MMA/nBA colloidal particles was investigated. Utilizing 1-myristoyl-2-hydroxy-sn-glycero-phosphocholine (MHPC) phospholipid, and sodium dioctyl sulfosuccinate (SDOSS) surfactant as dispersing media in H(2)O, narrow unimodal particle size distributions of methyl methacrylate (MMA)/n-butyl acrylate (nBA) copolymers were synthesized. The particle diameters were 154 nm when a SDOSS/MHPC mixture was used and 161 nm using MHPC as the only surface-stabilizing species. When such colloidal dispersions are exposed to 1.7, 3.3, and 6.7 mM aqueous CaCl(2) and KCl electrolyte solutions, surface-localized ionic clusters are generated at the film-air interface that may serve as lipid rafts composed of crystalline phases of MHPC deposited on poly(MMA)/nBA films. These studies illustrate that it is possible to control release and morphology developments of surface phospholipid rafts on artificial surfaces.     

Control through monomer placement of surface properties and morphology of fluoromethacrylate copolymers

The arrangement of monomers and morphology of fluorinated copolymers of methyl methacrylate (MMA) were found to be important for controlling the surface energy of the materials when formed into thin films. Novel copolymers of MMA and 2,2,3,3,4,4,4‐heptafluorobutyl methacrylate (F3MA) were prepared with different monomer placement, namely statistical and block arrangements of the monomer units. The surface energies decreased with increasing incorporation of F3MA, in a manner consistent with previous reports for similar copolymers; however, the surface energies of the block copolymers were consistently lower than the statistical copolymers. This was interpreted as arising from conformational restriction of presentation of the fluoromonomers to the surface in the statistical copolymers, and formation of phase‐separated domains at the surface of the block copolymers. The morphology of the block copolymers was confirmed by small angle X‐ray scattering measurements, which allowed calculation of a solubility parameter for the fluorinated segments. The results have implications for the design of more environmentally acceptable materials with ultra‐low surface energies. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 2633–2641     

Image formation by dyeing of copolymers bearing photogenerated acid and base groups with dye bath containing acid and basic dyes

Copolymers bearing photoacid generating groups and/or photobase generating groups were dyed after UV irradiation with a dye bath containing both an acid dye and a basic dye. Acetophenone O‐acryloyloxime (AAPO) was used as a monomer bearing acyloxyimino (AOI) group that generates a primary amino group upon irradiation, which is followed by hydrolysis. Phenacylsulfonylstyrene (PSSt) and 1,2,3,4‐tetrahydronaphthylideneamino p‐styrenesulfonate (NISS) were chosen as monomers having β‐keto sulfone (β‐KS) and iminosulfonate (IS) groups, respectively, which yielded acid groups when irradiated. Copolymers of AAPO and methyl methacrylate (MMA) were dyed with only the acid dye, and those of PSSt or NISS were dyed with only the basic dye after irradiation. AAPO‐PSSt‐MMA films became dyeable with the acid dye when irradiated for a short time and with the basic dye with further irradiation. However, AAPO‐NISS‐MMA copolymers showed the reverse dyeing behavior. IR spectra revealed that AOI groups were photochemically decomposed prior to the β‐KS groups for AAPO‐PSSt‐MMA, and AOI and IS groups decomposed simultaneously for AAPO‐NISS‐MMA. These results suggested the possibility of adsorption of different ionic dyes on the films by a change of irradiation time; in fact, color patterns could be obtained in a single staining process using the dye bath. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 3043–3051, 2000     

Methacrylic silicon-containing tercopolymers for chemically amplified resists

Tercopolymers of methyl methacrylate with methacrylic acid and dimethylphenyl (methyldiphenyl)silyl methacrylates are synthesized and investigated as components of chemically amplified resistive formulations with sulfonium and iodonium salts as photoacid generators for UV lithography in the 254-nm range. The surface behavior and the kinetics of dissolution of resistive films in an aqueous solution of tetraethylammonium hydroxide in relation to the concentration of onium salts and the temperatures of postapply and postexposure bakes are studied. The introduction of sulfonium salt into the resistive formulation brings about an increase in the solubility of unexposed films, thereby erasing the difference in dissolution rates of exposed and unexposed areas of a resist and preventing image formation. The iodonium salt plays the role of an inhibitor for dissolution of unexposed films of both copolymers, which makes it possible to obtain a high-contrast positive image in resists.     

Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist for multicomponent protein patterning

A novel photoresist (PR) that can be processed under mild aqueous conditions was synthesized and used to create photogenerated polyelectrolyte bilayers. Thin films of the PR cast on polycation-coated substrates were exposed to UV irradiation to generate carboxylate groups in the photoresist. The bulk of the UV-exposed PR film was dissolved by rinsing with pH 7.4 phosphate-buffered saline, but a polyelectrolyte bilayer formed in situ at the PR/polycation interface on exposure remained bound to the substrate. The UV-exposed photoresist also exhibited pH-dependent solubility; it was soluble in water above pH 6.6, but insoluble at lower pHs. Using these unique properties, two-component protein patterning was achieved using biotinylated PR films under conditions that avoid exposing the proteins to conditions outside the narrow range of physiological pH, ionic strength, and temperature where their stability is greatest.     

Brush-type amphiphilic diblock copolymers from "living"/controlled radical polymerizations and their aggregation behavior

Two brush-type amphiphilic diblock copolymers, poly(poly(ethylene glycol)methyl ether methacrylate-block-polystyrene) (P(PEGMA)-b-PS) and poly(glycidyl methacrylate)-block-poly(poly(ethylene glycol)methyl ether methacrylate) (P(GMA)-b-P(PEGMA)) were synthesized, respectively, via consecutive atom-transfer radical polymerizations (ATRPs) and reversible addition-fragmentation chain-transfer (RAFT) polymerizations. The diblock copolymers were characterized by gel permeation chromatography (GPC), (1)H nuclear magnetic resonance (NMR) spectroscopy, and FT-IR spectroscopy. The aggregation behavior of the two amphiphilic diblock copolymers in water was also studied. Scanning electron and transmission electron microscopic images revealed that spherical micelles (40-80 nm in diameter) from self-assembly of the P(PEGMA)-b-PS copolymers and wormlike micelles (60-120 nm in length and 20-30 nm in diameter) from self-assembly of the P(GMA)-b-P(PEGMA) copolymers were prevalent. The spherical P(PEGMA)-b-PS micelles could self-assemble gradually into giant aggregates of several micrometers in diameter.     

Synthesis of photocleavable poly(methyl methacrylate‐block‐d‐lactide) via atom‐transfer radical polymerization and ring‐opening polymerization

The synthesis and characterization of a photocleavable block copolymer containing an ortho‐nitrobenzyl (ONB) linker between poly(methyl methacrylate) and poly(d ‐lactide) blocks is presented here. The block copolymers were synthesized via atom transfer radical polymerization (ATRP) of MMA followed by ring‐opening polymerization (ROP) of d ‐Lactide and ROP of d ‐lactide followed by ATRP of MMA from a difunctional photoresponsive ONB initiator, respectively. The challenges and limitations during synthesis of the photocleavable block copolymers using the difunctional photoresponsive ONB initiator are discussed. The photocleavage of the copolymers occurs under mild conditions by simple irradiation with 302 nm wavelength UV light (Relative intensity at 7.6 cm: 1500 μW/cm²) for several hours. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013, 51, 4309–4316     

COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS

The copolymers of chloroethyl methacrylate (CMA), glycidyl methacry-late (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3, respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm, respectively.     

Synthesis of Poly(methyl methacrylate)-poly(poly(ethylene glycol) methacrylate)-polyisobutylene ABCBA Pentablock Copolymers by Combining Quasiliving Carbocationic and Atom Transfer Radical Polymerizations and Characterization Thereof

Novel, unique amphiphilic pentablock terpolymers consisting of the highly hydrophobic polyisobutylene (PIB) mid-segment attached to the hydrophilic combshaped poly(poly(ethylene glycol) methacrylate) (PPEGMA) polymacromonomer chains, which are coupled to poly(methyl methacrylate) (PMMA) outer segments were synthesized by the combination of quasiliving carbocationic polymerization and atom transfer radical polymerization (ATRP). First, a bifunctional PIB macroinitiator was prepared by quasiliving carbocationic polymerization and subsequent quantitative chain end derivatizations. Quasiliving ATRP of PEGMAs with different molecular weights (M_n = 188, 300 and 475 g/mol) led to triblock copolymers which were further reacted with MMA under ATRP conditions to obtain PMMA-PPEGMA-PIB-PPEGMA-PMMA ABCBA-type pentablock copolymers. It was found that slow initiation takes place between the PIB macroinitiator and PEGMA macromonomers with higher molecular weights via ATRP. ATRP of MMA with the resulting block copolymers composed of PIB and PPEGMA chain segments led to the desired block copolymers with high initiating efficiency. Investigations of the resulting pentablock copolymers by DSC, SAXS and phase mode AFM revealed that nanophase separation occurs in these new macromolecular structures with average domain distances of 11-14 nm, and local lamellar self-assembly takes place in the pentablocks with PPEGMA polymacromonomer segments of PEGMAs with M_n of 118 g/mol and 300 g/mol, while disordered nanophases are observed in the block copolymer with PEGMA having molecular weight of 475 g/mol. These new amphiphilic block copolymers composed of biocompatible chain segments can find applications in a variety of advanced fields.     

PEGMA/MMA copolymer graftings: generation, protein resistance, and a hydrophobic domain

We synthesized various graft copolymer films of poly(ethylene glycol) methacrylate (PEGMA) and methyl methacrylate (MMA) on silicon to examine the dependency of protein-surface interactions on grafting composition. We optimized atom transfer radical polymerizations to achieve film thicknesses from 25 to 100 nm depending on the monomer mole fractions, and analyzed the resulting surfaces by X-ray photoelectron spectroscopy (XPS), ellipsometry, contact angle measurements, and atomic force microscopy (AFM). As determined by XPS, the stoichiometric ratios of copolymer graftings correlated with the concentrations of provided monomer solutions. However, we found an unexpected and pronounced hydrophobic domain on copolymer films with a molar amount of 10-40% PEGMA, as indicated by advancing contact angles of up to 90 degrees . Nevertheless, a breakdown of the protein-repelling character was only observed for a fraction of 15% PEGMA and lower, far in the hydrophobic domain. Investigation of the structural basis of this exceptional wettability by high-resolution AFM demonstrated the independence of this property from morphological features.     

Anti-microbial activity of anhydride copolymers and their derivatives prepared by ionizing radiation

Methyl methacrylate/maleic anhydride (MMA/MAn) copolymers were synthesized using gamma rays. Preparation conditions such as irradiation dose, comonomer composition and type of diluent affecting the degree of comonomer conversion were investigated. The suitable diluent for obtaining reasonable MMA/MAn copolymer yield was acetone. The higher copolymer yield was achieved when the amount of methyl methacrylate in comonomer feed solutions as well as irradiation dose increased. The effect of ZnCl₂ on the MMA/MAn copolymer yield and structure was studied. Characterization of the prepared MMA/MAn copolymers was performed using FTIR, and thermogravimetric and viscometric analysis. The derivatives of MMA/MAn copolymers were obtained by treating them with different reagents such as sulpha-drugs, hydroxylamine hydrochloride and 4-amino sodium salyciliate. The antimicrobial activity of MMA/MAn copolymers and their derivatives was examined. The activity of such copolymers against Staphylococcus aureus and Escherichia coli increased by increasing MAn content in the copolymer. The MMA/MAn copolymers treated with sulpha-drugs exhibited particularly high biological activity against different microorganisms. These results revealed that the prepared MMA/MAn copolymer and its derivatives have a broad antimicrobial activity.     

Vapor-phase testing of the memory-effects in benzene- and toluene-imprinted polymers conditioned at elevated temperature

The preparation of polymers imprinted with common aromatic solvents such as benzene and toluene is an under-exploited subject of research. The present study was aimed at the understanding of whether true solvent memory effects can be achieved by molecular imprinting, as well as if they are stable at elevated temperature. A set of copolymers, comprising low and high cross-linking levels, was prepared from four different combinations of functional monomer and cross-linker, namely methacrylic acid (MAA)/ethylene glycol dimethacrylate (EGDMA), methyl methacrylate (MMA)/EGDMA, MAA/divinyl benzene (DVB) and MMA/DVB. Each possible combination was prepared separately in benzene, toluene and acetonitrile. The obtained materials were applied as coatings onto nickel–titanium (Ni–Ti) alloy wires which were incorporated into solid-phase microextraction devices and finally tested for their ability to competitively adsorb vapors from the headspace of an aqueous solution containing a few volatile organic compounds.     

Preparation and photochemical study of soluble optically active block copolymethacrylates and azo-containing random copolymethacrylates

A series of soluble optically active block copolymers of trityl methacrylate (TrMA) and cyclohexyldiphenylmethyl methacrylate (CHDPMA) with methyl methacrylate (MMA) and n-butyl methacrylate (n-BuMA) were synthesized using the complex of 9-fluorenyllithium and (S,S)-(+)-2,3-dimethoxy-1,4-bis(dimethylamino)butane as an initiator in toluene at −78°C. Soluble optically active random copolymers derived from TrMA and azo methacrylates, 6-(4-phenylazophenoxy)hexyl methacrylate (PAHM) and 2-(4-phenylazophenoxy)ethyl methacrylate (PAEM), were obtained under similar anionic polymerization conditions. Optical activities of the copolymers largely depended on the weight percentage of TrMA or CHDPMA component in the polymer chains. Solubility and film formability were significantly improved for the copolymers. Irradiation of optically active TrMA–MMA and CHDPMA–MMA block copolymer films containing photoacid, diphenyl-p-tolylsulfonium triflate, causes the partial hydrolysis of bulky esters and results in the conformational randomization of helical chains, which in turn leads to a significant change in optical rotation of the films. Photoisomerization studies of azo-containing random copolymers indicate that the trans to cis isomerization induces the helical conformation racemization in solution. © 1997 John Wiley & Sons, Inc.     

Poly(sodium styrene sulfonate)-b-poly(methyl methacrylate) diblock copolymers through direct atom transfer radical polymerization: Influence of hydrophilic–hydrophobic balance on self-organization in aqueous solution

A series of poly(sodium styrene sulfonate)-b-poly(methyl methacrylate), PSSNa-b-PMMA, amphiphilic diblock copolymers have been synthesized through atom transfer radical polymerization (ATRP) of methyl methacrylate (MMA) in N,N-dimethylformamide/water mixtures, starting from a PSSNa macroinitiator. The kinetics of the polymerization was followed by ¹H NMR, while the chemical composition of the copolymers was verified by a variety of techniques, such as ¹H NMR, FTIR and TGA. The MMA content of the copolymers ranges from 0 up to 60 mol%, while the number–average molecular weight of the PSSNa macroinitiator was 9000 g/mol. The self-association of the diblock copolymers in aqueous solution was compared to the respective behavior of similar random P(SSNa-co-MMA) copolymers through optical density measurements, pyrene fluorescence probing, dynamic light scattering and surface tension measurements. It is shown that the diblock copolymers form micellar structures in water, characterized by an increasing hydrophobic character and a decreasing size as the length of the PMMA block increases. These micelle-like structures turn from surface inactive to surface active as the length of the PMMA block increases. Moreover, contrary to the MMA-rich random copolymers, the respective diblock copolymers form water insoluble polymer/surfactant complexes with cationic surfactants such as hexadecyltrimethyl ammonium bromide (HTAB), leading to materials with antimicrobial activity.     

Direct synthesis of amphiphilic block copolymers, consisting of poly(methyl methacrylate) and poly(sodium styrene sulfonate) blocks through atom transfer radical polymerization

Amphiphilic block copolymers of methyl methacrylate (MMA) and sodium styrene sulfonate (SSNa) were successfully synthesized via direct atom transfer radical polymerization (ATRP) of SSNa. First, poly(sodium styrene sulfonate) (PSSNa) or poly(methyl methacrylate) (PMMA) macroinitiators were prepared using proper ATRP systems for each case. In some cases, functional initiators, which allow further reactions, were used. The macroinitiators were characterized and further used to synthesize PSSNa/PMMA block copolymers, by using proper solvent combinations, such as N,N-dimethylformamide/water or methanol/water at appropriate volume ratios, in order to ensure solubility of the synthesized amphiphilic copolymers. The molecular weight of the copolymers was determined by gel permeation chromatography, using water as eluent. By using a combination of analytical techniques like ¹H NMR, FTIR and thermogravimetry, the chemical structure and the actual copolymer composition were determined. Since, the block copolymers were soluble in water, forming hydrophilic/hydrophobic domains in aqueous solution, their micellization behavior was further studied by pyrene fluorescence probing.