Two-dimensional electronic transport in In0.53Ga0.47As quantum Wells

Transport properties of the electrons itinerant two dimensionality in a square quantum well of In_0.53Ga_0.47As are studied in the framework of Fermi-Dirac statistics including the relevant scattering mechanisms. An iterative solution of the Boltzmann equation shows that the ohmic mobility is controlled by LO phonon scattering at room temperature, but below 130 K alloy scattering is predominant. The calculated mobilities with a suitable value of the alloy scattering potential agree with the experimental results over a range of lattice temperature. For lattice temperatures below 25 K where the carrier energy loss is governed by the deformation potential acoustic scattering, the warm electron coefficient is found to be negative. Its magnitude decreases with increasing lattice temperature and is greater for larger channel widths. Values of the small-signal AC mobility of hot electrons at a lattice temperature of 4.2 K are obtained for different sheet carrier densities and channel widths. Cut-off frequencies around 100 GHz are indicated.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Temperature dependence of relaxation times in electron focusing and antidot structures made from In0.53Ga0.47As/InP heterojunctions

The magnetoresistance of antidot lattices and the magnetic field dependence of the three-terminal resistance of transverse electron focusing (TEF) devices is studied in a 2DEG in the lattice-matched In_0.53Ga_0.47As/InP heterojunction system, as a function of temperature. Ballistic effects are observed in both types of mesoscopic devices at temperatures exceeding 100 K, and are considerably more robust than Shubnikov–de Haas (SdH) oscillations. Two effects influence the decay in the amplitude of the magnetoresistance peaks in the antidot structures, and of the focusing peaks in the TEF devices: the thermal smearing of the Fermi surface, and the increase in the electron scattering time with increasing temperature due to the increase in electron–phonon scattering. We deduce the temperature dependencies of the scattering times for the different geometries.Copright 1998 Academic Press     

Correlation of electrical properties with magnetic properties for ferromagnetic (Ga1−xMnx)As epilayer

The correlation of electrical properties with magnetic properties for the (Ga_1−xMn_x)As epilayer was investigated. For electrical transport measurements, it was clearly observed that the electrical mobility is increased with decreasing temperatures for both the (Ga_0.974Mn_0.026)As/LT-GaAs epilayer and the LT-GaAs:Be epilayer. However, a different behavior was observed at the cryogenic temperature region. The electrical mobility of (Ga_0.974Mn_0.026)As/LT-GaAs epilayer increases with decreasing temperature, while the mobility of LT-GaAs:Be epilayer decreases with decreasing temperature. In Arrhenius plots of carrier mobility for the (Ga_0.974Mn_0.026)As/LT-GaAs epilayer, the critical point is observed at 69 K, and this value is almost the same as the T_C. This result indicates that the carrier transport in ferromagnetic (Ga_1−xMn_x)As epilayers might be related to a spin-ordering effect because the spins will be arranged with the same direction below the T_C, and this will lead to reducing the probability of spin-disorder scattering. Therefore, the observation of a gradual drop below the T_C in the temperature-dependent resistivity curve is expected to be a result of the spin-ordering effect in the ferromagnetic (Ga_0.974Mn_0.026)As/LT-GaAs epilayer.     

X射线吸收谱对Ga0.946Mn0.054As薄膜中缺陷的研究

采用低温分子束外延法(LT-MBE)制备出Ga_0.946Mn_0.054As稀磁半导体(DMS)薄膜.通过X射线吸收谱(XAS)研究影响Ga_0.946Mn_0.054As薄膜性质的主要缺陷Mn间隙原子(Mn_I)和As反位原子(As_Ga).实验结果表明,在较低生长温度(T_S=200℃)下Ga_0.946Mn_{0.054 关键词： 0.946}Mn_0.054As稀磁半导体')" href="#">Ga_0.946Mn_0.054As稀磁半导体 X射线吸收谱 As反位缺陷 Mn间隙原子     

Energy sublevels in an Al0.5Ga0.5As/GaAs/Al0.5Ga0.5As quantum wire

We report the successful fabrication of a V-grooveAl_0.5Ga_0.5As/GaAs/Al_0.5Ga_0.5As quantum wire system and the temperature-dependent photoluminescence (PL) measurement. The PL spectra are dominated by four features at 681, 642, 635 and 621 nm attributed to the luminescences from quantum wire, top, vertical and side-wall well regions by micro-PL measurements. By the calculations of the energy structure, discrete states (localized sublevels) in the quantum wire region and continuum states (extended along the side-wall and vertical quantum wells) in side-wall and vertical quantum wells have been obtained in both the conduction and valence bands. The calculated excitation energies explain very well the peak positions and their temperature dependence in the photoluminescence measurements.     

Structural and electronic properties of group III Rich In0.53Ga0.47As(001)

The structural and electronic properties of group III rich In_0.53Ga_0.47As(001) have been studied using scanning tunneling microscopy/spectroscopy (STM/STS). At room temperature (300 K), STM images show that the In_0.53Ga_0.47As(001)–(4 × 2) reconstruction is comprised of undimerized In/Ga atoms in the top layer. Quantitative comparison of the In_0.53Ga_0.47As(001)–(4 × 2) and InAs(001)–(4 × 2) shows the reconstructions are almost identical, but In_0.53Ga_0.47As(001)–(4 × 2) has at least a 4× higher surface defect density even on the best samples. At low temperature (77 K), STM images show that the most probable In_0.53Ga_0.47As(001) reconstruction is comprised of one In/Ga dimer and two undimerized In/Ga atoms in the top layer in a double (4 × 2) unit cell. Density functional theory (DFT) simulations at elevated temperature are consistent with the experimentally observed 300 K structure being a thermal superposition of three structures. DFT molecular dynamics (MD) show the row dimer formation and breaking is facilitated by the very large motions of tricoodinated row edge As atoms and z motion of In/Ga row atoms induced changes in As–In/Ga–As bond angles at elevated temperature. STS results show there is a surface dipole or the pinning states near the valence band (VB) for 300 K In_0.53Ga_0.47As(001)–(4 × 2) surface consistent with DFT calculations. DFT calculations of the band-decomposed charge density indicate that the strained unbuckled trough dimers being responsible for the surface pinning.     

Study of single event effect for the InP-based HEMT with In0.53Ga0.47As/In0.3Ga0.7As/In0.7Ga0.3As composite channel

In this study, the single event effects in In_0.53Ga_0.47As/In_0.3Ga_0.7As/In_0.7Ga_0.3As composite channel InP-based HEMT are investigated using TCAD simulation for the first time. Due to the higher conduction band difference between bottom In_0.7Ga_0.3As channel and InAlAs buffer, the electrons in the buffer layer induced by ions strike cannot enter the channel, led to reduce the peak concentration in the composite channel and significantly weakened the drain current for composite channel device. Meanwhile, higher barrier height under the gate for composite channel InP-based HEMT is formed after particle strike, and further attenuate the drain current. Therefore, the single event effects can be effectively reduced by designing channel structure. In addition, drain voltage and incident position also show significant impact drain current. With the increase in the drain voltage, the drain current increase and the most sensitive incident position is the gate electrode for the device.     

Ferromagnetic nature of (Ga, Cr)As epilayers revealed by magnetic circular dichroism

A systematic study of magnetic circular dichroism (MCD) was carried out in a wave length range 500-960 nm for (Ga_1−x, Cr_x)As epilayers with x=2.38% and 4.59% grown by the low temperature molecular beam epitaxy (LT-MBE) technique. Hysteresis characteristics showed up indeed in the magnetic field dependence of both MCD and magnetization measured by the superconductor quantum interference device (SQUID). The Curie temperature of the (Ga_1−x, Cr_x)As epilayer was determined to be about 12 K by the Arrott approach. The present result provides evidences that there is strong coupling of the Cr spins to the GaAs host band structure in (Ga_1−x, Cr_x)As samples. That affects the critical point of the semiconductor host, and makes the magnetization behavior in a plot of M∼B/T (magnetic field divided by temperature) substantially different from standard superparamagnetism.     

Light hole transport in a strained GaAs/In0.18Ga0.82As quantum well at high pressures

Abstract

Here we report what we believe to be the first observation of the pressure dependence of the light hole behavior in a modulation doped In_0.18Ga_0.82As/GaAs single strained quantum well grown by MBE. Transport measurements have been undertaken as a function of temperature (4–300K) and hydrostatic pressure (4–8kbar). Hole mobilities of ～17000 cm²/Vs have been obtained for sheet carrier densities of ～3.3×10¹¹ cm^?2. At low temperatures (<100K) persistent photogenerated holes have been observed. The hole mobility is found to decrease with increasing pressure at a rate intermediate between that typically observed for holes and electrons in bulk III-V semiconductors.     

Magnetotransport in modulation-doped In0.53Ga0.47As/In0.52Al0.48As heterojunctions: in-plane effective mass,quantum and transport mobilities of 2D electrons

Shubnikov–de Haas (SdH) and Hall effect measurements, performed in the temperature range between 3.3 and 20 K and at magnetic fields up to 2.3 T, have been used to investigate the electronic transport properties of lattice-matched In_0.53Ga_0.47As/In_0.52Al_0.48As heterojunctions. The spacer layer thickness (t_S) in modulation-doped samples was in the range between 0 and 400 Å. SdH oscillations indicate that two subbands are already occupied for all samples except for that witht_S =  400 Å. The carrier density in each subband, Fermi energy and subband separation have been determined from the periods of the SdH oscillations. The in-plane effective mass (m ^* ) and the quantum lifetime (τ_q) of 2D electrons in each subband have been obtained from the temperature and magnetic field dependences of the amplitude of SdH oscillations, respectively. The 2D carrier density (N₁) in the first subband decreases rapidly with increasing spacer thickness, while that (N₂) in the second subband, which is much smaller thanN₁ , decreases slightly with increasing spacer thickness from 0 to 200 Å. The in-plane effective mass of 2D electrons is similar to that of electrons in bulk In_0.53Ga_0.47As and show no dependence on spacer thickness. The quantum mobility of 2D electrons is essentially independent of the thickness of the spacer layer in the range between 0 and 200 Å. It is, however, markedly higher for the samples with a 400 Å thick spacer layer. The quantum mobility of 2D electrons is substantially smaller than the transport mobility which is obtained from the Hall effect measurements at low magnetic fields. The transport mobility of 2D electrons in the first subband is substantially higher than that of electrons in the second subband for all samples with double subband occupancy. The results obtained for transport-to-quantum lifetime ratios suggest that the scattering of electrons in the first subband is, on average, forward displaced in momentum space, while the electrons in the second subband undergo mainly large-angle scattering.     

Negative and persistent photoconductivity in p-type Al0.5Ga0.5As/GaAs/Al0.5Ga0.5As heterostructures under uniaxial stress

Abstract

Illumination of a double p-Al_0.5Ga_0.5As/GaAs/Al_0.5Ga_0.5As heterostructure by a red light emitting diode results in a negative photoconductivity that, after the diode is switched off, slowly relaxes to a positive persistent photoconductivity, characterised by an approximately 1.5-fold increase of the two-dimensional hole concentration. This metastable state may be explained with a model in which deep electron traps are supposed to be located above the Fermi level on the inverted heterointerface. Under uni-axial compression the hole concentration in the persistent photoconductivity state, as well as in the dark state, demonstrates the same linear decrease.     

Large negative magnetoresistance introduced by line dislocations in a modulation doped Ga0.25In0.75As/InP quantum well

A large negative magnetoresistance at low magnetic fields of a high mobility two dimensional electron gas in a modulation-doped Ga_0.25In_0.75As/InP quantum well containing dislocations is reported. The effect is attributed to electrons on open orbits caused by scattering against the potential created by line dislocations formed in the Ga_0.25In_0.75As layer when the critical thickness for growth on InP was exceeded. By comparing the magnetoresistance for the structures containing dislocations with those without, but with etched trenches with a similar distribution as the line dislocations, we conclude that the dislocations introduce a strong potential in the two dimensional electron gas.     

Spectrum analysis of interband optical transmissions and quantitative model of eigen-energies and absorptions in In0.53Ga0.47As/In0.52Al0.48As multi-quantum well structures

Interband transmission spectra were measured for three In_0.53Ga_0.47As/In_0.52Al_10.48As multi-quantum well specimens having different carrier concentrations by modulation-doping. Spectral shapes of transmissions were clear steplike structures but exciton peaks of first order transitions were masked with the carrier concentrations. The spectral shapes changed hardly between 100 and 310 K. Using our parameters of quantum wells, calculated eigen-energies for three specimens agreed with experiments and absorption coefficients reproduced experimental transmission spectra at any temperature.     

Dependence of propagation loss on etching depth in Al0.3Ga0.7As/GaAs/Al0.3Ga0.7As strip-loaded type waveguides

Al_0.3Ga_0.7As/GaAs/Al_0.3Ga_0.7As strip-loaded waveguides were fabricated using a broad-beam electron cyclotron resonance (ECR) ion source. It was found that a very smooth etching profile can be obtained by ECR ion etching and the etching rate of Al_0.3Ga_0.7As is 70 nm min^-1. The propagation losses of strip-loaded type III–V compound semiconductor waveguides with various etching depths were studied by the Fabry-Perot cavity method. It was observed that the reflectance at the cleavage increases slightly with etching depth for TE polarization. The propagation loss is measured as 1.5 dB cm^-1 for etching depth of 0.7 m, less than 1 dB cm^-1 for 0.8 m, and 3.5 dB cm^-1 for 1.1 m.     

Carrier diffusion in InGaAs/GaAs quantum wells grown on vicinal GaAs(0 0 1) substrates

We have investigated the influence of vicinal GaAs substrates on the optical and electronic properties of InGaAs/GaAs quantum wells (QWs). A single In_0.10Ga_0.90As QW was grown by molecular-beam epitaxy on a vicinal GaAs(0 0 1) substrate with a miscut angle of 0° (nominal), 2°, 4° and 6° towards [1 1 0]. The carrier diffusion was obtained by a micro-photoluminescence scan technique that permits to observe the effective diffusion length characterized by the lateral spread of carriers in the QW followed by radiative recombination. The carrier diffusion length was obtained parallel (L_||) and perpendicular (L) to the atomic steps. The diffusion length decreases as the temperature increases up to 100 K. Above this temperature we found different behaviours that depend on the sample miscut angle.     

In0.2Ga0.8As/GaAs interface revealed by an AlAs marker layer

A detailed analysis of the microstructure of layered semiconductor heterostructures is only possible if the interface between the various layers can be accurately located. Microstructural features whose characterisation is dependent on the location of the interface include the planarity and width of the layers, the composition profile and the geometry of misfit dislocations (in the particular case of lattice mismatched heterostructures). We report on an investigation to image, at high resolution in the transmission electron microscope, the interface in an In_0.2Ga_0.8As/GaAs structure grown by molecular beam epitaxy. The difficulty in locating the interface, due to similarity in electron optical behaviour of GaAs and In_0.2Ga_0.8As when imaged in a 110 direction, was overcome by incorporating into the structure a marker layer of AlAs two unit cells thick (11.4 Å in total) between the GaAs and the In_0.2Ga_0.8As layers. Lattice fringe images of an In_0.2Ga_0.8As/AlAs/GaAs structure are presented which show, at near atomic resolution, the location of the misfit dislocations relative to the In_0.2Ga_0.8As/GaAs interface.     

Recombination in tensile-strained In0.3Ga0.7As quantum well on InP

Photoluminescence (PL) measurements under different excitation powers were carried out at low temperature on tensile-strained In_0.3Ga_0.7As single wells of 6 nm with InGaAs barriers lattice matched to InP substrate. PL measurements taken at 2 K show a main emission band at 0.762 eV probably originating from a type-II transition. The insertion of an ultrathin InAs layer at In_0.3Ga_0.7As on In_0.53Ga_0.47As interface reveals an additional feature at 0.711 eV as well as an excited-state luminescence emission at high pump powers. The InAs insertion improves heterointerface quality, which was confirmed by an increase in PL intensity.     

Electron mobilities in isomorphic In0.53Ga0.47As quantum wells on InP substrates

The influence of the doping level, illumination, and width of isomorphic In_0.52Al_0.48As/In_0.53Ga_0.47As/In_0.52Al_0.48As quantum wells grown on InP substrates on the electron mobility is studied. The persistent photoconductivity at low temperatures is found. Band diagrams are calculated and optimal parameters are found for obtaining the maximum electron mobility. The quantum and transport electron mobilities in dimensional quantization subbands are obtained from the Shubnikov-de Haas effect. The electron mobilities are calculated in dimensional quantization subbands upon scattering by ionized impurities taking intersubband transitions into account. Scattering by ionized impurities in samples studied is shown to be dominant at low temperatures.     

Annealing effect on magnetic anisotropy in ultrathin（Ga,Mn）As

We investigated the effect of low temperature annealing on magnetic anisotropy in 7-nm ultrathin Ga0.94Mn0.06As devices by measuring the angle-dependent planar Hall resistance(PHR).Obvious hysteresis loops were observed during the magnetization reversal through the clockwise and counterclockwise rotations under low magnetic fields(below 1000 Gs,1 Gs = 10-4 T),which can be explained by competition between Zeeman energy and magnetic anisotropic energy.It is found that the uniaxial anisotropy is dominant in the whole measured ferromagnetic range for both the as-grown ultrathin Ga0.94Mn0.06As and the annealed one.The cubic anisotropy changes more than the uniaxial anisotropy in the measured temperature ranges after annealing.This gives a useful way to tune the magnetic anisotropy of ultrathin(Ga,Mn)As devices.