InAs/GaAs(0 0 1) wetting layer formation observed in situ by concurrent MBE and STM

The growth of InAs on GaAs(0 0 1) has attracted great interest and investigation over the past few decades primarily due to the opto-electronic properties of the self-assembled quantum dot (QD) arrays formed. Scanning tunnelling microscopy (STM) has been extensively employed to investigate the complicated and spontaneous mechanism of QD growth via molecular beam epitaxy (MBE). In order to access surface dynamics, MBE and STM must be performed concurrently. The system herein combines MBE functionality into an STM instrument in order to investigate wetting layer formation dynamically. The GaAs(0 0 1)-(2 × 4) starting surface undergoes 2D island growth, reconstruction change-induced roughness and re-entrant 3D island formation prior to the Stranski-Krastanow transition point.     

Photoluminescence and secondary ion mass spectroscopy characterization of GaAs-AlGaAs quantum wells grown on GaAs (1 0 0) substrates with different surface treatments

GaAs (1 0 0) substrates prepared in a quartz chamber under a H₂/As₄ flux, and then exposed to air were used for the subsequent growth of GaAs-AlGaAs single quantum wells by molecular beam epitaxy. The substrates prepared by this method showed atomically flat surfaces corroborated by atomic force microscopy analysis. Quantum wells grown directly on these substrates without a GaAs buffer layer exhibited narrow and intense photoluminescence peaks, an indication of a high quality material. The secondary ion mass spectroscopy analysis showed oxygen and carbon traces on the first AlGaAs barrier layer grown after air exposure with no effects on the quantum wells optical emissions. From the results we conclude that the prepared GaAs surfaces are useful for the epitaxial growth of high quality quantum structures.     

Growth by molecular beam epitaxy and electrical characterization of GaAs nanowires

We report on structural and electrical properties of GaAs nanowires (NWs) grown by molecular beam epitaxy (MBE) on GaAs and SiO₂ substrates using Au as growth catalyst. Au–Ga particles are observed on the top of the NWs by transmission electron microscopy (TEM). In most of the observed cases, individual particles contain two Au–Ga compositions, in particular orthorhombic AuGa and β′ hexagonal Au₇Ga₂. The wires grown on GaAs are regularly shaped and tidily oriented on both (1 0 0) and (1 1 1)B substrates. TEM also reveals that the NWs have a wurtzite lattice structure. Electrical transport measurements indicate that nominally undoped NWs are weakly n-type while both Be- and Si-doped wires show p-type behaviour. The effect of the lattice structure on impurity incorporation is briefly discussed.     

Raman study of the segregation of GaAs/AlAs heterostructures grown by molecular beam epitaxy

The Raman spectra of the optical confined phonons in the GaAs/AlAs ultra-thin layer superlattices grown with different growth conditions were used to determine the compositional profiles and to study the process of segregation at the heterointerfaces. A modified kinetic model was developed in order to calculate the compositional profiles in the samples under investigation. The comparison between the experimentally obtained compositional profiles and those calculated by the kinetic model allowed us to determine the parameters characterizing the segregation. It was shown that the increase of pressure of As acts equivalently to the decrease of the growth temperature, resulting in a more abrupt compositional profile.     

Annealing effect on InAs islands on GaAs(0 0 1) substrates studied by scanning tunneling microscopy

Post-annealing effects on InAs islands grown on GaAs(0 0 1) surfaces have been investigated by scanning tunneling microscopy (STM) connected to molecular beam epitaxy (MBE). It is found that for islands grown by 1.6 ML InAs deposition at 450 °C, post-annealing at 450 °C in an As₄ atmosphere causes dissolving of the InAs islands. In contrast, for larger islands obtained by 2.0 ML InAs deposition at 450 °C, the post-annealing leads to coarsening of the islands. The result can be explained in terms of a critical nucleus in heterogeneous nucleation.     

An in-situ study of structure and magnetic properties of Fe films on the sulphur passivated Ge(100) surface at 150°C

Ultra-thin Fe films have been grown on the sulphur passivated Ge(100) surface at 150°C. The growth, structure and the magnetic properties of the thin films were studied with LEED, AES, angle resolved AES and in-situ magneto-optical Kerr effect measurements. For the first five monolayers of Fe, no long-range order was observed . However, angle resolved AES data suggest that local order occurs with a small fraction of the Fe atoms adsorbed on bcc sites. For thicker Fe films, the growth becomes ordered. A comparison of the present study and with a previous study of the growth of Fe on sputter cleaned Ge(100)(2×1) surface, shows that sulphur passivation effectively prevents Fe–Ge intermixing. During the Fe deposition process, most of the sulphur atoms migrate to the growing surface, thus acting as surfactants. The presence of sulphur at the surface also affects the growth and magnetic properties of the thin films.     

On the growth conditions of 3–5 μm well-doped AlGaAs/AlAs/GaAs infrared detectors and its relation to the photovoltaic effect studied by transmission electron microscopy

In this work, we investigate the influence of the molecular beam epitaxy (MBE) growth conditions (substrate temperature and arsenic flux) on the photovoltaic (PV) behavior and asymmetric characteristics of nominally identical well-doped AlGaAs/AlAs/GaAs double-barrier quantum well infrared photodetectors. This PV effect, already studied and reported in the literature, has been attributed to unintentional asymmetries of the potential profile introduced during the MBE growth process; in particular, due to an inequivalence of the AlAs layer properties or, more plausibly, to local space-charge regions originating from silicon segregation. The different “unintended” asymmetries for the samples considered in this work, validated by both dark-current and responsivity measurements, point at first glance to the existence of structural dissimilarities affecting the PV response. Hence, in order to clarify the influence of the suggested AlAs barriers inequivalence or interface roughness and quality in the origin of the PV signal we have performed a direct layer structural characterization by cross-section high resolution transmission electron microscopy. The analysis yields that regardless of the different growth conditions, the layers properties are similar, suggesting they play a minor role in the origin of the PV effect. Also this characterization tool may provide a further evidence of Si segregation being the main responsible. Concerning its growth conditions dependence, it seems that the As flux, and not only the substrate temperature, may affect Si segregation and hence the PV response.     

Photoluminescence and capacitance–voltage characterization of GaAs surface passivated by an ultrathin GaN interface control layer

A novel surface passivation technique for GaAs using an ultrathin GaN interface control layer (GaN ICL) formed by surface nitridation was characterized by ultrahigh vacuum (UHV) photoluminescence (PL) and capacitance–voltage (C–V) measurements. The PL quantum efficiency was dramatically enhanced after being passivated by the GaN ICL structure, reaching as high as 30 times of the initial clean GaAs surface. Further analysis of PL data was done by the PL surface state spectroscopy (PLS³) simulation technique. PL and C–V results are in good agreement indicating that ultrathin GaN ICL reduces the gap states and unpins the Fermi level, realizing a wide movement of Fermi level within the midgap region and reduction of the effective surface recombination velocity by a factor of 1/60. GaN layer also introduced a large negative surface fixed charge of about 10¹² cm⁻². A further improvement took place by depositing a Si₃N₄ layer on GaN ICL/GaAs structure.     

{1 1 1} Quantum wells of dilute nitrides grown on GaAs by molecular beam epitaxy

Dilute nitrides are promising alloys in view of extending potential micro- and opto-electronics applications of GaAs technology. Orientation effects on nitrogen incorporation in GaAs have been scarcely addressed. Here, GaAsN on (1 0 0) and on As(B)- and Ga(A)-rich (1 1 1) substrates was grown by molecular beam epitaxy at different substrate temperatures. Nitrogen content measured by secondary ion mass spectrometry as a function of the growth temperature highlights the influence of orientation on nitrogen incorporation. Furthermore, thermal annealing is shown to improve the optical quality of GaAsN quantum wells whatever their substrate orientations.     

Initial stages of MnAs/GaAs(0 0 1) epitaxy studied by RHEED azimuthal scans

We study the nucleation phase of molecular beam epitaxy of (hexagonal) MnAs on (cubic) GaAs (0 0 1) using reflection high-energy electron diffraction (RHEED) azimuthal scans. The nucleation proceeds from a non-reconstructed initial stage through randomly oriented small nuclei and two orientation stages to the final single-phase epitaxial orientation. The fascinatingly complex nucleation process contains elements of both Volmer-Weber and Stranski-Krastanov growth. The measurement demonstrates the potential of high-resolution RHEED techniques to assess details of the surface structure during epitaxy.     

Growth and annealing of zinc-blende CdSe thin films on GaAs (0 0 1) by molecular beam epitaxy

CdSe thin films have been grown on GaAs (0 0 1) substrates by molecular beam epitaxy (MBE). The effects of substrate temperature and annealing treatment on the structural properties of CdSe layers were investigated. The growth rate slightly decreases due to the accelerated desorption of Cd from CdSe surface with an increase in the temperature. The sample grown at 260 °C shows a polycrystalline structure with rough surface. As the temperature increases over 300 °C, crystalline CdSe (0 0 1) epilayers with zinc-blende structure are achieved and the structural quality is improved remarkably. The epilayer grown at 340 °C displays the narrowest full-width at half-maximum (FWHM) from (0 0 4) reflection in double-crystal X-ray rocking curve (DCXRC) and the smallest root-mean-square (RMS) roughness of 0.816 nm. Additionally, samples fabricated at 320 °C were annealed in air for 30 min to study the films’ thermal stability. X-ray diffraction (XRD) results indicate that the zinc-blende structure remains unchanged when the annealing temperature is elevated to 460 °C, meaning a good thermal stability of the cubic CdSe epilayers.     

Structural and optical properties of nearly stress-free m-plane ZnO film on (1 0 0) γ-LiAlO2 with a GaN buffer layer by metal-organic chemical vapor deposition

m-plane ZnO film was epitaxially deposited on (1 0 0) γ-LiAlO₂ by metal-organic chemical vapor deposition at 600 °C with a GaN buffer layer. The epitaxial relationships between ZnO and GaN, GaN and (1 0 0) γ-LiAlO₂ were determined by X-ray diffraction Φ-scans. There exhibits very small decrease for the E₂ mode shift (0.3 cm⁻¹) of ZnO in the Raman spectrum, which indicates the epitaxial ZnO film was under a slight tensile stress (5.77 × 10⁷ Pa). Unlike the highly strained a-plane ZnO, temperature dependent photoluminescence spectra show that the free A exiton emission was observed with the temperature ≤138 K.