Beryllium-Based Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Ranges

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques - The latest experimental results of studying beryllium-containing multilayer mirrors are reviewed. The mirrors are of...     

极紫外光刻离轴照明技术研究

离轴照明技术(OAI)是极紫外光刻技术中提高光刻分辨率的关键技术之一。为了实现考虑掩模阴影效应情况下离轴照明的优化选择,构造了一种新型实现OAI曝光的成像模型。将照射到掩模上的非相干光等效为一系列具有连续入射方向的等强度平行光,基于阿贝成像原理分别对掩模进行成像,最终在像面进行强度叠加实现OAI方式下空间成像的计算;并通过向投影系统函数添加离焦像差项实现不同离焦面上空间成像计算。该模型极大地简化了OAI条件下对掩模阴影效应的计算,提高了成像质量计算效率。结合光刻胶特性及投影曝光系统焦深设计要求,以显影后光刻胶轮廓的侧壁倾角为判据,获得了采用数值孔径为0.32的投影系统实现16 nm线宽黑白线条曝光的最优OAI参数。     

Pinch Plasma Radiation Sources for the Extreme Ultraviolet

Extreme ultraviolet lithography (EUVL) is under discussion to be implemented in the production of chips as early as 2005 to 2007 for reducing structures in semiconductor devices to below 70 nm. The challenging task of developing optical components and radiation sources within this short period of time is pushing technology. As discharge produced and laser produced plasmas are the main candidates for EUV‐sources, plasma technology is forced to leap forward significantly. Progress in EUV‐sources is expected to open EUV‐technology for other applications in science and technology with increased need for spatial resolution, elemental contrast or sensitivity. Various technical concepts for realising high power sources for EUV lithography are under investigation world‐wide. Laser produced and discharge produced plasmas are the most promising schemes. Discharge produced pinch plasmas in general are of special interest, because their prospected costs (esp. cost of ownership) for the demanded throughput is expected to be much lower than with laser produced plasmas. However, the discharge plasmas are of high risk, because many crucial tasks have to be solved before reaching the required power levels. Beside the optimisation of the EUV‐generation ‐ which is the key to build the most reliable device with demanded EUV power ‐ the success will depend on the individual technical aspects of each source concept. Currently investigated pinch plasma concepts are evaluated based on their potential to be upgraded to fulfil the challenging demands of EUV‐lithography.     

Plasma-Resonance Effects in Nonlinear Reflection of an Electromagnetic Wave from a Semiconductor Superlattice

We show that dynamical localization of electrons in a thin semiconductor superlattice irradiated by a TM electromagnetic wave can lead to the formation of multistable states of the high-frequency field, which is accompanied by significant distortions of the reflection characteristics of superlattices. This effect is caused by the phenomenon of nonlinear plasma resonance and the related significant increase in the component of an alternating electric field, parallel to the superlattice axis, in the case where the real part of the corresponding component of the tensor of nonlinear dielectric permittivity becomes zero. It is found that the generation efficiency of odd harmonics of the radiation increases considerably under resonance conditions.     

极紫外投影光刻掩模的多层膜与照明误差

讨论了极紫外投影光刻掩模的反射光谱随多层膜参量的变化,通过曲线拟合得到了峰值反射率、带宽和中心波长与多层膜粗糙度、材料比值以及周期厚度的9个函数关系.模拟了6镜极紫外投影光刻系统的反射光谱,并计算了晶圆片处的相对照明强度.分析了由掩模在晶圆片处引入的照明误差,给出了照明误差的合成公式.     

月基极紫外相机反射镜组件的设计

为了使月基极紫外相机反射镜组件在月球环境下具有良好的力学和热学稳定性,从而保证相机的成像质量,本文针对月基极紫外相机所处的严酷的力学和温度条件,设计了一种满足月球环境的反射镜组件结构.通过对反射镜组件有限元模型的重力分析、热载荷分析、动态刚度分析以及结构强度分析,结果表明反射镜组件的一阶谐振频率达到354 Hz,在1 g重力作用和△T=50℃均匀温变作用下镜面综合面形误差RMS值分别达到3.62 nm和2.46 nm,满足反射镜面形要求.最后,通过静力学面形检测、力学试验、温度适应性试验及成像分辨率测试,结果显示反射镜镜面面形精度RMS值优于14 nm,反射镜组件的设计满足总体指标,验证了该方案的合理性.     

月基极紫外相机反射镜组件的设计

为了使月基极紫外相机反射镜组件在月球环境下具有良好的力学和热学稳定性,从而保证相机的成像质量,本文针对月基极紫外相机所处的严酷的力学和温度条件,设计了一种满足月球环境的反射镜组件结构.通过对反射镜组件有限元模型的重力分析、热载荷分析、动态刚度分析以及结构强度分析,结果表明反射镜组件的一阶谐振频率达到354 Hz,在1 g重力作用和ΔT=50℃均匀温变作用下镜面综合面形误差RMS值分别达到3.62 nm和2.46 nm,满足反射镜面形要求.最后,通过静力学面形检测、力学试验、温度适应性试验及成像分辨率测试,结果显示反射镜镜面面形精度RMS值优于14 nm,反射镜组件的设计满足总体指标,验证了该方案的合理性.     

形(应)变超晶格的退道效应与系统的全局分叉

把超晶格"折沟道"对粒子的作用等效为形状相似的弱周期调制.利用正弦平方势把粒子运动方程化为具有外周期弱调制的非线性微分方程,导出了退道系数与晶格畸变的关系.利用多尺度法研究了系统的主共振和子共振,并利用Melnikov方法分析了系统的全局分叉和出现Smale马蹄的临界条件. The effect of deflected channel on particle motion is equivalent to modulation with a weak potential having a periodic same as the deflected channel has. The motion equation of a particle has been reduced to the nonlinear differential equation with a weak periodic modulation by using sine squared potential. The dechanneling fraction has been derived for a strained superlattice. The main resonance and sub resonance have been inverstigated by using multi scale method, a global bifurcation and the critic...     

Long-Range Effects on the Pyroelectric Coefficient of Ferroelectric Superlattice

Long-range effects on the pyroelectric coefficient of a ferroelectric superlattice consisting of two differentferroelectric materials are investigated based on the transverse Ising model. The effects of the interfacial coupling andthe thickness of one period on the pyroelectric coefficient of the ferroelectric superlattice are studied by taking intoaccount the long-range interaction. It is found that with the increase of the strength of the long-range interaction, thepyroelectric coefficient decreases when the temperature is lower than the phase transition temperature; the number ofthe pyroelectric peaks decreases gradually and the phase transition temperature increases. It is also found that with thedecrease of the interfacial coupling and the thickness of one period, the phase transition temperature and the number ofthe pyroelectric peaks decrease.     

Long—Range Effects on the Pyroelectric Coefficient of Ferroelectric Superlattice

Long-range effects on the pyroelectric coefficient of a ferroelectric superlattice consisting of two different ferroelectric materials are investigated based on the transverse Ising model.The effects of the interfacial coupling and the thickness of one period on the pyroelectric coefficient of the ferroelectric superlattics are studied by taking into account the long-range interaction.It is found that with the increase of the strength of the long-range interaction,the pyroelectric coefficient decreases when the temperature is lower than the phase transition temperature;the mumber of the pyroelectric peaks decreases gradually and the phase transition temperature increases,It is also found that with the decrease of the interfacial coupling and the thickness of one period.the phase transition temperature and the number of the pyroelectric peaks decrease.     

Optimization of AlGaN-Based Deep Ultraviolet Laser Diodes with Graded Rectangular Superlattice Electron Blocking Layer and Graded Trapezoidal Superlattice Hole Blocking Layer

Journal of Russian Laser Research - To improve the carrier confinement capability and optimize the performance of deep ultraviolet laser diodes (DUV-LDs), we propose the graded rectangular...     

等离子体密度对放电等离子体极紫外光源影响研究

等离子体状态是决定极紫外光源功率和转换效率的最重要因素之一,理论和实验研究上Xe气流量对放电等离子体极紫外光源辐射谱和等离子体状态的影响,对于优化光源工作条件具有重要的意义。理论上,采用碰撞-辐射模型,模拟了非局部热力学平衡条件下,不同电离度的离子丰度分布随电子温度和离子密度的变化。推导了Xe8+~Xe11+离子4d-5p跃迁谱线强度随电子温度的变化趋势。实验上,采用毛细管放电机制,利用罗兰圆谱仪测量和分析了不同等离子体密度条件下,放电等离子体极紫外光谱的变化,分析了Xe气流量对等离子体状态的影响。理论和实验结果表明： 相同的电流条件下,等离子体箍缩时的平均电子温度随着Xe气流量的增加而降低。对于4d-5p跃迁,低电离度离子与高电离度离子谱线强度的比值随着温度的增加而减少。电流28 kA、Xe气流量0.4 sccm(cm3·min-1)时,等离子体Z 箍缩平均电子温度位于29 eV附近。Xe气流量增加时,受离子密度和最佳电子温度的影响,实现Xe10+离子4d-5p跃迁13.5 nm(2%带宽)辐射谱线强度最优化的Xe气流量位于0.3~0.4 sccm之间。     

WSZ极紫外探测器及其信号采集电路的研究

采用电荷分割方法设计了WSZ(Wedge-Strip and Zig)极紫外光探测器,其基于MCP的结构和单光子成像的特点使其在极弱光的探测方面具有独特的优势.设计了用于该探测器的快速三通道电荷放大电路和信号采集电路,以探测脉宽100～200 ms、总电荷量1～20 pC的电子脉冲.在真空条件下使用紫外光源对电路进行模拟试验,获得了峰值大小与阳极面板面积成比例的、噪音范围在10 mV以内的三路脉冲信号.模拟实验结果证明,该探测器预计分辨率有望达到100 μm×100 μm.     

嫦娥三号极紫外相机几何定位方法及其应用

针对嫦娥三号极紫外相机影像由于缺少控制点约束而无法沿用地球遥感影像几何定位方法的现状,研究了极紫外相机的工作原理、涉及的坐标系统及其转换关系,提出了一种基于星上遥测参数和严格坐标转换关系的几何定位方法,进行了影像数据几何定位及定位精度分析.研究结果表明,该方法能够解算影像拍摄时刻极紫外相机光轴在太阳磁层坐标系中的指向,以及着陆器在该坐标系中的位置,精确定位影像中地球质心的位置,校正相机光轴指向在原始影像中对应的位置,确保极紫外相机探测数据的科学应用价值,实现嫦娥三号空间环境探测的科学目标.     

不同集成度SRAM硬X射线剂量增强效应研究

给出了不同集成度16K—4Mb随机静态存储器SRAM在钴源和北京同步辐射装置BSRF3W1白光束线辐照的实验结果;通过实验在线测得SRAM位错误数随总剂量的变化,给出相同辐照剂量时20—100keVX光辐照和Co⁶⁰γ射线辐照的剂量损伤效应的比例因子;给出集成度不同的SRAM器件抗γ射线总剂量损伤能力与集成度的关系;给出不同集成度SRAM器件的X射线损伤阈值.这些结果对器件抗X射线辐射加固技术研究有重要价值.     

提高极紫外光谱纯度的多层膜设计及制备

极紫外光刻是实现22nm技术节点的候选技术。极紫外光刻使用的是波长为13.5nm的极紫外光,但在160～240nm波段,极紫外光刻中的激光等离子体光源光谱强度、光刻胶敏感度以及多层膜的反射率均比较高,光刻胶在此波段的曝光会降低光刻系统的光刻质量。从理论和实验两方面验证了在传统Mo/Si多层膜上镀制SiC单层膜可对极紫外光刻中的带外波段进行有效抑制。通过使用X射线衍射仪、椭偏仪以及真空紫外(VUV)分光光度计来确定薄膜厚度、薄膜的光学常数以及多层膜的反射率,设计并制备了[Mo/Si]40SiC多层膜。结果表明,在极紫外波段的反射率减少5%的前提下,带外波段的反射率减少到原来的1/5。     

软X射线-真空紫外波段光谱光源研究

介绍长春光学精密机械与物理研究所进行的软X射线-真空紫外波段光谱光源研究工作。研制成功的壁稳氩弧光源光谱辐射稳定性和重复性达±0.3%,可作标准辐射源,用于真空紫外波段仪器光谱强度绝对辐射定标。研制成功的潘宁(Penning)光源、双等离子体光源和空心阴极光源,可以覆盖从十几个nm至几十nm波段范围,光谱辐射稳定性和重复性达±1.0%,提供不同工作气体在该波段的原子和离子线谱,用于光谱仪器的波长定标。所研制的激光等离子体光源,尤其是近期研制成功的无污染微液滴喷射靶激光等离子体光源,可以提供较高亮度的软X射线辐射,13.0 nm处激光-软X射线转换效率达0.75%／2π·sr／2%带宽,适合于光刻和该波段辐射计量研究。     

Bi靶激光等离子体极紫外光源以及碎屑辐射特性研究

激光等离子体极紫外光源具有体积小、稳定性高和输出波长可调节等优势,在极紫外光刻领域发挥着重要的作用。Bi靶激光等离子体极紫外光源在波长9～17 nm范围内具有较宽的光谱,可应用于制造极紫外光刻机过程中所需的极紫外计量学领域。利用平像场光谱仪和法拉第杯对Bi靶激光等离子体极紫外光源以及离子碎屑辐射特性进行了实验研究。在单脉冲激光打靶条件下,实验中观察到Bi靶激光等离子极紫外光谱在波长12.3 nm处出现了一个明显的凹陷,其对应着Si L-edge的吸收,是Bi元素光谱的固有属性。相应地在波长为11.8和12.5 nm位置处产生了两个宽带的辐射峰。研究了两波长光谱特性以及辐射强度随激光功率密度的变化。结果表明,在改变聚焦光斑大小实现不同激光功率密度（0.7×1010～3.1×1010 W·cm-2）过程中,当功率密度为2.0×1010 W·cm-2时两波长处的光辐射最强,其原因归结为Bi靶极紫外光辐射强度受激光能量用于支撑等离子膨胀的损失和极紫外光被等离子体再吸收之间的平衡制约所致。在改变激光能量实现不同激光功率密度过程中,由于烧蚀材料和产生两波长所需高阶离子随着功率密度的增加而增加,增强了两波长处的光辐射。进一步,研究了双脉冲激光对Bi靶极紫外光谱辐射特性影响,实验发现双脉冲打靶下原来在单脉冲打靶时出现在波长13～14 nm范围内的凹陷消失。最后,对单脉冲激光作用Bi靶产生极紫外光源碎屑角分布进行了测量。结果表明,当探测方向从靶面法线方向移动到沿着靶面方向上的过程中,探测到Bi离子动能依次减小,并且离子动能随激光脉冲能量降低而呈线性减小。此项研究有望为我国在研制极紫外光刻机过程所需的计量学领域提供技术支持和打下夯实的基础。     

Effect of Near Ultraviolet Irradiation on Changes in Island Metallic Films during Thermal Annealing

Optics and Spectroscopy - The effect of low-intensity near ultraviolet irradiation and subsequent thermal annealing on the surface morphology of gold and silver granular films was investigated. It...     

EAST快速极紫外光谱仪绝对强度的原位标定

磁约束等离子体中杂质(特别是高Z杂质)的存在将大大增强等离子体辐射功率损失,破坏等离子体的约束性能。杂质行为的定量研究首先要求对杂质测量的光谱诊断系统进行绝对强度标定,获得灵敏度响应曲线。介绍了EAST托卡马克上的快速极紫外光谱仪系统绝对强度的原位标定方法。在波长范围20～150Å内,通过对比极紫外(EUV)波段连续轫致辐射强度的计算值和测量值得到光谱仪的绝对强度标定。在此过程中,首先由(523±1) nm范围内可见连续轫致辐射强度的绝对测量值计算出有效电荷数Z_eff,进而结合电子温度和密度分布计算EUV波段连续轫致辐射强度;EUV波段连续轫致辐射强度的测量值即为不同波长处探测器的连续本底计数扣除背景噪声计数值。对于较长波段范围130～280Å,通过对比等离子体中类锂杂质离子(Fe23+,Cr21+,Ar15+)和类钠杂质离子(Mo31+,Fe15+)发出的共振谱线对(跃迁分别为1s22s 2S_1/2-1s22p 2P_{1/2, 3/2}及2p63s 2S_1/2-2p63p 2P_{1/2, 3/2})强度比的理论和实验值进行相对强度标定。其中共振谱线对强度比的理论值由辐射碰撞模型计算得到,模型中处在各个能级的离子数主要由电子碰撞激发,去激发以及辐射衰变三个过程决定。两种方法相结合,实现了光谱仪20～280Å范围的绝对强度标定。考虑轫致辐射、电子温度及电子密度的测量误差,绝对标定误差约为30%。在绝对标定的基础上,我们对杂质特征谱线强度进行绝对测量,并将测量结果与杂质输运程序结合ADAS(Atomic Data and Analysis Structure)原子数据库计算得到的模拟值进行比较,进而估算等离子体中的杂质浓度。