3d过渡金属原子单层在Pd(001)表面磁性的第一性原理研究

用第一性原理基础上的超软赝势方法的总能计算，研究了3d过渡金属(Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn)在Pd(001)表面的单层p(1×1)和c(2×2)结构的表面磁性和总能. 所得结果表明：对于Sc, Ti, V和Cr只存在p(1×1)的铁磁性结构，而Mn只有c(2×2)的反铁磁结构存在. Fe, Co和Ni这三种元素上述两种结构都存在，但是总能上p(1×1)的铁磁结构要低些，因此是比较稳定的结构. 而Cu和Zn在该表面上的单层中不存在上述两种结构. 对于V的p(1×1)铁磁结构，计算得到的每个V原子磁矩为2.41μ_B，大于用全电子方法得到的0.51μ_B. 两种计算方法得到其他金属原子 (Cr，Mn，Fe，Co，Ni)的表面磁矩比较相近，都比孤立原子磁矩略小. 关键词： Pd(001)表面 过渡金属原子单层 表面磁性     

表面悬挂键导致硅纳米线掺杂失效机理的第一性原理研究

利用第一性原理方法, 本文计算了B/N单掺杂SiNWs, 以及含有表面悬挂键的B/N单掺杂硅纳米线的总能和电子结构, 计算结果表明, 悬挂键的出现会导致单原子掺杂失效. 能带结构分析表明, B/N掺杂的H钝化的SiNWs表现出正常的p/n特性, 而表面悬挂键(dangling binding, DB)的存在会导致p型(B原子)或者n型(N原子)掺杂失效; 其失效的原因主要是因为表面悬挂键所引入的缺陷能级俘获了n型杂质(p型杂质)所带来的电子(空穴); 利用小分子(SO₂)吸附饱和悬挂键可以起到激活杂质的作用, 进而实现Si纳米线的有效掺杂.     

清洁Si(111)表面电子结构的理论研究

本文报道在原子集团模型下用CNDO-SCF方法对清洁Si(111)表面电子结构的系统研究结果:(1)计算了表面上的净电荷分布、电荷转移以及局域在各原子轨道上的电荷;发现T₃⁰,T₃⁺和T₃^-式的表面悬挂键结构较难存在;表面原子趋于形成带有分数电荷的悬挂键,而实际上这些悬挂键彼此结合成弯键;表面原子及其悬挂键上有净电荷积累,且有很强的定域性和取向性。(2)计算了原子集团模型的静 关键词：     

Si(001)表面层及近表面层原子行为的分子动力学模拟研究

用分子动力学方法模拟了Si(001)表面。提出利用二维偶对相关函数分析方法研究表面层和近表面层原于的行为。硅原子间的相互作用势采用含有两体和三体相互作用的Stilli-anger-Weber势。模拟温度为300K,模拟结果和二维偶对相关函数的分析表明:表面层的大部分原子发生成键,键长为0.24nm;近表面层的其它几层原子仍保持原平面晶格构型。另外,对表面层和近表面层原子的弛豫问题也进行了模拟研究。 关键词：     

MoSi_2(001)表面的氧吸附行为

运用第一原理密度泛函理论方法,首先计算了MoSi_2各清洁表面的表面能,(001)Si-|-Si断面具有较低的表面能,是MoSi_2最可能的解理面;通过生成能及键布居分析研究了单氧原子、双氧原子及氧分子在(001)Si-|-Si断面的吸附行为,发现单氧原子在空位处吸附最稳定,此时O极易与Si结合,得到的Si-O-Si键长及键角与SiO_2的非常接近,表明低浓度下O极易与表面的Si结合生成SiO_2;双氧原子发生空位+顶位吸附时O原子除与Si有强作用外,可与Mo有一定相互作用;氧分子以平行的方式接近空位最有利于吸附,此时氧分子最易分解为氧原子,发生氧原子在空位的吸附.     

三氧化钨表面氢吸附机理的第一性原理研究

采用基于密度泛函理论的第一性原理平面波超软赝势方法,在广义梯度近似下,研究了立方WO_3,WO_3(001)表面结构及其氢吸附机理.计算结果表明立方晶体WO_3理论带隙宽度为0.587 eV.WO_3(001)表面有WO终止(001)表面和O终止(001)表面两种结构,表面结构优化后W—O键长和W—O—W键角改变,从而实现表面弛豫;WO终止(001)表面和O终止(001)表面分别呈现n型半导体特征和p型半导体特征.分别计算了H原子吸附在WO终止(001)表面和O终止(001)表面的H—O_(2c)—H,H—O_(2c)…H—O_(2c),H—O_(1c)—H和H—O_(1c)…H—O_(1c)四种吸附构型,其中H—O_(1c)—H吸附构型的吸附能最小,H—O键最短,H失去电子数最多,分别为-3.684 eV,0.0968 nm和0.55e,此吸附构型最稳定.分析其吸附前后的态密度,带隙从吸附前的0.624 eV增加到1.004 eV,价带宽度基本不变.H的1s轨道电子与O的2p,2s轨道电子相互作用,在-8和-20 eV附近各形成了一个较强的孤立电子峰,两个H原子分别与一个O_(1c)原子形成化学键,最终吸附反应生成了一个H_2O分子,同时产生了一个表面氧空位.     

β-SiC(001)-(2×1)表面结构的第一性原理研究

利用缀加平面波加局域轨道(APW+LO)的第一性原理方法计算了β-SiC(001)-(2×1)表面的原子及电子结构. 原子结构的计算结果表明，与Si(001)-(2×1) 表面的非对称性Si二聚体模型不同，β-SiC(001)-(2×1)表面为对称性的Si二聚体模型，其二聚体的Si原子间键长也较大，为0.269nm. 电子结构的计算结果表明，在费米能级处有明显的态密度，因此β-SiC(001)-(2×1)表面呈金属性. 在带隙附近存在四个表面态带,其中的两个占有表面态带已由价带的同步辐射光电子能谱实验得到证实. 关键词： 碳化硅 缀加平面波加局域轨道方法 原子结构 电子结构     

碳吸附于Fe（100）表面的第一性原理研究

本文采用自旋极化密度泛函理论计算了清洁Fe（100）表面及C吸附于Fe（100）表面三种结构: p(2×2)、c(2×2)及p(2×1)。清洁Fe(001)表面只有弛豫,没有重构。吸附C原子的Fe表面体系,最稳定位置为四重空位,空位吸附的C原子实际上与Fe成五重键,这与实验相符。通过对c(2×2)表面结构的电子态密度计算,发现C原子的s、p态与表面Fe原子的d、p及s态都有不同程度的相互作用,成键的主要作用为C2p态与Fe3dx2-y2、3dxy 态的杂化。     

金属Al表面熔化各向异性的分子动力学模拟

采用嵌入原子势,使用分子动力学方法对金属Al不同低指数晶面的表面熔化现象分别进行了模拟.分析了熔化过程中样品结构组态的变化.模拟结果表明对于不同的自由表面,表面熔化呈现出明显的各向异性行为.Al（110）面在低于熔点的温度之下发生预熔化;（111）与（001）面都出现过热现象.与（111）面不同,（001）面发生过热现象时表面原子层为类液层,而（111）面仍然保持很好的晶格结构,即预熔化的Al（001）面在高于熔点的温度下,仍可以在很长的时间内处于相对稳定的亚稳态.由模拟得到Al的热力学熔点为950 K左右,与实验值基本符合. 关键词： 分子动力学 表面熔化 过热     

Si_100_2_1表面上Li原子之间的相互作用与表面结构相变

本文用原子交迭和电子离域-分子轨道方法和原子集团模型, 计算了Li 原子在Si (1 0 0 )2 ×l 表面上的吸附能和吸附Li 原子之间的相互作用, 提出了一种在Li 原子的覆盖度将接近于一个单原子层时, 随着覆盖度的进一步增加, 表面结构连续地从Si (100)-Li (2 × l) 转变成Si( 10 0 )一L i(1×1 ) 的结构相变模型. 关键词：     

Si(113)表面原子结构的低能电子衍射研究

利用低能电子衍射(LEED)研究了离子轰击加退火处理的和淀积外延的两种Si(113)表面的原子结构。发现对于经750—800℃退火后的两种Si(113)表面,当其温度高于600℃时存在1×1非再构表面相。随着样品温度缓慢地冷却至室温,Si(113)-1×1表面经过3×1(约600—400℃)最后转变为3×2再构。当退火温度为600℃时,则只出现3×1再构,室温下的3×2和3×1表面都是很稳定的。讨论了表面杂质对Si(113)表面原子结构的影响。在衬底温度为580℃的Si(113)表面上进行淀积生长,当外延 关键词：     

Surface electronic structure of single-domain Si( 001) 2 × 2-Al: an angle-resolved photoelectron spectroscopy study using synchrotron radiation

The electronic structure of a single-domain Si(001)2 × 2-Al surface has been studied by angle-resolved photoelectron spectroscopy (ARPES) using synchrotron radiation. Through detailed ARPES measurements along various symmetry axes of the surface Brillouin zone, the existence and dispersions of five surface states are identified, one at binding energies a little less than 1 eV and the others between 1 and 2 eV. The origin of the surface states are discussed in terms of the Al-dimer structures on Si(001).     

A leed-aes study of thin Pd films on Si(111) and (100) substrates

A system Pd (deposit)-Si (substrate) has been studied by LEED and AES. Pd₂Si formed on Si(111) became epitaxial after a short time of annealing at a temperature between 300 and 700°C, while the Pd₂Si formed on Si(100) did not, in both cases the surfaces of the Pd₂Si being covered with a very thin Si layer. A sequence of superstructures (3√3 × 3√3), (1 × 1), and (2√3 × 2√3) was observed successively in Pd/Si(111) as the annealing temperature was increased. A (√3 × √3) structure was obtained by sputtering the 3√3 surface slightly. It was found that the √3 structure corresponds to Pd²Si(0001)-(1 × 1) grown epitaxially on Si(111), and that the 3√3 structure comes from the thin Si layer accumulated over the silicide surface, while the 2√3 and 1 structures arise from a submonolayer of Pd adsorbed on Si(111). Superstructures observed on a Pd/Si(100) system are also studied.     

Structural and phase transformations during initial stages of copper condensation on Si(001)

Auger-electron spectroscopy, electron-energy loss spectroscopy, low-energy electron diffraction, and atomic-force microscopy are employed to investigate the growth mechanism, composition, structural and phase states, and morphology of Cu films (0.1–1 nm thick) deposited on a Si(001)-2 × 1 surface at a lower temperature of Cu evaporation (900°C) and room temperature of a substrate. The Cu film phase is shown to start growing on the Si(001)⁻² × 1 surface after three Cu monolayers (MLs) are condensed. It has been revealed that atoms of Cu and Si(001) are mixed, a Cu₂Si film phase is formed, and, thereafter, Cu₃Si islands arise at a larger coating thickness. Annealing of the first Cu ML leads to reconstruction of the Si(001)-1 × 1-Cu surface layer, thereby modifying the film growth mechanism. As a consequence, the Cu₂Si film phase arises when the thickness reaches two to four MLs, and bulk Cu₃Si silicide islands begin growing at five to ten MLs. When islands continue to grow, their height and density reach, respectively, 1.5 nm and 2 × 10¹¹ cm⁻² and the island area is 70% of the substrate surface at a thickness of ten MLs.     

An atom scattering study of the kinetics of oxygen adsorption on a nickel (001) surface

A kinematic analysis of the scattering of helium atoms from oxygen adsorbed on Nickel (001) has been performed. For a substrate temperature of 375 K and an oxygen coverage of θ ～ 0.21 a metastable mixture of p(2×2) without long range order and some c(2×2) is obtained. Annealing at 475 K results in a well ordered p(2×2) structure with long range order. An order-disorder transition is identified at ～ 535 K.     

Surface structural transition of adsorption of oxygen on Ag(100)

High resolution electron energy loss spectroscopy (HREELS) and low energy electron diffraction (LEED) were used to study the oxygen adsorption on Ag(100). An ordered c(2 × 2) superstructure occurs after low temperature adsorption, in which the stretching mode at 37 meV was observed. The energy loss at 30 meV is attributed to the ordered p(1 × 1) structure after the adsorption at room temperature. The structure transition from the c(2 × 2) to the p(1 × 1) has been observed when heating the adsorbed surface from low temperature to room temperature. Cooling of the adsorbed surface at room temperature down to 180 K results in the surface transition from the p(1 × 1) structure to the coexistence of the p(1 × 1) and c(2 × 2) structures.     

Room temperature hydrogenation of the Si(001)2 × 1 surface studied by angle-resolved electron energy loss spectroscopy

We observed the hydrogen adsorption on the Si(001)2 × 1 surface achieved at room temperature by angle-resolved electron energy loss spectroscopy (AR-ELS) and elastic low-energy electron diffraction. From measurements of the intensities of elastically diffracted beams, we found a characteristic hydrogen covered surface (called Si(001)2 × 1H(RT) surface in this paper), where all the diffracted beam intensities were enhanced drastically and a sharp 2 × 1 LEED pattern was observed. The angular dependence of the elastically diffracted beams on the 2 × 1H(RT) surface was different from that on the monohydride 2 × 1:H surface. On the 2 × 1H(RT) surface the S₃, transition from the back bond surface state disappeared in contrary to the 2 × 1:H surface and two hydrogen induced transitions were observed at 7.0 and 8.0 eV in AR-ELS spectra. We revealed that the 2 × 1H(RT) surface consisted of the monohydride and the dihydride phases with comparable weights. Additionally, we found the new transition S'₁, ascribed to the newly produced dangling bond surface state due to the rupture of the dimerization bond with hydrogen adsorption.     

DFT and Monte Carlo study of the W(001) surface reconstruction

The driving force for the W(001) surface reconstruction and electronic structures of pristine and H-covered W(001) surfaces are studied by means of relativistic DFT calculations. The spin-orbit coupling leads to the splitting of the bands. Adsorbed physical monolayer of hydrogen due to forming adsorption bonds stabilizes the (1 × 1) structure of the H/W(001) surface. The performed calculations have not revealed any substantial nesting of Fermi surface, so do not support the Peierls-like charge-density-wave mechanism of the surface reconstruction. The total energy of the (√2 × √2)R45° W(001) surface structure is found to be lower, by 0.14 eV per atom, than for the (1 × 1 W(001). The dependence of the relative intensity of the characteristic LEED reflection on temperature, obtained with the help of Monte Carlo simulations using the interaction energies estimated from DFT calculations, is in good agreement with available experimental data, thus supporting the concept of the order-disorder type of the transition between the low-temperature ((√2 × √2)R45° and room-temperature (1 × 1) surface structures of W(001).     

Order-disorder transition on Si(001): c(4 × 2) to (2 × 1)

A phase transition between c(4 × 2) and (2 × 1) structures on the clean Si(001) surface has been observed at about 200 K by low energy electron diffraction. From the temperature dependence of the width and intensity of the diffraction spots this transition is concluded to be a second order order-disorder transition. The transition proceeds by a single stage, which is in strong contrast with the case of Ge(001) for which a two-stage transition has been reported.