中性及带电混合团簇Al12X(X=Li、Na、K、Rb、Cs结构和磁性的密度泛函研究

以四种13原子高对称性(Ih、Oh、D5h、D3h)密堆积结构为初始构型,通过不等价位原子替换,利用密度泛函理论系统研究了中性及带电Al12X(X=Li、Na、K、Rb、Cs)混合团簇的结构及磁性.结果表明:带电影响团簇稳定性序列且带正电影响显著强于负电情形;相较负电,对中性Al12X及正电Al12X+团簇基态均出现明显的近能同分异构现象;相较中性团簇,带电各混合团簇化学活性普遍降低;全部混合团簇基态均体现出磁矩最小化效应.     

Cu13团簇几何和电子结构的密度泛函研究

利用遗传算法结合Gupta原子间相互作用势,采用密度泛函理论,系统研究了带电 团簇的基态与低激发态的几何结构和电子结构并与中性Cu13团簇进行了对比．计算结果表明：对 Cu13（中性及带电）团簇,高对称性几何构型在众多异构中无能量竞争性优势,团簇基态结构皆为非紧致低对称性结构,对 负电Cu13找到一种新的低对称性最低能结构;带电明显影响团簇结构稳定性,带电Cu13团簇与中性Cu13团簇的结构稳定性序列显著不同;基态 Cu13（中性及带电）团簇的具有磁矩最小化效应,而其高对称性结构则有较大磁矩;计算所得Cu13团簇电离能及电子亲和势与实验结果相符．     

Cu±13团簇几何和电子结构的密度泛函研究

借助遗传算法结合Gupta原子间相互作用势,本文采用密度泛函理论系统研究了带电Cu13±团簇的基态与低激发态的几何结构和电子结构,并与中性Cu13团簇的结果进行了对比.计算结果表明:对Cu13n(n=0,士1)团簇,高对称性几何构型在众多异构中无能量竞争性优势,团簇基态结构皆为非紧致低对称性结构,对Cu13-找到一种新的低对称性最低能结构;带电明显影响团簇结构稳定性,带电Cu13±团簇与中性Cu13团簇的结构稳定性序列显著不同;基态Cu13n (n=0,±1)团簇具有磁矩最小化效应,而其高对称性结构则有较大磁矩;计算所得Cu13团簇电离能及电子亲和势与实验结果相符.     

Cu13±团簇几何和电子结构的密度泛函研究

借助遗传算法结合Gupta原子间相互作用势.本文采用密度泛函理论系统研究了带电Cu₁₃^±团簇的基态与低激发态的几何结构和电子结构,并与中性Cu₁₃团簇的结果进行了对比.计算结果表明:对Cu₁₃ⁿ（n=0,±1）团簇,高对称性几何构型在众多异构中无能量竞争性优势,团簇基态结构皆为非紧致低对称性结构,对Cu₁₃找到一种新的低对称性最低能结构;带电明显影响团簇结构稳定性,带电Cu₁₃^±团簇与中性Cu₁₃团簇的结构稳定性序列显著不同;基态Cu₁₃ⁿ（n=0,±1）团簇具有磁矩最小化效应,而其高对称性结构则有较大磁矩;计算所得Cu₁₃团簇电离能及电子亲和势与实验结果相符.     

氧原子在X@Al12 (X=C，Si，P+ )团簇吸附性质的研究

利用密度泛函理论了对X@Al12 (X=C, Si, P+)团簇吸附氧原子特性进行了研究,分别分析了氧原子在三个吸附位置(顶位置、桥位置和空位置)的氧原子吸附能,HOMO-LOMO能隙和电荷转移等性质。结果表明氧原子更倾向于吸附在空位位置。C@Al12和Si@Al12, P+@Al12 在对氧的吸附性质上比较接近。氧在X@Al12(X= C, Si, P+)的吸附性质与Al13−有显著不同。在Al13−O中O是倾向于以桥位形式吸附在Al13−上的。X@Al12(X=C, Si, P+)和Al13−的电子结构有着明显的差异,这导致了O在这些团簇表面不同的吸附形式,表明掺杂可以有效的改变团簇的性质。     

氧原子在X@Al12 (X=C，Si，P+ )团簇吸附性质的研究

利用密度泛函理论了对X@Al12 (X=C, Si, P+)团簇吸附氧原子特性进行了研究,分别分析了氧原子在三个吸附位置(顶位置、桥位置和空位置)的氧原子吸附能,HOMO-LOMO能隙和电荷转移等性质。结果表明氧原子更倾向于吸附在空位位置。C@Al12和Si@Al12, P+@Al12 在对氧的吸附性质上比较接近。氧在X@Al12(X= C, Si, P+)的吸附性质与Al13−有显著不同。在Al13−O中O是倾向于以桥位形式吸附在Al13−上的。X@Al12(X=C, Si, P+)和Al13−的电子结构有着明显的差异,这导致了O在这些团簇表面不同的吸附形式,表明掺杂可以有效的改变团簇的性质。     

H2在Al12X (X=Al, Ni, Cu)团簇表面解离吸附的第一性原理研究

以Ni和Cu原子中心替换的二十面体Al12X(X=Ni、Cu)团簇为基体、采用密度泛函理论系统计算研究了H原子及H2分子在团簇表面的吸附,并对比了纯Al13团簇对H及H2的吸附,结果表明：相对于纯Al13中H原子的桥位吸附、掺杂团簇Al12X(X=Ni、Cu)中H原子均吸附于团簇顶位;无论是吸附H原子还是H2分子,Al12Ni的几何结构均发生大的畸变;相较H2在纯Al13团簇表面的解离吸附,H2在掺杂团簇Al12X(X=Ni、Cu)表面的解离反应过程中反应能均增大、势垒均降低,这表明掺杂团簇Al12X(X=Ni、Cu)相较纯Al13团簇更有利于H2解离吸附的发生。     

Mg_n~-,AlMg_(n-1)(n=2～13)团簇结构和电子性质的密度泛函理论研究

本文从第一性原理出发,利用密度泛函理论的B3PW91方法,在6-311G水平上对Mg-n,AlMgn-1(n=2～13)团簇进行了几何结构优化和频率分析,并对团簇的平均结合能,二阶能量差分,劈裂能等进行了计算.结果表明:与Mgn团簇相比,带负电Mg-n团簇的最低能量结构整体(除n=6,8,11)变化不大.Al原子的掺杂对Mgn(n=2～13)团簇的最低能量结构没有太大影响,Mgn,AlMgn-1团簇有类似的结构生长方式.带一个负电和掺杂一个Al原子均能使Mgn团簇的平均结合能增大,稳定性增强.并发现Mg-n(n=2～13)团簇在n=4,9时比较稳定,在n=11时稳定性较差,与实验结果一致;而等电子的AlMgn-1团簇在n=4,7,9时比较稳定.     

CoBn(n≤19)团簇结构、电子性质和磁性的密度泛函理论研究

采用密度泛函理论中的广义梯度近似(Generalized Gradient Approximation, GGA)方法, 对不同自旋多重度的CoBn(n≤19)团簇的平衡几何结构、电子性质和磁性进行了研究. 随着尺寸的增加, CoBn(n≤19)团簇最低能量结构从平面结构逐步演变为立体结构, Co从主团簇的外部向内部转移. 团簇最低能量结构的二阶能量差分表明CoB3、CoB7、CoB10、CoB12、CoB14和CoB16团簇较相邻团簇稳定. Co的掺杂增强了硼团簇的化学活性. 最低能量结构中Co的d轨道和B的p轨道存在着明显的杂化. 当n<13, Co处于主团簇的外部时, Co的带电量为正, Co具有磁矩. 当n≥13, Co处于主团簇的内部时, Co的带电量为负, Co的磁矩几乎为零. 团簇最低能量结构的总磁矩主要来自Co的3d轨道的贡献, 且总磁矩随团簇尺寸增大呈现奇偶振荡.     

密度泛函理论研究NO与AunMg-1、Aun-1 (n=1-8)的相互作用

本文采用密度泛函理论对NO在阴离子团簇AunMg-1、Aun-1 (n=1-8)表面的吸附做了系统研究.结果表明, 团簇AunMgNO-1、AunNO-1的基态与亚稳定结构是在团簇AunMg-1、Aun-1最低能量结构的基础上吸附NO形成,NO的吸附没有改变团簇AunMg-1、Aun-1的最低能量结构;吸附后的NO键长变长, 表明NO分子被活化,此外吸附后的NO均带负电;计算表明团簇AunMgNO-1、AunNO-1吸附能都具有奇偶振荡的现象,取值相同时,AunMgNO-1的吸附能较低,表明团簇AunNO-1掺杂Mg后稳定性降低;HOMO-LOMO能隙结果表明AuMgNO-1活性最低、总体上AunNO-1掺杂Mg原子后团簇的化学活性降低.     

Oberflächenstrukturen von Silber-Aufdampfschichten

Using low-energy electron diffraction (LEED) technique surface structures of thin epitaxial silver films have been investigated. The surface of films, evaporated onto freshly cleaved mica sheets is found to be the undisturbed (111)-plane of silver, all crystallites of the film are well ordered within 1?. Two different superstructures caused by oxygen adsorption have been observed: One at room temperature, the other at 400? C with a unit mesh of 3 and √3 times the interatomic distance of silver, respectively.     

Atomic scale characterization of oxygen adsorbates on Al(111) by scanning tunneling microscopy

We present atomic scale STM pictures of clean and oxygen containing Al(111) surfaces. Little influence of the surface oxygen on the topography of the surfaces is found. Three different oxygen species can be distinguished. One of them is associated with adsorbed oxygen and found to grow in small islands upon adsorption at 300 K. Characteristic hexagonal nuclei, created upon annealing of a dilute oxygen adlayer, represent the second one. By comparison with existing spectroscopic data these are assigned to nuclei of a surface oxide.     

Low energy electron diffraction studies of chemisorbed gases on stepped surfaces of platinum

The chemisorption of hydrogen, oxygen, carbon, carbon monoxide and ethylene was studied by low-energy electron diffraction on ordered stepped surfaces of platinum which were cut at angles less than 10° from the (111) face. The chemisorption characteristics of stepped platinum surfaces are markedly different from those of low index platinum surfaces and they are also different from each other. Hydrogen and oxygen which do not chemisorb easily on the (111) and (100) crystal faces chemisorb readily and at relatively low temperatures and pressures on the stepped platinum surfaces used in this study. In contrast to the ordered adsorption of carbon monoxide and ethylene on low index faces, the adsorption was disordered on the stepped surfaces and there is evidence for dissociation of the molecule. Carbon formed several ordered surface structures and caused faceting on the stepped surface, which are not observed on low index platinum surfaces. There appears to be a much stronger interaction of chemisorbed gases with stepped surfaces than with low index planes that must be caused by the differing atomic structures at the steps. Evidence for the differing reactivities of the two stepped surfaces are also discussed.     

Effects of atomic oxygen treatment on structures, morphologies and electrical properties of ZnO:Al films

ZnO:Al (ZAO) film has a potential application in providing spacecrafts the protection against atomic oxygen (AO) erosion. To advance the understanding of the AO resisting mechanisms and the relationships between the structures, morphologies and conductive properties of ZAO film, direct current magnetron sputtered ZAO films with different thicknesses were treated with AO in a ground-based simulation facility. The microstructure, surface chemical state, morphologies and electrical properties of pristine films and irradiated ones were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy and Hall measurement. It is found that AO exposure produces novel, oriented recrystallization of the surface particles. It also increases the content of oxygen ions in fully oxidized stoichiometric surroundings on the surface, resulting in the decrease of the conductivity. As the thickness of ZAO film increases, the crystallinity, conductivity and resistance to AO erosion are all improved.     

Deposition of Ni<Subscript> 13</Subscript> and Cu<Subscript> 13</Subscript> clusters on Ni(111) and Cu(111) surfaces

The soft deposition of Ni₁₃ and Cu₁₃ clusters on Ni(111) and Cu(111) surfaces is studied by means of constant-energy molecular-dynamics simulations. The atomic interactions are described by the Embedded Atom Method. It is shown that the shape of the nickel clusters deposited on Cu(111) surfaces remains rather intact, while the copper clusters impacting on Ni(111) surfaces collapse forming double and triple layered products. Furthermore, it is found that for an impact energy of 0.5 eV/atom the structures of all investigated clusters show the lowest similarity to the original structures, except for the case of nickel clusters deposited on a Cu(111) surface. Finally, it is demonstrated that when cluster and substrate are of different materials, it is possible to control whether the deposition results in largely intact clusters on the substrate or in a spreading of the clusters. This separation into hard and soft clusters can be related to the relative cohesive energy of the crystalline materials.     

Al196团簇结构及熔化行为的分子动力学模拟

运用分子动力学方法结合退火及淬火技术,采用半经验的Gupta原子间多体势,系统研究了Al₁₉₆团簇的熔化特性.模拟结果表明:从不同的初始结构出发得到的熔化行为明显不同.从较低能量稳定结构出发,会出现明显的比热呈现双峰的熔化行为;而从基态或接近于基态的低能稳定结构出发.则呈现出比热显示单峰的熔化现象.通过分析不同温度点上团簇淬火结构的势能分布图给出了Al₁₉₆团簇的不同（比热出现双峰或单峰）熔化行为的成因.     

替位杂质对低能Pt原子与Pt(111)表面相互作用影响的分子动力学模拟

采用嵌入原子方法的原子间相互作用势，通过分子动力学方法模拟了低能Pt原子与Cu，Ag，Au，Ni，Pd替位掺杂Pt(111)表面的相互作用过程，系统研究了替位原子对表面吸附原子产额、溅射产额和空位缺陷产额的影响规律，分析了低能沉积过程中沉积原子与基体表面的相互作用机理以及替位原子的作用及其影响规律.研究结果显示：替位原子的存在不仅影响着沉积能量较低时的表面吸附原子的产额与空间分布，而且对沉积能量较高时的低能表面溅射过程和基体表面空位的形成产生重要影响.替位原子导致的表面吸附原子产额、表面原子溅射以及空位形 关键词： 分子动力学 低能粒子 替位掺杂 表面原子产额 溅射 空位     

On the mechanism of the interaction between oxygen and close-packed single-crystal aluminum surfaces

Using periodic first principles simulations we investigate the interaction of oxygen molecules with both regular Al(111) and Al(001) surfaces as well as a stepped Al(111) substrate. The limitation of this approach is the use of thin metallic slabs with a limited range for their coverage by adsorbed oxygen. The advantage is the detailed modeling that is possible at an atomic level. On the regular Al(111) surface, we have been able to follow the oxidation process from the approach of O₂ molecules to the surface, through the chemisorption and absorption of O atoms, up to the formation of first Al₂O₃ formula units. An energetically feasible mechanism for the formation of these Al₂O₃ ‘molecules’ is proposed but their aggregation to Al₂O₃ growth nuclei can only be surmised. On the Al(001) surface, absorption of oxygen atoms occurs more readily without any restrictions on the density of their surface overlayer, in agreement with the failure to observe a distinct chemisorption stage for O on Al(001) experimentally. The stepped Al(111) surface contains both {111} and {001} microfacets: the latter are obviously preferred for penetration of the oxygen adatoms into the subsurface space of the substrate. Before considering the O/Al interfaces the computational method is tested thoroughly by simulations on bulk Al and close-packed aluminum surfaces.     

Theoretical study of oxygen chemisorption on (111) and (100) silicon surfaces

The chemisorption of atomic oxygen on (111) and (100) silicon surfaces has been studied by the MNDO method using a cluster approach. The results show that, for both surfaces, chemisorption occurs preferentially on bridge positions, but chemisorption on top positions can play a significant role especially for the (111) surface.     

铝和银在铱（111）宽范围吸附的稳定性、原子构型及电子特性研究

利用第一性原理密度泛函理论研究了铝和银在铱的111面的宽范围吸附特性。基于密度泛函理论计算了覆盖度在0.11ML到2.00ML的结构稳定性、原子构型及平均结合能。对于铝原子在铱111面的吸附,最稳定的结构是铝原子覆盖度为0.5ML位于密堆六方空位（hcp-hollow）,相应的结合能为-4.68eV;对于亚层铝原子的吸附,最稳定结构是铝原子覆盖度为1.00ML时位于octahedral位置,相应的结合能为-5.28eV。对于覆盖度为2.00ML的满覆盖度混合结构的表层及亚层吸附,最稳定结构是Al位于六方密堆及八方密堆位置,相应的结合能为-4.70eV。这意味着当铝原子以满覆盖度吸附在铱的111面上时,趋向于在铱的111面的亚层形成化学键,而非吸附于表层。相比于铝吸附在铱111面,银的吸附特性呈现出很大的不同,面心位置更为稳定,在覆盖度为0.25ML时其结合能为3.89eV,略微高出密堆六方位置处3.88eV的结合能。