磁控条件下激波冲击三角形气柱过程的数值研究

本文基于磁流体动力学方程组,在保证磁场散度为零的条件下,采用CTU+CT（corner transport upwind+constrained transport）算法,对有无磁场控制下激波与重质或轻质三角形气柱相互作用过程进行数值研究.结果表明：无论有无磁场,两气柱在激波冲击下均具有完全不同的波系结构和射流现象.其中,入射激波与重气柱发生常规折射,形成介质射流,而与轻气柱作用则发生非常规折射,形成反相空气射流.无磁场时,气柱在激波冲击下,产生Richtmyer-Meshkov和Kelvin-Helmholtz不稳定性,界面出现次级涡序列,重气柱上下角卷起形成主涡对,轻气柱空气射流穿过下游界面后形成偶极子涡.施加横向磁场后,次级涡序列、主涡对以及偶极子涡均消失.进一步研究表明,在磁场作用下,洛伦兹力将不稳定性诱导产生的涡量向界面两侧的Alfvén波上输运,减少界面涡量沉积,抑制界面卷起失稳.最终,涡量沿界面两侧形成相互远离的涡层,界面不稳定性得到控制.此外,定量分析表明磁场能加快两气柱上游界面的运动,抑制下游界面的运动,且对轻气柱的控制效果更好.     

激波与SF6球形气泡相互作用的数值研究

本文基于大涡模拟方法, 采用高阶精度格式对平面入射激波以及不同反射距离条件下的反射激波与SF₆重气泡相互作用过程进行了三维数值模拟. 数值结果清晰地显示了SF₆重气泡在激波作用下诱导Richtmyer-Meshkov不稳定性过程, 揭示了入射激波以及反射激波在气泡界面聚焦诱导射流的过程, 详细分析了不同反射距离条件下反射激波与SF₆重气泡作用过程及流场结构.     

激波冲击R22重气柱所导致的射流与混合研究

基于大涡模拟, 结合五阶加权基本无振荡格式与沉浸边界法对激波自左向右与R22重气柱作用过程进行了数值模拟. 数值结果清晰地显示了激波诱导Richtmyer-Meshkov不稳定性所导致的重气柱变形过程, 并与Haas 和 Sturtevant 的实验结果符合. 另外, 结果还揭示了入射激波在气柱内右侧边界发生聚焦并诱导射流的过程, 以及在Kelvin-Helmhotz 次不稳定性作用下两个主涡滑移层形成次级涡的过程, 并分析了气柱变形过程中与周围空气的混合机理. 最后, 通过改变反射距离对反射激波与不同变形阶段的气柱的再次作用过程进行了研究. 结果表明: 当激波反射距离较长时, 反射激波与充分变形后的气柱作用, 使其在流向方向上进一步被压缩; 而当激波反射距离较短时, 反射激波会在气柱内发生马赫反射, 两个三波点附近产生两个高压区, 当其传播至气柱左侧边界时对气柱边界造成冲击加速, 诱导两道向左传播的反向射流. 关键词： Richtmyer-Meshkov不稳定性 R22重气柱 反射激波 射流     

激波诱导双层气柱演化的偏心效应研究

实验与数值研究了平面激波诱导下双层气柱的演化规律.利用肥皂膜技术生成了3种双层气柱,通过固定内、外层气柱半径,改变内层气柱在流向方向上的位置,研究了双层气柱偏心效应对流场演化的影响.结果表明,当内层气柱向上游偏移时,外层气柱的上游界面在后期会产生朝向上游的射流;当内层气柱向下游偏移时,下游两道界面会较早地耦合在一起...     

偏心对汇聚激波诱导的RM不稳定性影响的数值研究

数值研究汇聚激波与四种形状（圆形、小振幅单模、大振幅单模和正方形）的二维气柱界面相互作用,激波汇聚中心与界面同心和不同心（即偏心）时Richtmyer-Meshkov（RM）不稳定性的发展规律,重点考察界面中心的压力及混合区面积在两种情况下随时间的变化.数值方法使用VAS2D程序,该方法采用有限体积法结合网格自适应技术,能够达到时间和空间的二阶精度.结果表明,偏心情况下RM不稳定性是其在同心情况下的扰动和偏心小扰动叠加的结果.在本文采用的偏心程度下（20%）,偏心对于圆形无扰动界面发展的影响主要表现在后期界面出现微小扰动结构;而对于单模和正方形这种原本有扰动的界面,偏心使扰动结构呈现不对称及扭曲,同时也影响了界面中心压力和混合区面积,因而加剧了不稳定性的发展.     

激波诱导的液柱气液界面RM不稳定性的研究

为了进-步研究气/液界面上的Richtmyer-Meshkov(RM)不稳定性现象,在水平激波管中进行了激波与单、双排液柱相互作用的实验.通过使用驱动气体为氮气、被驱动气体为空气,获得了马赫数为1.10与1.25的激波;通过更换不同尺寸的试件获得了初始直径不同的液柱。使用高速摄影仪记录了激波作用之后液柱失稳变形的详细过程,测量分析了不稳定性发展过程中,尖钉高度、气泡深度及混合区域宽度随时间的发展规律,并与理论分析中的公式进行了比较。     

激波作用不同椭圆氦气柱过程中流动混合研究

在激波与气柱相互作用问题中,压力与密度间断不平行产生的斜压涡量会引起流动的不稳定性,从而促进物质间的混合.本文基于双通量模型,结合五阶加权基本无振荡(WENO)格式,求解多组分二维Navier-Stokes方程,分析激波作用面积相同结构不同的椭圆气柱所致的流动和混合.数值结果清晰地显示了激波诱导Richtmyer-Meshkov不稳定性引起的气柱界面变形和波系演化.同时定量地从界面运动、界面结构参数变化(长度和高度)、气柱体积压缩率、环量及混合率等角度分析激波诱导的流动混合机制,研究椭圆几何构型对氦气混合过程的影响.结果表明,界面及相关参数的演化与气柱初始形状密切相关.当激波沿椭圆长轴作用于气柱时,气柱前端出现空气射流结构,且射流不断增长并渗透到下游界面,致使气柱分离成两个独立涡团,离心率越大,射流发展越快;同时激波作用气柱后在界面处产生不规则反射现象.圆形气柱界面演化与这种作用情形类似.当激波沿椭圆短轴作用于气柱时,界面上游出现类平面结构,随后平面上下缘处产生涡旋,主导流动发展,激波在界面作用产生规则反射,离心率越大,这些现象越明显.界面高度、长度、体积压缩率也因此有所差异.对界面演化、环量和混合率的综合分析表明,激波沿长轴作用于气柱且离心率较大时,流动发展较快,不稳定性导致的流动越复杂,越有利于氦气与环境介质的混合.     

二维气/液界面不稳定性数值模拟

 以多介质的体积分数方法和三阶PPM（Piecewise Parabolic Method）方法为基础,给出了适用于多介质流体动力学数值模拟的计算方法和程序MFPPM。利用MFPPM程序对在高压气体冲击作用下的气体/液体交界面的Richtmyer-Meshkov（RM）不稳定性及其引起的流体混合现象进行了数值模拟研究。主要研究在不同的初始扰动情况下流体混合区的发展,并细致研究了流体混合区的宽度、气泡和尖钉高度随时间的增长情况及不同初始扰动对它们的影响;同时还研究了网格尺度不同时混合区、气泡以及尖钉的构型和高度的增长情况。通过对计算结果的分析得出,流体混合区、气泡以及尖钉的发展与初始扰动有密切的关系,特别是在后期影响更为显著;混合区宽度的变化过程和尖钉相似,而气泡高度的变化基本上呈线性增长趋势,且受初始扰动的影响比较小,但是其构型却有明显差别;网格的影响也主要体现在对混合区、气泡和尖钉的构型上。     

弱激波冲击无膜重气柱和气帘界面的实验研究

研制了一个改进的激波管设备,对马赫数为1.2的弱激波冲击作用下空气中SF6气柱和气帘界面的演变过程进行了初步的实验研究。通过设计激波管实验段、烟雾发生器、气体箱、进气吸气系统和激波管尾段,控制混合气体中SF6的峰值浓度和初始气流速度,建立了稳定、可重复的无膜气柱和气帘初始界面形成技术。利用高速摄影技术,在水平面内观测了气柱和气帘的初始界面图像,沿垂直方向观测了界面RM(Richtmyer-Meshkov)不稳定性的演变过程。气柱演变图像显示了典型的对涡结构,气帘演变图像显示了早期的多蘑菇形结构和后期的相邻波长干扰效应。图像后处理表明,气柱的高度和宽度、气帘的宽度均随时间单调增加,且宽度比高度增加快得多。从二维涡量动力学方程出发,对图像中涡的演变过程进行了初步解释。     

激波冲击V形界面重气体导致的壁面与旋涡作用及其对湍流混合的影响

基于多组分混合物质量分数模型,采用色散最小耗散可控的高分辨率有限体积方法,数值模拟了弱激波冲击V形空气/SF_6界面后,界面不稳定性生成的旋涡与固体壁面作用问题.激波冲击V形界面之后,因斜压效应诱导涡量沉积在界面附近,形成沿界面规则排列的多个涡对结构.旋涡的诱导作用使界面不断变形和卷起,同时旋涡之间不断发生相互并对,诱导更多更小尺度的旋涡产生.旋涡诱导作用的叠加效应,使界面尖端处的初始涡对向上下壁面发展.随后,涡结构开始与壁面发生复杂的相互作用.旋涡与壁面作用后沿壁面加速,使得物质界面沿壁面伸展,随后,旋涡从壁面回弹,并诱导二次旋涡产生.旋涡与壁面相互作用的过程,能够明显加剧物质混合.本文从物质混合的角度研究了该过程的机理,分析了旋涡与壁面作用对物质混合的影响.     

The geometric structure of pure SF6 and mixed Ar/SF6 clusters investigated by core level photoelectron spectroscopy

The S 2p core level photoelectron spectra of Sulphurhexafluoride clusters have been investigated together with heterogeneous Ar/SF₆ clusters, created by doping Ar host clusters (with a mean size of 3600 atoms) with the molecule. Surface and bulk features are resolved both in the argon 2p and the sulphur 2p core level photoelectron spectra. For the latter level such features were only observed in the pure cluster case; a single feature characterizes the S 2p core level spectra of SF₆ doped argon clusters. From the chemical shifts, investigated with respect to SF₆ doping pressure. It can be concluded that the host clusters get smaller with increasing doping pressures and that the SF₆ molecules predominantly stay below the cluster surface, whereas the Argon core stays intact. We have neither observed features corresponding to SF₆ on the cluster surface, nor features corresponding to molecules deep inside the bulk in any of the spectra from the pick-up experiments.     

激波作用下SF6气泡界面演化和射流发展的数值模拟

 数值研究了平面激波冲击氮气环境中SF₆气泡界面的Richtmyer-Meshkov不稳定性,重点关注其中的激波聚焦及射流的产生和发展过程。在入射激波马赫数为1.23的情况下,给出了压力、密度、数值纹影和涡量等物理量的演化图像,定量分析了流场中压力最大值、密度最大值、射流速度、环量和斜压力矩随时间的变化关系。计算结果表明,平面激波冲击SF₆气泡过程有很强的聚能效应,在气泡内部靠近下游极点处发生激波近似理想聚焦和点爆炸现象,直接导致出现二次波系以及向下游运动的细长射流结构。相比入射激波,二次波系产生斜压力矩和涡量的能力要弱得多。     

Enhancement of the hydrophobicity of silk fabrics by SF6 plasma

Hydrophobic properties are of interest in fabric and textile manufacture. We have used radio-frequency inductively coupled SF₆plasma to modify the surface of Thai silk fabrics for the enhancement of the hydrophobic property. The water contact angle of fabrics increased from 0°up to 145°after SF₆ plasma treatment. The measured water absorption time was found to depend upon the treatment time and RF power, for SF₆ pressures lower than 0.05 Torr. At higher SF₆ pressures, all samples achieved absorption times in excess of 200 min, regardless of the treatment time and RF power. The morphology changes of fabrics after plasma treatment were characterized by scanning electron microscopy and atomic force microscopy. After plasma treatment, the RMS surface roughness of the fibres increased from about 10 to 30 nm. From X-ray photoelectron microscopy analysis, we found that the hydrophobicity of the fabrics is the highest when the fluorine/carbon ratio at the surface increases. A small decrease of the oxygen/carbon ratio was also observed on the fabrics that showed the longest absorption times.     

Dose and pressure dependence of silicon microstructure in SF6 gas due to excimer laser irradiation

ArF excimer laser radiation on Si surface at controlled SF₆ atmosphere creates a microstructure whose alteration at various UV doses and SF₆ pressures are investigated in this work. Moreover, a rigorous model has been presented here regarding the experiments based on the micro-fluid mechanical properties of molten silicon layer and the subsequent mechanical wave resonance due to the surface shallow fluid theory. The competitive thermal and non-thermal UV laser interaction with Si and the following heat transfer explains the creation of the self-assembled micro-pillars on Si surface.     

Novel device to measure critical point "Onset" of capillary wave and interpretation of Faraday instability wave by numerical analysis

A capillary wave was created on a surface by vibrating from the bottom of a container. When the amplitude of the container vibration approached the critical point, called the onset state, the surface broke up and bursted into very small drops on the air. The numerical analysis was used to determine the amplitude of the onset. The onset point was found to be 0.349 μm at f = 500 kHz. The critical amplitude h_cr was determined by using a multi-Fourier horn nozzle (MFHN) device. The onset point was measured to be 0.37 μm using a laser Doppler vibrometer (LDV) with the MFHN at f = 486 kHz. These drops indicate that particle size distributions of 10.8 μm and 7.0 μm were produced by the MFHN at f = 289 kHz and f = 486 kHz, respectively. These results agreed with those obtained using Kelvin’s equation, which predicted D = 0.34λ.     

Absorption of CO2 laser pulses at different wavelengths by ground-state and vibrationally heated SF6

The absorption of CO₂ laser pulses by low pressure SF₆ gas has been investigated over a wide range of energy fluxes. For laser energy fluxes of 0.01–1 J cm^-2 the effective absorption cross section varies between 0.2 and 2 × 10^-18 cm². For each laser line an individual dependence on the energy is found and in some cases minor changes in the absorption behaviour seem to occur around 0.1 J cm^-2. SF₆ excited with an average vibrational energy content of up to 20 photons/molecule does not absorb measurable amounts of 9.4 μm laser light. The influence of various SF₆ and Ar pressures on the temporal shape of the transmitted pulses has been investigated.     

Measurement of optical and electrical properties of silicon microstructuring induced by ArF excimer laser at SF6 atmosphere

The irradiation of ArF excimer laser (193 nm) on Si wafer (〈1 1 1〉, n-type, arsenic-doped, 0.01 Ω cm) in SF₆ atmosphere, from vacuum to 1000 mbar, creates a regular self-assembled microstructure owning to a great number of microconical spikes covered with SiF₂ (fluorosilyl) layer containing sulfur impurities. The geometry of microstructure as well as the layer thickness varies with the gas pressure and the laser parameters, particularly duration, pulse energy and the dose. In this work, the electrical properties of the layer on the microstructured silicon have been investigated based on electrical impedance spectroscopy (EIS). The measured impedance significantly changes regarding to the unirradiated samples. It was shown that the corresponding electrical conductance and the dielectric constants of the layer are strongly dependent on the gas pressure and UV dose. The layer thickness was also determined in terms of SF₆ pressures.