An AFM study of the processing of hydrogen passivated silicon(1 1 1) of a low miscut angle

We present atomic force microscopy (AFM) measurements from a passivated silicon crystal miscut by 0.1° and show the etching regime to be significantly different from surfaces with a larger miscut angle. A simple kinetic model is developed to explain the results and is used to derive the optimal etching conditions for nominally flat Si(1 1 1)–(1×1)H. We show that small changes in miscut angle can alter the kinetic steady state and promote the formation of deep etch pits, even on the least stable, miscut surface. Collisions of steps with these pits result in arrays of stable, self-aligned ‘etch hillocks' over micron dimensions. Following preparation, we use AFM to observe the initial growth of native oxide on the Si(1 1 1)–(1×1)H surface, and demonstrate that AFM is a sensitive probe to surface oxidation in the sub-monolayer regime.     

Ex-situ prepared films of 4-aminothiophenol on Au(1 1 1): photoemission, NEXAFS and STM measurements

Ex-situ prepared films of 4-aminothiophenol (4-ATP) on Au(1 1 1) have been studied by core-level photoemission using synchrotron radiation, ultra-high-vacuum scanning tunneling microscopy and spectroscopy (UHV-STM, STS), and X-ray absorption (NEXAFS). Photoemission measurements suggest that the film contains a relatively low percentage of 4-ATP bonded to the Au surface, with the presence of free 4-ATP, with oxidised and possibly dimerised molecules also present. We find a lower oxide content than has previously been observed, with well-resolved STM images. These images show a disruption of the long range order of the Au(1 1 1)-(22 × √3) reconstruction, with local nucleation of the reconstruction apparently induced by the 4-ATP, and bias-dependent contrast images. This latter effect, together with the asymmetry observed in STS, is ascribed to the presence of oriented molecular dipole layers between the metal and the organic material. NEXAFS data suggest a broadly upright geometry, with, however, considerable uncertainties.     

Observation of triangular terraces and triangular craters of CaF2 film on Si(1 1 1) substrate

We have investigated the growth mode and surface morphology of CaF₂ film on Si(1 1 1)7×7 substrate by reflection high-energy electron diffraction (RHEED) using very weak electron beam and atomic force microscopy (AFM). It was found by RHEED intensity oscillation measurements and AFM observations that three-dimensional (3D) islands grow at RT; however, rather flat surface appears with two-dimensional (2D) islands around 300 °C. Especially, at high temperature of 700 °C, characteristic equilateral triangular terraces (or islands) with flat and wide shape grow with the tops directed toward [1 1 −2] of substrate Si(1 1 1). On the other hand, the desorption process of the CaF₂ film due to electron stimulated desorption (ESD) was also examined. It was found that the ESD process at 300 °C forms characteristic equilateral triangular craters on the film surface with the tops (or corners) directed toward [−1 −1 2] of substrate Si(1 1 1), provided that the film was grown at 700 °C.     

Optimizing phase imaging via dynamic force curves

Tapping mode (TM, also called intermittent contact mode) atomic force microscopy (AFM) has been routinely used in many laboratories. However, consistent or deliberate control of measuring conditions and interpretation of results are often difficult. In this article, we demonstrate how measurement parameters (drive frequency, cantilever stiffness and oscillation amplitude) affect the tapping tip's state. This has been done by systematic dynamic force measurements performed on mica and polystyrene surfaces together with computer simulations. Our study shows the following results. (1) Weaker cantilevers, smaller amplitude and higher drive frequency (around the resonance) lead to an extension of the attractive region (greater phase lag) in amplitude–phase–distance curves and thus can help to achieve stable high-setpoint TM imaging with minimal tip–sample pressure. (2) Bistability of tapping tips often exists and may cause height artefacts if the setpoint falls in the bistable region. (3) Tapping tips with high vibrating energy (stiff cantilevers and large amplitude) driven at resonance are only slightly perturbed by tip–sample interactions and usually remain monostable during the sweep of the scanner position. This can help to achieve good phase contrast without significant artefacts when the setpoint falls in a continuous negative–positive phase shift transition region. (4) Low energy cantilevers (compliant cantilevers and small amplitude) usually result in large phase shift and can be used to acquire large phase contrast images. However, height artefacts will occur when the setpoint falls in the bistable region usually existing for such cantilevers. (5) Computer simulations are useful in understanding the bistability in dynamic force curves and determining either material properties or the optimal imaging parameters.     

A single h-BN layer on Pt(1 1 1)

The structure and formation of an ultrathin hexagonal boron nitride (h-BN) film on Pt(1 1 1) has been studied by a combination of scanning tunneling microscopy, low energy electron diffraction, low energy electron microscopy, X-ray absorption and high resolution core level spectroscopy. The study shows that a single boron nitride layer is formed on Pt(1 1 1), resulting in a coincidence structure. High resolution scanning tunneling microscopy (STM) images of the h-BN ultrathin film display only one of the atomic species in the unit cell. Probing the boron and nitrogen related local density of states by near edge X-ray absorption fine structure measurements we conclude that the nitrogen sublattice is visible in STM images. The growth of the single hexagonal boron nitride layer by vapourized borazine in the pressure range of 1×10^-6–1×10^-8 at 800 °C is further studied by low energy electron microscopy, and reveals that the number of nucleation sites and the perfection of the growth is strongly pressure dependent. A model for the single, hexagonal, boron nitride layer on Pt(1 1 1) is proposed.     

Scanning probe microscopy study of exfoliated oxidized graphene sheets

Exfoliated oxidized graphene (OG) sheets, suspended in an aqueous solution, were deposited on freshly cleaved HOPG and studied by ambient AFM and UHV STM. The AFM images revealed oxidized graphene sheets with a lateral dimension of 5–10 μm. The oxidized graphene sheets exhibited different thicknesses and were found to conformally coat the HOPG substrate. Wrinkles and folds induced by the deposition process were clearly observed. Phase imaging and lateral force microscopy showed distinct contrast between the oxidized graphene and the underlying HOPG substrate. The UHV STM studies of oxidized graphene revealed atomic scale periodicity showing a (0.273 ± 0.008) nm × (0.406 ± 0.013) nm unit cell over distances spanning few nanometers. This periodicity is identified with oxygen atoms bound to the oxidized graphene sheet. I(V) data were taken from oxidized graphene sheets and compared to similar data obtained from bulk HOPG. The dI/dV data from oxidized graphene reveals a reduction in the local density of states for bias voltages in the range of ±0.1 V.     

Structural investigation of n-hexadecanoic acid multilayers on mica surface: Atomic force microscopy study

The structure of n-hexadecanoic acid (HA) multilayers formed by spreading an ethanol solution containing this molecule onto a freshly cleaved mica surface has been studied by atomic force microscopy (AFM). AFM images of multilayers obtained with different coating time showed that HA molecules first formed some sporadic domains on mica surface. With the proceeding of the coating process, these domains gradually enlarged and coalesced, until formed a continuous film finally. It was observed that HA molecules were always adsorbed on mica surface with tilted even-numbered layers structure. The height of the repeated tilted bilayer film was measured to be approximately 3.8 ± 0.2 nm, which implied a ∼60° tilt molecular conformation of the HA bilayers on mica surface. Phase image confirmed that the HA multilayers terminated with the hydrophilic carboxylic acid groups. The formation mechanism of the HA multilayers was discussed in detail. Thus, resulted hydrophilic surfaces are of special interest for further study in biological or man-made member systems.     

InAs wetting layer evolution on GaAs(0 0 1)

The evolution of two-dimensional (2D) strained InAs wetting layers on GaAs(0 0 1), grown at different temperatures by molecular beam epitaxy, was studied by in situ high-resolution scanning tunneling microscopy. At low growth temperature (400 °C), the substrate exhibits a well-defined GaAs(0 0 1)-c(4 × 4) structure. For a disorientation of 0.7°, InAs grows in the step-flow mode and forms an unalloyed wetting layer mainly along steps, but also in part on the terrace. The wetting layer displays some local c(4 × 6) reconstruction, for which a model is proposed. 1.2 monolayer (ML) InAs deposition induces the formation of 3D islands. At a higher temperature (460 °C), the wetting layer is obviously alloyed even at low InAs coverage. The critical thickness of the wetting layer for the 2D-to-3D transition is shifted to 1.50 ML in this case presumably since the strain is reduced by alloying.     

STM/nc-AFM investigation of (n×6) reconstructed GaAs(0 0 1) surface

We have investigated the n×6 reconstructed GaAs(0 0 1) surface with scanning tunneling and non-contact atomic force microscopy techniques (STM/nc-AFM). For the first time atomically resolved nc-AFM images of that surface are shown. The images confirm the presence of rows of arsenic dimers in the topmost layer as predicted by the current model of n×6 reconstructed surface. However, in contrast to previous reports we found that postulated As dimer sites are not fully occupied. Moreover, the images suggest that ×6 symmetry is present on the surface even in absence of the dimers. We show that due to probing of different surface properties nc-AFM and STM are complementary tools for complex surfaces investigation.     

Influence of interfactants on thin metal film growth

The growth of Pb on Si(1 1 1) with and without Ag as an interfactant is studied in the temperature range from 270 to 375 K by microscopy and spectroscopy. Whereas Pb grows on the Si(1 1 1)-7×7 surface in the Stranski–Krastanov (SK) mode, the growth mode on the Si(1 1 1)-√3×√3-R30°-Ag surface changes from layer-by-layer below 300 K to SK mode above 300 K. Spectroscopy shows that Ag remains at the interface between the substrate and the growing Pb film. The influence of the interfactant on the growth is attributed to the increase of the island density by an order of magnitude and to the changes of the growth kinetics resulting from this increase.     

Methane mobility in carbon nanotubes

Quasi-elastic neutron scattering has been used to characterize the diffusivity of CH₄ molecules condensed in single-wall carbon nanotubes. It is shown that the two sites of adsorption, previously observed by adsorption volumetry and calorimetry measurements, correspond to a solid-like phase for the more strongly bound site at T<120 K and to a liquid-like component for the more weakly bound site at 70<T<120 K. The diffusion coefficients of the mobile molecules range between 3×10⁻⁷ to 15×10⁻⁷ cm² s⁻¹. The fraction of this viscous liquid diminishes as the temperature is decreased; the adsorbate is fully solidified at 50 K and below.     

GaAs(0 0 1) surface reconstructions: geometries, chemical bonding and optical properties

We re-examine the GaAs(0 0 1) surface by means of first-principles calculations based on a real-space multigrid method. The c(4×4),(2×4) and (4×2) surface reconstructions minimize the surface energy for anion-rich, stoichiometric and cation-rich surfaces, respectively. Structural models proposed in the literature to explain the Ga-rich GaAs(0 0 1) (4×6) surface are dismissed on energetic grounds. The electronic properties of the novel ζ(4×2) structure are discussed in detail. We calculate the reflectance anisotropy of the energetically most favoured surfaces. A strong influence of the surface geometry on the optical anisotropy is found.     

Well-ordered (1 0 0) InAs surfaces using wet chemical treatments

Atomic ordering of HCl-isopropanol (HCl-iPA) treated and vacuum annealed (1 0 0) InAs surfaces was studied by scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), and reflectance anisotropy spectroscopy (RAS). On the as-treated surface, a diffused (1 × 1) pattern is observed, which successively evolves to the β₂(2 × 4)/c(2 × 8) and (4 × 2)/c(8 × 2) ones after annealing to 330 °C and 410 °C, respectively. At the intermediate temperature of 370 °C, an ₂(2 × 4)/(4 × 2) mixed reconstruction is observed. Reflectance anisotropy spectra are compared with those of the corresponding reconstructions observed after As-decapping and found to be quite similar. Therefore we conclude that high-quality (1 0 0) InAs surfaces can be obtained by wet chemical treatment in an easy, inexpensive and practical way.     

Large scale atomic ordering on uncovered GaAs(0 0 1) after InAs monolayer capping: Atomic structure of the (12 × 6) reconstruction

A well ordered c(8 × 2)-InAs monolayer is grown by molecular beam epitaxy (MBE) on a GaAs(0 0 1) substrate. After slow sublimation of this monolayer up to 560 °C, a homogeneously (n × 6) reconstructed GaAs surface is obtained. This surface is studied by scanning tunneling microscopy (STM) in UHV. This shows that it is well-ordered on a large scale with 200 nm long As dimer rows along and is also locally (12 × 6) reconstructed, the cell structure is proposed. We believe that this surface organization results from the specific As/Ga (0.7) surface atomic ratio obtained after the InAs monolayer growth and sublimation cycle.     

Surface properties of Hafnium diboride(0 0 0 1) as determined by X-ray photoelectron spectroscopy and scanning tunneling microscopy

The surface structure and properties of the HfB₂(0 0 0 1) (Hafnium diboride, HfB₂) surface have been investigated with X-ray photoelectron spectroscopy, low energy electron diffraction (LEED), and scanning tunneling microscopy (STM). Annealing temperatures above 1900°C produce a sharp (1×1) LEED pattern, which corresponds to STM images showing flat (0 0 0 1) terraces with a very low contamination level separated by steps 3.4 Å in height, corresponding to the separation of adjacent Hf planes in the HfB₂ bulk structure. For lower annealing temperatures, extra p(2×2) spots were observed with LEED, which correspond to intermediate terraces of a p(2×1) missing row structure as observed with STM.     

Deposition of MgO films by pulsed mid-frequency magnetron sputtering

MgO films were deposited by pulsed mid-frequency magnetron sputtering from metallic targets in the mixture of Ar and O₂ gas. The surface morphology, crystalline structure, and optical properties were characterized by using atomic force microscopy (AFM), X-ray diffraction (XRD), and spectroscopic ellipsometry, respectively. The secondary electron emission coefficients of MgO films were measured by using a self-made apparatus in He gas. A pronounced hysteresis phenomenon of target voltage, current, and deposition rate with increasing and decreasing O₂ flow rate was observed. The structure of films deposited at a metallic mode changes from Mg phase to the mixed Mg and MgO phase, and the films have a very rough surface. All the films deposited at oxide mode have high transparency and smooth surface, and show (2 2 0) preferred orientation growth. The refractive index and extinction coefficient at a wavelength of 670 nm for MgO films deposited at oxide mode with a O₂ flow rate of 3 sccm are 1.698 and 1.16×10⁻⁴, respectively. The secondary emission coefficient at a E/p of 57.8 V/(cm Torr) for MgO films deposited at a O₂ flow rate of 3 sccm is 0.16, which is higher than that of MgO films deposited by e-beam evaporation.     

Controlled assembly of DNA nanostructures on silanized silicon and mica surfaces for future molecular devices

In order to establish key technology for future molecular devices, we have explored the assembly behaviour of λ-deoxyribonucleic acid (DNA) molecules adsorbed on silanized mica and silanized oxide silicon surfaces by using atomic force microscopy (AFM). AFM experiments show that λ-DNA molecules can be hardly adsorbed on untreated mica and oxidized silicon surfaces, but can be strongly adsorbed onto aminosilanized mica and oxidized silicon surfaces. Importantly, DNA molecules can be assembled into linear DNA alignment, and can also self-assemble into various network structures on the silanized surfaces. Our experimental observations have demonstrated the feasibility of assembling DNA-based nanostructures by varying surface chemistry of substrates, and offer useful clues in constructing DNA-based nanodevices for nanoelectronics and biomolecular computation as well as quantum computation.     

Influence of surface temperature and surface modifications on the initial layer growth of para-hexaphenyl on mica (0 0 1)

Ultra-thin films of para-hexaphenyl (6P) were prepared on muscovite mica (0 0 1) utilizing organic molecular beam deposition (OMBD) under well defined ultra high vacuum (UHV) conditions. The 6P growth characteristics were studied as a function of substrate temperature and substrate surface conditions. For the initial state of layer growth, thermal desorption spectroscopy (TDS) was used to verify the existence of a wetting layer. In this monomolecular continuous wetting layer, the molecules lie flat on the surface and are rather strongly bonded. For thicker films, in-situ X-ray photoelectron spectroscopy (XPS) in combination with (TDS) was applied to reveal the kinetics of the layer growth. Ex-situ atomic-force microscopy (AFM) was used to determine the film morphology. In particular, the influence of surface modifications (carbon contamination, sputtering) on 6P layer growth was investigated. XPS and low energy electron diffraction (LEED) were used to characterize the mica surface before the film deposition. TDS and AFM revealed a considerable change in film growth, from a needle-like island growth of flat laying molecules on top of the wetting layer (for the air cleaved mica) to terrace-like film growth of standing molecules, without a wetting layer (after surface modifications).     

原子力显微镜扫描成像DNA分子

采用Mg2+处理DNA、APTES或戊二醛修饰云母表面、DNA拉直方法制备了λ-DNA及DNA-组蛋白复合物样品.室温下原子力显微镜以轻敲模式在空气中扫描样品成像.实验结果表明:AFM扫描成像的效果与样品的制备方法有关,同时也受操作因素影响.     

Electrode contact study for SiGe thin film operated at high temperature

A study on the electrode contact of the sputtered SiGe thin film is reported for application of devices working at high temperature. Surface morphological characterization with optical microscope and AFM (atomic force microscope) together with the electrical characterization by TLM measurements (transmission line method) were performed before and after aging at 500 °C for 24 h using various sputtered multilayer electrodes, Ti/Au/Ti, Ta/Pt/Ta and Ti/Pt/Ti, on 300-nm B-doped SiGe thin film deposited by magnetron sputtering and furnace crystallisation at high temperature. After aging at 500 °C for 24 h, the Ti/Au/Ti multilayer electrodes seriously degraded to be non-ohmic contact, showing rough surface morphology. The Ti/Pt/Ti metal layers showed the lowest specific contact, resistivity before and after aging, 1.46 × 10⁻³ Ω cm² and 1.68 × 10² Ω cm² respectively.