Proton and electron impact on molecular and atomic oxygen: I. High resolution fluorescence spectra in the visible and VUV spectral range and emission cross-sections for dissociative ionisation and excitation of

Molecular oxygen O₂ was dissociated in collisions with protons and electrons in the intermediate velocity range (p⁺-energies: 17-800 keV, e^--energies: 0.2-2 keV). Fluorescence from excited atomic and singly ionised fragments and from singly ionised molecules was detected in the VUV and in the visible and near UV spectral range. Highly resolved spectra are presented for the VUV (46-131 nm) and the near UV/visible (340-605 nm) spectral range. Absolute emission cross-sections have been determined for dissociative ionisation and excitation leading to fluorescence in the VUV. Results are compared with published data. Received 9 September 1999 and Received in final form 15 December 1999     

Electroluminescence from thin SiO2 layers after Si- and C-coimplantation

In this paper we explore the electroluminescence (EL) properties of thermally grown 350 nm thick SiO₂ layers co-implanted with Si⁺ and C⁺ ions. The implanted fluences were chosen in such a way that peak concentrations of excess Si and C of 5–10 at% were achieved. The devices show a broad photoluminescence (PL) between 2.0 and 3.2 eV with a main peak around 2.7 eV. The broad EL spectra show additional peaks around 3.3 eV and between 2.1 and 2.5 eV which are decreased with increasing Si/C concentration. The shape of the EL spectra does not change with increasing injection currents which implies that various types of defects occur for the different concentrations. The device stability is improved in comparison to Ge or Sn implanted oxide layers.     

Blue photo- and electroluminescence of silicon dioxide layers ion-implanted with group IV elements

The microstructural, optical and electrical properties of Si-, Ge- and Sn-implanted silicon dioxide layers were investigated. It was found, that these layers exhibit strong photoluminescence (PL) around 2.7 eV (Si) and between 3 and 3.2 eV (Ge, Sn) at room temperature (RT), which is accompanied by an UV emission around 4.3 eV. This PL is compared with that of Ar-implanted silicon dioxide and that of Si- and Ge-rich oxide made by rf magnetron sputtering. Based on PL and PL excitation (PLE) spectra we tentatively interpret the blue–violet PL as due to a T₁→S₀ transition of the neutral oxygen vacancy typical for Si-rich SiO₂ and similar Ge- or Sn-related defects in Ge- and Sn-implanted silicon dioxide. The differences between Si, Ge and Sn will be explained by means of the heavy atom effect. For Ge-implanted silicon dioxide layers a strong electroluminescence (EL) well visible with the naked eye and with a power efficiency up to 5×10^-4 was achieved. The EL spectrum correlates very well with the PL one. Whereas the EL intensity shows a linear dependence on the injection current over three orders of magnitude, the shape of the EL spectrum remains unchanged. The I-V dependence exhibiting the typical behavior of Fowler–Nordheim tunneling shows an increase of the breakdown voltage and the tunnel current in comparison to the unimplanted material. Finally, the suitability of Ge-implanted silicon dioxide layers for optoelectronic applications is briefly discussed. Received: 9 March 2000 / Published online: 30 June 2000     

Light-intensity dependence of slow-relaxation phenomena in semi-insulating GaAs

Quenching-only and quenching-enhancement phenomena in low-temperature photoconductivity (PC) of SI GaAs have been studied as a function of light intensity for photons in 1.0–1.2 eV energy range. Quenching-only of PC occurs only at high light intensities (above 10¹⁴ photons/cm² s) and reflects well-known bleaching of EL2 defects. On the contrary, the quenching-enhancement effect can be observed only for several orders of magnitude lower light intensities and neither the quenching nor the enhancement part of low-temperature evolution of PC is directly connected with EL2 defects, but reflects the time evolution of the occupancy of deep traps other than EL2. It was also found that bleaching of EL2 is quite an unefficient process.     

Infrared electroluminescence from a Si MOS structure with Ge in the oxide

We report on room-temperature infrared electroluminescence (EL) from metal-oxide-semiconductor devices made from Si. We compare the luminescence from RF sputtered oxide films containing SiO₂ with and without Ge by using a composite target and luminescence from a SiO₂ layer made by rapid thermal oxidation. The sputtered films were annealed in the temperature range 600-900 °C. This densifies the films and is likely to reduce the concentration of defects. A luminescence peak located around 1150-1170 nm is observed at current densities as low as 0.1 A/cm². The corresponding photon energy is close to that of the Si band gap. In addition, we observe several broad luminescence bands in the range 1000-1750 nm. These bands get stronger with Ge in the SiO₂ film. Some of these bands have previously been suggested and are directly associated with Ge. Since we observe that the intensity is correlated with the presence of Ge while the mere presence of the bands is not, we discuss the EL bands being due to defects which concentration is influenced by Ge in the oxide.     

Electrical characterization of defects introduced in n-GaAs by alpha and beta irradiation from radionuclides

We investigated defect production in n-type GaAs with two different free-carrier densities (4×10¹⁴ and 1×10¹⁶/cm³) by using particles liberated from radionuclides. ⁹⁰Sr and ²⁴¹Am were employed as beta and alpha sources, respectively. The results obtained for electron irradiation showed that the same set of primary defects can be produced by beta irradiation from the Sr source as by electrons produced in an accelerator. Similarly, the defects produced by alpha irradiation from the Am source closely resemble those introduced by alpha irradiation in a Van de Graaff accelerator. It was found that the relative concentrations of the primary defects in electron-irradiated GaAs are different to those in alpha-particle irradiated GaAs. Further, for the first time, an alpha irradiation induced defect which seems to be related to the doping concentration was observed in the 10¹⁶/cm³ Si doped GaAs. It is concluded that the use of radionuclides is an inexpensive and convenient method to introduce and to study radiation induced defects in semiconductors.     

Red electroluminescent process excited by hot holes in SrGa2S4:Ce, Mn thin film

This paper reports the first observation of red electroluminescence (EL) in SrGa₂S₄:Ce, Mn thin film. The EL spectrum consists of single broad emission band having a peak wavelength of 665 nm. The dominant EL decay time was 31 μs. The relationship between the applied voltage and the EL waveform was measured in single insulating thin film electroluminescent (TFEL) devices. An asymmetric EL waveform was observed in SrGa₂S₄:Ce, Mn TFEL devices under a rectangular applied voltage. The polarity of the EL waveform in these devices was different from the waveform in manganese-activated zinc sulfide ZnS:Mn devices. This indicates that hot holes excite the Mn²⁺ ions to cause the red EL.     

Blue organic electroluminescent devices based on a distyrylarylene derivative as emitting layer and a terbium complex as electron-transporting layer

With a blue distyrylarylene derivative, 4,4′-bis(2,2-di(2-methoxyphenyl)ethenyl)-1,1′-biphenyl (CBS) as emitting material, double-layer and triple-layer electroluminescent (EL) devices were fabricated. For the device using tris-(1-phenyl-3-methyl-4-isobutyryl-5-pyrozolone)-bis(triphenyl phosphine oxide) terbium (Tb(PMIP)₃(TPPO)₂) as the electron-transporting layer, blue EL emission with a maximum luminance of 253 cd/m² was achieved at 19 V. The difference of Tb(PMIP)₃(TPPO)₂ and tris(8-hydroxyquinolinate)aluminum (AlQ) as the electron-transporting materials in these devices were compared and discussed.     

Study on the bias-dependent effects of proton-induced damage in CdZnTe radiation detectors using ion beam induced charge microscopy

The influence of damage induced by 2 MeV protons on CdZnTe radiation detectors is investigated using ion beam induced charge (IBIC) microscopy. Charge collection efficiency (CCE) in irradiated region is found to be degraded above a fluence of 3.3 × 10¹¹ p/cm² and the energy spectrum is severely deteriorated with increasing fluence. Moreover, CCE maps obtained under the applied biases from 50 V to 400 V suggests that local radiation damage results in significant degradation of CCE uniformity, especially under low bias, i. e., 50 V and 100 V. The CCE nonuniformity induced by local radiation damage, however, can be greatly improved by increasing the detector applied bias. This bias-dependent effect of 2 MeV proton-induced radiation damage in CdZnTe detectors is attributed to the interaction of electron cloud and radiation-induced displacement defects.     

Influence of the electric characteristics of II–VI semiconductor material on the electroluminescence of lanthanide complex

The organic-inorganic combined structural device (ITO/PVK:Eu/ZnS/Al) is fabricated based on layered optimization scheme. II–VI semiconductor material ZnS is acted as an electron function (transporting and acceleration) layer. The hot electrons which have been accelerated in the ZnS layer directly impact excitation europium ions through resonant energy transfer and then recombine with injected holes to form excitons in PVK or EuTTA₂(N-HPA)Phen. Europium (Eu) ions may also be excited by intramolecular energy transfer from ligands. There are two kinds of excitation mechanisms: impacted excitation and injected recombination for the combined structural device. The electroluminescence (EL) intensity of the combined structural device is strongly improved and reaches up to 381 cd/m² at 20 V compared with the pure organic structural device. It may be an effective method to improve the EL intensity of the lanthanide complex by using electric characteristics of inorganic semiconductor materials.     

Gd3Ga5O12:Ag薄膜电致发光材料的制备及其发光性质

研究了Gd₃Ga₅O₁₂:Ag材料的制备及其发光性质.Gd₃Ga₅O₁₂:Ag材料通过固相反应法制得,采用X射线衍射法分 析了材料的结晶度及成分.用电子束蒸发将该材料制备成交流的薄膜电致发光器件,得到了 较好的蓝紫色发光,发光峰分别位于397和467nm.通过对材料的光致发光和激发光谱的研究 和比较,得出397和467nm分别来自于氧空位和Ag⁺的发光.     

Defect study of proton-irradiated liquid-encapsulated Czochralski GaAs using the positron-annihilation technique

The positron lifetime of undoped Liquid-Encapsulated Czochralski (LEC)-GaAs and Si-doped (1.3×10¹⁸ cm^–3) LEC-GaAs was measured before and after irradiation with protons (dose 1×10¹⁵/cm², 15 MeV). In Si-doped GaAs, the decrease of positron lifetime at temperatures between 10 and 300 K are due to the decrease of the positron-diffusion length and the increase of the effective shallow traps such as antisite Ga_As. The annealing stage of the proton-irradiation-induced defects which show the different behavior from that of electron-irradiation-induced defects suggests that proton irradiation creates more complicated defect complexes, containing vacancies rather than isolated vacancy-type defects or simple complexes which have been observed during electron-irradiation processes. Above 700 K, proton-irradiation-induced defects such as vacancy-type defects and simple vacancy complexes are almost annealed out, while Si-induced defects such as Si_Ga-V_Ga complexes cannot be annealed out above 973 K.     

Influence of high-energy electron irradiation on the transport properties of La1-xCaxMnO3 films ($$(x \approx 1/3)$$ )

The effect of crystal lattice disorder on the conductivity and colossal magnetoresistance in La_1-xCa_xMnO₃ ( ) films has been examined. The lattice defects are introduced by irradiating the film with high-energy ( MeV) electrons with a maximal fluence of about cm^-2. This comparatively low dose of irradiation produces rather small radiation damage in the films. The number of displacements per atom (dpa) in the irradiated sample is about 10^-5. Nevertheless, this results in an appreciable increase in the film resistivity. The percentage of the resistivity increase in the ferromagnetic metallic state (below the Curie temperature ) was much greater than that observed in the insulating state (above ). At the same time irradiation has much less effect on or on the magnitude of the colossal magnetoresistance. A possible explanation of such behavior is proposed. Received 21 July 1999 and Received in final form 27 December 1999     

Electrical characteristics of the rf-excited oxygen plasma-cathodization-grown SiO2/Si interface

The electrical properties of the SiO₂/n-type Si(100) interface, where the silicon-oxide layer was grown by an electrodeless rf oxygen-plasma-cathodization technique, were investigated usingC-V and DLTS methods. Interface traps with high density in the range of 10¹² eV^–1 cm^–2 and a capture cross section as large as 10^–18 cm² were found in the upper region of the silicon forbidden gap. After a post-annealing process, typically at 400°C for 30 min in dry N₂ atmosphere, their densities and capture cross sections were reduced to the range of 1–2 × 10¹¹ eV^–1 cm^–2 and 10^–19 cm^–2, respectively. Apparant differences in DLTS curves before and after thermal annealing were also observed. Results are qualitatively explained by considering the specific oxidation and annealing mechanism of this low-temperature silicon-oxidation technique.     

Blue electroluminescence of ytterbium clusters in SiO2 by co-operative up-conversion

Metal-oxynitride-oxide-silicon (MONOS) structures containing a SiO₂ layer implanted with different concentrations of ytterbium atoms were investigated. The electroluminescence (EL) measurements show that the MONOS:Yb devices can operate as blue or near infrared light emitters depending on the Yb concentration and annealing time. For an Yb concentration of up to 1.5% and annealing times of 30 min the near infrared EL with a peak at 975 nm corresponding to the ² F _5/2→² F _7/2 transition dominates. The short time annealed (6 s) sample containing 3% of Yb atoms exhibits mainly the blue EL due to co-operative up-conversion emission in the Yb³⁺–Yb³⁺ system. An enhancement of the red EL at 650 nm due to up-conversion energy transfer from the ²F_5/2 excited state to the nonbridging oxygen hole center (NBOHC) is also presented.     

Light figure studies of optical anisotropy induced by nanoscale spatial modulation in TlInS2

The incommensurate material, TlInS₂, with layer structure was studied by light figure spectroscopy techniques in spectral range 400-700 nm in temperature interval 80-350 K. Evolution of light figures with temperature in phase transition region was reliably established. The optic angle of TlInS₂ was found to be sample-dependent with essentially two types of critical behavior with temperature; peak-like behavior that was ascribed to a pure incommensurate phase and peak-free behavior that was attributed to the influence of the domains or defects. In latter case the samples showed symmetry forbidden rotation of optic plane with temperature. As a whole, the obtained results allow for a conclusion that incommensurate spatial modulation with correlation length at the nanoscale was contributing to biaxial anisotropy of TlInS₂ to a level of 10⁻³ versus 10⁻⁴ for basic lattice.     

Quenching of electroluminescence and charge trapping in high-efficiency Ge-implanted MOS light-emitting silicon diodes

Combined measurements of charge trapping and electroluminescence intensity as a function of injected charge and current have been carried out with the aim of clarifying the mechanisms of electroluminescence (EL) quenching in Ge-implanted ITO-SiO₂-Si light-emitting silicon diodes. Good correlation between the negative charge capture in traps of small effective capture cross-sections (σ_t1 ^e=1.7×10^-19 cm² and σ_t2 ^e=4.8×10^-20 cm²) located in SiO₂, and the quenching of the asymmetrical EL line with a maximum intensity at 400 nm has been observed. Similar correlation between the electron capture in traps with extremely small effective capture cross-section (σ_t3 ^e=5×10^-21 cm²) and the quenching of the EL line at 637 nm has been established. A quantitative model for the EL quenching has been developed, which takes into account the modification of the luminescent centers with subsequent electron capture at the newly generated traps. The model shows good agreement between simulation and experimental data. It also demonstrates that small effective capture cross-sections for electron charging during the EL quenching are determined by the probability of the luminescence centers (LCs) being disrupted, and enables one to estimate the Ge concentration associated with the EL at 400 nm. PACS 72.20.Jv; 73.40.Qv; 73.50.Gr     

Fabrication of p-CuGaS2/n-ZnO:Al heterojunction light-emitting diode grown by metalorganic vapor phase epitaxy and helicon-wave-excited-plasma sputtering methods

Greenish-white electroluminescence (EL) was observed from the heterojunction light-emitting diodes (LEDs) composed of p-type (001) CuGaS₂ chalcopyrite semiconductor epilayers and preferentially (0001)-oriented polycrystalline n-type ZnO thin films. The CuGaS₂ layers were grown on a (001) GaP substrate by metalorganic vapor phase epitaxy and the ZnO films were deposited by the surface-damage-free helicon-wave-excited-plasma sputtering method. The n-ZnO/p-CuGaS₂ LED structure was designed to enable an electron injection from the n-type wider band gap material forming a TYPE-I heterojunction. The EL spectra exhibited emission peaks and bands between 1.6 and 2.5 eV, although their higher energy portions were absorbed by the GaP substrate. Since the spectral lineshape resembled that of the photoluminescence from identical CuGaS₂ epilayers, the EL was assigned to originate from p-CuGaS₂.     

Electron excitation of neutral and ionic levels in Townsend discharges of argon at high E/N

We have measured the emission coefficients of the 3p levels of ArI: 3p₁, 3p₅, 3p₆, 3p₇, 3p₈, and 3p₁₀. The data for the 3p₅, 3p₆, 3p₇, 3p₈ and 3p₁₀ levels were converted to excitation coefficients by using quenching coefficients from the literature. Measurements were performed in the range of E/N between to above except for the 3p₇ level where measurements were done only up to . The data for the emission coefficients for Ar II levels include two 4p' levels with terms ² P ⁰ _1/2 and ² F ⁰ _7/2, and three 4p levels with terms ² P ⁰ _1/2, ⁴ P ⁰ _5/2 and ² D ⁰ _5/2. The measurements for the ionic levels were done for E/N above up to nearly . The absolute values of the coefficients were obtained from the intensity of the light emitted at the anode in the parallel plate self-sustained Townsend argon discharges. For low E/N the apparent emission coefficients (i.e. the normalized spatial profile of emission) for both neutral and ionic levels increase exponentially in almost the entire discharge gap. At about the exponentially increasing signal was obtained only near the anode, while at the spatial dependence was flat throughout the electrode gap. Received: 18 January 1999 / Received in final form: 12 April 1999     

Characterization of defect type and dislocation density in double oxide heteroepitaxial CeO2/YSZ/Si(001) films

In order to qualitatively and quantitatively analyze the structural defects including the defect types and their concentrations in oxide heteroepitaxial films, a new X-ray rocking-curve width-fitting method was used in the case of doubleCeO₂/YSZ/Si (YSZ=yttria-stabilized ZrO₂) films that were prepared by pulsed laser deposition. Two main defect types, angular rotation and oriented curvature, were found in both CeO₂ and YSZ. Dislocation densities of CeO₂ and YSZ, which were obtained from the angular rotations, are functions of the YSZ thickness. A distinct two-step correlation between dislocation densities of CeO₂ and YSZ was found that as the dislocation density of YSZ is higher than 2.4×10¹¹ cm^-2, the dislocation density of CeO₂ shows a high sensitivity with that of YSZ compared with the low relativity in lower dislocation density (<2.4×10¹¹ cm^-2). In addition, YSZ always has higher dislocation densities and oriented curvatures than CeO₂ in each specimen, which can be attributed to the smaller mosaic domain sizes in YSZ than in CeO₂ as observed by high-resolution transmission electron microscopy. Received: 12 August 2002 / Accepted: 14 August 2002 / Published online: 4 December 2002 RID="*" ID="*"Corresponding author. Fax: +81-3/5734-3369, E-mail: chun_hua_chen@hotmail.com