用于四结电池的InGaAsN材料研究

随着InGaP2/InGaAs/Ge三结太阳电池技术日趋成熟,具有更高理论效率的基于GaAs体系的四结电池新材料AlInGaP/InGaAs/?(新材料)/Ge已经受到人们的关注,经过计算,要求新材料的禁带宽度应该为0.95eV～1.05eV.InxGa1-xAs1-xNy材料的禁带宽度可以调整为0.95eV～1.05eV,是有望实现突破的材料.我们通过选取合适的生长方案,在D180MOCVD系统上外延生长了InxGa1-xAs1-yNy材料,并通过高分辨X光双晶衍射仪、分光光度计以及电化学电容-电压(EC-V)测试仪等对材料性能进行了分析.获得了室温下禁带宽度为1.17eV的InxGa1-xAs1-xNy材料.     

一个实用的生产用Ⅲ-Ⅴ族化合物半导体材料Turbo-Disc MOCVD生长模型

在MOCVD质量控制生长模式下,通过分析Ⅲ-Ⅴ族化合物半导体材料在衬底表面的反应过程,建立了一个实用的生长模型.此模型是基于分子动力学、化学反应热力学理论分析之上的.针对Turbo-Disc 反应体系,分析了Turbo-Disc 的传热以及质量传送模式后, 建立了Turbo-Disc的生长模型.在此模型中建立了输入反应室的参数(IPs)和边界层的生长参数的关系.在对组分匹配的GaInP/GaAs 三组分生长体系进行分析时,发现此模型是非常有效的,理论计算的结果与实验得到的结果非常吻合.应用此模型在实际生产中可以迅速地得到匹配的多组分外延层.     

95%氧化铝陶瓷烧结过程中的表面晶粒织构生长及相场法仿真

本文报道了一种CaO+SiO₂共添加的95%氧化铝陶瓷烧结过程中表面呈现的晶粒织构生长现象:(006)晶面平行于样品表面的晶粒优先生长.对该现象的机理进行了讨论:这可能和(006)晶面形成的表面具有更低表面能有关.采用多相场模型,将表面能的差异归于自由能密度的差异中,对95;氧化铝陶瓷烧结过程中出现了表面晶粒织构生长进行了仿真研究,得到的仿真结果与个别取向的晶粒优先生长的实验结果一致.     

0.6Ca0.61La0.26TiO3-0.4La(Mg0.5Ti0.5)O3介质陶瓷微波烧结的晶粒生长动力学研究

采用微波烧结制备了0.6Ca0.61La0.26TiO3-0.4La(Mg0.5Ti0.5)O3[0.6CLT-0.4LMT]陶瓷,研究烧结工艺对其显微结构和晶粒生长行为的影响,并采用线性回归方法建立了Hillert模型和Sellars简化模型,采用非线性回归方法建立了具有时间指数的Sellars-Anelli模型.结果 表明,随着烧结温度的升高、保温时间越长,晶粒尺寸越大,且烧结温度对晶粒生长的影响更为明显.对三种模型预测的晶粒尺寸与实验结果的平均晶粒尺寸进行了误差分析,发现Hillert模型对该陶瓷的预测精度最低,Sellars-Anelli模型对该陶瓷的预测精度最高.由Sellars-Anelli模型得到的0.6CLT-0.4LMT陶瓷的晶粒生长动力学方程为d4.718=d04.718 +4.516×1033×t0.888×exp[-1 059 682/(RT)],能够有效预测0.6CLT-0.4LMT陶瓷微波烧结的晶粒生长过程.     

垂直Bridgman法变速生长Hg1-xMnxTe晶体

在固液界面迁移理论和SODCM模型(二次反扩散补偿法)的基础上,本文提出采用垂直Bridgman法变速生长Hg1-xMnxTe晶体,并从理论和实验两方面对该方法的可行性进行了验证.与传统垂直Bridgman法的对比实验结果表明,该方法可以在提高轴向组分均匀性的前提下增大抽拉速度,进而提高晶体生长速度.     

生长温度对InAs/GaAs量子点太阳电池的影响研究

InAs/GaAs量子点的生长形貌和特性受不同生长环境和生长条件影响.本文借助光致发光光谱(PL)特性表征方法,通过实验生长,对比研究不同生长温度下获得的量子点性能,结合当前三结叠层GaInP/GaAs/C-e(2-terminal)电池存在的问题,以及该电池的设计、制作要求,分析了InAs量子点的不同生长温度对于具有量子点结构的中电池吸收的影响.     

C/SiC复合材料表面SiC/Zr-Si-C/SiC复合涂层的制备及性能研究

为提高C/SiC复合材料的抗氧化性能,设计了致密的CVD-SiC涂层和多孔的熔盐法Zr-Si-C涂层相间的涂层体系.通过实验测试,建立了该涂层的生长模型,并考核了材料在1773 K的抗氧化性能.氧化结果显示,材料在氧化2h后的失重率为仅0.67;,弯曲强度保留率为99.7;,不同组成相间的结构涂层呈现出优异的抗氧化性能.     

CuCl2·2H2O晶体聚集体形貌及晶体模型的建立

本文通过斜方晶系水溶性晶体CuCl2·2H2O的生长实验,得到了晶体聚集体,观察了结晶形貌,探讨了该晶体聚集体形貌中蕴含的结晶学规律,建立了该晶体在理想情况下的聚集体的结晶学模型.在该模型中,晶体生长方向为[001],发育晶面为(100)、(010)和(110),形成聚集体形貌时晶体结合的共格晶界分别为(012)与(0 10 1)、(103)与(120 1)和(112)与(991)或(113)与(1313 1).试验观察验证了模型的正确性.     

溶液中结晶生长的动力学模拟:化学键合方法

基于化学键合的角度对晶体生长过程的理解,提出了一个由动力学因素控制的形貌预测模型.该模型同时考虑了晶体内部结构和环境生长因素对晶体最终形貌的影响.对磷酸二氢钾 (KDP) 和磷酸二氢铵 (ADP) 晶体在不同动力学条件下的生长形貌进行了理论模拟,所预测的结果与实验观测结果基本一致.同时比较了相同过饱和度条件下KDP和ADP晶体的生长形貌,认为晶体局部成键性质不同是导致两者形貌差异的根本原因.本文通过对动力学因素控制的生长形貌的分析,为实际晶体生长过程中的形貌调控研究及应用提供理论依据.     

一个实用的生产用Ⅲ-V族化合物半导体材料Turbo-DiscMOCVD生长模型(英文)

在MOCVD质量控制生长模式下 ,通过分析Ⅲ -V族化合物半导体材料在衬底表面的反应过程 ,建立了一个实用的生长模型。此模型是基于分子动力学、化学反应热力学理论分析之上的。针对Turbo -Disc反应体系 ,分析了Turbo -Disc的传热以及质量传送模式后 ,建立了Turbo -Disc的生长模型。在此模型中建立了输入反应室的参数 (IPs)和边界层的生长参数的关系。在对组分匹配的GaInP/GaAs三组分生长体系进行分析时 ,发现此模型是非常有效的 ,理论计算的结果与实验得到的结果非常吻合。应用此模型在实际生产中可以迅速地得到匹配的多组分外延层。     

Large area lateral overgrowth of mismatched InGaP on GaAs(111)B substrates

Application of InGaAs/InGaP double‐heterostructure (DH) lasers increases the band offset between the cladding layer and the active layer more than the use of conventional 1.3 µm InGaAsP/InP lasers. As a first step in realizing 1.3 µm InGaP/InGaAs/InGaP DH lasers, we proposed InGaP lattice‐mismatched epitaxial lateral overgrowth (ELO) technique and successfully carried out the InGaP growth on both GaAs (100), (111)B and InP (100) substrates by liquid phase epitaxy. In this work, we grew the InGaP crystal on GaAs (111)B substrate by adjusting Ga and P composition in In solution, to obtain In_0.79Ga_0.21P (λ = 820 nm) virtual substrate for 1.3 µm InGaAs/InGaP DH lasers. To grow the InGaP all over the lateral surface of the substrate, the growth time was extended to 6 hours. The amount of InGaP lateral growth up to 2 hours was gradually increased, but the lateral growth was saturated. The InGaP lateral width was about 250 µm at the growth time of 6 hours. We report the result that optical microscope observation, CL and X‐ray rocking curve measurements and reciprocal lattice space mapping were carried out to evaluate the crystal quality of the grown InGaP layers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Electron microscopy of epitaxial structures of pseudobinary A III B V solid solutions and the model of nonequilibrium ordering in epitaxial growth

The results of the electron microscopy studies of self-modulated GaAlAs, GaAsP, and InGaP layers have been generalized, and the laws governing the self-oscillatory growth of these materials have been formulated. The growth characteristics under the autocatalysis conditions were established from a computer simulation of the epitaxial process. It is demonstrated that the autocatalytic model of crystallization corresponds to the experimental characteristics of self-modulation. The anomalies in electron microscopy images of the boundaries were revealed, which can be interpreted only with the invocation of the autocatalytic model. The reliabilities of various theoretical self-modulation models are also discussed.     

Precise structure control of GaAs/InGaP hetero-interfaces using metal organic vapor phase epitaxy and its abruptness analyzed by STEM

Fabrication of abrupt InGaP on GaAs (InGaP/GaAs) and GaAs on InGaP (GaAs/InGaP) hetero-interfaces has been difficult using metal organic vapor phase epitaxy (MOVPE) due to the exchange of P and As during the fabrication steps. Indium (In) surface segregation during InGaP growth also degrades the abruptness. Here, the MOVPE gas-switching sequence to fabricate atomically abrupt hetero-interfaces was optimized and the effects of this optimization on the hetero-interface abruptness were quantitatively evaluated using the Z-contrast method with scanning transmission electron microscopy (STEM). Results revealed that (a) in the fabrication of InGaP/GaAs hetero-interface, the GaAs top layer should be stabilized using As-source gas supply, and the excess As layer on GaAs should be terminated using an additional supply of Ga species, and (b) in the fabrication of GaAs/InGaP interface, the InGaP layer should be grown using the flow modulation method to suppress In surface segregation. In conclusion, the abruptness of hetero-interfaces of InGaP/GaAs and GaAs/InGaP was improved by using these optimized gas-switching sequences.     

Structural and optical characterization of MOVPE grown InGaP/GaAs MQWs for advanced photovoltaic devices

The optimization of the electronic properties of InGaP/GaAs MQWs, to be inserted in multilayers heterostructure for novel photovoltaic devices, was performed by structural, optical and photoelectrical measurements. Different sequences of nominally undoped InGaP and GaAs alternated layers were grown by low-pressure metalorganic vapour phase epitaxy, employing tertiarybutylarsine and tertiarybutylphosphine as metalorganic precursors for the V-group elements. In order to minimize the As/P exchange effect, the interface In segregation, and to control the whole lattice matching, single and multi-quantum wells (MQWs) with different: (i) periods, (ii) well widths, (iii) growth temperatures, (iv) gas-switching sequences at the interfaces and (v) indium concentrations in the InGaP alloy, were prepared and investigated. The interface sharpness and the compositional fluctuation of thick MQW region containing up to 40 well-barrier sequences were investigated for the modelling, realization and evaluation of test structures based on low-dimensional systems for third generation solar cells.     

Gettering Properties of Praseodymium in InGaP LPE Growth

Praseodymium (Pr) is added to the InGaP growth melt during Liquid Phase Epitaxy (LEP) for the first time. The epilayers are grown by using a supercoling method, on (100) Cr-doped Semi-Insulating (SI) GaAs substrates at a growth temperature of 790°C. An examination of the electrical properties reveals that, depending on the amount of Pr in the growth melt, n-tpye InGaP epilayers with room temperature electron concentrations in the range of 3.4 × 10¹⁶ cm⁻³ to 5.3 × 10¹⁵ cm⁻³ and electron mobilities from 730 to 1310 cm²/Vs can be prepared. The photoluminescence spectral results show that by increasing the amount of Pr in the growth melt, smaller Full Width at Half Maximum (FWHM) values and better band edge (BE) recombination intensities result.     

Luminescence characteristics of InAlP---InGaP heterostructures having native-oxide windows

Data are presented on the luminescence characteristics of InGaP/InAlP heterostructures with oxidized InAlP cladding layers grown by metalorganic chemical vapor deposition. The structures are grown on GaAs substrates and consist of either a 20 nm thick In_0.5Ga_0.5P quantum well or a 0.75 μm InGaP layer sandwiched between two InAlP bulk barriers or between two 10-period In_0.5Al_0.5P/In_xGa_1−xP strain-modulated superlattice heterobarriers, where x varies from 0.5 to 0.45 and the period of the superlattice is 3 nm. The top InAlP cladding layer of the InAlP/InGaP heterostructures is oxidized for 2–5.5 h at 500°C in an ambient of H₂O vapor saturated in a N₂ carrier gas. Photoluminescence and time-resolved photoluminescence studies at room temperature show that, as a result of the oxidation of a portion of the top InAlP cladding layer, the photoluminescence emission intensity and lifetime from the InGaP QWs increase significantly.     

MOVPE-grown high CW power InGaAs/InGaAsP/InGaP diode lasers

Al-free InGaAs/InGaAsP/InGaP laser structures grown by MOVPE have yielded new records in performance. CW front-facet-emitted powers of 5.8 W are achieved from optimized double-quantum-well lasers with 100 μm wide stripes and 1 mm long cavity lengths. Devices with a 0.5 mm cavity length exhibit total power conversion efficiencies as high as 59%. A novel facet passivation technique, consisting of laser-assisted deposition of ZnSe, is shown to increase the COD level by 50%. Single-mode, CW output powers of 400 mW are obtained from triple-core ARROW lasers fabricated by a two-step MOVPE growth process.     

Microampere laser threshold at 80°C with InGaAs/GaAs/InGaP buried heterostructre strained quantum well lasers

An extremely low CW threshold current of 670 μA and a high slope efficiency of 0.14 W/A at a high junction temperature of 80°C were obtained with a 200 μm long Al-free InGaAs/GaAs/InGaP buried heterostructure (BH) quantum well laser grown by three-step metal organic vapor phase epitaxy (MOVPE). The maximum energy conversion efficiency of a 500 μm long laser was as high as 50% at a output power level of 1 mW. Regrowth conditions of InGaP layers were found to be crucial for planarizing the grown surface to realize the high performances.     

Polarisation characteristics of visible VCSELs

Vertical cavity surface emitting lasers (VCSELs) based on InGaP lase in the visible close to 650 nm. The polarisation characteristics of these devices are unlike other VCSELs in that they are stable and reproducible and show no switching with increased current. We describe the polarisation characteristics for such devices where the structures were grown on different orientation wafers. We show that polarisation selectivity increases directly with the degree of spontaneous ordering in the InGaP quantum wells, but not with the wafer offset angle.     

Carbon background in P-based III-V semiconductors grown by metalorganic molecular beam epitaxy using ethyl-metalorganic sources

Electrical properties of InP, GaP, InGaP and AlGaP, grown by metalorganic molecular beam epitaxy (MOMBE) using ethyl-metalorganics (triethyl-indium, -gallium and -alluminum), are discussed in connection with the carbon background. More C atoms are incorporated into epilayers in the order of AlGaP, GaP and InP. The C atoms act as accepters in AlGaP and GaP epilayers, but they probably work as donors in InP. InGaP showed highly resistive or compensated possibly due to the amphoteric nature of C atoms.