水热沉积电压对ZrSiO4抗氧化涂层显微结构及抗氧化性能的影响

以硅酸锆粉体为原料,异丙醇为溶剂,碘为荷电介质,采用水热电泳沉积法在C/C-SiC复合材料基体表面制备了硅酸锆外涂层。通过X射线衍射(XRD)、扫描电子显微镜(SEM)对涂层的晶相结构和微观形貌进行表征。研究了水热电泳沉积电压对涂层的显微结构及高温抗氧化性能的影响,并分析了涂层试样在1 773 K下静态空气中的氧化行为。结果表明：电泳沉积电压在160~200 V范围内,复合涂层的致密程度、厚度及抗氧化性能随着沉积电压的升高而提高。但沉积电压过高(220 V),复合涂层中出现微裂纹等缺陷,此时涂层的抗氧化性能下降。沉积电压控制在200 V时所制备的复合涂层可在1 773 K静态空气中有效保护C/C复合材料332 h,氧化失重率仅为0.2%,相应的氧化失重速率稳定在48.3 μg·cm^-2·h^-1的极低水平。     

以微凝胶模板合成P(AM-co-DMC)/SiO2杂化粒子

以聚(丙烯酰胺-co-甲基丙烯酰氧乙基三甲基氯化铵)[P(AM-co-DMC)]微凝胶为模板,TMOS为硅前驱体,中性水环境下合成了一系列P(AM-co-DMC)/SiO2有机-无机杂化粒子.对杂化粒子的大小、形态及表面形貌等进行研究,发现微凝胶对杂化粒子的形态和大小起主导作用,SiO2在模板上沉积,即使经过灼烧依然保持模板的形态;TMOS的用量对杂化粒子的性质也有重要影响——用量少时,得到的杂化粒子表面粗糙,增加用量会使表面变得光滑.杂化粒子经过灼烧后,表面会变得更加粗糙.     

电泳沉积技术在生物合金上的应用

电泳沉积(EPD)是目前广泛应用于增加医用金属合金生物相容性以及耐蚀性的一种简便的涂层技术.该技术能够在复杂形貌基体上形成可控厚度的膜层,因此可有效应用于增加不锈钢、钛合金、镁合金等医用金属合金的生物相容性.本文介绍了电泳沉积技术原理、优缺点以及影响因素,同时也对电泳沉积技术在不同合金上沉积不同的功能涂层进行了综述.     

SiO2纳米粒子对溶胶凝胶涂层性能的影响

在高强钢表面制备了防护性溶胶凝胶涂层,并研究了不同浓度二氧化硅纳米粒子的加入对于涂层形貌、耐蚀性和硬度的影响。采用扫描电子显微镜(SEM)和电子能谱(EDS)观察了涂层的微观结构和成分;采用显微硬度计测试了涂层的硬度;采用电化学方法研究了二氧化硅纳米粒子的浓度对于涂层耐蚀性能的影响;采用傅里叶红外光谱研究涂层的化学结构,进而探讨了二氧化硅纳米粒子对于涂层的强化机理。结果显示涂层加入二氧化硅纳米粒子的最佳浓度为500 mg.L-1,此条件下的涂层表面均匀致密,有较高的硬度并且在3.5%NaCl溶液中体现出较好的耐蚀作用。纳米粒子在溶胶中反应形成活性羟基基团并与硅烷发生反应生成空间网状结构,从而强化涂层。     

莫来石抗氧化外涂层的制备及抗氧化性能

以莫来石粉体(3Al2O3·2SiO2)为原料,采用水热电泳沉积法在C/C-SiC复合材料表面制备了莫来石外涂层。借助XRD和SEM等对涂层的晶相组成和显微结构进行了表征。研究了水热沉积电压对莫来石外涂层相组成、形貌及高温抗氧化性能的影响。结果表明:外涂层主要由莫来石晶相组成。当沉积电压控制在120~180 V范围内时,莫来石外涂层的致密程度、厚度及抗氧化性能随着沉积电压的升高而提高。当沉积电压达到210 V时,制备的外涂层出现疏松、裂纹等缺陷,抗氧化性能减弱。抗氧化测试表明与包埋法制备的SiC-C/C涂层试样相比,莫来石-SiC-C/C涂层试样的抗氧化性能明显提高。当沉积电压为180 V时,制备的复合涂层试样可在1500℃的空气气氛下有效保护C/C复合材料164 h,其失重仅为1.75%。     

钛基表面纳米羟基磷灰石涂层的电泳沉积

应用沉淀法合成纳米羟基磷灰石,并以电泳沉积法在粗糙化的钛表面制备纳米结构的羟基磷灰石涂层.纳米涂层有利于保持羟基磷灰石的化学组成和结构,制备的涂层均匀并且无裂缝,烧结后涂层仍保持纳米结构,其烧结温度也明显降低。钛表面经化学处理后,可形成很多微孔和TiO2薄层,增强了涂层和基体之间的结合.涂层的结合力为 18±2. 5MPa,硬度和杨式模量分别为 32. 0和 2. 4GPa.     

自组织多孔海绵状有机-无机杂化二氧化硅

经由溶胶.凝胶过程,利用硅试剂制备出新颖的多孔海绵状有机-无机杂化二氧化硅.使用冷场发射扫描电镜(FESEM),表征了多种反应条件下样品的形貌.这种杂化二氧化硅海绵体能快速吸收水和有机溶剂,每克能吸收12.2 mL溶剂.     

电化学沉积羟基磷灰石过程晶体生长行为

采用恒电流电化学沉积方法从含钙与磷盐水溶液中直接在纯金属钛电极表面沉积纳米羟基磷灰石涂层,运用EDS、SEM、XRD、FTIR等方法对其进行表征. 重点考察了一种典型制备条件下钙磷沉积层的形貌、结构及组分随沉积时间的变化,进而探讨相应条件下电化学沉积羟基磷灰石涂层晶体生长过程的基本规律. 研究表明电化学沉积法可用于在医用金属表面直接涂覆含钙离子缺陷的纳米羟基磷灰石涂层,典型条件下涂层的生长规律为: (1)沉积过程中羟基磷灰石晶粒以c轴方向沿沉积面法线方向择优生长,且这一趋势延续整个沉积过程; (2)内层晶粒的生长受到外层晶粒生长的抑制, 对于同层的晶粒,当晶粒分布密集时,晶粒生长可能发生相互制约; (3)随沉积时间的延长,沉积量增加,而膜层的化学组成基本不发生变化.     

具有超疏水表面的硅/二氧化硅层次结构薄膜

目前报道的硅基材料的超疏水表面主要是通过制备粗糙微观结构,并在其表面修饰表面能相对较低的有机物两个步骤来实现的,在户外等实际环境中应用时存在由于表面修饰有机物的降解而逐渐失去超疏水性的问题.本工作以液态金属锡作为生长衬底,通过化学气相沉积(CVD)法制备了一种具有超疏水性能的硅基薄膜结构.利用扫描电镜(SEM),透射电镜(TEM)以及X射线衍射(XRD)等手段对产物的表面形貌和组成结构进行分析发现,薄膜表面由竖直生长的硅/二氧化硅(Si/SiO2)核壳层次结构组成.采用Cassie理论模型对其超疏水性能的产生提出了可能的解释.发现构成薄膜表面的Si/SiO2层次结构单元的形貌是影响超疏水性能的重要因素.相对于以前报道的硅基材料的超疏水表面,这种新结构的超疏水性能不依赖于表面化学修饰,有望拓宽硅基材料的应用环境.     

Cd基化合物纳米晶-有机聚合物杂化太阳能电池研究进展

有机-无机杂化太阳能电池因其结合了有机材料和无机材料各自的优势而引起了人们的广泛关注和研究. Cd基化合物纳米晶因其具有制备方法简单、尺寸及形貌可控、载流子迁移率高和稳定性好等优点而成为最早被研究的一类无机受体. 本文介绍了有机-无机杂化太阳能电池的结构及原理, 分析了影响有机-无机杂化太阳能电池效率的三个主要因素, 分别是开路电压(V_oc)、短路电流(J_sc)和填充因子(FF). 从改善Cd基化合物纳米晶的合成方法, 增加Cd基化合物纳米晶和有机聚合物间的界面接触, 以及优化Cd基化合物纳米晶和有机聚合物所用溶剂和所占比例等方面阐述了近年来Cd基化合物纳米晶-有机聚合物杂化太阳能电池的研究进展. 并展望了Cd基化合物纳米晶-有机聚合物杂化太阳能电池的发展方向.     

Investigation of nucleation processes under the influence of magnetic fields

The present work demonstrates the possibilities and the limits of the in situ electrochemical scanning tunneling microscopy for investigation of nucleation processes in magnetic fields on the examples of Cu and Co electrodeposition onto Au(111) electrodes from sulfate electrolytes with pH 3. Cyclic voltammograms of Cu in the underpotential range (UPD) exhibit no significant change in the cathodic and anodic peaks recorded in magnetic fields parallel to the surface. In magnetic fields of a permanent magnet, the reconstruction of Au has been annihilated during UPD of Cu. In the overpotential range, the dissolution of Cu is inhibited. This triggers the formation of a Cu–Au surface alloy. The UPD deposition of Co onto Au(111) could be proven without magnetic field, which leads to the formation of two monolayers. The nucleation in an applied field could not be observed due to higher induced fluctuations and microconvective effects. Contribution to special issue “Magnetic field effects in Electrochemistry”.     

Bismuth underpotential deposition on tellurium

Electroless underpotential deposition (UPD) of Bi adatoms (Bi_ad) on Te by Bi^III reduction with Ti^III in aqua solution has been investigated. Comparison studies of electroless Bi UPD on Te and of a corresponding electrochemical process have been performed. Bi_ad stability on Te under the open-circuit conditions has been investigated.     

Palladium Deposition on Pt Surface by Reduction of Pd2+ Ions with Organic Substances

It has been demonstrated that Pd²⁺ ions can be reduced onto Pt surface in the presence of organic materials but only at a very low Cl^– ion activity. Unlike rhenium deposition, Pd deposition may proceed after the formation of an adsorbed Pd monolayer and bulk deposits are formed on the Pt surface.     

Influence of the degree of surface oxidation of polycrystalline Rh electrodes on the underpotential deposition of Cu

The underpotential deposition of copper onto polycrystalline rhodium was studied as a function of the degree of oxidation of the electrode surface in acidic media using potentiodynamic techniques. Surface oxidation of the rhodium electrode was carried out using a triangular sweep potential between E _L (lower limit) and E _U (upper limit: 0.94≤E _U≤1.4 V). Cu electrodeposition was performed at the same time as the total or partial reduction of the oxidized species. The surface oxides produced at E _U≤1.09 V were completely reduced during Cu electrodeposition. In this case, the potentiodynamic I-E patterns for oxidative dissolution of Cu were characterized by three anodic peaks located at 0.41 V (peak I), 0.47 V (peak II) and 0.59 V (peak III) and the coverage degree by Cu, θ_Cu, was on the order of a monolayer. Surface oxides produced at E _U>1.09 V were partially reduced during the copper electrodeposition. In this case, the I-E profiles exhibited only two anodic peaks (II and III) and θ_Cu was <1. The Rh-oxygen species that remain on the electrode surface block the active sites of lower energy and modify the binding energy of strongly adsorbed Cu. Electronic Publication     

Bond energies in alloys determined from underpotential deposition potentials

A procedure is presented to determine bond energies between the metal (Me) and substrate (S) components of binary alloys from characteristic underpotential deposition (UPD) potentials. The bond energy between Me and S atoms is one of the factors governing the deposition kinetics and structure of Me-S alloy deposits. The proposed procedure is based on the determination of the UPD potential for formation of a condensed two-dimensional (2D) phase of the less noble metal Me (the UPD metal) on the more noble metal S (the substrate). Making reasonable approximations, the sublimation enthalpy of the condensed 2D Me phase is obtained from the corresponding formation underpotential. From this sublimation enthalpy the bond energy of an atom of the UPD metal in a kink site position of the 2D Me phase is calculated. This value is used to calculate the bond energy (_Me-S) between an Me atom and an S atom. The method is demonstrated using experimental data obtained in selected electrochemical UPD systems.     

Atomic-Scale Designing of Zeolite Based Catalysts by Atomic Layer Deposition

Zeolite-supported catalysts have been widely used in the field of heterogeneous catalysis. Atomic-scale governing the metal or acid sites on zeolites still encounters great challenge in controllable synthesis and developing of novel catalysts. Atomic layer deposition (ALD), owing to its unique character of self-limiting surface reactions, becomes one of the most promising and controllable strategies to tailor the metallic deposition sites in atomic scale precisely. In this review, we present a comprehensive summary and viewpoint of recent research in designing and engineering the structural of zeolite-based catalysts via ALD method. A prior focus is laid on the deposition of metals on the zeolites with emphasis on the isolated states of metals, followed by introducing the selected metals into channels of zeolites associates with identifying the location of metals in and/or out of the channels. Subsequently, detailed analysis of tailoring the acid sites of different zeolites is provided. Assisted synthesis of zeolite and the regioselective deposition of metal on special sites to modify the structures of zeolites are also critically discussed. We further summarize the challenges of ALD with respect to engineering the active sites in heterogeneous zeolite-based catalysts and provide the perspectives on the development in this field.     

Atomic and Molecular Layer Deposition as Surface Engineering Techniques for Emerging Alkali Metal Rechargeable Batteries

Alkali metals (lithium, sodium, and potassium) are promising as anodes in emerging rechargeable batteries, ascribed to their high capacity or abundance. Two commonly experienced issues, however, have hindered them from commercialization: the dendritic growth of alkali metals during plating and the formation of solid electrolyte interphase due to contact with liquid electrolytes. Many technical strategies have been developed for addressing these two issues in the past decades. Among them, atomic and molecular layer deposition (ALD and MLD) have been drawing more and more efforts, owing to a series of their unique capabilities. ALD and MLD enable a variety of inorganic, organic, and even inorganic-organic hybrid materials, featuring accurate nanoscale controllability, low process temperature, and extremely uniform and conformal coverage. Consequently, ALD and MLD have paved a novel route for tackling the issues of alkali metal anodes. In this review, we have made a thorough survey on surface coatings via ALD and MLD, and comparatively analyzed their effects on improving the safety and stability of alkali metal anodes. We expect that this article will help boost more efforts in exploring advanced surface coatings via ALD and MLD to successfully mitigate the issues of alkali metal anodes.     

灰污热流探针模拟锅炉受热面灰沉积的研究

基于傅里叶导热定律,设计了一简单实用的灰污热流探针,以神木煤、黄陵煤、新汶水煤浆和新汶黑液水煤浆为研究对象,在0.25MW热态实验炉上用灰污热流探针模拟了灰沉积过程,研究了四种燃料灰沉积过程中的热流变化特性和灰沉积机理。结果表明,灰污探针能很好地模拟不同燃料的灰污形成过程,模拟结果与实际情况相吻合;灰粒的沉积速率和吸收热流的衰减速率主要取决于燃料本身特性,同时也受烟气温度的影响;通过对探针上灰污的表观物理特性、微观结构、元素构成和矿物相的分析,发现四种燃料的灰沉积机理是不同的,黑液水煤浆灰污中Na、K含量较高,主要物相为熔融温度很低的富Na霞石和无水芒硝,黄陵煤灰污含有较高的Fe、Ca、S,而水煤浆燃烧时Fe的沉积和富集是灰污形成的主要因素;四种实验燃料中,黑液水煤浆和黄陵煤的结渣趋势强于神木煤和水煤浆。     

Glow discharge deposition of tetramethylsilane films

Thin films have been deposited in a low-pressure glow discharge of tetramethylsilane. The study of the deposition kinetics has shown that the determining parameter is the ratio W/P_TMS of the RF power over the TMS partial pressure. The role of oxygenated impurities present in the starting monomer is emphasized. High values of the W/P_TMS ratio give films of low oxygen content as shown by IR spectroscopy measurements (<5% of Si-O bonds). These films have high densities (1.7–2 g/cm³) and refractive indices (1.7) and are similar to amorphous hydrogenated silicon carbide films. On the contrary, low values of W/P_TMS result in the formation of a significant amount of Si-O bonds which are formed at the expense of Si-H bonds. The deposited films show lower densities (0.98–1.6 g/cm³) and lower refractive indices (1.47). It is postulated that this oxygen, which affects the kinetics and the film properties, comes from oxygenated pollutants (H₂O) carried along with the monomer, and that its concentration depends on the temperature of the TMS cooling bath.     

Pulsed Laser Deposition ZnS Buffer Layers for CIGS Solar Cells

Polycrystalline ZnS films were prepared by pulsed laser deposition （PLD） on quartz glass substrates under different growth conditions at different substrate temperatures of 20, 200, 400, and 600 ℃, which is a suitable alternative to chemical bath deposited （CBD） CdS as a buffer layer in Cu（In,Ga）Se2 （CIGS） solar cells. X-ray diffraction studies indicate the films are polycrystalline with zinc-blende structure and they exhibit preferential orientation along the cubic phase β-ZnS （111） direction, which conflicts with the conclusion of wurtzite structure by Murali that the ZnS films deposited by pulse plating technique was polycrystalline with wurtzite structure. The Raman spectra of grown films show Al mode at approximately 350 cm^-1, generally observed in the cubic phase β-ZnS compounds. The planar and the cross-sectional morphology were observed by scanning electron microscopic. The dense, smooth, uniform grains are formed on the quartz glass substrates through PLD technique. The grain size of ZnS deposited by PLD is much smaller than that of CdS by conventional CBD method, which is analyzed as the main reason of detrimental cell performance. The composition of the ZnS films was also measured by X-ray fluorescence. The typical ZnS films obtained in this work are near stoichiometric and only a small amount of S-rich. The energy band gaps at different temperatures were obtained by absorption spectroscopy measurement, which increases from 3.2 eV to 3.7 eV with the increasing of the deposition temperature. ZnS has a wider energy band gap than CdS （2.4 eV）, which can enhance the blue response of the photovoltaic cells. These results show the high-quality of these substitute buffer layer materials are prepared through an all-dry technology, which can be used in the manufacture of CIGS thin film solar cells.