粗糙界面对Bi2Te3/PbTe超晶格热电优值影响的理论分析

以Bi2Te3/PbTe超晶格薄膜为例,分析电子在Bi2Te3量子阱中的输运过程,综合了薄膜的经典散射效应和理想量子效应,并以此混合效应为基础,在PbTe障碍层厚度一定时,模拟计算了两种混合效应中量子效应占不同比例时,Bi2Te3/PbTe超晶格热电优值的变化.在镜面反射占混合效应的0 3时,得到的热电优值与当前报道的量子阱超晶格的实验值接近.     

石墨烯/Bi0.5Sb1.5Te3柔性热电薄膜及其面内散热器件的设计制备与性能评价

基于柔性热电薄膜制冷的面内散热技术有望为电子器件高效面内散热提供解决方案,但柔性热电薄膜电输运性能太低和面内散热器件结构设计困难严重制约了该技术在电子元器件散热中的应用.本文通过在环氧树脂/Bi_0.5Sb_1.5Te₃柔性热电薄膜中掺入具有同时调控电热输运行为功能的石墨烯,发现不仅有助于Bi_0.5Sb_1.5Te₃晶粒沿(000l)择优取向,而且还提供了载流子快速传输通道,石墨烯/Bi_0.5Sb_1.5Te₃柔性热电薄膜的载流子浓度和迁移率同时显著增大;石墨烯掺入量为1.0%的柔性热电薄膜室温最高功率因子达到1.56 mW/(K~2·m),与环氧树脂/Bi_0.5Sb_1.5Te₃柔性热电薄膜相比提高了71%,其最大制冷温差提高了1倍.利用这种高性能石墨烯/Bi_0.5Sb_1.5Te_3...     

Bi-Sb-Te基热电薄膜温差电池离子束溅射制备与表征

本文采用离子束溅射Bi/Te和Sb/Te二元复合靶,直接制备n型Bi₂Te₃热电薄膜和p型Sb₂Te₃热电薄膜.在退火时间同为1 h的条件下,对所制备的Bi₂Te₃薄膜和Sb₂Te₃薄膜进行不同温度的退火处理,并对其热电性能进行表征.结果表明,在退火温度为150 ℃时,制备的n型Bi₂Te₃关键词： 薄膜温差电池 2Te₃薄膜')" href="#">Sb₂Te₃薄膜 2Te₃薄膜')" href="#">Bi₂Te₃薄膜 离子束溅射     

n型Bi2–xSbxTe3–ySey基化合物的缺陷结构调控与电热输运性能

Bi₂Te₃基化合物是目前室温附近性能最好的热电材料,但其存在着大量复杂的缺陷结构,缺陷工程是调控材料热电性能的核心手段,因此理解和有效地调控缺陷形态和浓度是获得高性能Bi₂Te₃基热电材料的关键.本文系统地研究了四元n型Bi_2-xSb_xTe_3-ySe_y基化合物的缺陷演化过程及其对热电输运性能的影响规律.Sb和Se的固溶引入的带电伴生结构缺陷使得材料的载流子浓度发生了巨大变化,在Bi_2-xSb_xTe_2.994Cl_0.006样品中,Sb的固溶降低了反位缺陷Sb_Te2形成能,诱导产生了反位缺陷Sb_Te2,使得少数载流子空穴浓度从2.09×10¹⁶ cm^-3增加至3.99×10¹⁷ cm^-3,严重劣化了...     

Bi2Te3拓扑绝缘体表面颗粒化铅膜诱导的超导邻近效应

拓扑绝缘体的出现为寻找拓扑超导体和Majorana费米子提供了一种可能的途径. 在拓扑绝缘体Bi₂Te₃表面沉积极薄的不连续铅膜, 试图通过邻近效应感应出大片的超导区, 为下一步研究拓扑超导电性创造条件.借助四引线电输运测量实验, 在0.25 K的低温下看到了超流现象, 表明沉积在Bi₂Te₃表面的厚度小于20 nm的颗粒化铅膜能够诱导邻近效应, 并且使大片Bi₂Te₃超导. 关键词： 超导邻近效应 S-N-S结 拓扑绝缘体     

TeI4掺杂量对n型Bi2Te3基烧结材料热电性能的影响

采用区熔法结合放电等离子体快速烧结(SPS)技术制备了n型Bi₂Te₃基热电材料.在300—500K的温度范围内测量了各热电性能参数，包括电导率(σ)、塞贝克系数(α)和热导率(κ)，研究了掺杂剂TeI₄的含量(质量百分比分别为0，0.05，0.08，0.10，0.13和0.15wt%)对热电性能的影响.结果表明：试样的载流子浓度(n)随TeI₄含量增加而增大，使电导率增大、塞贝克系数的绝对值先增大而后减小，从而导致品质因子(α²σ)呈先增加后降低的变化趋势；同时，由于异质离子(I^-)以及载流子对声子的散射作用增强，可显著降低其晶格热导率.烧结材料的性能优值(ZT=α²σT/κ)对应于TeI₄含量为0.08wt%有其最大值，约为0.92.此外，烧结材料的抗弯强度增加至80MPa左右，从而可以显著改善材料的可加工性以及元器件的使用可靠性. 关键词： 2Te₃')" href="#">Bi₂Te₃ 放电等离子体快速烧结 热电性能     

高压烧结法制备Bi2Te3纳米晶块体热电性能的研究

用高压烧结法对水热法制备的Bi₂Te₃纳米线及纳米颗粒粉体进行了压制成型, 并与真空热压法制备的样品进行了形貌和热电性能的比较. 研究表明, 高压烧结样品内的晶粒尺寸明显小于热压样品. 热电性能的研究表明, 高压烧结样品的电阻率、赛贝克系数和热导率均优于真空热压样品. 由纳米线粉体高压烧结的样品其热电优值ZT 在室温时达到了0.5, 高于真空热压样品的值, 表明高压烧结是热电材料纳米粉体成型的一种有效方法.     

n型Bi2Te3基化合物的类施主效应和热电性能

晶粒细化是提高Bi₂Te₃基热电材料力学性能的重要方法,但晶粒细化过程中伴随的类施主效应严重劣化了材料的热电性能,并且一旦产生类施主效应,就很难通过简单的热处理等工艺消除.本文系统研究n型Bi₂Te₃基化合物烧结前粉体颗粒尺寸对材料类施主效应和热电性能的影响规律.随着颗粒尺寸减小,氧诱导的类施主效应明显增强,载流子浓度从10 M烧结样品的3.36×10¹⁹ cm^-3急剧增加到120 M烧结样品的7.33×10¹⁹ cm^-3,严重偏离最佳载流子浓度2.51×10¹⁹ cm^-3,热电性能严重劣化.当粉体颗粒尺寸为1—2 mm时,烧结样品的Seebeck系数为–195 μV/K,载流子浓度为3.36×10¹⁹ cm^-3,与区熔样品沿着ab面方向的Seebeck系数为–203 μV/K和载流子浓度为2.51×10¹⁹     

a-Si ∶H/SiO2多量子阱材料制备及其光学性能和微结构研究

利用等离子体增强化学气相沉积技术制备了a-Si ∶H/SiO₂多量子阱结构材料.对a-Si ∶H/SiO₂多量子阱样品分别进行了3种不同的热处理,其中样品经1100 ℃高温退火可获得尺寸可控的nc-Si:H/SiO₂量子点超晶格结构,其尺寸与非晶硅子层厚度相当.比较了a-Si ∶H/SiO₂多量子阱材料与相同制备工艺条件下a-Si ∶H材料的吸收系数,在紫外/可见短波段前者的吸收系数明显增大,光学吸收边蓝移,说明该材料 关键词： 多量子阱 量子限制效应 光学吸收 能带结构     

纳米SiO2复合对Mg3Sb2基材料热电性能的影响

Mg₃(Sb,Bi)2基热电材料由于其优异的热电性能和较低的成本近来受到广泛的关注.本研究通过将纳米SiO₂复合进成分为Mg_3.275Mn_0.025Sb_1.49Bi_0.5Te_0.01的基体相中,考察其热电输运性能的变化及机制.结果表明,当SiO₂复合进Mg₃Sb₂基材料中时,由于引进大量的微小晶界,能有效地散射声子,促使晶格热导率降低,优化热输运性能,如SiO₂体积含量为0.54%时,室温时热导率由复合前的1.24 W/(m·K)降至1.04 W/(m·K),降幅达到15%;同时其对电子也产生强烈的散射作用,导致迁移率和电导率大幅下滑,结果表现为近室温区功率因子剧烈衰减,恶化了电输运性能.电性能相对于热性能较大降低幅度使得材料在整个测试温区的热电优值没有得到改善.纳米SiO₂作为Mg₃Sb₂     

Bi2Te3/Sb超晶格纳米线的外延生长和热电测量

通过脉冲电沉积,外延生长出小单元长度的Bi₂Te₃/Sb超晶格纳米线.借助哈曼方法,测量了超晶格纳米线阵列的热电性能,330 K时的ZT值可达0.15.研究了Bi₂Te₃/Sb超晶格纳米线阵列器件的制冷或者加热能力,发现器件的上下表面的最大温差可以达到6.6 K.     

Thermoelectric properties of Bi2Se3/Bi2Te3/Bi2Se3 and Sb2Te3/Bi2Te3/Sb2Te3 quantum well systems

In this work, we develop a theory of thermoelectric transport properties in two-dimensional semiconducting quantum well structures. Calculations are performed for n-type 0.1 wt.% CuBr-doped Bi₂Se₃/Bi₂Te₃/Bi₂Se₃ and p-type 3 wt.% Te-doped Sb₂Te₃/Bi₂Te₃/Sb₂Te₃ quantum well systems in the temperature range 50–600 K. It is found that reducing the well thickness has a pronounced effect on enhancing the thermoelectric figure of merit (ZT). For the n-type Bi₂Se₃/Bi₂Te₃/Bi₂Se₃ with 7 nm well width, the maximum value of ZT is estimated to be 0.97 at 350 K and for the p-type Sb₂Te₃/Bi₂Te₃/Sb₂Te₃ with well width 10 nm the highest value of the ZT is found to be 1.945 at 440 K. An explanation is provided for the resulting higher ZT value of the p-type system compared to the n-type system.     

Electrical transport and high thermoelectric properties of PbTe doped with Bi2Te3 prepared by HPHT

In this paper, n-type lead telluride (PbTe) compounds doped with Bi₂Te₃ have been successfully prepared by high pressure and high temperature (HPHT) technique. The composition-dependent thermoelectric properties of PbTe doped with Bi₂Te₃ have been studied at room temperature. The figure-of-merit, Z, for PbTe is very sentivite to the dopants, which could be improved largely although the doped content of Bi₂Te₃ is very small (<0.08 mol%). In addition, the maximum value reaches to 9.3×10⁻⁴ K⁻¹, which is about 20% higher than that of PbTe alloyed with Bi₂Te₃ sintered at ambient pressure (7.6×10⁻⁴ K⁻¹) and several times higher than that of small grain size PbTe containing other dopants. The improved thermoelectric performance in this study may be due to the effect of high pressure and the low lattice thermal conductivity resulting from Bi₂Te₃ as source of dopants.     

制备工艺对p型碲化铋基合金热电性能的影响

利用区熔法、机械合金化、放电等离子烧结(SPS)技术、热压法等多种工艺制备了p型碲化铋基热电材料.在300—500K的温度范围内测量了各热电性能参数，包括电导率(σ)、塞贝克系数(α)和热导率(κ)，研究了制备工艺对热电性能的影响.结果表明，所制备的块体材料与同组成区熔晶体相比，性能优值ZT均有不同程度的提高.其中，利用区熔法结合SPS技术可获得热电性能最佳的块体材料，其ZT值达1.15. 关键词： 碲化铋 放电等离子烧结 区熔法 热电性能     

Anomalous increase of the thermopower and thermoelectric figure of merit in Ga-doped <Emphasis Type="Italic">p</Emphasis>-(Bi<Subscript>0.5</Subscript>Sb<Subscript>0.5</Subscript>)<Subscript>2</Subscript>Te<Subscript>3</Subscript> single crystals

The effect of Ga doping on the temperature dependences (5 K ≤ T ≤ 300 K) of the Seebeck coefficient α, electrical conductivity σ, thermal conductivity coefficient κ, and thermoelectric figure of merit Z of p-(Bi_0.5Sb_0.5)₂Te₃ single crystals has been investigated. It has been shown that, upon Ga doping, the hole concentration decreases, the Seebeck coefficient increases, the electrical conductivity decreases, and the thermoelectric figure of merit increases. The observed variations in the Seebeck coefficient cannot be completely explained by the decrease in the hole concentration and indicate a noticeable variation in the density of states due to the Ga doping.     

Investigation of the possibilities for increasing the thermoelectric figure of merit of nanostructured materials based on Bi2Te3-Sb2Te3 solid solutions

The transport coefficients and thermoelectric figure of merit ZT for bulk nanostructured materials based on Bi₂Te₃-Sb₂Te₃ solid solutions have been investigated theoretically. Similar materials prepared by rapid quenching of the melt with the subsequent grinding and sintering contain amorphous and nanocrystalline regions with different sizes of particles. According to the performed estimations, the thermoelectric figure of merit of the amorphous phase can exceed the value of ZT for the initial solid solution by a factor of 2?C3 primarily due to the significant decrease in the thermal conductivity. The effective transport coefficients of the medium as a whole have also been investigated as a function of the parameters of each phase, and the concentration range of the amorphous phase, which corresponds to the effective values ZT > 1, has been determined.     

Thermoelectric properties of nano-bulk bismuth telluride prepared with spark plasma sintered nano-plates

The pursuit for a high-performance thermoelectric n-type bismuth telluride-based material is significant because n-type materials are inferior to their corresponding p-type materials in highly efficient thermoelectric modules. Herein, to improve the thermoelectric performance of an n-type Bi₂Te₃, we prepared Bi₂Te₃ nano-plates with a homogeneous sub-micron size distribution and thickness range of about a few tens of nanometers. This was achieved using a typical nano-chemical synthetic method, and the prepared materials were then spark plasma sintered to fabricate n-type nano-bulk Bi₂Te₃ samples. We observed a significant enhancement of the anisotropic electrical transport properties for the nano-bulk sample with a higher power factor along the in-plane direction (24.3?μW?cm^?1?K^?2 at 300?K) than that along the out-of-plane direction (8.1?μW?cm^?1?K^?2 at 300?K). However, thermal transport properties were insensitive along the measured direction for the nano-bulk sample. We used a dimensionless figure of merit ZT to calculate the thermoelectric performance. The results showed that the maximum ZT value of 0.69 was achieved along the in-plane direction at 440?K for the nano-bulk n-type Bi₂Te₃ sample, which was however smaller than that of the previously reported n-type samples (ZT of 1.1). We believe that a further enhancement of the ZT value in the fabricated nano-bulk sample could be accomplished by effectively removing the surface organic ligand of the Bi₂Te₃ nano-plate particles and optimizing the spark plasma sintering conditions, maintaining the nano-plate morphology intact.     

Study of the microstructure influence on the transport properties of Bi86.5Sb13.5 polycrystalline alloy

This study is focused on the investigation of the transport properties of Bi_86.5Sb_13.5 polycrystalline alloys. Bulk materials were prepared by cold pressing ultrafine powders of alloy and by annealing the resulting pellets. Special care was taken to avoid contamination of the powders. Starting with powders of average grain size of 0.06 μm bulk semi-conducting sample with mean grain size respectively of 0.1, 0.8, 2.5 and 200 μm were obtained. The influence of the grain size on both electrical resistivity, thermal conductivity, thermoelectric power, thermoelectric figure of merit is presented within the range 80-330 K. The thermoelectric properties are discussed and compared with those of single crystals presented in previous studies.     

Pulsed laser deposition of Bi2Te3 thermoelectric films

Bi₂Te₃ is one of the most used materials for thermoelectric applications at ambient temperature. An improvement of thermoelectric performances through a suitable modification of electron and phonon transport mechanisms is predicted for low dimensional or nanostructured systems, but this requires a control of the material structure down to the nanoscale. We show that pulsed laser deposition provides control on film composition, phase and structure, necessary for a comprehension of the relationship between structure and thermoelectric properties. We have explored the role of deposition temperature, background inert gas type and pressure, laser fluence and target-to-substrate distance and we found the experimental condition ranges to obtain crystalline films containing the Bi₂Te₃ phase only, by comparing energy dispersive X-ray spectroscopy, Raman spectroscopy and X-ray diffraction analysis. Variations of substrate temperature and deposition gas pressure prove to be crucial also for the control of film morphology and crystallinity. Substrate type has no influence on film stoichiometry and crystallinity, but highly oriented growth can be achieved on mica due to van der Waals epitaxy.