MOCVD生长GaN:Si单晶膜的研究

获得高质量的ｎ型ＧａＮ单晶膜是制作ＧａＮ基光电子器件的关键之一。采用立式ＭＯＣＶＤ系统生长ＧａＮ：Ｓｉ单晶膜,通过优化生长工艺,获得了电子载流于浓度高达２ ×１０１９ｃｍ－３,迁移率达１２０ｃｍ２／Ｖ·ｓ的ｎ型ＧａＮ：Ｓｉ单晶膜;并有效地抑制了ＧａＮ中由深能级引起的黄带发射,大大提高带边发光强度。研究结果还表明：随着Ｓ掺杂量的增大,ＧａＮ：Ｓｉ单晶膜的电子载流于浓度增加,迁移率下降,Ｘ光双晶衍射峰半高宽增大。首次报道了随掺Ｓ量增大,ＧａＮ：Ｓｉ单晶膜的生长速率显著下降的现象。     

MOCVD生长的未掺杂GaN的结晶特性与补偿度关系的研究

对本实验室用ＭＯＣＶＤ方法生长的未故意掺杂的ＧａＮ单晶膜进行了结晶性能、电学性能研究。结果表明,室温时ＧａＮ的Ｘ射线双晶衍射半高宽与其补偿度有较强的依赖关系。高补偿的ＧａＮ的Ｘ射线双晶衍射半高宽较宽。低补偿的ＧａＮ的Ｘ射线双晶衍射半高宽较窄。     

MOCVD生长的GaN单晶膜的蓝带发光研究

对实验室用ＭＯＣＶＤ方法生长的未掺杂ＧａＮ单晶膜的发光性能进行了研究。结果表明：在室温时未掺杂ＧａＮ单晶出现的能量为２．９ｅＶ左右蓝带发光与被偿度有较强的依赖关系。高补偿ＧａＮ的蓝带发射强,低补偿ＧａＮ的蓝带发射弱。对蓝带发光机理进行了探讨,认为蓝 导带电子过至受主能级的发光（ｅＡ发光）。观察到降低ＧａＮ补偿度能提高ＧａＮ带边发射强度。     

NSRL在表面化学中的同步辐射研究进展

综述了国家同步辐射实验室在表面化学的同步辐射研究中的部分新进展，其中包括碱金属Ｋ和稀土金属Ｇｄ对半导体表面氧化和氮化的催化作用；ＧａＡｓ（１００）半导体表面采用ＣＨ３ＣＳＮＨ２硫钝化的新方法，稀土金属Ｇｄ在半导体表面的吸附及界面形成；一种新的氧化镁薄膜的制备方法。     

表面增强拉曼光谱研究硫脲衍生物与ClO_4~-的共吸附行为

表面增强拉曼光谱研究硫脲衍生物与ＣｌＯ－４的共吸附行为顾仁敖１姚建林１袁亚仙１钟起玲２田中群３（１苏州大学化学系苏州２１５００６）（２江西师范化学系南昌３３００２７）（３厦门大学固体表面物理化学国家重点实验室，化学系厦门３６１００５）Ｓｕｒｆａｃｅ...     

新型蓝光衬底材料LiAlO_2晶体的生长和缺陷分析

ＬｉＡｌＯ２和ＧａＮ的晶格失配率只有１．４％，是一种很有希望的ＧａＮ外延生长衬底材料。本文利用温度梯度法生长出了透明的ＬｉＡｌＯ２单晶，并通过化学浸蚀、光学显微镜、透射电子显微镜、同步辐射Ｘ射线貌相术对晶体中的缺陷进行了检测。结果表明：ＬｉＡｌＯ２在钼坩埚中无籽晶自由凝固结晶时，是沿（１００）方向生长。用温度梯度法生长的ＬｉＡｌＯ２晶体质量良好，晶体中无气泡和包裹物。在ＬｉＡｌＯ２（１００）晶面上测得的位错密度为（３．８～６．０）×１０４ｃｍ－２，晶体中的主要缺陷为亚晶界或镶嵌结构，可能是由于温场不稳定、生长速率太快造成的。     

南京大学“近代声学”国家重点实验室

南京大学“近代声学”国家重点实验室南京大学“近代声学”国家重点实验室由著名声学家魏荣爵院士任学术委员会名誉主任，张淑仪院士任学术委员会主任，王耀俊教授任实验室主任．实验室主要研究方向为（１）非线性声学，（２）凝聚态物质中声与物质相互作用，（３）光声学...     

新型蓝光衬底材料LiAlO2晶体的生长的缺陷分析

ＬｉＡｌＯ２和ＧａＮ的晶格失配率只有１．４％，是一种很有希望的ＧａＮ外延生长衬底材料。本文利用温度梯度法生长出透明的ＬｉＡｌＯ２单晶，并通过化学浸蚀、光学显微镜、透射电子显微镜、同步辐射Ｘ射线貌相术对晶体中的缺陷进行了检测。结果表明：ＬｉＡｌＯ２在钼坩埚中无籽晶自由凝固结日地，是沿（１００）方向生长。用温度梯度法生长的ＡｉＡｌＯ２晶体质量良好，晶体中无气泡和包裹物，在ＬｉＡｌＯ２（１００）方向晶面     

Abinitio方法研究2，4－二甲基－1，3－戊二烯稳定构象的拉曼光谱

Ａｂｉｎｉｔｉｏ方法研究２，４－二甲基－１，３－戊二烯稳定构象的拉曼光谱赵冰，赵永年，陶艳春，吴梦月，李学奎（吉林大学分子光谱与分子结构开放实验室）（吉林大学超硬材料国家重点实验室）（吉林大学理论化学计算国家重点实验室长春１３００２３）ＡｂＩｎｉｔｉ...     

高质量GaN外延薄膜的生长

综述了高质量ＧａＮ外延薄膜的生长研究工作的最新重要进展．主要采用的新工艺为：在较低温度下生长ＧａＮ缓冲层后再高温生长ＧａＮ外延薄膜,双气流金属有机化合物气相沉积（ＭＯＣＶＤ）,以及用开有窗口的ＳｉＯ２膜截断穿过位错后横向覆盖外延生长（ｅｐｉｔａｘｉａｌｙｌａｔｅｒａｌｏｖｅｒｇｒｏｗｔｈ）．Ｘ射线衍射和高分辨电镜研究证实,上述工艺使ＧａＮ外延薄膜质量得到显著提高．利用这种薄膜研制成的蓝色激光管即将投放市场．     

KDP晶体拉曼散射角度特性

利用群理论详细分析了磷酸二氢钾(KDP)晶体的拉曼振动模式,得出了其拉曼振动模的归类。并采用拉曼光谱仪测量了Z切退火KDP晶体X(ZZ)珡X,Z(XY)珚Z和Y(XY)X三种散射配置和未退火KDP晶体Z(XY)珚Z配置下的拉曼光谱。根据拉曼选择定则得出X(ZZ)珡X,Z(XY)珚Z和Y(XY)X散射配置下的拉曼峰分别对应A1,B2(LO),B2(TO)对称类振动模,但在Z(XY)珚Z配置下的拉曼光谱中除了B2模,还观察到了A1模,而在Y(XY)X配置下的拉曼光谱中只有B2模,且退火和未退火晶体Z(XY)珚Z配置下的拉曼光谱无明显差别,此结果表明KDP晶体的对称性降低,在背向散射时A1模也具有角度特性,但与晶体的内应力无关,这是由KDP晶体内部结构决定的。     

Study on the relationships between Raman shifts and temperature range for α-plane GaN using temperature-dependent Raman scattering

In this paper,Raman shifts of a-plane GaN layers grown on r-plane sapphire substrates by low-pressure metal-organic chemical vapor deposition(LPMOCVD) are investigated.We compare the crystal qualities and study the relationships between Raman shift and temperature for conventional a-plane GaN epilayer and insertion AlN/AlGaN superlattice layers for a-plane GaN epilayer using temperature-dependent Raman scattering in a temperature range from 83 K to 503 K.The temperature-dependences of GaN phonon modes(A1(TO),E2(high),and E1(TO)) and the linewidths of E2(high) phonon peak are studied.The results indicate that there exist two mechanisms between phonon peaks in the whole temperature range,and the relationship can be fitted to the pseudo-Voigt function.From analytic results we find a critical temperature existing in the relationship,which can characterize the anharmonic effects of a-plane GaN in different temperature ranges.In the range of higher temperature,the relationship exhibits an approximately linear behavior,which is consistent with the analyzed results theoretically.     

SiN插入层对GaN外延膜应力和光学质量的影响

研究了MOCVD系统中原位SiN插入层对GaN薄膜应力和光学性质的影响。采用SiN插入层后,GaN薄膜的裂纹数量大大减少,薄膜所承受的张应力得到了一定的释放。同时,GaN薄膜的缺陷密度降低一倍,晶体质量得到了极大的改善。研究表明,位错密度的降低在GaN薄膜中留存较大的残余应力,补偿了降温过程中所引入的张应力。同样,随着SiN插入层的应用,低温PL谱的半峰宽降低,薄膜光学质量提高。最后研究了PL谱发光峰与应力的关系,得到了一个-13.8的线性系数。     

The influence of an SixNy interlayer on a GaN film grown on an Si（lll） substrate

<正>A method to drastically reduce dislocation density in a GaN film grown on an Si(111) substrate is newly developed. In this method,the Si_xN_y interlayer which is deposited on an A1N buffer layer in situ is introduced to grow the GaN film laterally.The crack-free GaN film with thickness over 1.7 micron is successfully grown on an Si(111) substrate. A synthesized GaN epilayer is characterized by X-ray diffraction(XRD),atomic force microscope(AFM),and Raman spectrum.The test results show that the GaN crystal reveals a wurtzite structure with the(0001) crystal orientation and the full width at half maximum of the X-ray diffraction curve in the(0002) plane is as low as 403 arcsec for the GaN film grown on the Si substrate with an Si_xN_y interlayer.In addition,Raman scattering is used to study the stress in the sample.The results indicate that the Si_xN_y interlayer can more effectively accommodate the strain energy.So the dislocation density can be reduced drastically,and the crystal quality of GaN film can be greatly improved by introducing an Si_xN_y interlayer.     

Temperature dependence of biaxial strain and its influence on phonon and band gap of GaN thin film

Hexagonal GaN epilayer grown on sapphire substrate by metal organic chemical vapour deposition (MOCVD) is studied using Raman scattering and photoluminescence in a temperature range from 100\,K to 873\,K. The model of strain (stress) induced by the different lattice parameters and thermal coefficients of epilayer and substrate as a function of temperature is set up. The frequency and the linewidth of $E_2^{\rm high}$ mode in a GaN layer are modelled by a theory with considering the thermal expansion of the lattice, a symmetric decay of the optical phonons, and the strain (stress) in the layer. The temperature-dependent energy shift of free exciton A is determined by using Varshni empirical relation, and the effect of strain (stress) is also investigated. We find that the strain in the film leads to a decreasing shift of the phonon frequency and an about 10meV-increasing shift of the energy in a temperature range from 100\,K to 823\,K.     

The effect of single A1GaN interlayer on the structural properties of GaN epilayers grown on Si （111） substrates

High-quality and nearly crack-free GaN epitaxial layer was obtained by inserting a single AlGaN interlayer between GaN epilayer and high-temperature AlN buffer layer on Si (111) substrate by metalorganic chemical vapor deposition. This paper investigates the effect of AlGaN interlayer on the structural properties of the resulting GaN epilayer. It confirms from the optical microscopy and Raman scattering spectroscopy that the AlGaN interlayer has a remarkable effect on introducing relative compressive strain to the top GaN layer and preventing the formation of cracks. X-ray diffraction and transmission electron microscopy analysis reveal that a significant reduction in both screw and edge threading dislocations is achieved in GaN epilayer by the insertion of AlGaN interlayer. The process of threading dislocation reduction in both AlGaN interlayer and GaN epilayer is demonstrated.     

GaN外延层中的缺陷对光学性质的影响

用金属有机化合物气相外延（ＭＯＶＥＰ）方法生长具有不同表面形貌的非掺杂ＧａＮ，并对部分样品的外延层表面进行镜面加工．用阴极射线发光、光散射和拉曼散射方法观察ＧａＮ中深能级发光、缺陷散射光分布和拉曼散射光频移．结果表明，缺陷不但影响ＧａＮ的发光和光散射，而且影响拉曼频移     

气相外延GaN的拉曼散射

测量了在蓝宝石衬底上气相外延生长GaN的拉曼散射谱.除观察到已被确认的两个E2,一个A1(TO)和一个E1(TO)声于振动以外,在734±3cm-1处观察到一个散射峰且从实验上确认其为GaN的纵向光学声子模E1(LO).而且发现其强度与外延层晶体质量密切相关.A1(TO)和高频E2散射峰相对强度变化显示不同生长条件引起的外延层质量的变化.     

The influence of SixNy interlayer on GaN film grown on Si(111) substrate

A method to drastically reduce dislocation density in a GaN film grown on an Si(111) substrate is newly developed. In this method, the Si_xN_y interlayer which is deposited on an AlN buffer layer in situ is introduced to grow the GaN film laterally. The crack-free GaN film with thickness over 1.7 micron is grown on an Si(111) substrate successfully. Synthesized GaN epilayer is characterized by X-ray diffraction (XRD), atomic force microscope (AFM), and Raman spectrum. The test results show that the GaN crystal reveals a wurtzite structure with the <0001> crystal orientation and the full width at half maximum of the X-ray diffraction curve in the (0002) plane is as low as 403 arcsec for the GaN film grown on the Si substrate with an Si_xN_y interlayer. In addition, Raman scattering is used to study the stress in the sample. The results indicate that the Si_xN_y interlayer can more effectively accommodate the strain energy. So the dislocation density can be reduced drastically, and the crystal quality of GaN film can be greatly improved by introducing Si_xN_y interlayer.     

氮化铝单晶薄膜的ECR PEMOCVD低温生长研究

采用电子回旋共振等离子体增强金属有机物化学气相沉积（ECR－PEMOCVD）技术，在c轴取向的蓝宝石即α Al2O3（0001）衬底上，以氮化镓（GaN）缓冲层和外延层作为初始层，分别以高纯氮气（N2）和三甲基铝(TMAl)为氮源和铝源低温生长氮化铝（AlN）薄膜.并利用反射高能电子衍射（RHEED）、原子力显微镜（AFM）和x射线衍射（XRD）等测量结果，研究了氢等离子体清洗、氮化和GaN初始层对六方AlN外延层质量的影响，从而获得解理性与α Al2O3衬底一致的六方相AlN单晶薄膜，其XRD半高宽为1 关键词： AlN 氢等离子体清洗 氮化 GaN