Study of depth-dependent tetragonal distortion of quaternary AIInGaN epilayer by Rutherford backscattering/channeling

<正>A 240-nm thick Al_0.4In_0.02Ga_0.58N layer is grown by metal organic chemical vapour deposition,with an over 1-μm thick GaN layer used as a buffer layer on a substrate of sapphire（0001）.Rutherford backscattering and channeling are used to characterize the microstructure of AlInGaN.The results show a good crystalline quality of AlInGaN(x_min= 1.5%) with GaN buffer layer.The channeling angular scan around an off-normal（1213） axis in the {1010} plane of the AlInGaN layer is used to determine tetragonal distortion e_T,which is caused by the elastic strain in the AlInGaN.The resulting AlInGaN is subjected to an elastic strain at interfacial layer,and the strain decreases gradually towards the near-surface layer.It is expected that an epitaxial AlInGaN thin film with a thickness of 850 nm will be fully relaxed （e_T=0）.     

Characterization of tetragonal distortion in a thick Al0.2Ga0.8N epilayer with an AIN interlayer by Rutherford backscattering/channeling

An Al0.2Ga0.8N/AlN/Al0.2Ga0.8N heterostructure was grown by metalorganic chemical vapor deposition on a sapphire （0001） substrate with a thick （〉 1 μm） GaN intermediate layer. The Al composition was determined by Rutherford backscattering （RBS）. Using the channeling scan around an off-normal [1213] axis in the （1010） plane of the Al0.2Ga0.8N layer, the tetragonal distortion eT, which is caused by the elastic strain in the epilayer, is investigated. The results show that eT in the high-quality Al0.2Ga0.8N layer is dramatically released by the AIN interlayer from 0.66% to 0.27%.     

Tetragonal distortion of InAsPSb film grown on InAs substrate studied by Rutherford backscattering/channeling and synchrotron X-ray diffraction

Rutherford backscattering/channeling spectrometry and synchrotron X-ray diffraction are employed to characterize the structural properties of the InAsPSb epilayer grown on the InAs substrate. The results indicate that a 975-nm thick InAs_0.668P_0.219Sb_0.113 layer has a quite good crystalline quality (χ_min=6.1%). The channeling angular scan around an off-normal 〈1 1 1〉 axis in the (0 1? 1) plane of the sample is used to determine the tetragonal distortion e_T, which is caused by elastic strain in the layer. The results show that the InAsPSb layer is subjected to an elastic strain at the interfacial layer, and the strain decreases gradually moving towards the near-surface layer. It is expected that an epitaxial InAsPSb layer with the thickness of around 1700 nm will be fully relaxed (e_T=0). The magnitude difference of e_T deduced from angular scans and X-ray diffraction implies some structure (like dislocations) may play a role.     

Characterization of tetragonal distortion in a thick Al_(0.2)Ga_(0.8)N epilayer with an AlN interlayer by Rutherford backscattering/channeling

An Al0.2Ga0.8N/AlN/Al0.2Ga0.8N heterostructure was grown by metalorganic chemical vapor deposition on a sapphire(0001) substrate with a thick(> 1 μm) GaN intermediate layer. The Al composition was determined by Rutherford backscattering(RBS). Using the channeling scan around an off-normal [1213] axis in the(1010) plane of the Al0.2Ga0.8N layer, the tetragonal distortion eT, which is caused by the elastic strain in the epilayer, is investigated. The results show that eTin the high-quality Al0.2Ga0.8N layer is dramatically released by the AlN interlayer from 0.66% to 0.27%.     

Interface defects in GaN/sapphire studied using Rutherford backscattering spectroscopy and channeling

GaN on sapphire was grown by MOCVD technique. Rutherford backscattering spectra together with channeling along [0 0 0 1] axis were recorded to study the defects at the interface. Detailed calculation shows that the defects at GaN/sapphire interface are due to dislocations which are distributed into the whole thickness of the film and are mainly aligned on the growth direction.     

用卢瑟福背散射/沟道技术研究ZnO/Zn0.9Mg0.1O/ZnO异质结的弹性应变

利用卢瑟福背散射/沟道技术对射频等离子体辅助分子束外延法生长在蓝宝石衬底上的ZnO/Zn_0.9Mg_0.1O/ZnO异质结进行了组分分析，并得到了异质结弹性应变随深度的变化，应变由界面向表面逐渐释放，并由负变正，且在ZnO与Zn_0.9Mg_0.1O界面处轻微增大.负的应变是由于ZnO与衬底的晶格失配和热失配，而逐渐变为正值是Zn_0.9Mg_0.1O与ZnO的晶格常数差异及弹性应变的 关键词： 异质结 卢瑟福背散射/沟道 弹性应变 ZnMgO     

H+2，H+3团簇离子在沟道条件下的背散射 质子产额测量

采用卢瑟福背散射方法，测得了每质子能量为650 keV的H⁺₂，H+₃团簇离子在Si晶体<100>和<110>沟道条件下的质子背散射能谱.结果发现，由于H⁺₂，H⁺₃团簇在晶体中的库仑爆炸和团簇效应，H⁺₂的背散射质子产额大于H ⁺的背散射产额，而H^{+< 关键词： 团簇 沟道效应 库仑爆炸 背散射}     

Profiling measurements of metal ion distribution in thin polymer inclusion membranes by Rutherford backscattering spectrometry

Polymer inclusion membranes (PIMs) composed of a homogeneous mixture of cellulose triacetate matrix, 2-nitro-phenyl-octyl-ether as plasticizer and tri-octyl-phosphine-oxyde as carrier were synthesized by the spin coating method. Synthesized membranes were doped with molybdenum metal ions and then characterized by four experimental techniques: thermo gravimetric and differential analyses, scanning electron microscopy (SEM), attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy and Rutherford backscattering (RBS) spectrometry using a 3.2 MeV He⁺ ion beam. The RBS analysis has established both the elemental composition as well as the Mo⁺ metal profiling of the studied PIMs. The experimental irradiation conditions were optimized in order to determine the ion fluence thresholds resulting in measurable changes in elemental composition of membranes. Changes in physico-chemical properties of the irradiated PIMs vs He⁺ ion fluence were observed with the ATR-FTIR analysis. Also, the SEM analysis of PIMs surfaces has revealed a porous texture, while the thermal analysis of annealed PIMs at 105°C has showed no significant changes of mass (～1%) of the studied samples.     

氧气氛中p-GaN/Ni/Au电极在相同温度不同合金时间下的欧姆接触形成机制和扩散行为

用卢瑟福背散射/沟道技术研究了p-GaN上的Ni/Au电极在氧气氛下相同合金温度(500℃)不同合金时间后的微结构演化,以揭示欧姆接触的形成机制.利用背散射随机谱和RUMP模拟程序研究了电极金属之间的互扩散,用沟道谱探测了电极金属中的氧分布.结合不同合金时间下比接触电阻ρ_c的变化,发现随着合金时间的延长比接触电阻持续降低,在合金时间60 s后降低的速度减慢, Au扩散到GaN的表面,在p-GaN上形成外延结构,O向电极内部扩散反应生成NiO对降低ρ_{关键词： GaN 卢瑟福背散射/沟道 欧姆接触}     

用卢瑟福背散射/沟道技术及高分辨X射线衍射技术分析不同Al和In含量的AlInGaN薄膜的应变

利用卢瑟福背散射/沟道技术对在蓝宝石衬底上用金属有机化学气相沉积方法生长的有GaN缓冲层(>2μm)的一系列不同Al和In含量的AlInGaN薄膜进行组分及结晶品质的测量；并结合高分辨X射线衍射技术，通过对AlInGaN的对称(0002)面，及非对称(1015)面的θ—2θ扫描及倒空间扫描，可以精确测定AlInGaN外延层的晶格常数及水平和垂直方向的应变.实验结果表明AlInGaN 薄膜中不同含量Al和In对其应变有较大的影响，结合Vegard定理，对这一现象给出了理论的解释. 关键词： AlInGaN 高分辨X射线衍射 卢瑟福背散射/沟道 弹性应变     

Mg+注入对GaN晶体辐射损伤的研究

在蓝宝石衬底上通过金属有机物化学气相沉积(metal-organic chemical vapor deposition，MOCVD)方法外延生长的GaN薄膜具有良好的结晶品质，χ_min达到2.00%. 结合卢瑟福背散射/沟道(Rutherford backscattering/channeling，RBS/C)和高分辨X射线衍射(high-resolution X-ray diffraction，HXRD)的实验测量，研究了不同剂量和不同角度Mg⁺注入GaN所造成的辐射损伤. 实验结果表明，随注入剂量的增大，晶体的辐射损伤也增大，注入剂量在1×10¹⁵atom/cm²以下，χ_min小于4.78%，1×10¹⁶atom/cm²是Mg⁺注入GaN的剂量阈值，超过这个阈值，结晶品质急剧变差，χ_min达到29.5%；随机注入比沟道注入的辐射损伤大，且在一定范围内随注入角度的增大，损伤也增大，在4×10¹⁵atom/cm²剂量下偏离〈0001〉沟道0°，4°，6°，9°时的χ_min(%)分别为6.28，8.46，10.06，10.85；经过700℃/10min+1050℃/20s两步退火和1000℃/30s高温快速退火后，晶体的辐射损伤都有一定程度的恢复，而且1000℃/30s高温快速退火的效果更好，晶体的辐射损伤可以得到更好的恢复. 关键词： GaN 卢瑟福被散射/沟道 高分辨X射线衍射 辐射损伤     

AlxGa1-xN晶体薄膜中铝含量的卢瑟福背散射精确测定

采用金属有机化合物气相淀积法在(0001)取向的蓝宝石衬底上生长一层 大约20 nm厚的AlN缓冲层, 在缓冲层上生长大约2 μm厚、 晶体质量良好的Al_xGa_1-xN外延层, 通过深紫外光致发光法测量发光峰的能量E_g 判断外延层中铝含量的均匀性, 取样品均匀性良好的氮铝镓外延片进行卢瑟福背散射(RBS)实验, 通过两个高能离子束实验室分别进行RBS随机谱分析, 每个实验室测量六个样品, 由分析软件拟合随机谱获得外延层中的x_Al. 并对样品的均匀性、堆积校准、计数统计、散射角、离子束能量与阻止截面 等影响测量结果准确性的不确定度来源进行分析. 结果表明, 采用入射离子⁴He, 能量为2000 keV, 散射角为165° 时, 氮铝镓外延片中铝含量(x=0.8) 的测量不确定度为2.0%, 包含扩展因子k=2. 关键词： 氮铝镓 卢瑟福背散射 测量不确定度 金属有机化合物气相淀积法     

有机源载气对MOCVD生长InGaN薄膜的影响研究

彩MOCVD技术以Al2O3为衬底在GaN膜上生长了InxGa1-xN薄膜。以卢瑟福背散射／沟道技术和光致发光技术对InxGa1-xN/GaN/Al2O3样品进行了测试。获得了合金层的组分，厚度，结晶品质及发光性能等信息。研究表明：在以N2作主载气的情况下，有机源的载气对InxGa1-xN膜的In组分和生长速率影响很大，生长温度为760℃时，以70ml/min的N2作有机源载气得到的InxGa1-xN膜的In组分为0．10，生长速率为6．0nm/min,而以70ml/min的H2作有机源载气得到的InxGa1-xN薄膜的In组分为0．06，生长速率为10．6nm/min.本文首次报导了载气中含有少量H2能增大InxGa1-xN薄膜的生长速率的现象。     

Heusler合金Mn2 NiAl的电子结构和磁性对四方畸变的响应及其压力响应

运用基于密度泛函理论的第一性原理的投影缀加波方法,对Hg₂CuTi型Mn₂NiAl在由立方结构至四方结构的畸变过程中电子结构和磁性的变化规律及其对压力响应的规律进行了研究.研究发现:在由奥氏体相到马氏体相的相变中,由于Ni-Mn(A)原子间距的减小而使得杂化程度增强,导致占据态的态密度向低能区域移动,体系的能量降低,致使在马氏体相中的稳定性增大;在从奥氏体相到马氏体相的相变中,能带变宽,成键作用加强,从而在马氏体相中的稳定性增大;在四方畸变过程中,总磁矩的变化主要来源于Ni原子磁矩的变化;计算得到Mn₂NiAl的零压体积弹性模量为125.69 GPa,其抗压缩性比其他常见的Heusler型合金弱. 关键词： 第一性原理 电子结构 磁性 四方畸变     

Investigation of the long-range effect of light irradiation by means of Rutherford backscattering/ion channeling spectroscopy

This paper presents the results of the first experiments on the observation of the long-range effect by means of Rutherford backscattering/ion channeling spectroscopy under irradiation of a silicon crystal by visible light.     

Hg2CuTi型Mn2NiGe合金的电子结构、磁性对压力、四方变形的响应

运用基于密度泛函理论的第一性原理方法,研究了Hg2CuTi型 Mn2NiGe合金的电子结构对外加压力的响应以及Mn2NiGe的电子结构、磁性对四方变形的响应．结果表明：i）随着外加压力的增加,因Ni、Mn原子间距的减小而导致杂化程度的增强,使得态密度整体向低能区域移动,同时,态密度幅度整体略有减小;ii）在由奥氏体相到马氏体相的变形中,同样因Ni、Mn原子间距的减小而导致杂化程度的增强,占据态的态密度向低能区域移动,体系的能量降低,同时,成键态向低能方向移动,反键态向高能方向移动,能带变宽,成键作用加强,最终导致在马氏体相中的稳定性增大;iii）在四方变形过程中,Mn2NiGe总磁矩的变化主要由Ni原子磁矩的变化所产生．     

Hg2CuTi型Mn2NiGe合金的电子结构、磁性对压力、四方变形的响应

运用基于密度泛函理论的第一性原理方法,研究了Hg2CuTi型 Mn2NiGe合金的电子结构对外加压力的响应以及Mn2NiGe的电子结构、磁性对四方变形的响应．结果表明：i）随着外加压力的增加,因Ni、Mn原子间距的减小而导致杂化程度的增强,使得态密度整体向低能区域移动,同时,态密度幅度整体略有减小;ii）在由奥氏体相到马氏体相的变形中,同样因Ni、Mn原子间距的减小而导致杂化程度的增强,占据态的态密度向低能区域移动,体系的能量降低,同时,成键态向低能方向移动,反键态向高能方向移动,能带变宽,成键作用加强,最终导致在马氏体相中的稳定性增大;iii）在四方变形过程中,Mn2NiGe总磁矩的变化主要由Ni原子磁矩的变化所产生．     

Investigations on the oxidation of zirconium nitride films in air by nuclear reaction analysis and backscattering spectrometry

The thermal oxidation of dc magnetron sputter deposited thin ZrN films in air in the temperature range of 100-475 °C has been studied by depth profiling N using nuclear reaction analysis (NRA) involving ¹⁵N(¹H,αγ)¹²C resonance reaction and O using 3.05 MeV ¹⁶O(α,α)¹⁶O resonant scattering. The structural and morphological changes accompanying the process have also been investigated. NRA/backscattering spectrometry measurements show that oxidation results in the formation of ZrO_1.8±0.1 at the surface. An interface consisting of Zr, O and N is also formed underneath the surface oxide. For an isothermal annealing, oxide layer as well as interface exhibits parabolic growth with the duration of annealing. The diffusion of oxygen through the already grown oxide layer (D = 5.6 × 10⁻¹⁴ cm² s⁻¹ at 475 °C) forms the rate-controlling step of oxidation. The diffusion may be facilitated by the high concentration of oxygen vacancies in the oxide layer. Glancing incidence X-ray diffraction (GIXRD) measurements indicate that zirconia films formed are phase-singular (monoclinic) and are textured in (2 0 0) and (3 1 1) orientations. Examination by scanning electron microscopy (SEM) reveals the formation of blisters on sample surfaces on prolonged oxidation. The blistering can be attributed to intrinsic growth stress arising due to the larger molar volume of zirconium oxide in comparison to zirconium nitride, a fact demonstrated by the depth profile measurements as well.     

Reprint of: Determination of deuteron characteristic channeling parameters by simulation of RBS spectrum along Si <100>

In this paper, the channeling behavior of deuterons in the energy of 1400 keV along the <100> channel of Si was studied by the simulation of the channeling Rutherford spectrum in the backscattering geometry. The simulation was done by taking three considerations into account: (i) a minimum random component of the beam which enters the sample because of the scattering ions from the surface, (ii) the dechanneling starts at the greater penetration depths and (iii) the dechanneling follows a Gompertz type sigmoidal function with the two parameters which present the dechanneling rate and range, respectively. The Levenberg–Marquardt algorithm was used to set the best characteristic channeling parameters, the penetration depth at which the dechanneling starts, the energy loss and the dechanneling rate and range. The energy dependence of the ratio of channeling to random energy loss of deuterons in the energy range 1–2 MeV is investigated by comparing the determined value with the ones obtained in the other references.     

Study of the long-range effect by the method of Rutherford backscattering with ion channeling under light irradiation of silicon

The results of a study of the effect of light irradiation of silicon on the spectra of Rutherford backscattering with ion channeling (RBSC) in the side opposite to the irradiated one are presented. It is shown that the integral yield of backscattered He⁺ ions increases as a result of irradiation (the long-range effect); in this case, the shape of the dependence of the effect size on the irradiation time is bell-like and agrees qualitatively with the results obtained by hardness measurements previously. These data show light generation of a high concentration of movable defects near the opposite plate side.