Ni/SnO_2复合薄膜的制备与光电性能

采用旋涂法将溶胶-凝胶法制备的Ni/Sn O2凝胶在玻璃基底上镀膜,得到了Ni/Sn O2复合薄膜,探讨了镍掺杂量、煅烧温度对薄膜结构和形貌的影响。通过X射线衍射、红外光谱、扫描电子显微镜等测试手段对Ni/Sn O2复合膜的结构和形貌进行表征。结果显示,500℃下煅烧的薄膜样品的结晶度较高,粒径小,颗粒分布均匀。用紫外-可见分光光度计和四探针电阻仪对其进行光学、电学性能测试,结果显示:适量的Ni掺杂可以提高Sn O2薄膜在近紫外光区的吸收,Ni/Sn O2薄膜在近紫外光区的吸收随着Ni2+掺杂摩尔分数从5%增加到10%而逐渐减小。当Ni2+掺杂摩尔分数为6%时,Ni/Sn O2复合薄膜的导电性能最好。     

Effect of bilayer repeats on magnetic properties of Au-buffered Co/Ni multilayers with perpendicular magnetic anisotropy

The effect of bilayer repeats (N) on the static and dynamic magnetic properties of Co/Ni multilayers was investigated. The effective perpendicular magnetic anisotropy constant of multilayers drops from $1.08\times {10}^6$ erg/cm³ to $0.78\times {10}^6$ erg/cm³ with N increasing from 5 to 11. For Co/Ni multilayers with $N\le 7$, sharp magnetization switching was observed. In contrast, Co/Ni multilayers with $N\ge 9$ have a long tail in the hysteresis loop. Ferromagnetic resonance measurements show that intrinsic Gilbert damping changes from 0.021 to 0.016 with increase in N and is inversely proportional to N. This study provides a deep understanding and effective control of magnetic properties of Co/Ni multilayers for spintronics devices.     

Ni/ITO与p型GaN的欧姆接触

通过环形传输线方法(CTLM),电流-电压(I-V)曲线、光学透过率、表面形貌等手段,研究了N i层厚度和N i层的高温退火对N i/ITO与p型氮化镓接触特性的影响,探讨了N i/ITO-p-GaN欧姆接触的形成机制,提出了低温氧化N i金属层的方法。获得接触电阻率(cρ)小于9.5×10-5Ω.cm2,透过率达到74%(470 nm)的N i/ITO-p-GaN电极。     

成分和厚度的依赖

通过调整Mn的成分，系统地研究了Ni81Fe19/Ni100-xMnx双层膜的磁学性质，特别是交换偏置场(Hex)的变化.当Ni100-xMnx中Mn的原子百分比在534%到600%之间时，对于150nm的Ni81Fe19，得到了最大的交换偏置场175kA/m，同时由于Mn对Ni81Fe19层的扩散所造成的磁矩的降低小于20%；高角x射线衍射证明Ni100-xMnx的晶格常数随着Mn成分的改变而变化，Mn含量越多，其晶格常数越大；制备态Ni100-xMnx膜晶格常数与θ相NiMn膜晶格常数的接近程度与NiMn膜θ相形成的容易程度相对应.也研究了交换偏置场随着Ni１００-xMnx厚度的变化，第一次得到了当Ni100-xMnx中Mn的原子百分比为706%时，Ni81Fe19(150nm)/Ni100-xMnx(90nm)双层膜在经过240℃，5h退火后，可以有80kA/m的交换偏置场，此时铁磁层磁矩的大小几乎不变. 关键词： Ni81Fe19/Ni100-xMnx 交换偏置场     

High temperature annealing effect on structural and magnetic properties of Ti/Ni multilayers

High temperature annealing effect on structural and magnetic properties of Ti/Ni multilayer (ML) up to 600 °C have been studied and reported in this paper. Ti/Ni multilayer samples having constant layer thicknesses of 50 Å each are deposited on float glass and Si(1 1 1) substrates using electron-beam evaporation technique under ultra-high vacuum (UHV) conditions at room temperatures. The micro-structural parameters and their evolution with temperature for as-deposited as well as annealed multilayer samples up to 600 °C in a step of 100 °C for 1 h are determined by using X-ray diffraction (XRD) and grazing incidence X-ray reflectivity techniques. The X-ray diffraction pattern recorded at 300 °C annealed multilayer sample shows interesting structural transformation (from crystalline to amorphous) because of the solid-state reaction (SSR) and subsequent re-crystallization at higher temperatures of annealing, particularly at ≥400 °C due to the formation of TiNi₃ and Ti₂Ni alloy phases. Sample quality and surface morphology are examined by using atomic force microscopy (AFM) technique for both as-deposited as well as annealed multilayer samples. In addition to this, a temperature dependent dc resistivity measurement is also used to study the structural transformation and subsequent alloy phase formation due to annealing treatment. The corresponding magnetization behavior of multilayer samples after each stage of annealing has been investigated by using Magneto-Optical Kerr Effect (MOKE) technique and results are interpreted in terms of observed micro-structural changes.     

Ni/Au与N掺杂p型ZnO的欧姆接触

研究了Au,In,Ni/Au三种不同金属膜与N掺杂p型ZnO的接触特性,发现Ni/Au双层膜更适合作为其欧姆电极材料,并比较了不同气氛和不同温度退火对Ni/Au电极的影响.发现在O₂中退火电极性能发生蜕变,而在N₂中退火性能得到改善.指出即使在N₂中退火,退火温度的选择也是至关重要的,本实验在400℃,氮气气氛下退火150s,得到了较好的欧姆接触特性.     

Homotopic method of solving a class of EI Nino/La Nina-Southern Oscillation sea-air oscillator

The EI Nino/La Nina-Southern Oscillation （ENSO） is an interannual phenomenon involved in the tropical Pacific Ocean-atmosphere interactions. In this paper, an asymptotic method of solving the nonlinear equation for the ENSO model is created. And based on a class of oscillator of the ENSO model, the approximate solution of a corresponding problem is studied by employing the method of homotopic mapping. It is proved from the results that the homotopic method can be used for analysing the sea surface temperature anomaly in the equatorial eastern Pacific and the thermocline depth anomaly of the atmosphere-ocean oscillation for the ENSO model.     

Synthesis and magnetic properties of multilayer Ni/Cu and NiFe/Cu nanowires

Highly ordered composite nanowires with multilayer Ni/Cu and NiFe/Cu have been fabricated by pulsed electrodeposition into nanoporous alumina membrane. The diameter of wires can be easily varied by pore size of alumina, ranging from 30 to 100 nm. The applied potential and the duration of each potential square pulse determine the thickness of the metal layers. The nanowires have been characterized by transmission electron microscopy (TEM), magnetic force microscopy (MFM), and vibrating sample magnetometer (VSM) measurements. The MFM images indicate that every ferromagnetic layer separated by Cu layer was present as single isolated domain-like magnet. This technique has potential use in the measurement and application of magnetic nanodevices.     

超细Ni80Cr20合金丝的冷拉拔制备及表征

开展特定直径超细Ni80Cr20合金丝的冷拉拔制备研究,并通过扫描电子显微镜（SEM）、X射线衍射仪（XRD）和金属丝强力仪等对超细合金丝进行了表征。研究结果表明：烧头过程最佳电解液浓度为0.05 mol/L,时间为3 s;制备的镍铬合金丝直径为24.54 m,表面光滑,尺寸精准;拉拔后晶粒尺寸减小,退火后晶粒尺寸长大;拉拔态镍铬丝由于加工硬化,其伸长率由16%降低至1.88%;退火可改善镍铬丝性能,其断裂强度降低,伸长率增大,合金塑性增强,氮气退火丝的断裂强度大于真空退火丝的断裂强度,伸长率则相反。     

Magnetic studies in evaporated Ni/Pd multilayers

The magnetic properties of Ni/Pd multilayers, prepared by sequential evaporation in ultrahigh vacuum, have been studied. The Ni thickness dependence of the magnetization and magnetic anisotropy is discussed. The temperature dependence of the spontaneous magnetization is well described by a T^3/2 law in all multilayers. A spin-wave theory has been used to explain the temperature dependence of the spontaneous magnetization, and the approximate values for the exchange interactions for various Ni layer thicknesses have been obtained.     

N 掺杂ZnO薄膜的接触特性

氧化锌(ZnO)是一种直接带隙半导体材料,室温下带隙为3.37eV,激子束缚能为60meV。ZnO因其优越的光电特性在高亮度蓝紫光发光器件、紫外探测器件和短波长激子型激光器等方面具有广阔的应用前景。而要实现大功率的光电器件,稳定可靠的欧姆接触是必需的。研究了氮气氛条件下,不同温度快速退火对氮掺杂ZnO样品的电学性质以及Ni/Au与其接触特性的影响。原生样品表现为弱的肖特基接触,适当温度退火后,由肖特基转成了欧姆接触,650℃退火后得到最小比接触电阻率8×10-4Ω·cm2。霍尔测量表明550℃快速退火后,样品的导电类型由p型转变成了n型。采用AES和GXRD分别研究了不同退火温度下Au、Ni、Zn、O的深度分布变化及退火后所生成的合金相。实验结果表明,退火所导致的薄膜电学性质的变化以及界面态和表面态的增加是接触特性变化的原因。     

Low specific contact resistivity to graphene achieved by AuGe/Ni/Au and annealing process

Low metal-graphene contact resistance is important in making high-performance graphene devices.In this work,we demonstrate a lower specific contact resistivity of Au_(0.88)Ge_(0.12)/Ni/Au-graphene contact compared with Ti/Au and Ti/Pt/Au contacts.The rapid thermal annealing process was optimized to improve AuGe/Ni/Au contact resistance.Results reveal that both pre- and post-annealing processes are effective for reducing the contact resistance.The specific contact resistivity decreases from 2.5 × 10~(-4) to 7.8 × 10~(-5) Ω·cm~2 by pre-annealing at 300 ℃ for one hour,and continues to decrease to9.5 × 10~(-7) H·cm~2 after post-annealing at 490 ℃ for 60 seconds.These approaches provide reliable means of lowering contact resistance.     

Ni／Zr双层膜中固态非晶化的分子动力学模拟

文章采用多体势，用分子动力学模拟研究了含有无序界面的Ｎｉ／Ｚｒ双层膜在等温退火下的自发非晶化过程．在原子尺度上首次观察到了Ｎｉ－Ｚｒ之间的互扩散和合金化，以及由此导致的从界面开始、由扩散控制的非晶化．     

Microstructure and current transport in Ti/Al/Ni/Au ohmic contacts to n-type AlGaN epilayers grown on Si(111)

The microstructure and the current transport in Ti/Al/Ni/Au ohmic contacts on AlGaN were investigated in this paper.Significant structural changes of the metal stack occurred upon annealing and ohmic contacts were obtained after thermal treatments above 700 C, with specific contact resistance values , which depend on the thickness of the Ti layer.Although the formation of a TiN interfacial layer is independent of the Ti thickness, different contact structures, i.e. the phases and grain location, were found as a function of the Ti layer, which were crucial for the nanoscale current transport through the contact stack. In particular, conductive atomic force microscopy combined with the resistivity measurement of the main phases formed upon annealing (AlNi, AlAu₄, Al₂Au) indicated that the low resistivity Al₂Au phase provides preferential conductive paths for the nanoscopic current flow through the contact.     

用MAEAM法计算Ag/Ni的界面能

采用改进分析型嵌入原子法计算了Ag(111)//Ni(001)和Ag(001)//Ni(111)扭转界面的能量，结果表明：对Ag(111)//Ni(001)界面，当扭转角等于0°（或30°）时界面能最小，这一择优扭转角取向和Gao等人的实验结果一致；同样，对Ag(001)//Ni（111）界面，当扭转角等于0°（或30°）时界面能最小；从界面能最小化考虑，Ag(001)//Ni(111)扭转界面的择优扭转角也为0°（或30°）. 关键词： Ag/Ni界面 界面能 计算 改进分析型嵌入原子法 近重合位置点阵     

利用17O固体核磁共振波谱分析Ni/CeO2表面镍离子含量

本文以具有重要催化应用前景的Ni/CeO₂体系为例,借助¹⁷O固体核磁共振波谱技术,根据表面氧物种¹⁷O NMR信号的变化,尝试分析了Ni/CeO₂表面层中镍离子的含量.分析结果显示,10% NiCe-500和20% NiCe-300两种Ni/CeO2样品表面第一和第二金属离子层中Ni离子的含量分别位于9%~17%和8%~15%范围内.这一方法或可推广至研究其它一系列顺磁掺杂氧化物的表面掺杂含量.     

利用多元醇共浸渍促进Ni/MCM-41催化剂的萘加氢活性

研究了利用乙二醇、甘油、木糖醇、山梨醇、葡萄糖多元醇共浸渍方法促进Ni负载在MCM-41载体上的萘加氢活性．和传统的浸渍方法比较,只要在硝酸盐的水溶液中添加适合量的多元醇即可以提高金属活性中心和载体表面的相互作用,导致5 nm以下超细NiO粒子的形成,以及高分散的催化活性中心和异常高的催化活性;零价Ni的纳米粒子从36.1 nm减少到5 nm以下,同时萘的加氢活性取决于零价Ni纳米粒子的大小．利用多元醇共浸渍制备的负载型催化剂表现出优异的催化活性,即使在55 oC的低温环境中亦表现出100%的萘转化率．     

在Ni/HZSM-5催化剂上低温水蒸汽重整生物油制氢

利用浸渍方法制备的Ni/HZSM-5催化剂在生物油低温水蒸汽重整合成中表现了较高的催化活性． 探讨了催化剂的组成、重整温度、水碳比例对重整过程的影响．在电催化重整研究中,发现催化剂上通过的电流可以显著地促进生物油水蒸汽重整．通过对不同负载量的Ni/HZSM-5催化剂和Ni₂₀/Al₂O₃催化剂的催化活性的比较,NiO在催化剂中负载量为20%(Ni₂₀/ZSM)时表现出了最高的催化活性; 即使在450 oC时, 在Ni₂₀/ZSM催化剂上也可以达到碳转化率接近完全, 氢气产率约为90%的效果． 利用XRD、ICP/AES、H₂-TPR、BET等表征手段对Ni/HZSM-5催化剂的形态和结构进行了表征.     

电迁移对Ni/Sn3.0Ag0.5Cu/Au/Pd/Ni-P倒装焊点界面反应的影响

本文研究了150 ℃, 1.0× 10⁴ A/cm²条件下电迁移对Ni/Sn3.0Ag0.5Cu/Au/Pd/Ni-P倒装焊点界面反应的影响. 回流后在solder/Ni和solder/Ni-P的界面上均形成(Cu,Ni)₆Sn₅类型金属间化合物. 时效过程中两端界面化合物都随时间延长而增厚, 且化合物类型都由(Cu,Ni)₆Sn₅转变为(Ni,Cu)₃Sn₄. 电迁移过程中电子的流动方向对Ni-P层的消耗起着决定性作用. 当电子从基板端流向芯片端时, 电迁移促进了Ni-P层的消耗, 600 h后阴极端Ni-P层全部转变为Ni₂SnP层. 阴极界面处由于Ni₂SnP层的存在, 使界面Cu-Sn-Ni三元金属间化合物发生电迁移脱落溶解, 而且由于Ni₂SnP层与Cu焊盘的结合力较差, 在Ni₂SnP/Cu界面处会形成裂纹. 当电子从芯片端流向基板端时, 阳极端Ni-P层并没有发生明显的消耗. 电流拥挤效应导致了阴极芯片端Ni层和Cu焊盘均发生了局部快速溶解, 溶解到钎料中的Cu和Ni原子沿电子运动的方向往阳极运动并在钎料中形成了大量的化合物颗粒. 电迁移过程中(Au,Pd,Ni)Sn₄的聚集具有方向性, 即(Au,Pd,Ni)Sn₄因电流作用而在阳极界面处聚集.     

Magnetic properties of Ni/Au core/shell studied by Monte Carlo simulations

The magnetic properties of ferromagnetic Ni/Au core/shell have been studied using Monte Carlo simulations within the Ising model framework. The considered Hamiltonian includes the exchange interactions between Ni–Ni, Au–Au and Ni–Au and the external magnetic field. The thermal total magnetizations and total magnetic susceptibilities of core/shell Ni/Au are computed. The critical temperature is deduced. The exchange interaction between Ni and Au atoms is obtained. In addition, the total magnetizations versus the external magnetic field and crystal filed for different temperature are also established.