Influence of ion-irradiation parameters on defect formation in silicon films

It is shown that unlike bulk silicon, for which amorphization is observed at an irradiation dose of 5 × 10¹⁶ ion/cm², thin silicon films on sapphire are amorphized at lower critical doses (10¹⁵ ion/cm²). An undamaged surface layer remains when the silicon films are irradiated with Si⁺ ion beams. Its thickness depends on the current density of the incident beam. Rutherford backscattering studies show that annealing at 950°C improves the crystallinity of the irradiated silicon film. Annealing of the films at 1100°C leads to mixing of the silicon-sapphire interface.     

Effect of annealing temperature on optical and electrochemical properties of chitosan–ZnO nanostructure

Chitosan–ZnO nanostructures were prepared by chemical precipitation method using different concentration of zinc chloride and sodium hydroxide solutions. Nanorod-shaped grains with hexagonal structure for samples annealed at 300 °C and porous structure with amorphous morphology for samples annealed at 600 °C were revealed in SEM analysis. X-ray diffraction patterns confirmed the hexagonal phase ZnO with crystallite size found to be in the range of ~24.15–34.83 nm. Blue shift of UV–Vis absorption shows formation of nanocrystals/nanorods of ZnO with marginal increase in band gap. Photoluminescence spectra show that blue–green emission band at 380–580 nm. The chitosan–ZnO nanostructures used on surface of a glassy carbon electrode gives the oxidation peak potential at ~0.6 V. The electrical conductivity of chitosan–ZnO composites were observed at 2.1?×?10^?5 to 2.85?×?10^?5?S/m. The nanorods with high surface area and nontoxicity nature of chitosan–ZnO nanostructures observed in samples annealed at 300 °C were suitable as a potential material for biosensing.     

Ion beam shaping of embedded metal nanoparticles by Si+ ion irradiation

Fine Co and Pt nanoparticles are nucleated when a silica sample is implanted with 400 keV Co⁺ and 1370 keV Pt⁺ ions. At the implanted range, Co and Pt react to form small Co _x Pt_(1?x) nanoparticles during Si⁺ ion irradiation at 300 °C. Thermal annealing of the pre-implanted silica substrate at 1000 °C results in the formation of spherical nanoparticles of various sizes. When irradiated with Si⁺ ions at 300 °C, particles in the size range of 5–17 nm undergo rod-like shape transformation with an elongation in the direction of the incident ion beam, while those particles in the size range of 17–26 nm turn into elliptical shape. Moreover, it is suspected that very big nanoparticles (size >26 nm) decrease in size, while small nanoparticles (size <5 nm) do not undergo any transformation. During Si⁺ ion irradiation, the crystalline nature of the nanoparticles is preserved. The results are discussed in the light of the thermal spike model.     

Effect of implantation temperature on the blistering behavior of hydrogen implanted GaN

GaN epitaxial layers were implanted by 100 keV H⁺ ions at different implantation temperatures (LN₂, RT and 300 °C) with a fluence of 2.5×10¹⁷ cm^?2. The implanted samples were characterized using Nomarski optical microscopy, AFM, XRD, and TEM. Topographical investigations of the implanted surface revealed the formation of surface blistering in the as-implanted samples at 300 °C and after annealing at higher temperature for the implantation at LN₂ and RT. The physical dimensions of the surface blisters/craters were dependent on the implantation temperature. XRD showed the dependence of damage-induced stress on the implantation temperature with higher stress for the implantation at 300 °C. TEM investigations revealed the formation of a damage band in all the cases. The damage band was filled with large area microcracks for the implantation at 300 °C, which were responsible for the as-implanted surface blistering.     

Study of SHI-induced ion beam mixing in Y3+: YIG employing X-ray diffraction and Mössbauer spectroscopy

The consequences of swift heavy ion (SHI) irradiation (Li^3?+?, 50 MeV, fluence =?5 × 10¹³ ions/cm²) on the structural and microscopic magnetic properties of Y^3?+?-substituted yttrium iron garnet (Y_3?+?x Fe_5???x O₁₂, x = 0.0, 0.2 and 0.4) have been studied at 300 K. It is found that an additional YFeO₃-phase observed along with bcc garnet phase, is completely removed for x = 0.2 composition while its percentage formation considerably reduces for x = 0.4 composition after irradiation. Similar effect has been observed for specimens sintered at 1,500°C. The SHI-induced ion beam mixing has been revealed through X-ray diffraction and Mössbauer spectroscopy.     

STM study of structural changes on Si(100)2×1-Sb surface induced by atomic hydrogen

Using scanning tunneling microscopy (STM) and low energy electron diffraction (LEED), we have studied the structural changes of the Si(100)2×1-Sb surface caused by hydrogen adsorption at both room temperature (RT) and 300°C. We have found that the ordering of a 2×1-Sb surface is more stable against atomic hydrogen exposure at 300°C than at RT, and that some Sb atoms desorb during atomic hydrogen exposure at 300°C. However, upon hydrogen exposure at both temperatures, we have observed neither three-dimensional islands nor the hydrogen terminated Si substrate which were reported for hydrogen interaction with the other metal/Si systems. On the 2×1-Sb surface exposed to atomic hydrogen of 1000 L at RT followed by 550°C annealing, long bright lines similar to those reported for the Bi/Si(100) system have also been found.     

Observation of grain growth in swift heavy ion irradiated NiO thin films

NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 °C and 700 °C. The films were irradiated with 120 MeV Au⁹⁺ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 10¹¹ ions cm⁻² leads to grain growth for the films sintered at 500 °C and grain fragmentation for the films sintered at 700 °C. At still higher fluences of irradiation, grain size in 500 °C sintered film decreased, but the same improved in 700 °C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.     

Formation of ordered helium pores in amorphous silicon subjected to low-energy helium ion irradiation

Thin transparent (for transmission electron microscopy, TEM) self-supported Si(001) films are irradiated on the (110) end face by low-energy (E=17 keV) He⁺ ions at doses ranging from 5×10¹⁶ to 4.5×10¹⁷ cm⁻² at room temperature. The TEM study of the irradiated Si films along the ion range shows that an a-Si layer forms in the most heavily damaged region and helium pores (bubbles) with a density of up to 3×10¹⁷ cm⁻³ and 2–5 nm in diameter nucleate and grow across the entire width of this layer. The growth of nanopores in the a-Si layer is accompanied by their linear ordering into chains oriented along the ion tracks. The absence of pores in the region that remains crystalline and has the maximal concentration of implanted helium is explained by the desorption of helium atoms from the thin film during the irradiation. After annealing at 600°C, the volume of immobile pores in the remaining a-Si layer increases owing to the capture of helium atoms from the amorphous matrix. Solid solution is shown to be the prevalent state of the helium implanted into the amorphous silicon. Linear features with a diameter close to 1 nm and density of about 10⁷ cm⁻¹ discovered in the helium-doped a-Si layer are identified as low-energy He⁺ ion tracks.     

Heavy-ion irradiations of Fe and Fe–Cr model alloys Part 1: Damage evolution in thin-foils at lower doses

The evolution of radiation damage in Fe and Fe–Cr alloys under heavy-ion irradiation was investigated using transmission electron microscopy. Thin foils were irradiated with 100 or 150 keV Fe⁺ and Xe⁺ ions at room temperature (RT) and 300°C. Dynamic observations followed the evolution of damage and the early stages in damage development are reported. Small (2–5 nm) dislocation loops first appeared at doses between 10¹⁶ and 10¹⁷ ions m^?2 in all materials. Loop number densities depended strongly on the foil orientation in pure Fe but not in Fe–Cr alloys. Number densities did not depend strongly on Cr content. For a given material, defect yields were higher for Xe⁺ ions than for Fe⁺ ions, and were higher at RT than at 300°C. Loops with both ?100? and ½?111? Burgers vectors were identified. The proportion of ?100? loops was larger, especially in pure Fe. Dynamic observations showed that: the contrast of some new loops developed over intervals as long as 0.2 s; hopping of ½?111? loops was induced by the ion and electron beams and was pronounced in ultra-pure iron; and many loops were lost during and after ion irradiation by glide to the foil surface. The number of loops retained was strongly dependent on the foil orientation in Fe, but less so in Fe–Cr alloys. This is due to lower loop mobility in Fe–Cr alloys, probably due to pinning by Cr atoms. Reduced loop loss probably explains the higher loop number densities in Fe–Cr alloys compared with pure Fe.     

Thermal expansion measurements for estimating vacancy concentration in X-ray irradiated KCl single crystals

A sensitive capacitance technique is used for measuring changes in length (Δl) of KCl single crystals with temperature in the region 30–300°C. These measurements have been taken on KCl in (i) as-cleaved (ii) X-ray irradiated (iii) quenched and X-ray irradiated conditions (X-ray irradiation was always done at room temperature (≈ 30°C). The linear coefficient of thermal expansion (α) of the as-cleaved sample is 40.8 × 10^-6°C^-1. Variation of Δl with temperature in X-ray irradiated crystal shows two regions: (a) 30–180°C where α is 48.1 × 10^-6°C^-1, (b) 180–300°C where α is 40.4 × 10^-6°C^-1. Similar behaviour is exhibited by quenched and later X-ray irradiated KCl the first region is up to 140°C, beyond which the second region takes over. From these data, concentration of vacancies in X-ray irradiated KCl at room temperature is calculated to be 3.4 × 10¹⁷ cm^-3 which is in fairly good agreement with the value obtained from F-band absorption measurements on the sample. An attempt has been made to understand these results.     

Contact welding study of carbon nanotube with ZnO nanowire

Study of proton beam induced welding of multiwall carbon nanotubes (MWCNTs) with ZnO nanowires (NWs) has been carried out by proton (H⁺) beam irradiation. The samples were irradiated by 70-keV proton (H⁺) ion beams at different substrate temperatures. The irradiation-induced defects in CNTs and ZnO NWs were greatly reduced at elevated temperature. The crystalline structure of ZnO NWs and MWCNTs were found to remain stable after the irradiation at 700 K. As a preparation step, a coupling of two parallel ZnO NWs with irradiation has also been demonstrated. The welding mechanisms of MWCNTs and ZnO NWs were also been suggested. These two welding processes between same and distinct nanostructures to form homo- and hetero-junctions have provided an opportunity to mass produce interconnecting one-dimensional structures used for the manufacturing of future nanowire-based electronic circuits and devices.     

Recrystallization of hexagonal silicon carbide after gold ion irradiation and thermal annealing

Silicon carbide (SiC) single crystals with the 6H polytype structure were irradiated with 4.0-MeV Au ions at room temperature (RT) for increasing fluences ranging from 1?×?10¹² to 2?×?10¹⁵ cm^?2, corresponding to irradiation doses from ~0.03 to 5.3 displacements per atom (dpa). The damage build-up was studied by micro-Raman spectroscopy that shows a progressive amorphization by the decrease and broadening of 6H-SiC lattice phonon peaks and the related growth of bands assigned to Si–Si and C–C homonuclear bonds. A saturation of the lattice damage fraction deduced from Raman spectra is found for ~0.8?dpa (i.e. ion fluence of 3?×?10¹⁴ cm^?2). This process is accompanied by an increase and saturation of the out-of-plane expansion (also for ~0.8?dpa), deduced from the step height at the sample surface, as measured by phase-shift interferometry. Isochronal thermal annealing experiments were then performed on partially amorphous (from 30 to 90%) and fully amorphous samples for temperatures from 200 °C up to 1500 °C under vacuum. Damage recovery and densification take place at the same annealing stage with an onset temperature of ~200 °C. Almost complete 6H polytype regrowth is found for partially amorphous samples (for doses lower than 0.8 dpa) at 1000 °C, whereas a residual damage and swelling remain for larger doses. In the latter case, these unrelaxed internal stresses give rise to an exfoliation process for higher annealing temperatures.     

Structural and Morphological Changes of Carbon Fiber Surfaces,Produced via Sputtering by Noble Gas Ions

SEM, laser goniophotometry, and Raman spectroscopy are used to analyze a modification of the carbon PAN fiber shell of KUP-VM composite upon irradiation with 30 keV Ne⁺ and Ar⁺ ions at normal incidence and temperatures of RT to 600°C. It is found that the formation of corrugated submicron structures in the composite upon irradiation at elevated temperatures (≥125°C for neon and ≥250°C for argon) displays certain features at temperatures of 400–500°C. The corrugated faces’ angles of inclination and the fraction of the corrugated structure on the fiber surface at these temperatures are minimal. Together with regularities established earlier, the observed patterns allow us to relate ion-induced corrugation to anisotropic radiation- induced plastic processes of dimensional changes in carbon materials affected by ion sputtering of their surfaces.     

Magnetic behaviour and DCEMS study of SnO2 films implanted with 57Fe

Fe implanted SnO₂ films (5 × 10¹⁶ and 1 × 10^{17 57}Fe ions/cm²) characterized by conversion electron Mossbauer spectroscopy (CEMS) are reviewed. The substrate temperatures affect the growth of precipitated iron oxides. The Fe ion implanted film at room temperature (RT) shows no Kerr effect and no magnetic sextet in CEM spectra. The SnO₂ film implanted with ⁵⁷Fe at the substrate temperature of 300 °C show a small Kerr effect although the magnetic sextet is not observed, but post-annealing results in the disappearance of the Kerr effect. This magnetism is considered to be due to defect induced magnetism. Some samples were measured by CEMS at 15 K. SnO₂ (0.1 at %Sb and 3 at %Sb) films, implanted at 500 °C and the post-annealed samples, show RT ferromagnetism due to formation of clusters of magnetite and maghemite, respectively. The layer by layer analysis of these films within 100 nm in thickness has been done by depth sensitive CEMS (DCEMS) using a He + 5 % CH₄ gas counter. The structures and compositions of Fe implanted SnO₂ films, and the effects due to post-annealing were investigated.     

Spectroscopic studies of copper and carbon ion irradiated polypropylene

The samples of polypropylene (PP) have been irradiated with 120 MeV ⁶⁴Cu⁹⁺ and 70 MeV ¹²C⁵⁺ ion beams, with the fluence ranging from 1 × 10¹³ to 1 × 10¹¹ ions/-cm⁻². UV-VIS and FTIR techniques have been used to study the chemical and optical properties of these irradiated polymers. UV spectra revealed that the optical-gap energy decreases by 54 % with copper ion irradiation at the fluence of 1 × 10¹³ ions/cm², whereas at the same fluence, carbon beam decreases the optical-gap energy by 20%. FTIR analysis of ion irradiated samples revealed the presence of -OH, C = O and C = C bonds. Alkyne formation has been observed only in the case of copper ion irradiation.      

非晶Fe89.7P10.3合金纳米线阵列的磁性研究

利用电化学沉积方法在阳极氧化铝模板中制备了Fe_89.7P_10.3非晶 合金纳 米线阵列.利用x射线衍射仪、透射电子显微镜、振动样品磁强计和穆斯堡尔谱仪研究了样品的结构和磁性,发现纳米线阵列是非晶结构，且拥有垂直磁各向异性和高的矫顽力，H_c =304×10⁴A/m.纳米线内部的平均超精细场和平均同质异能移分别为2 15×10⁶ A/m和007 mm/s；而纳米线末端的平均超精细场（233×10⁶ A/m ）大于内 部的值，平均同质异能移（004 mm/s）小于内部的值.另外，纳米线内部Fe原子磁矩与线轴的夹角约为16°，而在纳米线末端Fe原子磁矩与线轴的夹角约为28°.这些结果表明，由于形状各 向异性，在纳米线中实现了无序非晶合金磁矩的有序排列. 关键词： 非晶合金 纳米线阵列 垂直磁各向异性 穆斯堡尔谱     

Temperature dependence of the radiation-induced hardening of EP-823 steel after 7-MeV Ni++-ion irradiation

Ferritic-martensitic steel 16Kh12MVSFBR (EP-823) is irradiated with 7-MeV Ni⁺⁺ ions to fluences in the range of (2.7–6) × 10²⁰ ion/m² at temperatures of 350–600°C. The obtained temperature dependence of steel hardening after irradiation has a non-monotonic character with a maximum at 380°C. This dependence is determined by changes in the steel microstructure with irradiation temperature and correlates with the known experimental data on neutron irradiation and results of mathematical-statistical simulation using the bootstrap procedure and a neural-network model of changes in the strength properties of 12% chromium steels of the ferritic-martensitic class after neutron irradiation.     

Mössbauer study of ferromagnetic metallic glasses irradiated by swift heavy ions at temperatures 100 and 300 K

The effect of swift heavy ion irradiation on ferromagnetic metallic glasses Fe₄₀Ni₃₈Mo₄B₁₈ and Fe₇₈Si₉B₁₃ has been studied. The ion beams used are 100 MeV ¹²⁷I and 180 MeV ¹⁹⁷Au. The specimens were irradiated at fluences ranging from 3 × 10¹² to 1.5 × 10¹⁴ ions/cm². The irradiations have been carried out at temperatures 100 and 300 K. The magnetic moments are sensitive towards the irradiation conditions such as irradiation temperature and stopping power of incident ion beam. The irradiation-induced effects have been monitored, by using Mössbauer spectroscopy. The modifications in magnetic anisotropy and hyperfine magnetic field distributions, as an effect of different irradiation temperature as well as different stopping power have been discussed. After irradiation, all the samples remain amorphous and magnetic anisotropy considerably changes from its original in-plane direction. The results show enhancement in magnetic anisotropy in the specimen irradiated at 100 K, as compared to that of irradiated at 300 K. It is expected that at low temperature, the stresses produced in the material would remain un-annealed, compared to the samples irradiated at room temperature and therefore, the modification in magnetic anisotropy would be enhanced. A distribution of hyperfine magnetic field, of the samples irradiated at low temperature, show a small but distinct peak at ～?11 Tesla, indicating Fe-B pairing.     

Ammonia gas sensor based on SnO2 nanostructure with the enhanced sensing capability at low temperatures

ABSTRACT

We investigated the gas-sensing performance of tin oxide nanowires for ammonia gas at low temperature (～ 50°C). Tin oxide nanostructures were deposited at 1000°C and 1100°C on gold-coated silicon substrates using the physical vapor deposition method. Gas-sensing measurements were made for ammonia gas at various strengths (i.e. 50, 100 and 200?ppm) and the sensing performance was compared at low temperature for both the samples e.g. nanostructures deposited at 1000°C and 1100°C. Due to the highly oriented structure, the sample deposited at 1000°C shows high sensing capability at low temperature as compared to the regular tetragonal phase observed at 1100°C. The morphological and structural properties of nanowires were systematically examined using the scanning electron microscopy and X-ray diffraction.     

Swift heavy ion provoked structural, optical and electrical properties in SnO2 thin films

SnO₂ thin films grown on glass substrates at 300 ^°C by reactive thermal evaporation and annealed at 600 ^°C were irradiated by 120 MeV Ag⁹⁺ ions. Though irradiation is known to induce lattice disorder and suppression of crystallinity, we observe grain growth at a certain fluence of irradiation. X-ray diffraction (XRD) revealed the crystalline nature of the films. The particle size estimated by Scherrer’s formula for the irradiated films was in the range 10–25 nm. The crystallite size increases with increase in fluence up to 1×10¹² ions?cm^?2, whereas after that the size starts decreasing. Atomic force microscope (AFM) results showed the surface modification of nanostructures for films irradiated with fluences of 1×10¹¹ ions?cm^?2 to 1×10¹³ ions?cm^?2. The UV–visible spectrum showed the band gap of the irradiated films in the range of 3.56 eV–3.95 eV. The resistivity decreases with fluence up to 5×10¹² ions?cm^?2 and starts increasing after that. Rutherford Backscattering (RBS) reveals the composition of the films and sputtering of ions due to irradiation at higher fluence.