Alkaline-developable positive-type photosensitive polyimide with high mechanical strength and high resolution based on chain extendable poly(amic acid), thermally degradable cross-linker and photoacid generator

A positive-type photosensitive polyimide ( PSPI ) based on a chain extendable poly(amic acid) ( PAA ), a thermally degradable cross-linker 1,3,5-tris[(2-vinyloxy)ethoxy]benzene ( TVEB ), and a photoacid generator (PAG) (5-propylsulfonyloxyimino-5H-thiophene-2-ylidene)-(2-methylphenyl)acetonitrile ( PTMA ) has been developed. The chain extendable PAA was prepared from 3,3′,4,4′-biphenyltetracarboxylic dianhydride ( BPDA ) and 4,4′-oxydianiline ( ODA ) and end-capped with di-tert-butyl dicarbonate ( DIBOC ) in N-methyl-2-pyrrolidone (NMP), which has a controlled molecular weight for developing in a 2.38 wt% tetramethyl ammonium hydroxide aqueous solution ( TMAH _aq ) and undergoes a chain extending reaction during curing stage. The photosensitive resist solution was formulated with the polymerization solution (30 wt% in NMP), TVEB (15 wt% for the polymer), and PAG (4.5 wt% for the polymer). The PSPI showed a sensitivity of 47 mJ cm⁻² and a contrast of 5.8 when exposed to 365-nm light, followed by postexposure baking at 90 °C for 10 min and development with the 2.38 wt% TMAH _aq at room temperature. A fine-positive image with 3-μm line-and-space patterns was obtained on a 3-μm thick film exposed to UV light at 365 nm in the contact-printed mode. After thermal curing at 350 °C for 1 hr, the resulting PSPI features excellent mechanical strength and elongation.     

Photosensitive polybenzoxazole based on a poly(o‐hydroxy amide), a dissolution inhibitor,and a photoacid generator

A positive‐type photosensitive polybenzoxazole (PSPBO), based on a poly(o‐hydroxy amide) (PHA), the dissolution inhibitor (DI) 9,9‐bis(4‐tert‐butoxycarbonyloxyphenyl)fluorene (t‐Boc BHF), and the photoacid generator (5‐propylsulfonyloxyimino‐5H‐thiophene‐2‐ylidene)‐(2‐methylphenyl)acetonitrile (PTMA), was developed. Several new tert‐butoxycarbonylated compounds as DIs for PSPBOs were prepared from phenolic compounds having a cardolike structure with di‐tert‐butyl dicarbonate in the presence of 4‐dimethylaminopyridine. Among them, t‐Boc BHF and 5,5′,6,6′‐tetra(tert‐butoxycarbonyl)‐3,3,3′,3′‐tetramethyl‐1,1′‐spirobiindane acted as excellent DIs, giving a large dissolution contrast between the exposed and unexposed areas in a 2.38 wt % tetramethylammonium hydroxide solution (TMAHaq)/5 wt % iso‐propanol (i‐PrOH). The dissolution behavior of this PSPBO system was studied in relation to the PTMA and t‐Boc BHF loadings and postexposure baking temperature. A PSPBO consisting of PHA (77 wt %), t‐Boc BHF (20 wt %), and PTMA (3 wt %) exhibited a sensitivity of 34 mJ/cm² and a contrast of 5.8 when exposed to 365‐nm light (i‐line) and developed with an aqueous alkaline developer, 2.38 wt % TMAHaq/5 wt % i‐PrOH. A clear, positive image with 6‐μm features and a 10‐μm‐thick pattern with high sensitivity and contrast was produced by contact printing and converted into polybenzoxazole patterns upon heating at 350 °C for 1 h. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 661–668, 2007     

Direct patterning of poly(amic acid) and low‐temperature imidization using a crosslinker,a photoacid generator,and a thermobase generator

A positive‐type photosensitive polyimide (PSPI) based on poly(amic acid) (PAA), a crosslinker 1,1,1‐tris{4‐[2‐(vinyloxy)ethoxy]phenyl}ethane (TVPE), a photoacid generator (PAG) (5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐2‐(methylphenyl)acetonitrile (PTMA), and a thermobase generator (TBG) t‐butyl 2,6‐dimethylpiperidine‐1‐carboxylate (BDPC) has been developed as a promising material in microelectronics. The PAA was prepared from 3,3′,4,4′‐biphenyltetracarboxylic dianhydride (BPDA) and 4,4′‐oxydianiline (ODA) in dimethyl sulfoxide (DMSO). The PSPI, consisting of PAA (69 wt %), TPVE (21 wt %), PTMA (3 wt %), and BDPC (7 wt %), showed high sensitivity of 21 mJ/cm² and a high contrast of 6.8 when it was exposed to a 436‐nm line (g‐line), postbaked at 90 °C for 5 min, and developed with 1.69 wt % TMAHaq. A clear positive image of 8 μm line and space pattern was printed on film, which was exposed to 50 mJ/cm² of g‐line by a contact printing mode and fully converted to the corresponding polyimide (PI) pattern on heating at 200 °C, confirmed by FTIR spectroscopy. Thus, this system will be a good candidate for next generation PSPIs. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 3362–3369, 2009     

Synthesis and properties of novel photosensitive polyimides containing chalcone moiety in the main chain

Two chalcone-derivative isomers, 4,4′-diaminochalcone ( 4DAC ) and 3,3′-diaminochalcone ( 3DAC ), were synthesized and used as monomers together with tetracarboxylic dianhydrides to prepare novel photosensitive polyimides that contain a chalcone moiety in the main chain. The polyimides were characterized and their photochemical behavior was investigated as thin films and in solutions with the aid of ultraviolet and infrared spectroscopy. Compared with 4DAC -based polyimides, the 3DAC -based polyimides exhibited lower glass transition temperatures and higher photocrosslinking rates of the carbon–carbon double bond as well as higher photosensitivities obtained from the exposure characteristic curves, suggesting that an increase in the photoreactivity of the 3DAC -based polyimides might arise from the improved flexibility of their backbones. The polyimide from 3DAC and 6FDA (2,2-bis[3,4-dicarboxypheny]hexa-fluoropropane dianhydride) showed a photosensitivity of 33 mJ/cm² with a contrast of 1.5 upon light irradiation using a Xenon lamp. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 685–693, 1998     

Negative‐type photosensitive poly(phenylene ether) based on poly(2,6‐dimethyl‐1,4‐phenylene ether), a crosslinker,and a photoacid generator

A negative‐type photosensitive poly(phenylene ether) (PSPPE) based on poly(2,6‐dimethyl‐1,4‐phenylene ether) (PPE), a novel crosslinker 4,4′‐methylene‐bis [2,6‐bis(methoxymethyl)phenol] (MBMP) having good compatibility with PPE, and diphenylidonium 9,10‐dimethoxy anthracene‐2‐sulfonate (DIAS) as a photoacid generator (PAG) has been developed. This resist consisting of PPE (73 wt %), MBMP (20 wt %) and DIAS (7 wt %) showed a high sensitivity (D_0.5) of 58 mJ/cm² and a contrast (γ_0.5) of 9.5 when it was exposed to i‐line (365 nm wavelength light), postexposure baked at 145 °C for 10 min, and developed with toluene at 25 °C. A fine negative image featuring 6 μm line‐and‐space pattern was obtained on the film exposed to 300 mJ/cm² of i‐line by a contact‐printed mode. The resulting polymer film cured at 300 °C for 1 h under nitrogen had a low dielectric constant (ε = 2.46) comparable to that of PPE and a higher T_g than that of PPE. In addition, the cured PSPPE film was pretty low water absorption (<0.05%) as same as PPE. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 4949–4958, 2008     

Synthesis of polymer containing o-nitrobenzyl ether structure in the main chain

The polycondensation of nitrated xylenedihalides with diphenols was carried out under various conditions. The polycondensation of 2-nitro-1, 3-xylylenedibromide (NXDB) with 4,4′-isopropylidenediphenol proceeded in competition with the decomposition of polymer in the mixed solvent of tetrahydrofuran (THF) and dimethylsulfoxide (DMSO). The viscosity of the resulting polymer was markedly affected by the concentration of aqueous sodium hydroxide, reaction time, and reaction temperature. When dibromomethane was used as a solvent, the polycondensation proceeded very smoothly without the decomposition to give a higher reduced viscosity polymer than that in THF-DMSO at 60°C. The polymer obtained in dibromomethane contained a very small amount of formal bonds determined from the ¹H-NMR spectrum. The formation of formal bonds seems to cause the molecular weight in increase. Furthemore, the polycondensation of NXDB with 2,2-bis (4-hydroxyphenyl) hexafluoropropane afforded high molecular-weight polyether in dibromomethane. However, either high reaction temperatures or the high concentrations of aqueous potassium hydroxide solution casused the viscosity of the resulting polymer to decrease during the polycondensation in dibromomethane. The obtained polyethers with o-nitrobenzyl groups showed relatively good solubility, and decomposed smoothly upon the irradiation with UV light. Therefore, these polymers might be useful for positive type photoresists.     

Synthesis and positive‐imaging photosensitivity of soluble polyimides having pendant carboxyl groups

Polyimides having pendant carboxyl groups were prepared by a direct one‐pot polycondensation of 4,4′‐(hexafluoroisopropylidene)diphthalic anhydride (6FDA) with 3,5‐diaminobenzoic acid (DABz) and bis[4‐(3‐aminophenoxy)phenyl]sulfone (m‐BAPS) in the presence of a γ‐valerolactone/pyridine catalyst system using N‐methyl‐2‐pyrrolidone (NMP)/toluene mixture as a solvent at 180 °C. The obtained polyimides were soluble in dipolar aprotic solvents such as dimethylformamide, dimethyl sulfoxide, and NMP as well as in tetrahydrofuran and aqueous basic solution. The solubility of the polyimides was dependent on the diamine composition. Photosensitve polyimide (PSPI) systems composed of the polyimides and diazonaphthoquinone compound as a photosensitive material gave positive‐tone behavior by UV irradiation, followed by development with aqueous tetramethylammonium hydroxide (TMAH) solution. The scanning electron microscopic photograph of the resulting image showed 10‐μm line/space resolution with about 15 μm of film thickness. The PSPIs baked at 350 °C for a short time had excellent thermal resistance comparable to the original polyimides. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 934–946, 2001     

Image formation by dyeing of copolymers bearing photogenerated acid and base groups with dye bath containing acid and basic dyes

Copolymers bearing photoacid generating groups and/or photobase generating groups were dyed after UV irradiation with a dye bath containing both an acid dye and a basic dye. Acetophenone O‐acryloyloxime (AAPO) was used as a monomer bearing acyloxyimino (AOI) group that generates a primary amino group upon irradiation, which is followed by hydrolysis. Phenacylsulfonylstyrene (PSSt) and 1,2,3,4‐tetrahydronaphthylideneamino p‐styrenesulfonate (NISS) were chosen as monomers having β‐keto sulfone (β‐KS) and iminosulfonate (IS) groups, respectively, which yielded acid groups when irradiated. Copolymers of AAPO and methyl methacrylate (MMA) were dyed with only the acid dye, and those of PSSt or NISS were dyed with only the basic dye after irradiation. AAPO‐PSSt‐MMA films became dyeable with the acid dye when irradiated for a short time and with the basic dye with further irradiation. However, AAPO‐NISS‐MMA copolymers showed the reverse dyeing behavior. IR spectra revealed that AOI groups were photochemically decomposed prior to the β‐KS groups for AAPO‐PSSt‐MMA, and AOI and IS groups decomposed simultaneously for AAPO‐NISS‐MMA. These results suggested the possibility of adsorption of different ionic dyes on the films by a change of irradiation time; in fact, color patterns could be obtained in a single staining process using the dye bath. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 3043–3051, 2000     

Synthesis of alkaline‐developable,photosensitive hyperbranched polyimides through the reaction of carboxylic acid dianhydrides and trisamines

Hyperbranched polyimides (HBPI)s with high glass‐transition temperatures and excellent thermal stability were synthesized through the reaction of commercially available carboxylic acid dianhydrides with tris[4‐(4‐aminophenoxy)phenyl]ethane (TAPE). In particular, hyperbranched polyimide HBPI(TAPE‐DSDA), prepared through the reaction of TAPE with 3,3′,4,4′‐diphenylsulfonetetracarboxylic dianhydride (DSDA), showed higher thermal stability and good solubility. Furthermore, alkaline‐developable, photosensitive HBPI(TAPE‐DSDA)‐MA‐CA was prepared through the reaction of HBPI(TAPE‐DSDA) with glycidyl methacrylate with tetrabutylammonium bromide as a catalyst in N‐methyl‐2‐pyrrolidinone (NMP) followed by the addition reaction of cis‐1,2,3,6‐tetrahydrophthalic anhydride with triphenylphosphine as a catalyst in NMP. The glass‐transition temperatures of HBPI(TAPE‐DSDA)‐MA‐CA were greater than 300 °C. A resist composed of 74 wt % HBPI(TAPE‐DSDA)‐MA‐CA, 22.2 wt % trimethylpropane triacrylate, and 3.8 wt % Irgacure 907 as a photoinitiator achieved a resolution of a 55‐μm line pattern and a 275‐μm space pattern by UV irradiation (1000 mJ/cm²). © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 3697–3707, 2004     

Synthesis and micropatterning properties of a novel base‐soluble,positive‐working,photosensitive polyimide having an o‐nitrobenzyl ether group

A novel positive‐working, photosensitive polyimide, poly[1,4‐phenyleneoxy‐1,4‐phenylene‐2,2′‐di(2‐nitrobenzyloxy)benzophenone‐3,3′,4,4′‐tetracarboxdiimide] (OPI‐Nb), developable with an aqueous base was prepared by the o‐nitrobenzylation of a polyimide, poly(1,4‐phenyleneoxy‐1,4‐phenylene‐2,2′‐dihydroxybenzophenone‐3,3′,4,4′‐tetracarboxdiimide) (OPI), derived from 2,2′‐dihydroxy‐3,3′,4,4′‐benzophenonetetracarboxylic dianhydride (DHBA) and 4,4′‐oxydianiline, and it micropatterning properties were investigated. The o‐nitrobenzylation of OPI to OPI‐Nb was conducted with o‐nitrobenzyl bromide in N‐methyl‐2‐pyrrolidinone containing Et₃N. The DHBA monomer was synthesized by exhaustive KMnO₄ oxidation of bis(2‐dimethoxy‐3,4‐dimethylphenyl)methane obtained by etherification of bis(2‐hydroxy‐3,4‐dimethylphenyl)methane with iodomethane, followed by deprotection of the methoxy groups and cyclodehydration of the obtained 2,2′‐dihydroxy‐3,3′4,4′‐benzophenonetetracarboxylic acid. The intermediate bis(2‐hydroxy‐3,4‐dimethylphenyl)methane was prepared by the condensation of 2,3‐dimethylphenol with paraformaldehyde. The degree of o‐nitrobenzylation was determined to be over 94 mol % from ¹H NMR absorption of benzylic CH₂ protons. The aromatic OPI was perfectly soluble in a dilute aqueous NaOH solution and tetramethylammonium hydroxide (TMAH), whereas OPI‐Nb was not even swellable in them. In the micropatterning process, OPI‐Nb showed a line‐width resolution of 0.4‐μm and a sensitivity of 5.4 J/cm² when its thin films were irradiated with 365‐nm light and developed with a 2.38% aqueous TMAH solution at room temperature for 90 s. The thickness loss of OPI‐Nb films measured after postbaking at 350 °C was in the 8–9% range. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 776–788, 2007     

Synthesis of photosensitive and thermosetting poly(phenylene ether) based on poly[2,6‐di(3‐methyl‐2‐butenyl)phenol‐co‐2,6‐dimethyl‐phenol] and a photoacid generator

A chemically amplified photosensitive and thermosetting polymer based on poly[2,6‐di(3‐methyl‐2‐butenyl)phenol (15 mol %)‐co‐2,6‐dimethylphenol (85 mol %)] ( 3c ) and a photoacid generator [(5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐(2‐methylphenyl)acetonitrile] was developed. Poly[2,6‐bis(3‐methyl‐2‐butenyl)phenol]‐co‐2,6‐dimethylphenol)] ( 3 ) with high molecular weights (number‐average molecular weight ～ 24,000) was prepared by the oxidative coupling copolymerization of 2,6‐di(3‐methyl‐2‐butenyl)phenol with 2,6‐dimethylphenol in the presence of copper(I) chloride and pyridine as the catalyst under a stream of oxygen. The structures of 3 were characterized with IR, ¹H NMR, and ¹³C NMR spectroscopy. 3 was crosslinked by a thermal treatment at 300 °C for 1 h under N₂. The 5% weight loss temperatures and glass‐transition temperatures of the cured copolymers reached around 420 °C in nitrogen and 300 °C, respectively. The average refractive index of the cured copolymer ( 3c ) film was 1.5452, from which the dielectric constant at 1 MHz was estimated to be 2.6. The resist showed a sensitivity of 35 mJ cm^?2 and a contrast of 1.6 when it was exposed to 436‐nm light, postexposure‐baked at 145 °C for 5 min, and developed with toluene at 25 °C. A fine negative image featuring 8‐μm line‐and‐space patterns was obtained on a film exposed to 100 mJ cm^?2 with 436‐nm light in the contact‐printed mode. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 149–156, 2005     

Photochemical modification of polymer surface by the pendant photobase generator containing oxime‐urethane groups and its application to an image‐recording material

Copolymers containing oxime‐urethane groups were prepared by the copolymerization of methyl methacrylate and benzophenoneoximinocarbonylaminoethyl methacrylate (BCM), and their photochemical properties were examined from the UV and IR absorption spectral changes. The decomposed fraction of oxime‐urethane groups in the copolymer increased with irradiation time, but it decreased with the content of BCM units in the copolymer. Changes of the surface properties of the copolymer film on irradiation were studied by measurements of the contact angle and dyeing with an acid dye. The surface of the copolymer film changed to become more hydrophilic upon irradiation with 254 nm of UV light. After the irradiated copolymer films were treated with HCl or methanol, changes of the contact angle of water on irradiation were compared. The copolymer film was dyed by acid dyes after treatment of the irradiated film with HCl. The degree of dyeing increased with irradiation time and BCM units in the copolymer, but it was unaffected by the film thickness. Various colors were developed on the irradiated area depending on the acid dye as the developer. © 2002 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 40: 1200–1207, 2002     

Alternative approach to the design of thermosensitive polymers: The addition of hydrophobic groups to the ends of hydrophilic polyether

We synthesized thermosensitive polymers by adding hydrophobic groups to the ends of a hydrophilic polyether, poly(ethylene oxide‐co‐propylene oxide). The cloud points of the polymers were controlled by the molecular weight of the polyether and the kind of hydrophobic end group. The polymers showed relatively sharp phase transitions, as observed by turbidimetry. The order of the cloud points of the polymers with various end groups did not follow that of the critical micelle concentrations of the polymers determined with fluorescence measurements with pyrene as a probe. The cloud points of the polymers linearly decreased with increasing concentrations of salts (Na₂SO₄ and Na₃PO₄). The slopes of the linear lines were almost constant, regardless of the kind of hydrophobic group and the molecular weight of the polyether. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 1007–1013, 2005     

Investigation on dual properties of photosensitive thermotropic liquid‐crystalline poly(benzylidene‐ether)s containing alkanones and methylene spacers in the main chain

Thermotropic main chain liquid‐crystalline poly (benzylidene‐ether)s were synthesized by Claisen‐Schmidt polycondensation reaction of 4,4′‐diformyl‐2,2′‐dimethoxy‐α,ω‐diphenoxyalkanes with acetone, cyclopentanone, and cyclohexanone. The diformyl precursors were synthesized from 4‐hydroxy‐3‐methoxybenzaldehyde with dibromoalkanes of varying spacer lengths. The structure of monomers and polymers was confirmed by elemental analyses, Fourier‐transform infrared, ¹H NMR, and ¹³C NMR spectral analyses. The thermal properties were studied by thermogravimetric analysis and differential scanning calorimetry. Thermogravimetric analysis (TGA) data revealed that the polymers were stable up to 285 °C and start degrading thereafter. Cyclopentanone‐containing polymers are more stable than cyclohexanone‐ and acetone‐containing polymers. The self‐extinguishing property of the synthesized polymers was studied by calculating the limiting oxygen index values using Van Krevelen's equation. The influence of the length of methylene spacer on phase transition was investigated using differential scanning calorimetry (DSC), and it was proved that the isotropic temperature decreases with an increase in the length of the spacer. Polarized optical microscopic study showed that cyclohexanone‐containing polymers exhibit nematic threadlike and nematic droplet texture. The photolysis of liquid‐crystal poly(benzylidene‐ether)s revealed that the Entgegen, Zusammen (EZ) photoisomerization proceeds in the system. The band gap energy was calculated from absorption spectra and is in the range of 3.05–3.37 eV and proved that the length of spacers has a significant influence on their absorption and emission. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Synthesis of autophotosensitive hyperbranched polyimides based on 3,3′,4,4′‐benzophenonetetracarboxylic dianhydride and 1,3,5‐tris(4‐aminophenoxy)benzene via end capping of the terminal anhydride groups by ortho‐alkyl aniline

Benzophenone‐containing, anhydride‐terminated hyperbranched poly(amic acid)s were end‐capped by ortho‐alkyl aniline in situ and then chemically imidized, yielding autophotosensitive hyperbranched polyimides. The polyimides were soluble in strong polar solvents, such as N‐methyl‐2‐pyrrolidone, N‐dimethylformamide, dimethylacetamide, and dimethyl sulfoxide. Thermogravimetric analysis revealed their excellent thermal stability, with a 5 wt % thermal loss temperature in the range of 527–548 °C and a10 wt % thermal loss temperature in the range of 562–583 °C. The strong absorption of the polyimide films in ultraviolet–visible spectra at 365 nm indicated that the hyperbranched polyimides were patternable. Highly resolved images with a line width of 6 μm were developed by ultraviolet exposure of the polymer films. A well‐defined image with lines as thin as 3 μm was also patterned, but the lines were rounded at the edges. © 2003 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 41: 2026–2035, 2003     

Synthesis of poly(silyl ether)s containing pendant chloromethyl groups by the polyaddition of bis(oxetane)s with dichlorosilanes

The polyaddition of bis(3‐ethyl‐3‐oxetanylmethyl) terephthalate (BEOT) with dichlorodiphenylsilane (CPS) using tetrabutylammonium bromide (TBAB) as a catalyst proceeded under mild reaction conditions to afford a polymer containing silicon atoms in the polymer main chain. A poly(silyl ether) (P‐1) with a high molecular weight (M_n = 53,200) was obtained by the reaction of BEOT with CPS in the presence of 5 mol % of TBAB in toluene at 0 °C for 1 h and then at 50 °C for 24 h. The structure of the resulting polymer was confirmed by IR and ¹H NMR spectra. Furthermore, it was proved that the polyaddition of certain bis(oxetane)s with dichlorosilanes proceeds smoothly to give corresponding poly(silyl ether)s with TBAB as the catalyst. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 2254–2259, 2000     

pH-dependent aggregation of citrate-capped Au nanoparticles induced by Cu ions: The competition effect of hydroxyl groups with the carboxyl groups

The citrate-capped Au nanoparticles were found to undergo pH-dependent aggregation induced by Cu²⁺ ions. At low pH value (8.9), the Au nanoparticles aggregated into fractal-like structure induced by the coordination interactions between the carboxyl groups of citrate ligands and Cu²⁺ ions. At high pH value (10.1), the Au nanoparticles aggregated into close-packed structure attributed to the increased concentration of hydroxyl groups. The coordination interactions between the metal ions and the ligands were suppressed as a result of the competition effect of the hydroxyl groups with the carboxyl groups. The aggregation process was identified to be dominated by the cluster–cluster mechanism at the low pH value and the particle–cluster mechanism at the high pH value.     

Helical chirality of π‐conjugated main‐chain induced by polymerization of phenylacetylene with chiral bulky pinanyl groups: Effects of the flexible spacer and polymerization catalyst

Three optically active phenylacetylene polymers with chiral bulky pinanyl groups, (?)‐poly[4‐(dimethylpinanylsilyl)phenylacetylene] [(?)‐poly(PSPA)], (+)‐poly{4‐[3‐(10‐pinanyl)tetramethyldisiloxy]phenylacethylene} [(+)‐poly(PDSPA)], and their copolymer [(?)‐copoly(PSPA/PDSPA)], were synthesized. We observed high chirality in the main‐chain chromophore of (?)‐poly(PSPA), due to the presence of a chiral helix, with circular dichroism spectroscopy. In contrast, (+)‐poly(PDSPA),with flexible SiOSi spacers between the chiral pinanyl group and the main chain, had lower chirality. (?)‐Poly(PSPA), with large circular dichroism signals, was prepared by polymerization with a rhodium catalyst and had a highly stereoregular main chain (high cis‐configuration percentage). However, (?)‐poly(PSPA) prepared with a tungsten catalyst had lower chirality and lower stereoregularity in the main chain. A membrane from (?)‐poly(PSPA) showed enantioselective permeability for tryptophan in an aqueous solution. © 2002 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 40: 1689–1697, 2002