Luminescence of an erbium- and ytterbium-containing complex in porous silicon films

Er³⁺ and Yb³⁺ ions are introduced into porous silicon films, stabilized by oxidation in an oxygen plasma, in the form of a gadolinium oxychloride-based luminophor by means of thermal diffusion. An investigation is made of the luminescence and photoexcitation spectra of samples with Er³⁺ (10 and 30 wt.%), Yb³⁺ (10 wt.%), and Er³, Yb³⁺⁺ (10 wt.% each). It is shown that the intense IR luminescence (1.00 and 1.54 μm) is caused by cross-relaxation effects. The most effective excitation of the luminescence has been observed in the UV absorption band of the porous silicon. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 66, No. 3, pp. 428–433, May–June, 1999.     

有机吸附物对多孔硅微腔发光的影响

理论上,采用Bruggeman有效介质近似,研究了有机吸附物对多孔硅微腔的折射率及其光致发光谱的影响.实验上,采用计算机控制的电化学腐蚀法制备了多孔硅微腔样品,并利用机械泵油的蒸气分子与该微腔样品进行相互作用.研究发现,多孔硅微腔发射的窄化光致发光谱对泵油蒸气分子的吸附与脱附很敏感,与之伴随的是该窄化光致发光谱发生明显的峰位移动(可达71nm)和强度变化.结合Bruggeman近似和表面态对多孔硅发光的影响,对实验结果进行了定性解释.实验结果与理论模拟结果符合较好. 关键词： Bruggeman近似 吸附物 多孔硅微腔 光致发光谱     

多孔硅衬底上溅射沉积SiC:Tb薄膜的光致发光行为

在多孔硅衬底上用射频溅射法沉积了非晶的SiC:Tb薄膜. 对样品在N2中进行了不同温度的退火处理. 用傅里叶红外变换谱分析了样品的结构.用荧光光谱仪测试了样品的光致发光，在紫外、可见光区域观测到了强的发光峰.发现随着衬底加热温度和样品退火温度的变化，发光峰有明显的强度变化和微弱的蓝移现象.分析了产生这种现象的机理，得出了紫外区域的发光峰是由于氧缺乏中心引起的，而可见区的发光是由于Tb离子产生的. 关键词： 碳化硅 光致发光 氧缺乏中心 多孔硅     

矫顽力可调的多孔硅基Fe膜

采用电化学腐蚀法制备了不同多孔度的多孔硅(PS),再通过磁控溅射法在该PS衬底上沉积了一定厚度的Fe膜;并对样品进行了X射线衍射的结构分析、扫描隧道显微技术的表面形貌观察和磁光克尔效应的测量.发现在同一Fe膜厚度下，相对于参考样品硅上的Fe膜，多孔硅上Fe膜的矫顽力更大;同时观察到多孔硅基Fe膜随着PS多孔度的增加，矫顽力相应变大;而对于多孔度相同的多孔硅基样品,随着Fe膜厚度的增加矫顽力却逐步减小.得出了多孔硅特有的海绵状疏松结构能有效调节Fe膜矫顽力大小的结论. 关键词： 多孔硅 海绵状结构 Fe薄膜 矫顽力     

Blue Photoluminescence of Oxidized Films of Porous Silicon

It is found that the films of n ⁺-type porous silicon of low (10–50%) porosity exhibit photoluminescence in the region 400–500 nm after a 5-month storage in an air atmosphere. The spectrum of blue photoluminescence of the least porous but strongly oxidized films has maxima at 417, 435, and 465 nm. The same spectrum structure manifests itself upon the introduction of an Er³⁺- and Yb³⁺-containing complex. The mechanisms of blue photoluminesence are discussed.     

掺铜及掺铝多孔硅的光致发光及其发光机理

分别将特定杂质铜和铝引入多孔硅后，观察到了杂质铜和铝所引起的附加发光带：对于没有掺铜的多孔硅，其光致发光谱只有一个发光带；而掺过铜的多孔硅，其光致发光谱出现两个发光带，其中能量较低的发光带随主发光带而变化。在掺铝多孔硅的光致发光谱中，则出现4个与铝杂质能级有关发光带。我们认为上述与杂质有关的发光带是由截流子在杂质深能级上复合所致。     

多孔硅拉曼光谱的研究

采用电化学腐蚀的方法制备多孔硅。对不同实验条件下所得到的多孔硅的拉曼光谱进行了分析，确认多孔硅是具有纳米晶结构特征的材料，肯定了量子限制效应在多孔硅光致发光中的作用。     

稀土掺杂多孔硅的蓝光发射

关键词：     

Photoluminescence quenching of porous silicon by noble metal adsorbates

Ｐｈｏｔｏｌｕｍｉｎｅｓｃｅｎｃｅ ｑｕｅｎｃｈｉｎｇ ｏｆ ｐｏｒｏｕｓ ｓｉｌｉｃｏｎ ｂｙ ｎｏｂｌｅ ｍｅｔａｌ ａｄｓｏｒｂａｔｅｓ￥ＧＵＯＨｅｎｇｑｕｎ（ＤｅｐａｒｔｍｅｎｔｏｆＡｐｐｌｉｅｄＰｈｙｓｉｃｓ，ＨｕａｑｉａｏＵｎｉｙｅｒｓｉ...     

水蒸气退火多孔硅发光性能的正电子谱学研究

使用正电子湮没寿命谱和正电子寿命-动量关联谱对水蒸气和真空条件下退火的多孔硅样品的微观缺陷结构进行表征,结合发射光谱测量结果,对影响多孔硅发光性能的因素进行了讨论.实验结果表明,水蒸气退火后样品孔壁表面的悬挂键减少,并出现新的E′γ和EX类缺陷.水蒸气退火后样品中两种缺陷数量发生变化是导致多孔硅样品发光增强的直接原因;真空退火未使样品中发光相关缺陷发生变化,样品的发光性能没有显著改变.     

光声谱研究多孔碳化硅的能带特性

报道了用UV光照射和不用UV光照射条件下形成的p型α PSC以及原始SiC的光声光谱（PAS）.从光声Rosenwaig Gersho理论出发，计算出多孔SiC的吸收系数与能量的关系，得到多孔SiC的能隙低于原始SiC的能隙，并深入分析了能隙的变化原因，同时，对吸收边附近的吸收情况进行了讨论. 关键词： 光声光谱 多孔碳化硅 能隙     

Regularities of the photoluminescence of porous silicon after chemical etching in HF

The effect of chemical treatment of porous silicon samples by HF on its photoluminescence and its evolution with time in sample aging in air is investigated. It is shown that the effect of HF on the luminescence parameters depends on the duration of the treatment and the initial photoluminescence intensity of the sample. It is found that chemical etching in HF accelerates the growth of the total luminescence intensity in aging of the sample in air. The evolution of the photoluminescence spectrum in aging of the sample in air after chemical etching can be explained within the framework of the quantum-size model of the luminescence of porous silicon. Presented at the Fall Meeting of the Material Research Society, December 1–5, 1997, Boston, USA Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 66, No. 3, pp. 423–427, May–June, 1999.     

Photoactive thin films of polycaprolactam doped with europium (III) complex using phenylalanine as ligand

A photoactive complex based on europium(III) using the amino acid phenylalanine as ligand was prepared and characterized. The obtained europium(III)/phenylalanine complex presents an effective energy transfer from ligands to the rare earth center. The observed photoluminescent behavior for europium(III)/phenylalanine complex was similar to the well known europium(III)/ acetyl-β-acetonate hydrate. New photoactive polyamide thin films were prepared using polycaprolactam as host of these complexes. The structural characterizations of the films were studied through Rutherford backscattering (RBS), Fourier transform infrared (FTIR) and Raman spectroscopies. The polyamide films doped with the amino acid and acetyl-β-acetonate rare earth complexes maintain the original photoluminescent behavior, narrow emission bands corresponding to transitions ⁵D₀ → ⁷F_0-4, which indicates that this polymer is an excellent host to these complexes.     

Luminescence imaging for inline characterisation in silicon photovoltaics

Luminescence imaging is a very rapid technique for the characterisation of silicon samples. Megapixel luminescence images on silicon bricks, unprocessed wafers, partially processed wafers and fully processed cells can be captured with acquisition times of typically a few seconds or less than one second. A number of specific luminescence imaging applications have been developed over the last three years, allowing quantitative spatial information to be gained about a variety of crucial material and device parameters. This paper reviews some of the intriguing possibilities for inline monitoring in PV production at an early stage of production that result from the above mentioned short measurement times. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Study on structural properties of epitaxial silicon films on annealed double layer porous silicon

In this paper, epitaxial silicon films were grown on annealed double layer porous silicon by LPCVD. The evolvement of the double layer porous silicon before and after thermal annealing was investigated by scanning electron microscope. X-ray diffraction and Raman spectroscopy were used to investigate the structural properties of the epitaxial silicon thin films grown at different temperature and different pressure. The results show that the surface of the low-porosity layer becomes smooth and there are just few silicon-bridges connecting the porous layer and the substrate wafer. The qualities of the epitaxial silicon thin films become better along with increasing deposition temperature. All of the Raman peaks of silicon films with different deposition pressure are situated at 521 cm⁻¹ under the deposition temperature of 1100 °C, and the Raman intensity of the silicon film deposited at 100 Pa is much closer to that of the monocrystalline silicon wafer. The epitaxial silicon films are all (4 0 0)-oriented and (4 0 0) peak of silicon film deposited at 100 Pa is more symmetric.     

Fano resonance in heavily doped porous silicon

Unexpectedly, the Fano resonance caused by the interference of continuum electron excitations with the longitudinal optical (LO) phonons was observed in random porous Si by Raman scattering. The analysis of the experimental data shows that the electron states trapped at the Si SiO₂ interface dominate in the observed Raman scattering. The gap energy associated with the interface states was determined. Copyright © 2011 John Wiley & Sons, Ltd.     

发射可见光多孔硅的拉曼光谱

本文报导了多孔硅的拉曼散射和光致发光的研究。给出了多孔硅的拉曼和光致发光谱之间的对应关系,根据拉曼峰的移动,估算了多孔硅量子线横截面的平均尺度为2.1～4.2nm。     

Luminescence of silicon films on sapphire irradiated with high-energy particles

Using low-temperature (4.2–78 K) photoluminescence, we study the processes of defect formation in silicon films on sapphire irradiated with high-energy particles (electrons, γ-quanta of⁶⁰Co). It is established that carbon atoms, as a residual process impurity, participate in the formation of luminescence centers stable up to annealing temperatures of about 550 K. For carbon-containing centers we reveal a shift in the spectral lines relative to their position in spectra of single-crystal silicon. It is proposed that this spectral shift is associated with the presence of internal stresses of about 5·10⁸ N/m² in the silicon films. Institute of Solid-State Physics and Semiconductors, National Academy of Sciences of Belarus, 17, P. Brovka Str., Minsk, 220072, Belarus. Translated from Zhurnal Prikladnoi Spektroskefii, Vol. 66, No. 3, pp. 383–386, May–June, 1999.     

多孔硅的制备条件对其光致发光特性的影响

不同的实验条件下制备的多孔硅的光致发光(PL)特性是不同的,这是许多研究产生分歧的主要原因。对比分析了阳极氧化电流密度、阳极氧化时间、溶液浓度以及自然氧化时间对多孔硅光致发光光谱的影响。认为在一定的范围内,多孔硅的发光峰位会随电流密度的增大而蓝移,要获得较强的发光,需要选择合适的电流密度;随着腐蚀时间的延长,多孔硅的发光峰位也发生蓝移。当HF酸的浓度较小时,峰位随浓度的增大表现为向低能移动;而当HF酸的浓度较大时,峰位随浓度的增大则表现为移向高能。多孔硅在空气中自然氧化,其发光峰位发生蓝移,而发射强度随放置时间的延长而降低。并用量子限制模型和发光中心模型对实验结果进行解释。     

Tuning the cathodoluminescence of porous silicon films

We have obtained intense cathodoluminescence (CL) emission from electron beam modified porous silicon films by excitation with electrons with kinetic energies below 2 keV. Two types of CL emissions were observed, a stable one and a non-stable one. The first type is obtained in well-oxidized samples and is characterized by a spectral peak that is red shifted with respect to the photoluminescence (PL) peak. The physically interesting and technologically promising CL is however the CL that correlates closely with the PL. Tuning of this CL emission was achieved by controlling the average size of the nanostructure thus showing that the origin of this CL emission is associated with the quantum confinement and the surface chemistry effects that are known to exist in the porous silicon system. We also found that the electron bombardment causes microscale morphological modifications of the films, but the nanoscale features appear to be unchanged. The structural changes are manifested by the increase in the density of the nanoparticles which explains the significant enhancement of the PL that follows the electron irradiation.