椭偏测厚实验的CAI软件设计

分析了椭偏测厚实验存在的困难,采用Authorware等工具软件,成功地设计和编制一套椭偏测厚实验的CAI仿真程序,使用表明,软件界面友好,仿真度高,互动功能强,实验内容丰富,可用于辅助教学。     

光谱型椭偏仪对各向异性液晶层的测量

探讨了利用普通光谱型椭偏仪对各向异性液晶层进行综合性测量的可行性. 并利用法国Jobin Yvon公司的UVISEL SPME(Spectroscopic Phase Modulated Ellipsometer)光谱型椭偏仪测量了光学各向异性液晶层的折射率n_o和n_e及液晶层厚d，进一步利用椭偏仪在透射方式下测量了平行排列液晶层的光延迟特性Δnd，二者取得了很好的一致性，说明利用光谱型椭偏仪可以实现对光学单轴性液晶层及其他材料的测量，测厚精度为纳米量级. 关键词： 光谱型椭偏仪 各向异性 折射率 相位延迟     

椭偏法测膜厚的直接计算方法

改进了椭偏法测薄膜折射率和膜厚的迭代计算方法，由测量得到的起偏角A和检偏角P直接算出薄膜折射率和膜厚．     

多功能椭偏测厚仪

研究成功一台变入射角反射式消光法多功能智能椭偏测厚仪。实验表明 :仪器的测厚准确度为± 0 1nm ;椭偏参数Ψ和Δ的测量重复性精度分别为± 0 1°和± 0 3° ,适用于纳米级薄膜厚度和折射率的测量     

与衬底接触时金属膜折射率的经验规律

用椭偏仪测透明介质膜(例如硅片上生长的二氧化硅膜),实验数据与理论计算曲线符合得很好;但对于有很强吸收的金属膜,其实验数据与理论计算曲线相差很大。例如,用相同的加热电流但用不同的蒸发时间在硅片上蒸发出不同厚度的银膜,用椭偏仪测试膜厚的结果如图所示。按一般手册所     

椭偏法测厚及折射率的计算机解算

WJZ型多功能激光椭圆偏振仪是在JJY型分光计上附加激光椭偏装置而组成。兼有分光计和椭偏仪的功能,可用于测量不同基底上介质薄膜的厚度和折射率;除作为高校中级物理实验外,亦可用于材料表面光学参数的分析研究。但是,与原椭偏装置相配用的椭偏仪数据表,只能适用于K_q基底上生长的氧化锆薄膜标准试样,这就实际上限制了椭偏仪的使用范围;另一方面,即使对上述标准试样测量,所获数据往往与数据表提供的数值偏离甚大,直接影响实验效果。经过多次实际试验,本文分析了三相椭偏方程解的特性,讨论了不同条件下椭偏法测厚及折射率的计算机解算。     

一种新型椭偏测量实验 --塞曼激光外差椭偏仪

分析了大学物理实验中传统的消光式椭偏仪实验存在的问题，提出以一种新型外差式椭偏测量系统取代．结合塞曼激光外差干涉和反射式椭偏测量原理，给出了光学结构设计．系统中没有任何运动部件，也无需手动操作，实验过程自动化程度高，测量速度快．     

用椭偏光谱仪测量不同波长下砷化镓的光学参量

讨论了把单长TP－77型随偏仪改装成椭偏光谱仪的原理，并用改装后的椭偏仪测量多个波长下GaAs的光学参量，测量结果与参考文献的结果符合较好，改进后的实验提高了学生的动手能力，加深了学生对椭偏技术的了解。     

纳米精度外差椭偏仪的研制

本文介绍了各种椭偏仪的原理及性能,重点对外差式椭偏仪进行介绍,并对提出的几种外差透射椭偏仪的原理进行了实验验证。     

基于棱镜的椭偏法测量液体复折射率

通过引进等腰棱镜,利用椭偏测量技术实现了液体复折射率的精确测量.基于菲涅尔公式及椭偏测量原理,从理论上分析仪器测量得到的椭偏参数与棱镜-液体界面椭偏参数的关系,并讨论了测量液体折射率及吸收系数的精度.使用消光式椭偏仪,测量了水和印度墨水的复折射率,得到了样品的折射率、吸收系数随浓度变化的实验曲线,实验结果与参考文献基本一致.实验表明:棱镜椭圆偏振技术测量液体折射率及吸收系数的精度分别为0.000 4和0.000 3,适合于快速测量.     

提高旋转检偏器式椭偏仪准确度的方法

本文分析了最常见的影响旋转检偏器式椭偏仪准确度的两个因素.提出了改进的测量方法和测量结果的修正公式,提高了测量准确度并为实验所证实.     

与消光式兼容的光度椭偏仪的原理

在PQSA式消光型椭偏仪基础上,把原来方位固定的1/4波片改为旋转波片就可以构成与消光式兼容的新型光度椭偏仪。本文讨论了这种光度椭偏仪的工作原理和计算公式。理论分析指出,这是一种完全的椭偏仪,能唯一地确定的符号,并在测量线偏光的时精度不会下降。文中还报告了进行原理性实验的结果。     

Dual-frequency paired polarization phase shifting ellipsometer

A novel dual-frequency paired polarization phase shifting ellipsometer (DPPSE) is proposed and experimentally demonstrated. It combines the features of the phase shifting interferometer and common-path polarized heterodyne interferometric ellipsometer where the ellipsometric parameters (EP) of a specimen are measured accurately. The experimental results verify that DPPSE is capable of determining the full dynamic range of EP. In addition, the properties of dual-frequency paired linearly polarized laser beam in DPPSE perform in common phase noise rejection mode. It is insensitive to environmental disturbance and laser frequency noise. The capability of DPPSE to perform higher accuracy EP measurement than conventional ellipsometer is verified according to error analysis.     

Development and construction of rotating polarizer analyzer ellipsometer

A detailed mathematical derivation and an experimental characterization of one to two ratio rotating polarizer analyzer ellipsometer (RPAE) are presented. The alignment, calibration, and testing of reference samples are also discussed. The optical properties of some known materials obtained by the proposed ellipsometer will be shown and compared to accepted values. Moreover, the constructed ellipsometer will be tested using two ellipsometry standards with different thicknesses.     

椭圆偏振法测量薄膜参量的数据处理

利用实时作图的方法,开发设计了椭偏仪数据处理应用程序,该程序不但具有传统查图法简便直观的特点,而且不限制实验条件的选择,能够满足科学研究和实验教学的要求,利用该程序和多入射角测量方法,能够确定薄膜的真实厚度。     

新型花菁染料Langmuir-Blodgett膜的椭偏光谱研究

利用椭偏光谱法(SE)对Y型花菁染料LB膜在紫外—可见光范围内(λ=2755—8266nm)的光学特性进行了表征,同时得到了该薄膜的光学常量(复介电常数、消光系数、吸收系数、反射系数、折射率等).讨论了LB薄膜对不同频率光的较高吸收特性及其成膜结构之间的关系,对其物理机理给予了解释.此外,采用洛伦兹振子模型对所得的光学参量进行了理论拟合,结果发现：其理论拟合与实验数据符合得非常好. 关键词： Langmuir-Blodgett膜 椭圆偏振光谱法 洛伦兹振子模型     

Polarization modulation imaging ellipsometry for thin film thickness measurement

A polarization modulation (PM) imaging ellipsometer is proposed and setup in order to measure precisely the thickness of thin film. Five images are collected sequentially by CCD camera with respect to five pre-determined azimuth angles of a quarter wave plate (QWP) during measurement. Then two-dimensional (2-D) distributions of the ellipsometric parameters ψ and Δ over the full dynamic range are obtained. Conceptually, PM imaging ellipsometer integrates the features of phase shift interferometry with conventional photometric ellipsometry by rotating the QWP sequentially to produce polarization modulation that is able to measure the thickness of a thin film in two dimensions precisely and quickly. The basic principle of PM imaging ellipsometer is derived wherein features such as common path configuration, full dynamic range of measurement, and insensitive to non-uniform response of the CCD are analyzed. The experimental results verify the ability and performance of PM imaging ellipsometer on 2-D thin film thickness, while the errors regarding the ellipsometric parameters measurements are discussed.     

Novel scheme of ellipsometry utilizing parallel processing with arrayed photonic crystal

We propose a novel static parallel-processing ellipsometer consisting of arrays of photonic crystal polarizers and quarter-wave plates (QWP) having different orientations of the optical axes. On the basis of the autocloning technique, each array is monolithically integrated on a substrate in a single deposition process. The pattern of light transmitted through the two photonic crystals, a number of pairs of QWP, and polarizer with different axes is detected by an array of photodiodes, and the polarization is analyzed instantaneously from the image. No mechanical rotation or electrooptic modulation is necessary. Preliminary experiments of the ellipsometer are performed for the first time, and the principle of operation is confirmed. This type of ellipsometer is simple, compact, and robust, and therefore, will open up new applications for industrial use.     

Method for measuring the phase shift introduced by a phase plate with an interference ellipsometer

A new method for measuring the phase delay introduced by a phase plate is substantiated. The method uses an interference ellipsometer that does not require preliminary determination of the direction of the principal axes of the plate. Sources of error in the method are analyzed and components of error are quantitatively estimated. Requirements for the polarization characteristics of a beamsplitter used in the interference ellipsometer are formulated and conditions for decreasing the measurement error are found.