透射式指数掺杂GaAs光电阴极最佳厚度研究

通过研究指数掺杂GaAs光电阴极中光电子扩散漂移长度与均匀掺杂GaAs光电阴极中光电子扩散长度的差异,确定透射式指数掺杂GaAs光电阴极的最佳厚度范围为16—22 μm.利用量子效率公式对透射式指数掺杂GaAs光电阴极最佳厚度进行了仿真分析,发现厚度为20 μm时阴极积分灵敏度最大.外延生长阴极厚度分别为16和20 μm的两种透射式指数掺杂GaAs样品并进行了激活实验,测得样品的积分灵敏度分别为1228和1547 μA/lm,两者的比值为796%. 实验结果与仿真结果符合. 关键词： GaAs光电阴极 透射式 指数掺杂 厚度     

Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures. On the basis of our early research on the surface photovoltage of GaAs photocathodes, and comparative research before and after activation of reflection-mode GaAs photocathodes, we further the comparative research on transmission-mode GaAs photocathodes. An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer. By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure, we can obtain the equations for the surface photovoltage (SPV) curve before activation and the spectral response curve (SRC) after activation. Through experiments and fitting calculations for the designed material, the body-material parameters can be well fitted by the SPV before activation, and proven by the fitting calculation for SRC after activation. Through the comparative research before and after activation, the average surface escape probability (SEP) can also be well fitted. This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method, which only measures the body parameters by SRC after activation. It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes, and optimize the Cs-O activation technique in the future.     

Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures.On the basis of our early research on the surface photovoltage of GaAs photocathodes,and comparative research before and after activation of reflection-mode GaAs photocathodes,we further the comparative research on transmission-mode GaAs photocathodes.An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer.By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure,we can obtain the equations for the surface photovoltage(SPV) curve before activation and the spectral response curve(SRC) after activation.Through experiments and fitting calculations for the designed material,the body-material parameters can be well fitted by the SPV before activation,and proven by the fitting calculation for SRC after activation.Through the comparative research before and after activation,the average surface escape probability(SEP) can also be well fitted.This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method,which only measures the body parameters by SRC after activation.It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes,and optimize the Cs-O activation technique in the future.     

指数掺杂结构对透射式GaAs光电阴极量子效率的影响研究

通过在一维连续性方程光电子产生函数项中加入短波约束因子,修正了指数掺杂和均匀掺杂透射式GaAs光电阴极量子效率公式.利用修正的透射式阴极量子效率公式分别拟合制备的指数掺杂和均匀掺杂透射式阴极量子效率实验曲线,符合得很好.另外拟合得到的阴极性能参数表明,由于内建电场的作用,指数掺杂阴极的性能要好于均匀掺杂阴极,指数掺杂结构能够明显提高透射式阴极的量子效率. 关键词： 透射式光电阴极 指数掺杂 量子效率 内建电场     

大梯度指数掺杂透射式GaAs光电阴极响应特性的理论分析

讨论了一种具有超快时间响应特性的新光电阴极, 即大梯度指数掺杂透射式GaAs 负电子亲和势 (NEA) 光电阴极, 模拟了它的量子效率、时间分辨和空间分辨能力等特性. 理论分析结果表明, 由于大梯度指数掺杂设计方式, 在吸收层内形成较大的内建电场, 因此光生电子在GaAsNEA阴极内的渡越时间大大缩短, 当GaAs吸收层厚度～0.9 μm时, 其响应时间达到～ 10 ps, 说明这种新NEA阴极具有远优于传统均匀掺杂NEA阴极的超快响应特性. 同时在整个光谱响应范围内, 量子效率达到约10%-20%, 空间分辨力显著高于以往的计算结果. 分析结果表明,在保证较高的量子效率条件下, 这种新阴极能够突破常规GaAsNEA阴极的时间分辨率极限, 提高GaAsNEA阴极本身的分辨力, 有望用于超快摄影、电子加速器和自由电子激光器的电子源等领域, 进一步扩展NEA光电阴极的应用范围.     

Influence of built-in electric filed on the energy and emergence angle spreads of transmission-mode GaAs photocathode

In order to research the transport characteristic of photoelectrons in different-structure transmission-mode GaAs photocathodes, the energy and emergence angle spreads of photoelectrons reaching the band-bending region are calculated and the photoemission properties are analyzed. Based on the established atomic configuration models and ionized impurity scattering formulas of the uniform-doping and exponential-doping photocathodes, the trajectories of photoelectrons in different GaAs photocathodes have been calculated. The results show that, the emergence angle spread of the exponential-doping photocathode is more centralized than that of the uniform-doping one. The influence of the built-in electric field on the photoemission is obvious in the short-wave region. The built-in electric field not only increases the quantum efficient, but also improves the resolution of photocathode. This research can be propitious to investigate the photoemission mechanism, and to analyze the effect of the excited photoelectrons on the image intensifier performance.     

高性能透射式GaAs光电阴极量子效率拟合与结构研究

为了探索高性能透射式GaAs光电阴极的特征结构,对光电阴极量子效率公式进行了光谱反射率与短波截止限的修正,并利用修正后的公式对ITT透射式GaAs光电阴极量子效率(≈43%)曲线进行了拟合,得到拟合相对误差小于5%时的结构参数为:窗口层Ga_1-xAl_xAs的厚度介于0.3-0.5 μm,Al组分x值为0.7,发射层GaAs的厚度介于1.1-1.4 μm.另外,根据拟合结果讨论了均匀掺杂透射式GaAs光电阴极的优化结构参数,如果光电阴极具有0.4 μm厚的Ga_1-xAl_xAs(x=0.7)窗口层和1.1-1.5 μm厚的GaAs发射层,则积分灵敏度可以达到2350 μA/lm以上. 关键词： 透射式GaAs光电阴极 量子效率 积分灵敏度 光学性能     

利用紫外透射光谱研究透射式GaN光电阴极的材料结构及光学特性

GaN紫外光电阴极是近年发展起来的一种高性能真空紫外探测器件,其中透射式结构作为光电阴极实际应用的工作模式,其多层结构参数及光学特性对阴极的最终光电发射性能有着重要的影响.测试了透射式GaN阴极材料的紫外透射光谱,通过建立透射式GaN阴极样品的透射模型,得到了GaN阴极样品的薄膜厚度、光学吸收系数与透射谱之间的函数关系.计算得到的GaN外延材料的厚度与实际值误差小,吸收系数与已发表数据一致,表明紫外透射光谱法能够准确地实现透射式GaN阴极材料结构及光学特性的评估.     

Influence of cesium on the stability of a GaAs photocathode

The stability of a reflection-mode GaAs photocathode has been investigated by monitoring the photocurrent and the spectral response at room temperature.We observe the photocurrent of the cathode decaying with time in the vacuum system under the action of Cs current,and find that the Cs atoms residing in the vacuum system are helpful in prolonging the life of the cathode.We examine the evolution and analyse the influence of the barrier on the spectral response of the cathode.Our results support the double dipolar model for the explanation of the negative electron affinity effect.     

Influence of thermal processing on the properties of Sn-doped GaAs epitaxial layers

The influence of annealing at a temperature of 750–830°C on the electrophysical, luminescent, and structural characteristics of GaAs layers doped with various concentrations of tin is studied. It is shown that, for low doping levels, the layers possess properties with high thermal stability. During annealing, one observes a lowering of the concentration of electrons, a reduction of the lattice periodicity, and a change in the photoluminescence spectra of strongly-doped layers, which is explained by the process of the formation of complexes and by the decomposition of supersaturated solid solutions of impurity dopants.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 54–59, January, 1989.The authors express gratitude to M. P. Yakuben for x-ray topographical studies.     

Influence of thickness on optical properties of titanium layers

Titanium layers with different thicknesses of 21, 83.7, and 133 nm and same other deposition conditions were deposited on glass substrates at 300 K, by physical vapor deposition method under high vacuum conditions. The optical reflectance of the layers was measured in the wave length range of 400–800 nm. The optical properties were calculated by using Kramers-Kronig relations. Relation between the optical properties and nanostructure of the layers was investigated. By using Generalized Gradient Approximations in context of plane wave pseudopotentials (norm conserving and ultrasoft) method, band structure calculated and compared with experimental results.     

Influence of holmium doping on the optical properties of quaternary InGaAsP epitaxial layers

Photoluminescence and photoconductivity measurements were used to study the influence of Ho doping on the optical properties of InGaAsP layers grown by liquid phase epitaxy (LPE). The full width at half maximum (FWHM) of the photoluminescence peak was found to decrease as the amount of Ho increases. When the amount of Ho is 0.11 wt%, the FWHM has a minimum value of 7.93 meV, about 46% lower than that of the undoped InGaAsP. The absorption tails observed in the photoconductivity were analyzed with the Urbach tail model and the Urbach energies were obtained from the fits. The Urbach energy decreases as the amount of Ho increases, indicating that Ho doping greatly reduces the amount of residual impurities in LPE-grown layers.     

不同盖层对InAs/GaAs量子点结构和光学性质的影响

利用金属有机化合物气相沉积设备生长了不同盖层结构的InAs/GaAs量子点,采用原子力显微镜和光致发光光谱仪对量子点的结构和光学性质进行了研究.量子点层之间的盖层由一个低温层和一个高温层组成.对不同材料结构的低温盖层的对比研究表明,In组分渐变的InGaAs低温盖层有利于改善量子点均匀性、减少结合岛数目、提高光致发光强度;当组分渐变InGaAs低温盖层厚度由6.8 nm增加到12 nm,发光波长从1256.0 nm红移到1314.4 nm.另外,还对不同材料结构的高温盖层进行了对比分析,发现高温盖层采用In组分渐变的InGaAs材料有利于光致发光谱强度的提高. 关键词： 半导体量子点 盖层 组分渐变     

Electrophysical properties of GaAs layers and the characteristics of fast particle GaAs detectors

Results of complex experiments aimed at finding a relationship between the properties of initial GaAs single-crystal wafers and epitaxial films and the threshold spectrometric characteristics of ionizing radiation detectors are reported.     

光学窗口外形对气动光学效应的影响

流场求解采用3维雷诺平均N-S方程,分别利用ROE格式和二阶中心格式对对流通量和粘性通量进行离散处理;用高斯-赛德尔隐式格式对方程进行时间推进求解,采用k-ε两方程模型用于湍流的数值模拟。采用几何光学结合物理光学方法分析平均流动和湍流对光场的影响。计算结果表明:由于窗口外形曲面的曲率不同,两种窗口外部流场存在较大区别,气流速度、密度的分布情况各不相同。曲率较大的窗口外形对气流的压缩程度较大,导致气流绕过窗口顶端中心区域时流速快,密度梯度大,因而窗口空气阻力较大,光束在该窗口流场中传输受气流影响的影响也较大。     

Similarity of optical properties of hydrides and semiconductors for antireflection coatings

The electronic structure and optical properties of the complex hydrides Ca₂FeH₆, Ca₂RuH₆, Mg₂FeH₆, Mg₂RuH₆, Sr₂FeH₆, Sr₂RuH₆ and Sr₂OsH₆ were studied using first-principles calculations. Optical spectra of the hydrides were compared with those of SiN _x , In₂O₃ and ZnO determined from theoretical calculations and measured experimentally. Based on an analysis of band structure, it is found that the electrical conductivity of the hydrides is expected to be poor. However, optical properties of the hydrides in the energy range 0–3 eV are found to be almost the same as those of SiN _x , In₂O₃, ZnO and TiO₂. Hydrides are suggested to be used as antireflection layers and for passivation of surface and bulk defects. This finding could be useful for electronic device technology including solar cells.     

Effect of thermal annealing in the microstructural and the optical properties of uncapped InAs quantum dots grown on GaAs buffer layers

The effect of thermal annealing on self-assembled uncapped InAs/GaAs quantum dots (QDs) has been investigated using transmission electron microscopy (TEM) and photoluminescence (PL) measurements. The TEM images showed that the lateral sizes and densities of the InAs QDs were not changed significantly up to 650 °C. When the InAs/GaAs QDs were annealed at 700 °C, while the lateral size of the InAs QDs increased, their density decreased. The InAs QDs disappeared at 800 °C. PL spectra showed that the peaks corresponding to the interband transitions of the InAs QDs shifted slightly toward the high-energy side, and the PL intensity decreased with increasing annealing temperature. These results indicate that the microstructural and the optical properties of self-assembled uncapped InAs/GaAs can be modified due to postgrowth thermal annealing.     

Electrical properties of Cd,Zn and S ion-implanted layers in GaAs

The electrical properties of cadmium, zinc, and sulfur ion-implanted layers in gallium arsenide have been measured by the van der Pauw-Hall technique. Ion implantation was performed with the substrates held at room temperature. The dependence of sheet resistivity, surface carrier concentration, and mobility on ion dose and on post-implantation anneal temperature was determined. In the case of 60 keV Cd⁺ ions implanted into n-type substrates, a measurable p-type layer resulted when samples were annealed for 10 minutes at a temperature in the range 600—900°C. After annealing at 300—900°C for 10 minutes, 100 per cent electrical activity of the Cd ions resulted for ion doses ≤ 10¹⁴/cm².

The properties of p-type layers produced by implantation of 85 keV Zn⁺ ions were similar to those of the 60 keV cadmium-implanted layers, in that no measurable p-type behavior was observed in samples annealed below a relatively high temperature. However, in samples implanted with 20 keV Zn⁺ ions a p-type layer was observed after annealing for 10 minutes at temperatures as low as 300°C.

Implantation of sulfur ions into p-type GaAs substrates at room temperature resulted in the formation of a high resistivity n-type layer, evcn before any annealing was performed. Annealing at temperatures up to 200°C or above 600°C lowered the resistivity of the layer, while annealing in the range 300—500°C eliminated the n-type layer.