Modifications in structural and optical properties of Mn-ion implanted CdS thin films

In this paper, we report on modifications in structural and optical properties of CdS thin films due to 190 keV Mn-ion implantation at 573 K. Mn-ion implantation induces disorder in the lattice, but does not lead to the formation of any secondary phase, either in the form of metallic clusters or impurity complexes. The optical band gap was found to decrease with increasing ion fluence. This is explained on the basis of band tailing due to the creation of localized energy states generated by structural disorder. Enhancement in the Raman scattering intensity has been attributed to the enhancement in the surface roughness due to increasing ion fluence. Mn-doped samples exhibit a new band in their photoluminescence spectra at 2.22 eV, which originates from the d-d (⁴T₁ → ⁶A₁) transition of tetrahedrally coordinated Mn²⁺ ions.     

Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.     

Effect of annealing on structural and optical properties of diamond-like nanocomposite thin films

The annealing effect on structural and optical properties of the Diamond-like Nanocomposite (DLN) thin film deposited on glass substrate by Plasma Assisted Chemical Vapor Deposition (PACVD) method has been investigated. The films were annealed at temperature ranging from 300 to 600 °C, with 100 °C interval for 9 minutes by rapid thermal process (RTP) under vacuum. The structural changes of the annealed films have been studied using Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Scanning Electron Microscope (SEM), and optical parameters have been determined using transmittance and reflectance spectra in UV-UIS-NIR range. The result shows that the refractive index increases gradually from 1.79 to 2.84 with annealing temperature due to out-diffusion of H by breaking Si–H and C–H bond leads to Si–C bond, i.e. more cross linking structure. In higher temperature range, graphitization also enhanced the refractive index. However, the optical band gap at up to 400 °C initially increases from 3.05 to 3.20 eV and then decreases due to graphitization. The film has a great potential to be used as anti-reflection coating (ARC) on silicon-based solar cell.     

Effect of Fe-ion implantation doping on structural and optical properties of CdS thin films

We report on effects of Fe implantation doping-induced changes in structural, optical, morphological, and vibrational properties of cadmium sulfide thin films. Films were implanted with 90 keV Fe⁺ ions at room temperature for a wide range of fluences from 0.1×10¹⁶ to 3.6×10¹⁶ ions cm⁻² (corresponding to 0.38–12.03 at.% of Fe). Glancing angle X-ray diffraction analysis revealed that the implanted Fe atoms tend to supersaturate by occupying the substitutional cationic sites rather than forming metallic clusters or secondary phase precipitates. In addition, Fe doping does not lead to any structural phase transformation although it induces structural disorder and lattice contraction. Optical absorption studies show a reduction in the optical band gap from 2.39 to 2.17 eV with increasing Fe concentration. This is attributed to disorder-induced band tailing in semiconductors and ion-beam-induced grain growth. The strain associated with a lattice contraction is deduced from micro-Raman scattering measurements and is found that size and shape fluctuations of grains, at higher fluences, give rise to inhomogeneity in strain.     

Structural and optical properties of CdS thin films

CdS thin films are deposited onto glass substrates by vacuum evaporation at 373 K and the films are annealed at different temperatures. Rutherford backscattering spectrometry (RBS) and X-ray diffraction techniques are used to determine the thickness, composition, crystalline structure and grain size of the films. The films show a predominant hexagonal phase with small crystallites. The optical band gap of the films are estimated using the optical transmittance measurements. A decrease in the band gap is observed for the annealed films. The Raman peak position of the CdS A₁ (LO) mode did not change much whereas, the full width at half maximum (FWHM) is found to decrease with annealing.     

Annealing temperature effect on the structural, optical and electrical properties of ZnS thin films

Zinc sulfide thin films were prepared on glass substrates at room temperature using a chemical bath deposition method. The obtained films were annealed at temperatures ranging from 100 to 500 °C in steps of 100 °C for 1 h. The films were characterized by X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray analysis (EDX), optical absorption spectra, and electrical measurements. X-ray diffraction analysis indicates that the deposited films have an amorphous structure, but after being annealed at 500 °C, they change to slightly polycrystalline. The optical constants such as the refractive index (n_r), the extinction coefficient (k), and the real (ε₁) and imaginary (ε₂) parts of the dielectric constant are calculated depending on the annealing temperature. Aside from the ohmic characteristics of the I-V curve, a nonlinear I-V curve owing to the Schottky contact is also found, and the barrier heights (?_bn) for Au/n-ZnS and In/n-ZnS heterojunctions are calculated. The conductivity type was identified by the hot-probe technique.     

The annealing effect on structural and optical properties of ZnO thin films produced by r.f. sputtering

In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E₂ (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated.     

Effect of annealing on structural, optical and electrical properties of nanostructured Ge thin films

Ge thin films with a thickness of about 110 nm have been deposited by electron beam evaporation of 99.999% pure Ge powder and annealed in air at 100-500 °C for 2 h. Their optical, electrical and structural properties were studied as a function of annealing temperature. The films are amorphous below an annealing temperature of 400 °C as confirmed by XRD, FESEM and AFM. The films annealed at 400 and 450 °C exhibit X-ray diffraction pattern of Ge with cubic-F structure. The Raman spectrum of the as-deposited film exhibits peak at 298 cm⁻¹, which is left-shifted as compared to that for bulk Ge (i.e. 302 cm⁻¹), indicating nanostructure and quantum confinement in the as-deposited film. The Raman peak shifts further towards lower wavenumbers with annealing temperature. Optical band gap energy of amorphous Ge films changes from 1.1 eV with a substantial increase to ∼1.35 eV on crystallization at 400 and 450 °C and with an abrupt rise to 4.14 eV due to oxidation. The oxidation of Ge has been confirmed by FTIR analysis. The quantum confinement effects cause tailoring of optical band gap energy of Ge thin films making them better absorber of photons for their applications in photo-detectors and solar cells. XRD, FESEM and AFM suggest that the deposited Ge films are composed of nanoparticles in the range of 8-20 nm. The initial surface RMS roughness measured with AFM is 9.56 nm which rises to 12.25 nm with the increase of annealing temperature in the amorphous phase, but reduces to 6.57 nm due to orderedness of the atoms at the surface when crystallization takes place. Electrical resistivity measured as a function of annealing temperature is found to reduce from 460 to 240 Ω-cm in the amorphous phase but drops suddenly to 250 Ω-cm with crystallization at 450 °C. The film shows a steep rise in resistivity to about 22.7 KΩ-cm at 500 °C due to oxidation. RMS roughness and resistivity show almost opposite trends with annealing in the amorphous phase.     

Effects of annealing on structural,optical and electrical properties of Al-doped ZnO thin films

Transparent conducting oxide (TCO) thin films such as SnO2, In2O3, and Cd2SnO4, have been used extensively as sensor devices, surface acoustic wave devices, coating to heat glass windows and transparent electrodes for solid state display devices, solar cells[1,2] because of their high optical transparency in the visible range, infrared reflec-tance and low d.c. resistivity. Although SnO2 film was developed early, nowadays Sn-doped In2O3 (ITO) films are the predominant TCO thin film in …     

Influence of annealing temperature on structural, optical and magnetic properties of Mn-doped ZnO thin films prepared by sol-gel method

Thin films of Zn_1−xMn_xO (x=0.01) diluted magnetic semiconductor were prepared on Si (1 0 0) substrates by the sol-gel method. The influence of annealing temperature on the structural, optical and magnetic properties was studied by X-ray diffraction (XRD), atom force microscopy (AFM), photoluminescence (PL) and SQUID magnetometer (MPMS, Quantum Design). The XRD spectrum shows that all the films are single crystalline with (0 0 2) preferential orientation along c-axis, indicating there are not any secondary phases. The atomic force microscopy images show the surfaces morphologies change greatly with an increase in annealing temperature. PL spectra reveal that the films marginally shift the near band-edge (NBE) position due to stress. The magnetic measurements of the films using SQUID clearly indicate the room temperature ferromagnetic behavior, and the Curie temperature of the samples is above room temperature. X-ray photoelectron spectroscopy (XPS) patterns suggest that Mn²⁺ ions were successfully incorporated into the lattice position of Zn²⁺ ions in ZnO host. It is also found that the post-annealing treatment can affect the ferromagnetic behavior of the films effectively.     

Influence of annealing temperature on structural and optical properties of ZnO: In thin films prepared by ultrasonic spray technique

Transparent conducting indium doped zinc oxide was deposited on glass substrate by ultrasonic spray method. The In doped ZnO samples with indium concentration of 3 wt.% were deposited at 300, 350 and 400 °C with 2 min of deposition time. The effects of substrate temperature and annealing temperature on the structural, electrical and optical properties were examined. The DRX analyses indicated that In doped ZnO films have polycrystalline nature and hexagonal wurtzite structure with (0 0 2) preferential orientation and the maximum average crystallite size of ZnO: In before and annealed at 500 °C were 45.78 and 55.47 nm at a substrate temperature of 350 °C. The crystallinity of the thin films increased by increasing the substrate temperature up 350 °C, the crystallinity improved after annealing temperature at 500 °C. The film annealed at 500 °C and deposited at 350 °C show lower absorption within the visible wavelength region. The band gap energy increased from E_g = 3.25 to 3.36 eV for without annealing and annealed films at 500 °C, respectively, indicating that the increase in the transition tail width. This is due to the increase in the electrical conductivity of the films after annealing temperature.     

Microstructural, optical and photocatalytic properties of CdS doped TiO2 thin films

CdS doped TiO₂ thin films (with CdS content=0, 3, 6, 9 and 12 at%) were grown on glass substrates. The X-ray diffraction analysis revealed that the films are polycrystalline of monoclinic TiO₂ structure. The microstructure parameters of the films such as crystallite size (D_ν) and microstrain (e) are calculated. Both the crystallites size and the microstrain are decreased with increasing CdS content. The optical constants have been determined in terms of Murmann's exact equations. The refractive index and extinction coefficient are increased with increasing CdS content. The optical band gap is calculated in the strong absorption region. The possible optical transition in these films is found to be an allowed direct transition. The values of E_g^opt are found to decrease as the CdS content increased. The films with 3 at% CdS content have better decomposition efficiency than undoped TiO₂. The films with 6 at% and 9 at% CdS content have decomposition efficiency comparable to that of undoped TiO₂, although they have lower band gap. The CdS doped TiO₂ could have a better impact on the decomposing of organic wastes.     

Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by sol–gel method

In this work, ZnO thin films were synthesized by sol–gel method on glass substrates followed by calcinations on different temperatures. The effect of annealing temperature on the structure and optical properties of the films was studied. The structural characteristics of the samples were analyzed by X-ray diffraction and atomic force microscope. The optical properties were studied by a UV-visible spectrophotometer. The results show that all the prepared ZnO thin films have a high preferential oriented c-axis orientation with compact hexagonal wurtzite structure. With the increasing annealing temperature (mse.ufl.edu), the intensity of (002) peak, particle size, surface RMS roughness, and absorbance of the ZnO thin films were increased as well. On the contrary, the transmittance and optical band gaps were decreased.     

Effect of post annealing temperature on structural and optical properties of ZnCdO thin films deposited by sol–gel method

Ternary ZnCdO thin films oriented along c-axis have been successfully deposited on p-Si (1 0 0) substrates using sol–gel spin coating route. To optimize most suitable annealing temperature for the Zn_1−xCd_xO thin films; these films with selected cadmium content x = 0.10 were treated at annealing temperatures from 300 °C up to 800 °C in oxygen ambient after deposition. The structural and optical properties of deposited thin films have been characterized by X-ray diffraction, energy dispersive spectroscopy, atomic force microscopy, UV–Vis spectroscopy, and photoluminescence spectra. The results show that the obtained films possess high crystallinity with wurtzite structure. The crystallite size, lattice parameters, lattice strain and stress in the deposited films are determined from X-ray diffraction analysis. The band gap energy increased as a function of annealing temperatures as observed from optical reflectance spectra of samples. The presence of Cd in the deposited films is confirmed by energy dispersive spectrum and it is observed that Cd re-evaporate from the lattice with annealing. The photoluminescence measurements as performed at room temperature did not exhibit any luminescence related to oxygen vacancies defects for lower annealing temperatures, as normally displayed by ZnO films. The green yellow luminescence associated to these defects was observed at higher annealing temperatures (≥700 °C).     

Crystalline structure and morphological properties of undoped and Sn doped ZnO thin films

Undoped and tin (Sn) doped ZnO thin films have been prepared by spray pyrolysis method. Effect of Sn dopant on the crystalline structure and morphological properties of ZnO thin films has been investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM) method. XRD patterns confirm that the films have polycrystalline nature. While undoped ZnO film has (101) as the preferred orientation, Sn doped ZnO thin films have (002) as the preferred orientation. Grain sizes, lattice parameters and texture coefficient values of the films were determined. Microstructure was analyzed by SEM and the influence of the doping concentration in the microstructure of the films is investigated.     

衬底温度对HfO_2薄膜结构和光学性能的影响

采用直流磁控反应溅射法,分别在室温,200,300,400和500℃下制备了HfO2薄膜。利用X射线衍射(XRD)、椭圆偏振光谱(SE)和紫外可见光谱(UVvis)研究了衬底温度对HfO2薄膜的晶体结构和光学性能的影响。XRD研究结果显示:不同衬底温度下制备的HfO2薄膜均为单斜多晶结构;随衬底温度的升高,(-111)面择优生长更加明显,薄膜中晶粒尺寸增大。SE和UVvis研究结果表明:随衬底温度升高,薄膜折射率增加,光学带隙变小;制备的HfO2薄膜在250～850nm范围内有良好的透过性能,透过率在80%以上。     

Low temperature ferromagnetic properties of CdS and CdTe thin films

The magnetic property in a material is induced by the unpaired electrons. This can occur due to defect states which can enhance the magnetic moment and the spin polarization. In this report, CdS and CdTe thin films are grown on FTO glass substrates by chemical bath deposition and close-spaced sublimation, respectively. The magnetic properties, which are introduced from oxygen states, are found in CdS and CdTe thin films. From the hysteresis loop of magnetic moment it is revealed that CdS and CdTe thin films have different kinds of magnetic moments at different temperatures. The M–H curves indicate that from 100 K to 350 K, CdS and CdTe thin films show paramagnetism and diamagnetism, respectively.A superparamagnetic or a weakly ferromagnetic response is found at 5 K. It is also observed from ZFC/FC curves that magnetic moments decrease with temperature increasing. Spin polarized density functional calculation for spin magnetic moment is also carried out.     

Thickness effect on the structural and optical constants of stibnite thin films prepared by sulfidation annealing of antimony films

This paper deals with some physical properties of antimony sulphide Sb₂S₃ thin films obtained by an annealing process in sulphur vapors at 300 °C of Sb thermal evaporated thin films deposited on glass substrate. The crystal structure and surface morphology were investigated by both XRD and AFM techniques. This structural study shows that Sb₂S₃ thin films were well crystallized in orthorhombic structure and some parameters such as the lattice parameter, crystallite size, microstrain and degree of preferred orientation have been reported and correlated with the effect of crystallite size. On the other hand, the refractive index and the extinction coefficient were discussed in terms of the Forouhi–Bloomer model. The optical band gap was found to range from 1.75 to 2.23 eV. Finally, the analysis of the optical parameters extracted from the Urbach–Martienssen and Forouhi–Bloomer models lead to some explanations of the correlations between the structural properties in terms of the crystallite size and optical ones.     

Effects of rapid thermal annealing on structural, magnetic and optical properties of Ni-doped ZnO thin films

XPS depth profiles were used to investigate the effects of rapid thermal annealing under varying conditions on the structural, magnetic and optical properties of Ni-doped ZnO thin films. Oxidization of metallic Ni from its metallic state to two-valence oxidation state occurred in the film annealed in air at 600 °C, while reduction of Ni²⁺ from its two-valence oxidation state to metallic state occurred in the film annealed in Ar at 600 and 800 °C. In addition, there appeared to be significant diffusion of Ni from the bottom to the top surface of the film during annealing in Ar at 800 °C. Both as-deposited and annealed thin films displayed obvious room temperature ferromagnetism (RTFM) which was from metallic Ni, Ni²⁺ or both with two distinct mechanisms. Furthermore, a significant improvement in saturation magnetization (M_s) in the films was observed after annealing in air (M_s = 0.036 μ_B/Ni) or Ar (M_s = 0.033 μ_B/Ni) at 600 °C compared to that in as-deposited film (M_s = 0.017 μ_B/Ni). An even higher M_s value was observed in the film annealed in Ar at 800 °C (M_s = 0.055 μ_B/Ni) compared to that at 600 °C mainly due to the diffusion of Ni. The ultraviolet emission of the Ni-doped ZnO thin film was restored during annealing in Ar at 800 °C, which was also attributed to the diffusion of Ni.     

Mn掺杂ZnO薄膜的结构及光学性能研究

通过脉冲激光沉积(PLD)法在SiO₂基片上制备了不同含量的Mn掺杂ZnO薄膜.X射线衍射、X射线能谱、原子力显微镜与紫外-可见分光光度计测试结果表明：少量的Mn离子的掺杂并没有改变薄膜的结构，薄膜具有(103)面的择优取向；PLD法制备的ZnO薄膜的成分与靶材基本一致，实现了薄膜的同组分沉积；薄膜表面比较平坦，起伏度小于80nm，颗粒尺寸主要集中在25nm附近；但是Mn离子的掺杂改变了ZnO薄膜的禁带宽度，随Mn掺杂含量的增加，ZnO薄膜的禁带宽度增加；当薄膜中Mn含量从6%增加到 关键词： PLD ZnO薄膜 Mn掺杂 吸收谱