Optical and electrical properties of as-prepared and annealed (Se80Te20)100 − xAgx (0 ≤ x ≤ 4) ultra-thin films

Optical and electrical properties of the (Se₈₀Te₂₀)_100 ? xAg_x (0 ≤ x ≤ 4) ultra-thin films have been studied. The ultra-thin films were prepared by thermal evaporation of the bulk samples. Thin films were annealed below glass transition temperature (328 K) and in between glass transition temperature and crystallization temperature (343 K). Thin films annealed at 343 K showed crystallization peaks for Se–Te–Ag phases in the XRD spectra. The transmission and reflection of as-prepared and annealed ultra-thin films were obtained in the 300–1100 nm spectral region. The optical band gap has been calculated from the transmission and reflection data. The refractive index has been calculated by the measured reflection data. It has been found that the optical band gap increases, but the refractive index, extinction coefficient, real and imaginary dielectric constant decrease with increase in Ag content. The optical band gap and refractive index show the variation in their values with increase in the annealing temperature. The extinction coefficient increases with increasing annealing temperature. The surface morphology of ultra-thin films has been determined using a scanning electron microscope (SEM). The measured dc conductivity, under a vacuum of 10^? 5 mbar, showed thermally activated conduction with single activation energy in the measured temperature range (288–358 K) and it followed Meyer–Neldel rule. The dc activation energy decreases with increase in Ag content in pristine and annealed films. The results have been analyzed on the bases of thermal annealing effects in the chalcogenide thin films.     

Characterization of pure ZnO thin films prepared by a direct photochemical method

In this paper, amorphous ZnO thin films were obtained by direct UV irradiation of β-diketonate Zn(II) precursor complexes spin-coated on Si(1 0 0) and fused silica substrates. ZnO films were characterized by means of XPS, X-ray diffraction (XRD) and Atomic Force Microscopy (AFM). These analyses revealed that as-deposited films are amorphous and have a rougher surface than thermally treated films. Optical characterization of the films showed that these are highly transparent in the visible spectrum with an average transmittance of up to 95% over 400 nm, and an optical band-gap energy of 3.21 eV for an as-deposited film, and 3.27 eV for a film annealed at 800 °C. Low resistivity values were obtained for the ZnO films (1.0 × 10⁻² Ω cm) as determined by Van der Pauw four-point probe method.     

Effect of high electronic energy loss of 100 MeV gold heavy ions in copper chalcogenides (CuX,X = S,Se) at nanoscale: Opto-electronic properties study

The copper chalcogenide (CuX, X = S, Se) thin films have been irradiated with 100 MeV gold swift heavy ions (SHI) at 10¹¹ and 10¹² ions/cm² fluences. The irradiation effects were probed by characterizing physical properties such as XRD, AFM, optical band gap and electrical resistivity of copper chalcogenide thin films. The increase in irradiation fluence increases the particle size, electrical conductivity and PL intensity of the materials, and the optical band edges were red shifted. The results are explained by quantifying electronic energy loss of ions in both the materials.     

Insights into effects of annealing on microstructure from SnO2 thin films prepared by pulsed delivery

Tin dioxide thin films were prepared by pulsed laser deposition techniques on clean glass substrates, and the thin films were then annealed for 30 min from 50 to 550 °C with a step of 50 °C, respectively. The influence of the annealing temperature on the microstructural and morphological properties of the tin dioxide thin films was investigated using X-ray diffraction, scanning electron microscopy, transmission electron microscopy and selected area electron diffraction. The experimental results showed that the amorphous microstructure almost transformed into a polycrystalline tin dioxide phase exhibiting a preferred orientation related to the (1 1 0), (1 0 1) and (2 1 1) crystal planes with increased temperatures. The thin film annealed at 200 °C demonstrated the best crystalline properties, viz. optimum growth conditions. However, the thin film annealed at 100 °C revealed the minimum average root-mean-square roughness of 20.6 nm with average grain size of 26.6 nm. These findings indicate that the annealing temperature is very important parameter to determining the thin film quality, which involves the phase formation, microstructure and preferred orientation of the thin films.     

Effect of annealing temperature on the optical and electrical properties of aluminum doped ZnO films

Aluminum doped ZnO thin films were successfully deposited on the silicon substrates by spin coating method. The effects of an annealing temperature on electrical and optical properties were investigated for 1.5 at.% of aluminum. Refractive index profile has been obtained for the film annealed at 350 °C using ellipsometry and it has shown minimum refractive index of 1.95 and maximum value of 2.1. Thickness profile shows quite good uniformity of the film having minimum thickness value of 30.1 nm and maximum value of 34.5 nm. Maximum conductivity value obtained was 4.63 Ω^?1-cm^?1 for the film annealed at 350 °C. Maximum carrier density of 2.20 × 10¹⁷ cm^?3 was deduced from the Hall measurement and Fourier transform infrared spectroscopy clearly reveals major peak at 407 cm^?1 in the spectra associated with the ZnO bond.     

Optical characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry

We have measured and analyzed the optical constants and polarized optical properties of amorphous aluminum nitride (a-AlN) thin films deposited by RF reactive magnetron sputtering onto silicon(1 1 1) and glass substrates. The optical constants were obtained by analysis of the measured ellipsometric spectra in the wavelength range 300–1400 nm, using the Cauchy–Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range 1.80–2.11 and 8.6 × 10⁻³–1.5 × 10⁻⁵, respectively. Analysis of the absorption coefficient, in the wavelength range 200–1400 nm, shows the bandgap of a-AlN thin films to be 5.84 ± 0.05 eV. From the angle dependence of the p-polarized reflectivity we deduce a Brewster angle of 61° and a principal angle of 64°. Measurement of the polarized optical properties reveals a high transmissivity and very low absorptivity for a-AlN films in the visible and near infrared regions. X-ray diffraction analysis confirmed the amorphous nature of the films under study.     

Evaluation of structural and mechanical properties of aluminum oxide thin films deposited by a sol–gel process: Comparison of microwave to conventional anneal

Thin films of Al₂O₃ have been deposited on polished silica glass substrates at room temperature by sol–gel dip coating technique followed by two different exposure methods. One set was annealed at different temperatures ranging from 200 °C to 800 °C for 10 h and a second set was exposed to microwave (2.45 MHz) radiation at different powers for 10 min. The lower temperature and shorter time with microwave irradiation might be ascribed to the activating and facilitating effect of microwaves on solid phase diffusion. Unlike other preparation methods, microwave heating is generally quite faster, and energy efficient. X-ray diffraction (XRD) and scanning electron microscopy (SEM), energy dispersive X-ray analysis techniques have been employed to characterize structural, morphological and elemental compositions of the films. Adhesion strength failure measurements on films performed by scratch test in progressive loading sequence have shown critical loads up to 25 N (partial perforation) for both annealed films and films exposed to microwave irradiation. Nanohardness indentation tests of the films exposed (800 W) to microwave have shown hardness of 8.3 GPa with elastic modulus of 120 GPa compared to the conventional annealed film (800°) of 4.5 GPa with elastic modulus of 90 GPa.     

Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target

Using a highly conductive ZnO(ZnAl₂O₄) ceramic target, c-axis-oriented transparent conductive ZnO:Al₂O₃ (ZAO) thin films were prepared on glass sheet substrates by direct current planar magnetron sputtering. The structural, electrical and optical properties of the films (deposited at different temperatures and annealed at 400°C in vacuum) were characterized with several techniques. The experimental results show that the electrical resistivity of films deposited at 320°C is 2.67×10⁻⁴ Ω cm and can be further reduced to as low as 1.5×10⁻⁴ Ω cm by annealing at 400°C for 2 h in a vacuum pressure of 10⁻⁵ Torr. ZAO thin films deposited at room temperature have flaky crystallites with an average grain size of ∼100 nm; however those deposited at 320°C have tetrahedron grains with an average grain size of ∼150 nm. By increasing the deposition temperature or the post-deposition vacuum annealing, the carrier concentration of ZAO thin films increases, and the absorption edge in the transmission spectra shifts toward the shorter wavelength side (blue shift).     

Preparation of thick,crack-free germanosilicate glass films by polyvinylpyrrolidone and study of the UV-bleachable absorption band

With addition of polyvinylpyrrolidone (PVP) transparent, stable GeO₂–SiO₂ sols containing up to 60–80 mol% GeO₂ were synthesized using tetraethyl orthogermanate (TEOG) and tetraethylorthosilicate (TEOS) as precursors for germania and silica, respectively. It was shown by TEM analyses that the PVP can be absorbed onto the colloidal particles providing steric hindrance for the combination and aggregation of particles. These sols were observed showing rapid increase in viscosity within both the early period and the end period of sol aging time, but exhibiting a viscosity value of about 28 mPa s within the rest aging time (45–90 h) satisfying well the requirements for the deposition of thick films by cycles of dip-coating operation. It was determined by TG-DTA and SEM analyses that the densification of GeO₂–SiO₂ gel material with PVP was much more retarded than the gel without PVP resulting in crack-free germansilicate films with a thickness of 3 μm. The crystallization behavior of germansilicate films was enhanced with the increase of GeO₂ content but glass films with a composition of 60GeO₂ · 40SiO₂ was obtained by sintered at 700 °C for 1 h and annealed at 550 °C under a flowing H₂/N₂ atmosphere for 2 h. FT-IR analyse showed that the heat treatment at 700 °C for 60 min was effective to remove the organics and hydroxyl groups in the germansilicate film. An intense 5 eV absorption band was distinctly observed in films. The intensity of this absorption band was found to be effectively bleached by UV illumination. Weak photoluminescence emission bands which originated from the neutral oxygen di-vacancy (NODV) were detected near 375 and 276 nm. Therefore, the 5 eV absorption band observed in this work was mainly caused by the neutral oxygen monovacancy (NOMV). A saturated absorptivity change of the UV-bleachable band after prolonged illumination was found to be 256 cm⁻¹ for the 60GeO₂ · 40SiO₂ films implying the NOMV concentration in the films reached about 3.8 × 10¹⁸ cm⁻³.     

Nanostructural and optical features of amorphous AlxSi0.45−xO0.55 (0 ⩽ x ⩽ 0.05) thin films prepared by RF-magnetron sputter techniques

The nanostructural, chemical, and optical features of Al_xSi_0.45−xO_0.55 (0 ⩽ x ⩽ 0.05) thin films were investigated in terms of Al concentration and post-deposition annealing conditions; the films were prepared by co-sputtering a Si main target and Al-chips, and the annealing was carried out at temperatures of 400–1100 °C. The a-Si_0.45O_0.55 films prepared without Al-chips and annealed at 800 °C contain ∼3.5 nm-sized Si nanocrystallites. The photoluminescence (PL) intensity as well as the volume fraction of Si nanocrystallites increased with increasing the concentration of Al to a certain level. In particular, the intensity of the PL spectra of the Al_0.025Si_0.425O_0.550 films which were annealed at 800 °C increased significantly at wavelengths of ∼580 nm. It is highly likely that the observed increase in the PL intensity is caused by the raise in the total volume of the ∼3.5 nm-sized nanocrystallites in the films. The addition of Al as well as the post-deposition annealing allow adjustment and control of the nanostructural and light-emission features of the a-SiO_x films.     

Structural and optical properties of TiO2 thin films derived by sol–gel dip coating process

Nanocrystalline thin films of titanium dioxide have been fabricated on glass and silica substrates from partially hydrolyzed precursor solution. These films were subjected to heat treatment for 1 h at temperatures 100, 200, 300, 400, 500, 600, 700, 800 and 900 °C and characterized by XRD, SEM, XPS and optical techniques. As deposited films are found to be amorphous and also contain hydroxyl and organic functional groups. Films heat treated above 100 °C do not contain hydroxyl and organic functional groups. Microcrystalline behavior is observed in the films heat treated above 300 °C. Crystallite size increases from ∼5 to 50 nm as sintering temperature is increased from 300 to 700 °C. Formation of anatase phase with c-axis length 7.03 Å is observed in the films annealed up to 700 °C. These films peel off from the substrate beyond 700 °C annealing temperature. Density as well as refractive index of the films increases with increase in annealing temperature up to 700 °C. Refractive index is found to show Cauchys behavior. Transmission better than 70% is observed in the visible range. There is a strong absorption around 370 nm, which is attributed to band gap absorption of the material.     

Crystallization behavior of e-beam evaporated Ga5Ge15Te80 thin films

Ga₅Ge₁₅Te₈₀ thin films have been deposited by e-beam evaporation method. The chemical composition of the deposited films was identified using energy dispersive X-ray spectrometry. The electrical conductivity, σ of the deposited films during heating/cooling cycles was investigated in the temperatures 298–570 K. The conductivity curve showed two sudden upward trends during the first heating cycle. The first upward trend occurs in the temperature range 408–430 K and was attributed to the amorphous-to-crystalline phase transformation. While the second is in the temperature range 470–495 K, and can be attributed to the crystallization process. However, for second heating cycle the conductivity curve becomes reversible. The optical band gap of the as-deposited and annealed film at annealing temperature 423 K was determined from the recorded transmittance and reflectance spectra. The obtained results were confirmed throughout the X-ray and transmission electron microscope studies.     

Growth of pure ZnO thin films prepared by chemical spray pyrolysis on silicon

Structural, morphological, optical and electrical properties of ZnO thin films prepared by chemical spray pyrolysis from zinc acetate (Zn(CH₃COO)₂ 2H₂O) aqueous solutions, on polished Si(1 0 0), and fused silica substrates for optical characterization, have been studied in terms of deposition time and substrate temperature. The growth of the films present three regimes depending on the substrate temperature, with increasing, constant and decreasing growth rates at lower, middle, and higher-temperature ranges, respectively. Growth rate higher than 15 nm min⁻¹ can be achieved at T_s=543 K. ZnO film morphological and electrical properties have been related to these growth regimes. The films have been characterized by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy.     

Sol–gel derived highly transparent and conducting yttrium doped ZnO films

This paper reports the structural, electrical and optical properties of Yttrium doped zinc oxide (YZO) thin films deposited on Corning (7059) glass substrates by spin coating technique. A precursor solution of ZnO, 0.2 M in concentration was prepared from zinc acetate dissolved in anhydrous ethanol with diethanolamine as a sol gel stabilizer. Yttrium nitrate hexahydrate (Y₂NO₃ · 6H₂O) was used as the dopant (3 wt%) in the present study. The films of different thickness in the range (200–500 nm) were prepared. The films were annealed in air at 450 °C for 1 h. It was observed that the c-axis orientation improves and the grain size increases as is indicated by an increase in intensity of the (0 0 2) peak and the decrease in the FWHM with the increase of film thickness. The resistivity decreased sharply from 2.8 × 10⁻² to 5.8 × 10⁻³ Ω-cm as the thickness increased from 200 to 500 nm. However, the average transmittance decreased from 87% to 82.6% as the film thickness increased to 500 nm. The lowest sheet resistance of ∼120 Ω/□ was obtained for the 500 nm thick film.     

Dielectric properties of bis(2,4 pentanedionato)copper(II) crystalline films grown on Si substrate for low-k applications

Bis(acetylacetonato)copper(II) thin films were prepared by sublimation at about 245 °C in vacuum on p-Si and glass substrates for dielectric and optical investigations. They were characterized by the X-ray diffraction (XRD) and energy-dispersion X-ray fluorescence (EDXRF) methods. The XRD pattern reveals that the prepared films were polycrystalline of monoclinic P2₁/n structure. The optical absorption spectrum of the prepared film was not identical to that of the molecular one, which identified by a strong absorption peak at 635 nm. The onset energy of the optical absorption of the complex was calculated by using Hamberg et al. method, which is usually used for common solid-state semiconductors and insulators. The dielectric properties for the complex as insulator were investigated on samples made in form of a metal-insulator-semiconductor (MIS) structure. The dielectric properties were studied in frequency range 1–1000 kHz and temperature range 298–333 K. The dielectric relaxation was analyzed in-terms of dielectric modulus M¹(ω). Generally, the present study shows that films of the complex grown on Si substrate are a promising candidate for low-k dielectric applications; it displays low-k value around 1.7 ± 0.1 at high frequencies.     

Plasma enhanced chemical vapor deposition of ZnO thin films

Zinc oxide thin films were deposited on silicon and corning-7059 glass substrates by plasma enhanced chemical vapor deposition at different substrate temperatures ranging from 36 to 400 °C and with different gas flow rates. Diethylzinc as the source precursor, H₂O as oxidizer and argon as carrier gas were used for the preparation of ZnO films. Structural and optical properties of these films were investigated using X-ray diffraction, reflection high energy electron diffraction, atomic force microscopy and photoluminescence. Highly oriented films with (0 0 2) preferred planes were obtained on silicon kept at 300 °C with 50 ml/min flow rate of diethylzinc without any post annealing. Reflection high energy electron diffraction pattern also showed the crystalline nature of these films. A textured surface with rms roughness ∼28 nm was observed by atomic force microscopy for the films deposited at 300 °C. A sharp peak at 380 nm in the PL spectra indicated the UV band-edge emission.     

Copper nitride (Cu3N) thin films deposited by RF magnetron sputtering

The copper nitride thin films were prepared on glass substrate by RF magnetron sputtering method. At pure nitrogen atmosphere, the nitrogen flow rate affects the copper nitride thin films’ structures. Only a little part of nitrogen atoms insert into the body center of Cu₃N structure and parts of nitrogen atoms insert into Cu₃N crystallites boundary at higher nitrogen flow rate. But the indirect optical energy gap, E_opg, decreases with increasing nitrogen flow rate. The typical value of E_opg is 1.57 eV. In a nitrogen and argon mixture atmosphere, when the nitrogen partial was less than 0.2 Pa at 50 sccm total flow rate, the (1 1 1) peak of copper nitride appears. Thermal decomposition temperature of Cu₃N thin films deposited in pure nitrogen and 30 sccm flow rate was less than 300 °C. The surface morphology was smooth.     

Amorphous tungsten-doped In2O3 transparent conductive films deposited at room temperature from metallic target

Amorphous tungsten-doped In₂O₃ (IWO) films were deposited from a metallic target by dc magnetron sputtering at room temperature. Both oxygen partial pressure and sputtering power have significant effects on the electrical and optical properties of the films. The as-deposited IWO films with the optimum resistivity of 5.8 × 10^?4 Ω·cm and the average optical transmittance of 92.3% from 400 to 700 nm were obtained at a W content of 1 wt%. The average transmittance in the near infrared region (700–2500 nm) is 84.6–92.8% for amorphous IWO prepared under varied oxygen partial pressure. The mobility of the IWO films reaches its highest value of 30.3 cm² V^?1 s^?1 with the carrier concentration of 1.6 × 10²⁰ cm^?3, confirming their potential application as transparent conductive oxide films in various flexible devices.     

Optical and kinetic properties of cathodically deposited amorphous tungsten oxide films

Optical properties and the coloration–decoloration kinetics of electrochromic films of amorphous tungsten oxide (a-WO₃), produced by cathodic deposition from a sodium tungstate based aqueous peroxide electrolyte, have been investigated. As films color in 1 N H₂SO₄, sequential appearance of bands with maxima at ∼1 eV, 1.6 eV, 2 eV, and 2.4 eV is observed in their optical absorption and electrosorption spectra, is the same as in the case of reduction of nanosized hydrated-WO₃ colloids with a gradual decrease in their size to that of 12-tungsten polyanions with Keggin structure, indicating the presence of such polytungstates in cathodically deposited a-WO₃, too. When polytungstate is reduced by one electron, an absorption band with a maximum at ∼1.6 eV appears in the optical spectrum of the film. This band corresponds to the optical excitation of charge transfer of the W⁵⁺ → W⁶⁺ type between two adjacent tungsten atoms. The reduction of polytungstate by a second electron with potential shift towards more negative values is accompanied by the appearance of an analogous band with a maximum at ∼2 eV. The reduction of such polytungstates involves participation of the bulk of injected electrons, indicating their dominate role in the nanostructure of the films investigated. The effective co-diffusion coefficient of electrons and protons in cathodically deposited a-WO₃ exhibits a potential dependence with a maximum at 0.1 V against a silver-chloride electrode, where its value is ∼10⁻⁸ cm²/s. It has been shown that the decrease in this coefficient at potential values of over 0.1 V is caused by a decrease in electron mobility.     

Correlation between the method of preparation and the properties of the sol–gel HfO2 thin films

This work describes the preparation of HfO₂ thin films by the sol–gel method, starting with different precursors such as hafnium ethoxide, hafnium 2,4-pentadionate and hafnium chloride. From the solution prepared as mentioned above, thin films on silicon wafer substrates have been realized by ‘dip-coating’ with a pulling out speed of 5 cm min^?1. The films densification was achieved by thermal treatment for 10 min at 100 °C and 30 min at 450 °C or 600 °C, with a heating rate of 1 °C min^?1. The structural and optical properties of the films are determined employing spectroellipsometric (SE) measurements in the visible range (0.4–0.7 μm), transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM). The main objective of this paper was to establish a correlation between the method of preparation (precursor, annealing temperature) and the properties of the obtained films. The samples prepared from pentadionate and ethoxide precursors are homogenous and uniform in thickness. The samples prepared starting from chloride precursor are thicker and proved to be less uniform in thickness. Higher non-uniformity develops in multi-deposition films or in crystallized films. A nano-porosity is present in the quasi-amorphous films as well in the crystallized one. For the samples deposited on silicon wafer, the thermal treatment induced the formation of a SiO₂ layer at the coating–substrate interface.