Carrier collection characteristics of microcrystalline silicon–germanium p–i–n junction solar cells

We report on the carrier collection characteristics of hydrogenated microcrystalline silicon–germanium (μc-Si_1?xGe_x:H) p–i–n junction solar cells fabricated by low-temperature (～200 °C) plasma-enhanced chemical vapor deposition. Spectral response measurements reveal that the Ge incorporation into absorber i-layer reduces the quantum efficiencies at short wavelengths. Furthermore, the illumination of the solar cells for x ? 0.35, particularly in the wavelength range of <650 nm, induces a strong injection-level-dependent p–i interface recombination and a weak collection enhancement in the bulk. These results indicate that space charges near the p–i interface are largely negative, which gives rise to an electric field distortion in the i-layer. We attribute the negative space charges to the presence of the acceptor-like states that are responsible for the strong p-type conduction observed in undoped μc-Si_1?xGe_x:H films for large Ge contents.     

GeO2 based high k dielectric material synthesized by sol–gel process

Recently, there has been lot of research on new high dielectric constant (high k) materials for use in future generations of ultra-large scale integrated circuits (ULSI). There are number of requirements for the new high k materials, such as high dielectric constant, thermal stability (400 °C or higher), high mechanical strength, and good adhesion to neighboring layers. Keeping in view the properties required for the replacement of existing SiO₂ dielectrics, new high k dielectric material based on GeO₂ has been synthesized. Polycrystalline GeO₂ thin films have been deposited by simple, and cost effective sol–gel spin coating process. The obtained xerogel films of germanium oxide have been annealed at 400 °C, 600 °C and 800 °C for 3 h in argon atmosphere. Elemental composition, morphology, and phase analysis have been measured by employing X-ray photoelectron spectroscopy, scanning electron microscopy, and X-ray diffraction techniques, respectively. The formation of the hexagonal GeO₂ phase at and above 400 °C has been reported. The composition of the annealed films have been measured and found to be 68 at.% of O, 32 at.% of Ge for GeO₂, which are close to the stoichiometry of the GeO₂.     

Multilayer planar structures prepared from chalcogenide thin films of As–Se and Ge–Se systems and polymer thin films using thermal evaporation and spin-coating techniques

We report the preparation of multilayers based on polyamide–imide polymer and As–Se or Ge–Se chalcogenide thin films. Chalcogenide films of As–Se and Ge–Se systems were deposited using a thermal evaporation method periodically alternating with spin-coated Polyamide–imide films. Fifteen layers of PAI + As–Se system and nineteen layers of PAI + Ge–Se system were coated. Optical properties of prepared multilayers have been established using UV–vis–NIR and Ellipsometric spectroscopy. Both, PAI + As–Se and PAI + Ge–Se multilayer systems, exhibited the high-reflection bands centered around 830 nm and 1350 nm, respectively. The shift of the band position of PAI + Ge–Se multilayers to lower energies was caused by higher thickness of Ge–Se films. The bandwidth of reflection band of 8 PAI + 7 As–Se multilayer was ～90 nm while bandwidth of PAI + Ge–Se system decreased to ～70 nm because Ge–Se films have 0.1 lower refractive index against As–Se films. Design of 1D-photonic crystals based on alternating chalcogenide and polymer films is a new opportunity for application of chalcogenide thin films as optical materials for near-infrared region.     

Optical characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry

We have measured and analyzed the optical constants and polarized optical properties of amorphous aluminum nitride (a-AlN) thin films deposited by RF reactive magnetron sputtering onto silicon(1 1 1) and glass substrates. The optical constants were obtained by analysis of the measured ellipsometric spectra in the wavelength range 300–1400 nm, using the Cauchy–Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range 1.80–2.11 and 8.6 × 10⁻³–1.5 × 10⁻⁵, respectively. Analysis of the absorption coefficient, in the wavelength range 200–1400 nm, shows the bandgap of a-AlN thin films to be 5.84 ± 0.05 eV. From the angle dependence of the p-polarized reflectivity we deduce a Brewster angle of 61° and a principal angle of 64°. Measurement of the polarized optical properties reveals a high transmissivity and very low absorptivity for a-AlN films in the visible and near infrared regions. X-ray diffraction analysis confirmed the amorphous nature of the films under study.     

Optical investigations of germanium nanoclusters – Rich SiO2 layers produced by ion beam synthesis

In this work, refractive index and extinction coefficient spectra of germanium nanoclusters – rich SiO₂ layers have been determined using variable angle spectroscopic ellipsometry (VASE) in the 250–1000 nm range. The samples were produced by Ge⁺ ion implantation into SiO₂ layers on Si substrates and subsequent annealing at temperatures from 700 to 1100 °C. It is known from previous investigations of similar samples that the Ge nanoclusterization process starts already at 800 °C and spherical Ge nanocrystallites 5–8 nm in diameter are observed in the SiO₂ layers after annealing for 1 h at even higher temperatures of 1000–1100 °C. Rutherford backscattering spectrometry (RBS) was employed to measure the Ge atom concentration depth profiles in the studied samples. The RBS results helped us choose realistic models for the VASE analysis which were necessary for a proper interpretation of the VASE data. It has been found that the refraction index value for the SiO₂/Si layer increases after Ge implantation. This effect can be explained by a defect-dependent compaction of ion-bombarded layers. A band’s tail in the extinction coefficient spectra for all the samples is observed which originates from a strong ultraviolet absorption band at 6.8 eV due to a Germanium Oxygen-Deficiency Center (GeODC) and/or a Ge-E’center in SiO₂. The annealing process results in the emergence of weaker extinction coefficient bands in the 400–600 nm region, associated with direct band-to-band transitions in Ge nanostructures. Transformation of these bands, including their blue-shift with the increasing annealing temperature could be explained via a quantum-confinement mechanism, by size and structural changes in Ge nanostructures.     

Structural study of undoped and (Mn, In)-doped SnO2 thin films grown by RF sputtering

Undoped and 5%(Mn, In)-doped SnO₂ thin films were deposited on Si(1 0 0) and Al₂O₃ (R-cut) by RF magnetron sputtering at different deposition power, sputtering gas mixture and substrate temperature. X-ray reflectivity was used to determine the films thickness (10–130 nm) and roughness (～1 nm). The combination of X-ray diffraction and Mössbauer techniques evidenced the presence of Sn⁴⁺ in an amorphous environment, for as-grown films obtained at low power and temperature, and the formation of crystalline SnO₂ for annealed films. As the deposition power, substrate temperature or O₂ proportion are increased, SnO₂ nanocrystals are formed. Epitaxial SnO₂ films are obtained on Al₂O₃ at 550 °C. The amorphous films are quite uniform but a more columnar growth is detected for increasing deposition power. No secondary phases or segregation of dopants were detected.     

Effect of OH-content on thermal and chemical properties of SnOP2O5 glasses

Glasses with 55–60 mol% SnO and 40–45 mol% P₂O₅ have shown extremely large differences in the chemical and thermal properties depending on the temperature at which they were melted. Glasses prepared at low melting temperature, 450–550 °C, had low T_g, 150–200 °C, and low chemical stability. Glasses prepared at high melting temperature, 800–1200 °C, had much higher T_g, 250–300 °C, and much higher chemical stability. No significant differences were found by ¹¹⁹Sn Mössbauer and ³¹P Nuclear Magnetic Resonance spectroscopy. Large differences in the OH-content could be detected as the reason by infrared absorption spectroscopy, thermal analyses, and ¹H Nuclear Magnetic Resonance spectroscopy. In samples with low T_g, a broad OH – vibration band around 3000 nm with an absorption intensity >20 cm^?1, bands at 2140 nm with intensity ～5 cm^?1, at 2038 nm with intensity ～2.7 cm^?1, and at 1564 nm with intensity ～0.4 cm^?1 were measured. These samples have shown a mass loss of 3–4 wt% by thermal gravimetric analyses under argon in the temperature range 400–1000 °C. No mass loss and only one broad OH-band with a maximum at 3150 nm and low absorption intensity <4 cm^?1 could be detected in samples melted at high temperature, 1000–1200 °C, which have much higher T_g, ～300 °C, and much higher chemical stability.     

Growth of germanium sulfide by hot wire chemical vapor deposition for nonvolatile memory applications

The growth of amorphous germanium sulfide (Ge–S) thin films using the hot wire chemical vapor deposition method has been performed at deposition temperatures in the range of 22–450 °C and pressures between 100 and 1800 Pa. Tetraallylgermanium and propylene sulfide were used as precursors for germanium and sulfur, respectively. The growth rate varies in the range of 1 and 100 nm/min and increases with increasing pressure and decreasing temperature. However, only the films deposited with lower growth rate exhibit conformal filling and good step coverage that could be observed at a growth rate of approximately 20 nm/min. Higher temperatures yield higher Ge content in the Ge–S films. In addition, the typical resistive switching behavior (three or four orders of magnitude) indicated that those films are suitable for nonvolatile memory applications.     

Surface morphology of spin-coated As–S–Se chalcogenide thin films

Surface morphology and roughness of amorphous spin-coated As–S–Se chalcogenide thin films were determined using atomic force microscopy. Prepared films were coated from butylamine solutions with thicknesses d ∼ 100 nm and then annealed in a vacuum furnace at 45 °C and 90 °C for 1 h for their stabilization. The root mean square surface roughness analysis of surfaces of as-deposited spin-coated As–S–Se films indicated a very smooth film surface (with R_q values 0.42–0.45 ± 0.2 nm depending on composition). The nanoscale images of as-deposited films confirmed that surface of the films is created by domains with dimensions 20–40 nm, which corresponds to diameters of clusters found in solutions. The domain character of film surfaces gradually disappeared with increasing annealing temperature while the solvent was removed from the films. Middle-infrared transmission spectra recorded a decrease of intensities of vibration bands connected to N–H (at 3367 and 3292 cm⁻¹) and C–H (at 2965, 2935 and 2880 cm⁻¹) stretching vibrations. Temperature regions of solvent evaporation T = 60–90 °C and glass transformation temperatures T_g = 135–150 °C of spin-coated As–S–Se thin films were determined using a modulated differential scanning calorimetry.     

Superior structural and electronic properties for amorphous silicon–germanium alloys deposited by a low temperature hot wire chemical vapor deposition process

Very good electronic properties of hot-wire CVD a-Si,Ge:H alloys have been established by junction capacitance methods. The samples were deposited using a tantalum filament maintained at about 1800 °C instead of the usual 2000 °C tungsten filament process. Urbach energies below 45 meV were found, as well as annealed defect densities below 10¹⁶ cm⁻³, for Ge fractions up to 30 at.%. However, samples with 10¹⁹ cm⁻³ levels of oxygen exhibited much broader Urbach energies and higher defect densities. Light induced degradation was examined in detail for one a-Si,Ge:H alloy sample and compared to the behavior of PECVD grown a-Si:H alloys of similar optical gap.     

Preparation of thick,crack-free germanosilicate glass films by polyvinylpyrrolidone and study of the UV-bleachable absorption band

With addition of polyvinylpyrrolidone (PVP) transparent, stable GeO₂–SiO₂ sols containing up to 60–80 mol% GeO₂ were synthesized using tetraethyl orthogermanate (TEOG) and tetraethylorthosilicate (TEOS) as precursors for germania and silica, respectively. It was shown by TEM analyses that the PVP can be absorbed onto the colloidal particles providing steric hindrance for the combination and aggregation of particles. These sols were observed showing rapid increase in viscosity within both the early period and the end period of sol aging time, but exhibiting a viscosity value of about 28 mPa s within the rest aging time (45–90 h) satisfying well the requirements for the deposition of thick films by cycles of dip-coating operation. It was determined by TG-DTA and SEM analyses that the densification of GeO₂–SiO₂ gel material with PVP was much more retarded than the gel without PVP resulting in crack-free germansilicate films with a thickness of 3 μm. The crystallization behavior of germansilicate films was enhanced with the increase of GeO₂ content but glass films with a composition of 60GeO₂ · 40SiO₂ was obtained by sintered at 700 °C for 1 h and annealed at 550 °C under a flowing H₂/N₂ atmosphere for 2 h. FT-IR analyse showed that the heat treatment at 700 °C for 60 min was effective to remove the organics and hydroxyl groups in the germansilicate film. An intense 5 eV absorption band was distinctly observed in films. The intensity of this absorption band was found to be effectively bleached by UV illumination. Weak photoluminescence emission bands which originated from the neutral oxygen di-vacancy (NODV) were detected near 375 and 276 nm. Therefore, the 5 eV absorption band observed in this work was mainly caused by the neutral oxygen monovacancy (NOMV). A saturated absorptivity change of the UV-bleachable band after prolonged illumination was found to be 256 cm⁻¹ for the 60GeO₂ · 40SiO₂ films implying the NOMV concentration in the films reached about 3.8 × 10¹⁸ cm⁻³.     

Insights into effects of annealing on microstructure from SnO2 thin films prepared by pulsed delivery

Tin dioxide thin films were prepared by pulsed laser deposition techniques on clean glass substrates, and the thin films were then annealed for 30 min from 50 to 550 °C with a step of 50 °C, respectively. The influence of the annealing temperature on the microstructural and morphological properties of the tin dioxide thin films was investigated using X-ray diffraction, scanning electron microscopy, transmission electron microscopy and selected area electron diffraction. The experimental results showed that the amorphous microstructure almost transformed into a polycrystalline tin dioxide phase exhibiting a preferred orientation related to the (1 1 0), (1 0 1) and (2 1 1) crystal planes with increased temperatures. The thin film annealed at 200 °C demonstrated the best crystalline properties, viz. optimum growth conditions. However, the thin film annealed at 100 °C revealed the minimum average root-mean-square roughness of 20.6 nm with average grain size of 26.6 nm. These findings indicate that the annealing temperature is very important parameter to determining the thin film quality, which involves the phase formation, microstructure and preferred orientation of the thin films.     

Structural,electrical and optical properties of in-situ phosphorous-doped Ge layers

We have studied the impact of temperature and pressure on the structural and electronic properties of Ge:P layers grown with GeH₄+PH₃ on thick Ge buffers, themselves on Si(0 0 1). The maximum phosphorous atomic concentration [P] exponentially decreased as the growth temperature increased, irrespective of pressure (20 Torr, 100 Torr or 250 Torr). The highest values were however achieved at 100 Torr (3.6×10²⁰ cm^?3 at 400 °C, 2.5×10¹⁹ cm^?3 at 600 °C and 10¹⁹ cm^?3 at 750 °C). P atomic depth profiles, “box-like” at 400 °C, became trapezoidal at 600 °C and 750 °C, most likely because of surface segregation. The increase at 100 Torr of [P] with the PH₃ mass-flow, almost linear at 400 °C, saturated quite rapidly at much lower values at 600 °C and 750 °C. Adding PH₃ had however almost no impact on the Ge growth rate (be it at 400 °C or 750 °C). A growth temperature of 400 °C yielded Ge:P layers tensily-strained on the Ge buffers underneath, with a very high concentration of substitutional P atoms (5.4×10²⁰ cm^?3). Such layers were however rough and of rather low crystalline quality in X-ray Diffraction. Ge:P layers grown at 600 °C and 750 °C had the same lattice parameter and smooth surface morphology as the Ge:B buffers underneath, most likely because of lower P atomic concentrations (2.5×10¹⁹ cm^?3 and 10¹⁹ cm^?3, respectively). Four point probe measurements showed that almost all P atoms were electrically active at 600 °C and 750 °C (1/4th at 400 °C). Finally, room temperature photoluminescence measurements confirmed that high temperature Ge:P layers were of high optical quality, with a direct bandgap peak either slightly less intense (750 °C) or more intense (600 °C) than similar thickness intrinsic Ge layers. In contrast, highly phosphorous-doped Ge layers grown at 400 °C were of poor optical quality, in line with structural and electrical results.     

Microstructural and photocatalytic properties of sol–gel-derived vanadium-doped mesoporous titanium dioxide nanoparticles

The vanadium (V)-doped mesoporous titanium dioxide (TiO₂) nanoparticles at low V/Ti ratios ranging from 0 to 2 wt% were prepared using hydrolytic sol–gel method in the presence of tri-block copolymer Pluronic F127. The microstructures of TiO₂ in terms of morphology, crystallization, chemical states of species, surface area, and band gap were characterized by SEM, TEM, XRPD, XPS, surface area analyzer, and UV–Vis spectrophotometer, respectively. SEM images showed that the V-doped TiO₂ nanoparticles were porous structures, and the surface areas and pore sizes ranged from 86 ± 9 to 96 ± 15 m²/g and from 12 ± 4 to 15 ± 2 nm, respectively. The XRPD patterns indicated that V-doped mesoporous TiO₂ after calcination at 500 °C was mainly anatase phase, and the crystallite sizes were in the range 14–16 nm, which are consistent with the results obtained from SEM images. XPS spectra and HRTEM images showed that vanadia was doped both on the surface and in the lattice of anatase TiO₂. A slight red-shift in wavelength absorption was observed when V/Ti ratio increased from 0 to 2 wt%. Methylene blue (MB) was further used as the target compound to examine the photocatalytic activity of V-doped mesoporous TiO₂ nanocatalysts under illumination of solar simulator or UV light. Addition of vanadium ions slightly decreased the photocatalytic activity of TiO₂ toward the decolorization of MB under the illumination of UV light at 305 nm. However, a 1.6–1.8 times increase in rate constants for MB photodegradation was observed when 0.5–1.0 wt% V-doped TiO₂ was illuminated with sunlight at AM 1.5.     

Effect of vacuum annealing on charge transport and trapping in a-Si1 − xCx:H/c-Si heterostructures

The processes of charge transport and trapping in amorphous Si_1 ? xC_x:H films deposited on crystalline p-type Si wafers and annealed in vacuum in the temperature range 300–650 °C have been evaluated. Current–voltage (I–V), capacitance–voltage (C–V) and admittance–temperature (G–T) characteristics were measured in the temperature range 100–350 K. The spectrum of thermal effusion of hydrogen was measured from room temperature up to 1000 °C.C–V characteristics indicate a slight increase of the dielectric constant k and a large hysteresis after annealing at 450 °C. The hysteresis is believed to be associated with mobile hydrogen effusion from the a-SiC:H film, and it is not seen after a 650 °C anneal. From I–V data the maximum rectification ratio is observed after annealing at 450 °C. Variable-range hopping (VRH) conduction at the Fermi level is found to dominate the forward current of the as-deposited structure. After annealing at 450 °C the forward current can be described by space-charge limited (SCL) mechanisms with trapping at shallow levels with energy of about 0.12 eV. After annealing at 650 °C the process of VRH conduction appears again, but the density of hopping sites is much higher than in the as-grown sample. From admittance spectra, the energy position of respective traps in a-SiC:H is at (E_V + 0.45) eV for as-deposited material and it decreases slightly after vacuum annealing. On the basis of these results, an energy band diagram of the a-Si_1 ? xC_x:H/p-Si structure annealed at 450 °C is proposed.     

Crystallization of amorphous silicates far from equilibrium part I: A versatile nitrate-based sol–gel synthesis of amorphous porous Ca,Mg-rich silicates

An easy-to-use, comprehensive sol–gel method is developed to produce amorphous calcium and magnesium silicates from nitrate precursors and TetraEthOxySilane (TEOS). Final products were designed to suit basic prerequisites of starting materials for experimental investigation of crystallization around the glass transition temperature range. After gelification, thermo-gravimetric methods and infrared-spectroscopy were used to follow dehydration, decarbonation and denitrification of the xerogel. A temperature of 500 °C is found to successfully remove volatiles without causing crystallization. The microstructure revealed by transmission electron microscopy (TEM) consists of 10–20 nm individual mesoparticles of 10–20 nm. Samples annealed at 500 °C were found entirely amorphous at the TEM scale. The porosity observed by TEM and characterized by nitrogen adsorption–desorption is homogeneous and varies from 4.6 to 8.5 nm as a function of the composition. Bulk analyses by ICPMS and local analyses by EDS-TEM demonstrate that the stoichiometry can be achieved and the homogeneity is confirmed at least down to 100 × 100 nm. At lower scale, irradiation by the electron beam produces a significant volatilization of Ca and Mg, which makes chemical analyses unreliable. Pros and cons of the method and special cares for specific applications are discussed. The method was also successfully used to produce a wider range of amorphous analogs having complex compositions or containing trace elements for applications in the field of mineral physics and chemistry.     

Structural and optical spectroscopy of LiNbO3:Tm nanocrystals embedded in a SiO2 glass matrix

Transparent SiO₂:Li₂O:Nb₂O₅ glass doped with Tm³⁺ has been prepared by the sol–gel method, and heat-treated in air (HT) at temperatures between 500 and 800 °C. X-ray diffraction (XRD) patterns and Raman spectroscopy show SiO₂ and LiNbO₃ phases in samples HT above 650 °C, and a NbTmO₄ phase for T > 750 °C. The XRD SEM analysis show increasing particle size and number with the increase of HT temperature. Intra-4f¹² transitions due to Tm³⁺ ion dispersed in the matrix are observed in samples with T > 650 °C. The luminescence is dominated by the ¹G₄ → ³F₄ (～650 nm), ¹D₂ → ³F₃ (～780 nm), ³H₄ → ³H₆ (～800 nm), ³H₅ → ³H₆ (～1200 nm) and ³H₄ → ³F₄ (～1500 nm) transitions under resonant excitation to the ion levels.     

Effect of annealing temperature on the optical and electrical properties of aluminum doped ZnO films

Aluminum doped ZnO thin films were successfully deposited on the silicon substrates by spin coating method. The effects of an annealing temperature on electrical and optical properties were investigated for 1.5 at.% of aluminum. Refractive index profile has been obtained for the film annealed at 350 °C using ellipsometry and it has shown minimum refractive index of 1.95 and maximum value of 2.1. Thickness profile shows quite good uniformity of the film having minimum thickness value of 30.1 nm and maximum value of 34.5 nm. Maximum conductivity value obtained was 4.63 Ω^?1-cm^?1 for the film annealed at 350 °C. Maximum carrier density of 2.20 × 10¹⁷ cm^?3 was deduced from the Hall measurement and Fourier transform infrared spectroscopy clearly reveals major peak at 407 cm^?1 in the spectra associated with the ZnO bond.     

Recombination luminescence of oxygen-deficient centers in silica

The luminescence of silica glass, prepared by plasma chemical vapor deposition (PCVD) and quartz glass of type IV (trade mark KS-4V) methods, were studied while irradiated with pulses of ArF laser (193 nm) light in the range of sample temperatures between 10 and 300 K. The samples contain less than 0.1 ppm metallic and hydroxyl impurities. The samples synthesized by PCVD were of two kinds. The first one (amorphous) was as-deposited from plasma at a substrate tube temperature of ～1200 °C. The second one (fused) was prepared from the first by the tube collapsing with an external burner. In this process, a section of the substrate tube with the deposited glass was installed in a lathe and processed at a temperature of ～2100 °C during ～20 min until the tube was transformed to a rod. After such processing, the rod was cooled down to room temperature in air at an average rate of about 400 °C per min. The only observed luminescence possesses two broad bands, with not well defined position, one at 2.6–2.9 eV (a blue band) and another in the range of 4.4 eV (an UV band). There is a correspondence in luminescence properties between KS-4V silica and fused PCVD silica. Those bands have been attributed to oxygen deficient centers (ODC). No luminescence is observed in amorphous PCVD silica under irradiation with 193 nm laser light. So, formation of the sample by melting at least stimulates formation of ODCs at 193 nm. The blue band decays obeys to power law ～t^?1 and is detected in the range of time 10 ns to 300 μs. The UV band possesses a fast, practically repeating excitation pulse, and a slow component (～30 μs). The obtained new kinetics data are compared with known in literature for lone twofold-coordinated silicon having exponential decay for the blue band equal to 10 ms and 4.5 ns for the UV band. That shows the blue band of new studied samples under ArF laser possesses decay component faster and the UV band slower than that of the twofold-coordinated silicon center. This corresponds to the recombination process of luminescence excitation by laser. We propose a model of the processes as charge separation under excitation with creation of a nearest self-trapped hole and electron trapped on the twofold-coordinated silicon, modified by its surrounding atoms or ions. This pair is recombining then with luminescence.     

Effect of isothermal annealing and visible-light illumination on the AC-impedance behavior of undoped selenium thin films

The effect of post-deposition isothermal annealing (30 °C ? T_A ? 70 °C) and visible-light illumination on the complex AC-impedance of undoped selenium thin films deposited at the substrate temperatures T_S = 30, 50, 70 °C has been studied in the frequency range 0.2–12 kHz. The AC-impedance of amorphous selenium (a-Se) films (T_S, T_A < 50 °C) was mainly capacitive, with no loss peaks being observed in their Z″(ω)–ω curves, irrespective of illumination. This behavior was ascribed to a dominant charge-carrier trapping effect of bulk/surface charged defects usually present in a-Se. On the other hand, the measured Z″(ω)–Z′(ω) diagrams of illuminated polycrystalline Se samples (50 °C ? T_S, T_A ? 70 °C) exhibited almost full semicircles, whereas their Z″(ω)–ω curves revealed prominent loss peaks at well-defined frequencies. As the annealing temperature or light intensity is increased the loci of the points determined by intersections of these semicircles with the Z′-axis at the low-frequency side shift greatly towards the origin, while the loss-peak positions shift to higher frequencies. These experimental findings were explained in terms of a significant increase in electrical conductivity of selenium films due to thermally-induced crystallization at temperatures beyond glass-transformation region of undoped selenium and to creation of electron–hole pairs by visible-light illumination.