杂质银对氧化锌薄膜气敏光学特性的影响

用反应式射频磁控溅射方法制备了纯氧化锌（ＺｎＯ）薄膜和掺Ａｇ的ＺｎＯ气敏光学传感薄膜。测量了这些薄膜在ＮＯｘ气体中的透射光谱，然后由透射光谱获得了灵敏度的变化规律，发现掺Ａｇ后的ＺｎＯ薄膜对ＮＯｘ气体的灵敏度高于纯ＺｎＯ薄膜，用俄歇电子能谱（ＡＥＳ）测试了这些薄膜的组分，发现当掺Ａｇ量为５％时灵敏度最高，并结合朗缪尔（Ｌａｎｇｍｕｉｒ）型吸附平衡关系式解释了这些现象，理论和实验结果能很好的相符。     

双靶磁控溅射镀膜机及镀膜工艺

介绍了双靶磁探溅射镀膜机的结构、工作原理、主要功能同时还简述了非反应与反应溅射相结合的工艺技术，制备了渐米Ａｌ－Ｎ／Ａｌ太阳能选择性吸收涂层以及ＴｉＯ２／Ａｌ反光保护膜层。     

水热法制备表面修饰的钛酸锶纳米微粉

以工业原料和常用试剂ＴｉＣｌ４、Ｓｒ（）ＮＯ３）２和ＫＯＨ为基础原料，通过添加表面活性剂十二烷基苯磺酸（ＤＢＳ），并采用制备出表面包裹有ＤＢＳ的钛酸锶纳米微粉姘应用红外光谱，Ｘ射线衍射谱，透射电子显微镜，热分析等一系列手段对其微结构进行了表征。结果表明：样品为表面包裹ＤＢＳ的钛酸锶纳同粉，其形态较为规则，粒度分布较窄，单分散性较好，粒子的平均粒径为１２０ｍｍ，包裹膜的平均厚度为６ｎｍ左右，根据Ｘ光     

多元离子束增强沉积在新型薄膜材料上的应用

采用Ｎ＋＋Ｃｒ＋多元离子束增强沉积合成（ＴｉＣｒ）Ｎ膜层，对膜层进行了ＡＥＳ、ＴＥＭ和ＸＲＤ分析．测试了膜基体系的力学性能和电化学性能．与普通物理气相沉积相比，多元离子束增强沉积显示了开发新型薄膜材料的较强潜力． Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition.     

YCO／CeO2／LaAlO3夹层膜的界面研究

用俄歇电子能谱结合透射电子显微镜对磁控溅射法制备的ＹＢＣＯ／ＣｅＯ２／ＬａＡｌＯ３夹层膜中的元素在各层间的扩散行为进行了研究。结果表明，ＣｅＯ２作为一种缓冲层，能够阻挡住基底ＬａＡｌＯ３中元素向ＹＢＣＯ膜的扩散和ＹＢＣＯ膜中元素向基底的扩散，基本身向ＹＢＣＯ膜中的扩散也不多。ＴＥＭ的分析表明，ＣｅＯ２能保持完好的晶格结构，在其上能得到结构完整的高质量ＹＢＣＯ膜。     

TW级Ti：Al2O3飞秒激光放大器

报道ＴＷ（１０＾１２Ｗ）级Ｔｉ：Ａｌ２Ｏ３飞秒激光放大器的研究，采用Ｔｉ：Ａｌ２Ｏ３自锁模激光振荡器和脉冲啁啾放大技术，获得了能量为８４ｍＪ，脉宽为７５ｆｓ的放大光脉冲，峰值功率达到ＴＷ量级。     

利用腔内倍频自锁模Ti：Al2O3激光器产生蓝光飞秒脉冲

利用腔内倍频自锁模Ｔｉ：Ａｌ_２Ｏ_３激光器产生蓝光飞秒脉冲魏志义，杨杰，黄斐然，李荣基，周建英，余振新（中山大学超快速激光光谱学国家重点实验室，广州５１０２７５）（香港中文大学物理系）目前采用自锁模（克尔透镜锁模）技术，人们已能广泛地从Ｔｉ：Ａｌ２Ｏ...     

半花菁／氮冠（醚）交替LB多层膜的二阶光学非线性性质

对一种新型的，具有双脂链的盘状非活性分子氮冠（醚）（ＮＣ）ＬＢ膜进行了表征。小角Ｘ射线衍射（ＳＡＸＤ）结果表明：纯ＮＣ分子可以形成非常好的ＬＢ膜有序结构。将它与活性分子半花菁（ＤＡＥＰ）制备成Ｙ型交替多层膜，由于半花菁分子的单脂链（长尾）可以镶嵌在ＮＣ分子的双脂链之间，改善了多层膜的结构有序性及稳定性，从而得到二次谐波强度随层数的变化在１￣１１６双层范围内显示出较理想的平方关系。通过二次谐波的测量     

金属羰基化合物[CpFe(CO)_2]_2与金属氧化物表面作用的傅里叶变换漫反射和光声红外光谱研究

用漫反射红外光谱和光声红外光谱法研究了金属羰基化合物［ＣｐＦｅ（ＣＯ）２］２Ｃｐ＝η５—Ｃ５Ｈ５与酸性、中性和碱性Ａｌ２Ｏ３及ＴｉＯ２的相互作用。结果表明，在Ａｌ２Ｏ３表面生成的衍生物种类及浓度与Ａｌ２Ｏ３的酸碱度明显相关。在酸性Ａｌ２Ｏ３表面，主要存在衍生物［ＣｐＦｅ（ＣＯ）２Ｆｅ—Ｈ—Ｆｅ（ＣＯ）２Ｃｐ］＋及少量的ＣｐＦｅ（ＣＯ）２（—Ｏ—）；在中性Ａｌ２Ｏ３表面存在ＣｐＦｅ（ＣＯ）２（—Ｏ—）及较少的［ＣｐＦｅ（ＣＯ）］４；而在碱性Ａｌ２Ｏ３表面主要衍生物为［ＣｐＦｅ（ＣＯ）］４及少量ＣｐＦｅ（ＣＯ）２（—Ｏ—）。衍生物的相对浓度以酸性Ａｌ２Ｏ３表面最高，碱性Ａｌ２Ｏ３表面最低。在ＴｉＯ２表面，［ＣｐＦｅ（ＣＯ）２］２结构基本未变，在空气中比较稳定，没有观察到衍生物的生成。测定了［ＣｐＦｅ（ＣＯ）２］２及其在ＴｉＯ２表面近红外漫反射光谱，指认了大部分观察到的光谱为羰基振动的合频和倍频，并尝试指认了少数光谱为高级（三级）倍频和多元组频（合频）。     

YBCO/CeO_2/LaAlO_3夹层膜的界面研究

用俄歇电子能谱（ＡＥＳ）结合透射电子显微镜（ＴＥＭ）对磁控溅射法制备的ＹＢＣＯ／ＣｅＯ２／ＬａＡｌＯ３夹层膜中的元素在各层间的扩散行为进行了研究．结果表明，ＣｅＯ２作为一种缓冲层，能够阻挡住基底ＬａＡｌＯ３中元素向ＹＢＣＯ膜的扩散和ＹＢＣＯ膜中元素向基底的扩散，其本身向ＹＢＣＯ膜中的扩散也不多．ＴＥＭ的分析表明，ＣｅＯ２能保持完好的晶格结构，在其上能得到结构完整的高质量ＹＢＣＯ膜     

Microstructure and tribological properties of TiN, TiC and Ti(C, N) thin films prepared by closed-field unbalanced magnetron sputtering ion plating

TiN, TiC and Ti(C, N) films have been respectively prepared using closed-field unbalanced magnetron sputtering ion plating technology, with graphite target serving as the C supplier in an Ar-N₂ mixture gas. Bonding states and microstructure of the films are characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) in combination with transmission electron microscopy (TEM). The friction coefficients are measured by pin-on-disc test and the wear traces of deposited films are observed by optical microscope. Results show that the TiN film and Ti(C, N) film exhibit dense columnar structure while the TiC film exhibits a mixed microstructure of main nanocrystallite and little amorphous phases. The Ti(C, N) film has the highest microhardness value and the TiC film has the lowest. Because of small amount of pure carbon with sp² bonds existing in the film, the friction coefficients of Ti(C, N) and TiC multilayer films are lower than that of TiN film. In addition, the multilayer structure of films also contributes visually to decrease of friction coefficients. The TiC film has extremely low friction coefficient while the wear ratio is the highest in all of the films. The results also show that the Ti(C, N) film has excellent anti-abrasion property.     

磁控溅射(Ti,N)/Al纳米复合薄膜的微结构和力学性能

采用Al和TiN靶通过磁控共溅射方法, 制备了一系列Ti:N≈1的不同(Ti, N) 含量的铝基纳米复合薄膜, 利用X射线能量分散谱仪、X射线衍射仪、透射电子显微镜和纳米力学探针表征了薄膜的成分、 微结构和力学性能, 研究了(Ti, N)含量对复合薄膜微结构和力学性能的影响. 结果表明: Ti, N原子的共同加入使复合薄膜形成了同时具有置换固溶和间隙固溶特征的"双超过饱和固溶体", 薄膜的晶粒随着溶质含量的增加逐步纳米化, 并进一步形成非晶结构, 晶界区域形成溶质原子的富集区. 相应地, 复合薄膜的硬度在含1.8 at.%(Ti, N) 时就可迅速提高到3.9 GPa; 随着TiN含量的增加, 薄膜的硬度进一步提高到含17.1 at.%(Ti, N)时的8.8 GPa. 以上结果显示出Ti和N"双超过饱和固溶"对Al薄膜极其显著的强化效果.     

脉冲高能量密度等离子体沉积(Ti,Al)N薄膜组织及其性能研究

利用脉冲高能量密度等离子体技术在室温条件下在45＃钢基材表面沉积了高硬度耐腐蚀(Ti, Al)N薄膜. 利用扫描电子显微镜、X射线衍射、X射线光电子能谱、俄歇电子能谱分析了薄膜的显微组织.利用纳米压痕仪测试了薄膜的纳米硬度.测试了薄膜在05mol/L H2SO4水溶液中的耐蚀性. 测试结果表明：薄膜主要组成相为(Ti, Al)N，同时含有少量的AlN,薄膜的纳米硬度高达26 GPa,薄膜具有良好的耐蚀性，与1Cr18Ni9Ti奥氏体不锈钢相比，耐蚀性提高了一个数量级. 关键词： 脉冲高能量密度等离子体 薄膜 纳米硬度 耐蚀性     

Ultrathin amorphous Ti–Al film used as a diffusion barrier for copper metallization

The viability of ultrathin amorphous Ti–Al film (～4 nm) as a diffusion barrier layer between Cu and Si for the application in Si-based ultra-large scale integration (ULSI) has been investigated. The Cu/Ti–Al/Si heterostructures are annealed in a high vacuum at various temperatures. There is no impurity peaks in the X-ray diffraction patterns for the samples up to annealing temperature of 800 ^°C, although the island-like grains were observed on the surface of the 800 ^°C annealed sample due to dewetting and agglomeration of the Cu film. No inter-reactions can be found from the images of transmission electron microscopy and Ti–Al is still amorphous after high-temperature annealing. These results indicate that Ti–Al film can effectively separate Cu from Si at high temperatures, and that the amorphous ultrathin Ti–Al film can be a very good barrier layer for Cu metallization.     

（Ti,Al）N Film on Normalized T8 Carbon Tool Steel Prepared by Pulsed High Energy Density Plasma Technique

Under optimized operating parameters, a hard and wear resistant （Ti,Al）N film is prepared on a normalized T8 carbon tool steel substrate by using pulsed high energy density plasma technique. Microstructure and composition of the film are analysed by x-ray diffraction, x-ray photoelectron spectroscopy, Auger electron spectroscopy and scanning electron microscopy. Hardness profile and tribological properties of the film are tested with nano- indenter and ring-on-ring wear tester, respectively. The tested results show that the microstructure of the film is dense ahd uniform and is mainly composed of （Ti,Al）N and A1N hard phases. A wide transition interface exists between the film and the normalized T8 carbon tool steel substrate. Thickness of the film is about lO00nm and mean hardness value of the film is about 26 GPa. Under dry sliding wear test conditions, relative wear resistance of the （Ti, Al）N film is approximately 9 times higher than that of the hardened T8 carbon tool steel reference sample. Meanwhile, the （Ti,Al）N film has low and stable friction coefficient compared with the hardened T8 carbon tool steel reference sample.     

添加Y改善离子镀氮化钛膜的结构与性能

评价了离子镀氮化钛(TiN)和Y改性氮化钛(Ti(Y)N)膜的结合强度和在酸性介质中的耐蚀性能;用X射线衍射,离子探针质谱分析(IMA),透射电子显微镜(TEM)研究它们的显微结构特征;结果表明,添加Y元素富集在Ti(Y)N与A₃钢基材界面区域,并形成厚度约为20nm的亚层,Y的界面改性导致Ti(Y)N膜的X射线衍射线形略有宽化和明显的TiN相(111)面的择优生长取向;这些显微结构特征的改善导致Ti(Y)N膜比TiN膜具有更高的界面结合强度和更好的耐蚀性能。 关键词：     

Annealing studies of Ti/Al multilayer film by slow positron beam

Single detector and coincidence Doppler broadening (CDB) spectroscopy measurements using slow positron beam were carried out to study as-deposited and annealed Ti/Al multilayer films. The changes of the film structure and defects in each layer by heat treatment have been investigated through the analysis of Doppler broadening lineshape variation. The coincidence Doppler broadening measurements revealed that Ti is the dominant diffusion species during the alloying process of Ti/Al by high temperature annealing. These results highlight the potential of slow positron beam in characterizing the vacancy-type defects evolution and mechanism of interlayer diffusion in Ti/Al multilayer film.     

Far-infrared conductivity measurements of pair breaking in superconducting Nb 0.5 Ti 0.5 N thin films induced by an external magnetic field

We report the complex optical conductivity of a superconducting thin film of Nb 0.5 Ti 0.5 N in an external magnetic field. The field was applied parallel to the film surface and the conductivity extracted from far-infrared transmission and reflection measurements. The real part shows the superconducting gap, which we observe to be suppressed by the applied magnetic field. We compare our results with the pair-breaking theory of Abrikosov and Gor'kov and confirm directly the theory's validity for the optical conductivity.     

Mechanical properties of Ti(C0.7N0.3) film produced by plasma electrolytic carbonitriding of Ti6Al4V alloy

Porous nanocrystalline Ti(C_0.7N_0.3) film on Ti6Al4V substrate was prepared by plasma electrolytic carbonitriding (PECN). The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM, EDX, TEM, FESEM, Rockwell C indenter, scratch tester, Vickers microhardness tester and ring-on-block tribometer. The results showed that the film was about 15 μm thick and its hardness was Hv 2369 at a load of 0.2 N. The adhesion of the film was characterized by Lc and Pc value, and was found to be about 42 N and more than 800 N, respectively. The friction coefficients and wear volume loss of the PECN-treated samples sliding against a steel counterpart were much less than those of the untreated Ti6Al4V. The film possessed a good wear-resistance and antifriction under oil-lubricated condition due to its high hardness, adhesion and fracture toughness. Also, the porous surface morphology of the Ti(C_0.7N_0.3) film contributed to the enhanced tribological resistance by promoting the formation of lubricant film and entrapping wear debris.     

氮化铝单晶薄膜的ECR PEMOCVD低温生长研究

采用电子回旋共振等离子体增强金属有机物化学气相沉积（ECR－PEMOCVD）技术，在c轴取向的蓝宝石即α Al2O3（0001）衬底上，以氮化镓（GaN）缓冲层和外延层作为初始层，分别以高纯氮气（N2）和三甲基铝(TMAl)为氮源和铝源低温生长氮化铝（AlN）薄膜.并利用反射高能电子衍射（RHEED）、原子力显微镜（AFM）和x射线衍射（XRD）等测量结果，研究了氢等离子体清洗、氮化和GaN初始层对六方AlN外延层质量的影响，从而获得解理性与α Al2O3衬底一致的六方相AlN单晶薄膜，其XRD半高宽为1 关键词： AlN 氢等离子体清洗 氮化 GaN