石墨片作辅助热沉的高功率半导体激光器热传导特性

为使边发射高功率单管半导体激光器有源区温度降低,增加封装结构的散热性能,降低器件封装成本,提出一种采用高热导率的石墨片作为辅助热沉的高功率半导体激光器封装结构。利用有限元分析研究了采用石墨片作辅助热沉后,封装器件的工作热阻更低,散热效果更好。研究分析过渡热沉铜钨合金与辅助热沉石墨的宽度尺寸变化对半导体激光器有源区温度的影响。新型封装结构与使用铜钨合金作为过渡热沉的传统结构相比,有源区结温降低4.5 K,热阻降低0.45 K/W。通过计算可知,激光器的最大输出功率为20.6 W。在研究结果的指导下,确定铜钨合金与石墨的结构尺寸,以达到最好的散热效果。     

高功率半导体激光器陶瓷封装散热性能研究

为实现半导体激光器单管的高功率输出,研究了使用氮化铝和碳化硅两种陶瓷材料制成的三明治型过渡热沉的散热性能。首先使用有限元分析方法计算,然后利用光谱法测量激光器的工作热阻。数值计算和实验测量结果均显示,碳化硅制成的过渡热沉所封装器件的工作热阻更低,散热效果更好。此外,实验进一步测试了器件的光电特性,结果表明碳化硅陶瓷制成的过渡热沉封装器件的电光转换效率更高、输出功率更大。915 nm附近单管器件在注入电流15 A时的输出功率为16.3 W,最高电光转换效率达到了68.3%。     

封装对大功率半导体激光器阵列热应力及Smile的影响

提出一种采用双铜-金刚石的"三明治"封装结构,利用有限元分析方法研究了其与传统的Cu+Cu W硬焊料封装结构激光器的热应力与Smile.对比模拟结果发现新封装结构热应力降低43.8%,Smile值增加95%.在次热沉热膨胀系数与芯片材料匹配的情况下,使用弹性模量更大的次热沉材料,可对芯片层热应力起到更好的缓冲作用.以硬焊料封装结构为例,分析了负极和次热沉厚度对器件Smile的影响.结果表明负极片厚度从50μm增加到300μm,器件工作结温降低2.26℃,Smile减小0.027μm,芯片的热应力增加22.95 MPa.当次热沉与热沉的厚度比小于29%时,Smile随次热沉厚度增加而增加;而当次热沉厚度超过临界点后,Smile随次热沉厚度增加而减小.当次热沉厚度达到临界点(2300μm)时,硬焊料封装的半导体激光器具有最大的Smile值3.876μm.制备了Cu W厚度分别为300μm和400μm的硬焊料封装976 nm激光器,并测量了其发光光谱.通过对比峰值波长漂移量,发现Cu W厚度增加了100μm,波长红移增加了1.25 nm,根据温度和应力对波长的影响率可知应力减小了18.05 MPa.测得两组器件的平均Smile值分别为0.904μm和1.292μm.实验证明增加Cu W厚度可减小芯片所受应力,增大Smile值.     

Au80Sn20合金焊料制备工艺

针对高功率二极管激光器的封装要求,通过磁控溅射的方法制备了Au80Sn20合金焊料,使用扫描电子显微镜（SEM）观察其微结构和表面形貌;利用能谱仪（EDX）和X射线荧光测试仪分析其成分;采用差热分析法（DTA）测试其熔化温度,并用制备的Au80Sn20合金焊料进行了可焊性实验。结果表明:磁控溅射法可以制备Au80Sn20合金焊料,其制备的Au80Sn20合金焊料表面无明显缺陷,结构致密;成分与理论值接近;熔点与理论熔点接近;焊接浸润性好,空洞率小,强度大。     

基于相变冷却的大功率二极管激光器技术

 设计了一种基于相变冷却方式工作的大功率二极管激光器,该激光器的散热器是基于节流式喷射微槽道相变冷却的原理,使冷却液在微槽中的气化率达到了70%,大幅度提高了冷却效果,减小了冷却液流量,在同样制冷功率条件下,冷却液流量仅为水冷方式的1/10。利用相变冷却器进行了背冷式半导体激光器叠阵封装工艺的研究,采用复合热沉与AuSn硬焊料结合的新型封装工艺,完成了准连续3 kW叠阵的封装。实验测试表明,单元叠阵的输出功率达到3.01 kW,占空比10%,封装间距为1.3 mm,光谱宽度小于3.5 nm。最大功率输出时所需R134a冷却液的流量仅为110 mL/min。     

烧结空洞对半导体激光器热分布的影响

在半导体激光器芯片与热沉的焊接过程中不可避免地会在焊料层产生一些空洞,而空洞会在铟的电迁移以及电热迁移作用下慢慢变大,使芯片局部温度迅速上升,进而影响半导体激光器的性能。针对10 W的808 nm单管焊装半导体激光器建立三维有限元模型,分别模拟计算了空洞面积、空洞厚度和空洞位置与结温的关系。芯片出光面边缘的有源区区域形成的空洞对芯片的结温影响更为显著,最后得到空洞面积与器件结温的关系,并表明对空洞率控制的重要性。     

热容型大功率半导体激光器瞬态热特性

为研究热容型大功率半导体激光器在低环境温度、高瞬时功率、长工作间歇时间条件下的应用,建立三维瞬态热传导模型,通过有限元法计算得出热沉三维尺寸对半导体激光器瞬态热特性的影响。选取尺寸为26.6 mm×11.5 mm×4 mm的热沉进行热容型半导体激光器的封装测试,获得其在-20℃和-30℃环境温度下连续工作3.5 s过程中有源区温度随时间的变化曲线,并与数值计算的结果进行对比。结果表明,两者在误差范围内能够很好地吻合。     

管式炉中半导体激光器巴条Au80Sn20焊料封装研究

为了提高半导体激光器的封装质量和效率,引入管式炉利用夹具进行批量封装。由于封装质量的好坏直接影响半导体激光器的输出特性和使用寿命,利用MOCVD生长808 nm芯片,重点分析了管式炉温度和封装时间对半导体激光器巴条双面金锡封装质量的影响。利用X射线检测、结电压、光电特性参数和smile效应测试手段,确定了管式炉封装半导体激光器巴条的最优封装条件,为以后的产业化提供了指导意义。     

反射式倒装对1 300 nm激光器性能改善的分析

对AlGaInAs多量子阱1 300 nm FP激光器进行反射式倒装封装,在热沉上靠近激光器出光端面约10~20 μm的区域采用Au反射层,对器件垂直方向出光进行反射。测试结果显示,与常规封装相比,采用这种结构封装芯片垂直发散角从34.5°降低至17°,器件单模光纤的平均耦合功率从1 850 μW提高至2 326 μW,耦合效率从21.1%提高到26.5%。对两种激光器进行光电参数的测量,结果表明：与常规封装器件相比,采用反射式倒装结构器件的饱和电流从135 mA提高至155 mA,饱和输出功率从37 mW提高至42 mW,热阻从194 K/W降低至131 K/W。最后对两种器件在95℃环境温度、100 mA电流下进行加速老化实验,老化结果显示：在老化条件下,器件衰退系数从常规封装的4.22×10^-5降低至1.06×10^-5,寿命从5 283 h提高至21 027 h。     

C-mount封装激光器热特性分析与热沉结构优化研究

为了降低单管半导体激光器的结温、提高器件的散热效果,基于C-mount热沉的热特性分析提出了一种优化的台阶热沉结构,研究了单管激光器结温和腔面侧向温度分布曲线的影响。在热沉温度298 K和连续输出功率10 W的条件下,腔长为1.5 mm的典型C-mount封装结构激光器的结温为343.6 K,热阻为4.6 K/W。通过在典型C-mount热沉中引入台阶结构,使封装激光器的结温降低为333.8 K,热阻减小到3.5 K/W。计算表明,其输出功率可提高近20%。     

Solder with discontinuous melting point in semiconductor laser arrays and stacks

High power semiconductor laser arrays must be mounted in the epitaxy-side down configuration for good heat transfer and so require a well-controlled solder. Selection of solder is very important in semiconductor laser arrays and stacks. Usually, the solder consists of two layers. The outer layer prevents In from oxidation. A new type of solder with several layers of Au between the two layers of In was made, which constitutes of multi-layer of W/Ni/Au/In/Cu. In packaging, the Au layer in the solder does not melt. Quick temperature decrease can avoid expansion of the solder. The solder cannot oxidize during packaging.     

Influence of AlN Buffer Thickness on GaN Grown on Si(111) by Gas Source Molecular Beam Epitaxy with Ammonia

Hexagonal GaN is grown on a Si(111) substrate with AlN as a buffer layer by gas source molecular beam epitaxy (GSMBE) with ammonia. The thickness of AlN buffer is changed from 9 to 72nm. When the thickness of AlN buffer is 36nm, the surface morphology and crystal quality of GaN is optimal. The in-situ reflection high energy electron diffraction (RHEED) reveals that the transition to a two-dimensional growth mode of AlN is the key to the quality of GaN. However, the thickness of AlN buffer is not so critical to the residual in-plane tensile stress in GaN grown on Si(111) by GSMBE for AlN thickness between 9 to 72nm.     

Effects of soft beam energy on the microstructure of Pb37Sn, Au20Sn, and Sn3.5Ag0.5Cu solder joints in lensed-SM-fiber to laser-diode-affixing application

This paper reports on the effectiveness of soft beam energy as a heat source to form an optimum solder joint to fix a lensed fiber permanently on a Ni/Au-plated substrate. Solders, i.e., Pb37Sn, Au20Sn, and Sn3.5Ag0.5Cu (SAC) [wt%] were evaluated for this fluxless application. The microstructures of the solder joints have been examined using scanning electron microscopy (SEM), in order to understand the response of these solder materials to the focussed white light. Obviously, the exposure time has a greater effect on the soldering temperature before reaching the peak temperature, which is determined by the power. A power setting of 40 W can reach approximately 340 °C, 30 W can reach about 310 °C while 25 W can easily reach 260 °C. In general, a higher soldering temperature than the melting temperature is required to form good wetting solder joints for fluxless applications. However, too high an input thermal energy may result in premature aging for the cases of Pb37Sn and SAC, and lateral cracks for the case of Au20Sn. The thermal cracks and voids observed in Au20Sn solder joint were attributed to the fact that the soft beam heating profile does not suit the AuSn preform. Out of these three solder types, SAC demonstrated just the right response to the soft beam, i.e., good wetting, fine and homogeneous structure, and no cracks or other visible failures.     

Effects of pulse laser duration and ambient nitrogen pressure in PLD of AlN

AlN thin films with a thickness in the nanometer range were prepared by pulsed laser deposition technique. We investigated the effect of laser wavelength, pulse duration, and ambient gas pressure on the composition and morphology of the deposited films. In all experiments we used AlN targets. We worked with three laser sources generating pulses of 34 ns@248 nm (source A), 450 fs@248 nm (source B), and 50 fs@800 nm (source C). XRD, SEM, and profilometric measurements were performed on the obtained AlN thin films. We have demonstrated that duration of the laser pulse is an important parameter for the quality and performances of AlN structures obtained by pulsed laser deposition. PACS 81.05.Ea; 81.15.Fg; 61.10.Nz     

基于多芯片封装的半导体激光器热特性

设计了一种由12只单条形芯片分为2组以从高到低阶梯排列的百瓦级半导体激光器结构。针对其在稳态工作条件下的热特性利用ANSYS软件进行了模拟分析,通过改变Cu热沉的宽度、间距和高度差,得到了最高和最低Cu热沉封装的芯片有源区温度及两者温度差值的变化规律。最后设计了一种较为理想的百W级半导体激光器的散热结构。     

连续100W量子阱二极管激光器封装工艺

为了提高激光器输出功率,对研制的铜微通道冷却器性能进行了测试,分析了其散热能力。设计了一种在软焊料中掺杂金属添加剂的工艺,有效抑制了晶须生长,并利用该冷却器和新工艺封装出了连续100W大功率二极管激光器,并对封装的器件进行了性能测试。测试结果表明,封装的连续100W器件在工作电流105 A时,输出功率超过了100W,中心波长为808.5 nm,光谱半高宽为2.15 nm,器件的smile尺寸小于2μm,部分值小于0.5μm。     

基于mini-bar的二极管激光器焊接实验研究

半导体激光器封装工艺过程对于激光器的输出特性、寿命等性能有重要影响,其中焊料的选择和焊接工艺是最关键的因素。采用半自动焊接系统将mini-bar芯片通过In焊料直接焊接在Cu热沉上,并通过硬件改进、软件优化、放缓成像过程等措施实现了高精度、高可靠性的焊接。通过对激光器的性能测试发现,其焊接功率稳定,焊接精度均值可达20 m,smile效应值可以控制在0.5 m。