硅表面上构筑烷烃单层膜的分子模拟

用分子力学方法模拟了十二烷烃在硅表面的单层膜的排列情况. 从中发现: 十二烷烃在硅表面的覆盖率约为50%, (8×8)大小的模拟格子即可描述烷烃链在硅表面的空间排列. 同时讨论了不同取代方式对单层膜的影响, 并比较了酯基和甲基终止的硅表面单层膜的空间排列方式, 模拟结果与实验测量基本吻合. 结果表明: 分子模拟方法可以作为实验手段的一种辅助工具, 在分子水平上为实验提供理论支持和微观信息.     

有机分子修饰硅表面*

硅作为一种重要的半导体材料,在微电子领域发挥着极其重要的作用。有机分子修饰硅表面是近年来硅表面化学领域的一个研究热点,引起了研究者的广泛重视。以共价键嫁接在硅表面的有机单分子层能形成稳定、高质量的杂化连接,将赋予传统的硅材料更多新的功能,具有许多其它表面难以比拟的优点。本文针对有机分子修饰硅表面的方法、单层膜的表征和应用,对近年来的最新研究进展进行了综述,并对该方向的今后的发展进行了展望。     

Au@Pt纳米粒子单层膜对甲醇氧化的电催化性能及SERS研究

通过种子生长法合成Au@Pt核壳结构纳米粒子,采用两相成膜法制备单层粒子膜,并转移获得Au@Pt核壳纳米粒子单层膜电极,该电极表面纳米粒子分布均匀,具有较大的比表面,对甲醇的氧化具有较好的电催化活性.研究表明,利用内核Au的长程电磁场增强效应,该单层膜表现出均匀且优良的表面增强拉曼散射(SERS)活性,适合作为基底在分子水平上研究表面的吸附和反应.获得了Au@Pt核壳纳米粒子单层膜表面甲醇电催化氧化过程的SERS光谱,为深入分析表面反应机理提供了实验依据.     

Au-Ag三角纳米环单层膜的原位转化制备及 SERS效应

利用模板牺牲氧化还原反应将自组装在基片上的三角板银纳米粒子(边长约为79.2 nm)与氯金酸溶液作用进而原位转化形成三角纳米环. 通过紫外-可见(UV-Vis)光谱实时监测基片上银三角板纳米粒子在反应不同阶段的消光特性; 扫描电子显微镜(SEM)显示了银三角板纳米粒子转化过程的形貌变化; 利用X射线光电子能谱(XPS)对其成分进行分析. 表征结果表明, 三角纳米环的成分为Au-Ag合金或复合物; 随着基片与氯金酸溶液作用时间的增加, 自组装膜的表面等离子体共振峰逐渐红移; Au-Ag三角环状纳米粒子的平均壁厚度从29.3 nm缩小至16.2 nm. 以4-巯基苯胺(4-ATP)为探针分子研究了该Au-Ag三角环状纳米粒子单层膜的表面增强拉曼(SERS)活性. 自组装单层膜基底的SERS信号随着Au-Ag三角纳米环平均壁厚度的增加逐渐增强.     

硅表面嫁接有机单分子膜的研究近况

由于在微电子、化学 /生物化学传感器、纳米技术及太阳能等领域具有潜在的应用价值 ,通过 Si— C键在硅表面上直接嫁接有机单分子膜 ,已成为近几年新开展的研究热点 .对这一研究领域进行了概要综述     

亚硒酸钠在L-半胱氨酸自组装类生物膜修饰电极上的电化学行为

利用L-半胱氨酸自组装膜修饰金电极(L-Cys,Au/SAMs), 在0.05mol/L H_2SO_4 底液中研究了 Na_2SeO_3 的电化学特性.在0.00～1.30 V (vs. SCE) 电位范围内对微量Na_2SeO_3进行循环伏安扫描,发现L-Cys, Au/SAMs修饰电极在峰电位0.89 V处有灵敏的Se的氧化溶出峰.通过比较裸金电极和修饰电极在Na_2SeO_3 溶液中的电化学特性发现,修饰电极通过巯基中的S与Na_2SeO_3发生氧化还原作用生成Se,且修饰电极对沉积在电极表面的Se的氧化过程具有催化作用.根据Na_2SeO_3在单分子膜上的电化学行为,提出了单分子膜中硫(Au-S)与Se(Ⅳ)作用生成Se的反应机理、Se电化学催化氧化机理及巯基化合物通过生成纳米硒生物吸收Se的类生物膜模型.     

不锈钢钝化膜耐蚀性与半导体特性的关联研究

通过极化曲线、交流阻抗谱和钝化膜半导体特性等电化学测量，研究了经电化学阳极氧化处理的不锈钢钝化膜在0.5 mol•L^-1 NaCl溶液中耐蚀性能与其半导体特性的关系，进一步探索电化学改性处理不锈钢钝化膜的耐蚀机理. 结果表明，不锈钢钝化膜在负于平带电位范围表现为p型半导体，在高于平带电位范围表现为n型半导体，这主要与组成钝化膜的Fe和Cr氧化物半导体性质有关. 与自然条件下形成的不锈钢钝化膜比较，发现经过电化学阳极氧化后不锈钢钝化膜具有较低的施主与受主浓度，平带电位负移，说明阴离子在钝化膜表面发生吸附. 低的施主与受主浓度及钝化膜表面负电荷的增强，可有效排斥侵蚀性Cl^－在钝化膜表面的特性吸附，有利于提高不锈钢的耐局部腐蚀性能.     

含磺酸盐基两性分子／聚乙烯亚胺LB膜的聚集结构

气液界面聚离子复合结构的形成能减弱两性分手亲水基间静电排斥作用，增加单分子膜的稳定性和累积性能．Ｘ－射线衍射结果表明，纯水和聚乙烯亚胺水溶液表面上的ＺＣ１４ＳＮａ单分子膜在聚苯乙烯基片上累积成Ｙ型膜，两种ＬＢ膜的等同周期差约为０．３０ｕｍ．     

水溶性聚合物和两亲聚合物——10.两亲聚合物PAMC_(16)S的自组装有序膜

用自组装技术在金(纯金和经阳极氧化的金)表面上获得了新型两亲聚合物PAMC_(16)S的有序膜。用接触角测试,XPS谱和电化学分析等方法对自组装膜进行了表征。根据膜表面的润湿性,金表面的自组装膜是疏水的,亲水的磺酸基团连于金表面,而疏水的碳氢链从表面伸展出。XPS实验结果支持金表面上单层膜的疏水结构。聚合物单层膜复盖的金电极起到含有针孔缺陷的阻膈型电极的作用。单层膜在法拉第反应中显示很强的吸附稳定性,说明聚合物LB膜在潜在应用中有其特有的特点。     

L-半胱氨酸和胱胺共自组装膜活体检测抗坏血酸

自组装单分子膜（SAM）由于其独特的物理化学性质近年来受到了极大的关注. SAM通过金硫键在电极表面形成高度有序的单分子膜,该稳定的分子膜不仅可以调节表面的亲疏水性质,而且可以促进电极表面氧化还原活性分子的反应速率. 本论文提出了一种简单有效的方法,在金微电极上构建半胱氨酸和胱胺共自组装单分子膜用于活体内抗坏血酸的检测. 研究发现,当混合单分子层中半胱氨酸和胱胺的摩尔比为1:1时,可以在低电位下（约为0.10 V）显著增强抗坏血酸氧化的电子转移动力学,同时该膜能在一定程度上抵抗蛋白质在电极表面的非特异性吸附. 将共自组装单分子膜应用到活体检测中,作者检测到鼠纹状体中抗坏血酸的基准值为257±30mmol·L^-1（n = 3）. 本论文为活体电化学检测提供了一种简单、有效的方法.     

界面微分电容法单晶硅表面单分子膜质量的检测

有机嫁接;分析;界面微分电容法单晶硅表面单分子膜质量的检测     

Theory of alkyl-terminated silicon quantum dots

We have carried out a series of ab initio calculations to investigate changes in the optical properties of Si quantum dots as a function of surface passivation. In particular, we have compared hydrogen-passivated dots with those having alkyl groups at the surface. We find that, while on clusters with reconstructed surfaces complete alkyl passivation is possible, steric repulsion prevents full passivation of Si dots with unreconstructed surfaces. In addition, our calculations show that steric repulsion may have a dominant effect in determining the surface structure and eventually the stability of alkyl-passivated clusters, with results dependent on the length of the carbon chain. Alkyl passivation weakly affects optical gaps of silicon quantum dots, while it substantially decreases ionization potentials and electron affinities and affects their excited state properties. On the basis of our results, we propose that alkyl-terminated quantum dots may be size selected, taking advantage of the change in ionization potential as a function of the cluster size.     

Engineering silicon oxide surfaces using self-assembled monolayers

Although a molecular monolayer is only a few nanometers thick it can completely change the properties of a surface. Molecular monolayers can be readily prepared using the Langmuir-Blodgett methodology or by chemisorption on metal and oxide surfaces. This Review focuses on the use of chemisorbed self-assembled monolayers (SAMs) as a platform for the functionalization of silicon oxide surfaces. The controlled organization of molecules and molecular assemblies on silicon oxide will have a prominent place in "bottom-up" nanofabrication, which could revolutionize fields such as nanoelectronics and biotechnology in the near future. In recent years, self-assembled monolayers on silicon oxide have reached a high level of sophistication and have been combined with various lithographic patterning methods to develop new nanofabrication protocols and biological arrays. Nanoscale control over surface properties is of paramount importance to advance from 2D patterning to 3D fabrication.     

Preparation and tribological study of a peptide-containing alkylsiloxane monolayer on silicon

A peptide-containing alkylsilane self-assembled monolayer on silicon surface has been prepared successfully by a simple one-step strategy. The formation and structure of the peptide-containing SAMs were characterized by means of contact angle measurement, ellipsometry, FT-IR, and AFM morphology observation. It was found that the water content in the hydrolysis solution plays a key role in determining the quality of the monolayers. The micro-tribological properties of various films were evaluated by using AFM, while the macro-tribological study was performed on a ball-on-plate tribometer. It was found that the peptide-containing monolayers possess excellent friction-reduction and antiwear ability, which was attributed to its amide-containing structure. In other words, the interchain hydrogen bonds among the molecules enhance the stability of the monolayers against rubbing the counterpart ball and thus endow it an outstanding antiwear ability.     

Langmuir-Blodgett film of hydrophobin protein from Pleurotus ostreatus at the air-water interface

We present results concerning the formation of Langmuir-Blodgett (LB) films of a class I hydrophobin from Pleurotus ostreatus at the air-water interface, and their structure as Langmuir-Blodgett (LB) films when deposited on silicon substrates. LB films of the hydrophobin were investigated by atomic force microscopy (AFM). We observed that the compressed film at the air-water interface exhibits a molecular depletion even at low surface pressure. In order to estimate the surface molecular concentration, we fit the experimental isotherm with Volmer's equation describing the equation of state for molecular monolayers. We found that about (1)/ 10 of the molecules contribute to the surface film formation. When transferred on silicon substrates, compact and uniform monomolecular layers about 2.5 nm thick, comparable to a typical molecular size, were observed. The monolayers coexist with protein aggregates, under the typical rodlet form with a uniform thickness of about 5.0 nm. The observed rodlets appear to be a hydrophilic bilayer and can then be responsible for the surface molecular depletion.     

Poly(ethylene glycol) monolayer formation and stability on gold and silicon nitride substrates

Poly(ethylene glycol) (PEG) self-assembled monolayers (SAMs) are extensively used to modify substrates to prevent nonspecific protein adsorption and to increase hydrophilicity. X-ray photoelectron spectroscopy analysis, complemented by water contact angle measurements, is employed to investigate the formation and stability upon aging and heating of PEG monolayers formed on gold and silicon nitride substrates. In particular, thiolated PEG monolayers on gold, with and without the addition of an undecylic spacer chain, and PEG monolayers formed with oxysilane precursors on silicon nitride have been probed. It is found that PEG-thiol SAMs are degraded after less than two weeks of exposure to air and when heated at temperatures as low as 120 degrees C. On the contrary, PEG-silane SAMs are stable for more than two weeks, and fewer molecules are desorbed even after two months of aging, compared to those desorbed in two weeks from the PEG-thiol SAMs. A strongly bound hydration layer is found on PEG-silane SAMs aged for two months. Heating PEG-silane SAMs to temperatures as high as 160 degrees C improves the quality of the monolayer, desorbing weakly bound contaminants. The differences in stability between PEG-thiol SAMs and PEG-silane SAMs are ascribed to the different types of bonding to the surface and to the fact that the thiol-Au bond can be easily oxidized, thus causing desorption of PEG molecules from the surface.     

多孔硅表面钝化对其发光性能的影响

报道多孔硅（PS）的表面钝化对其光致发光（PL）和电致发光（EL）的影响。PL和EL谱表明,经钝化处理的PS的PL和EL强度明显增强,且发光峰位较大蓝移;存放实验表明,经钝化处理的PS的PL和EL发光强度和发光峰位具有较好的稳定性;I～V曲线显示,经钝化处理的PS发光器件具有较低的启动电压。这些结果表明：用钝化处理的方法是提高PS的PL和EL强度和稳定性及改善其器件性能的有效途径。     

XPS and AFM characterization of the self‐assembled molecular monolayers of a 3‐aminopropyltrimethoxysilane on silicon surface,and effects of substrate pretreatment by UV‐irradiation

The self‐assembled (SA) molecular monolayers of a 3‐aminopropyltrimethoxysilane (3‐APTS) on a silicon (111) surface, and the effects of ultraviolet (UV) pre‐treatment for substrates on the assembling process have been studied using XPS and atomic force microscopy (AFM). The results show that the SA 3‐APTS molecules are bonded to the substrate surface in a nearly vertical orientation, with a thickness of the monolayer of about 0.8–1.5 nm. The SA molecular monolayers show a substantial degree of disorder in molecular packing, which are believed to result from the interactions of amine tails in the silane molecules used with surface functionalities of the substrates, and the oxygen‐containing species from the ambient. UV irradiation for silicon substrates prior to the self‐assembly reaction can enhance the assembly process and hence, significantly increase the coverage of the monolayer assembled for the substrates. Copyright © 2010 John Wiley & Sons, Ltd.     

Nanostructured pyramidal black silicon with ultra-low reflectance and high passivation

In this study, nanostructured pyramidal black silicon is prepared by metal assisted chemical etching method, in which the silver nitrate (AgNO₃) is used as the metal catalyst. Effects of the concentration of AgNO₃ on passivation and optical properties of the black silicon are investigated. The experimental results show that at the AgNO₃ concentration of 0.03 M, the nanostructure length is about 300 nm, and the reflectance of the black silicon with a stack of silicon nitride (SiN_x) and aluminum oxide (Al₂O₃) is 0.8%, which is comparable to that of the conventional black silicon with micrometer-long nanowires. In addition, an acceptably low surface recombination rate of 42 cm/s can be obtained. Plasma chemical vapor deposited SiN_x is deposited well on the top of nanostructures of black silicon, but shows poor coverage at the bottom region. Spatial atomic layer deposited Al₂O₃ can conformally cover the nanostructures with high passivation quality. Simulation result indicates an improvement of 5.5% of conversion efficiency for the nanostructured pyramidal black silicon solar cell compared to industrial silicon solar cell. The short nanostructured pyramidal surface with low reflectance and high passivation is expected to be helpful for black silicon technology applied to photovoltaic applications.