Spatial distribution of impurities in delta-doped n-type GaAs

Capacitance-voltage (CV) profiling measurements on delta-doped n-type GaAs reveal extremely narrow peaks with a full-width at half-maximum of 40 Å. Comparison of experimental with self-consistently calculated CV profiles demonstrates that Si impurities are localized on a length scale of a lattice constant in delta-doped GaAs. Diffusion and segregation are of minor importance. The basic theory of CV measurements on quantummechanical systems such as delta-doped semiconductors is developed and presented.     

Silicon doping effects on optical properties of InAs ultrathin layer embedded in GaAs/AlGaAs:δSi high electron mobility transistors structures

Micro-Raman scattering measurements were used to study the silicon delta-doped layer density variation effect on InAs ultrathin layer embedded in silicon-delta-doped GaAs/AlGaAs high electron mobility transistors (HEMTs) structures properties. These structures were grown by molecular beam epitaxy on GaAs substrates with different silicon (Si) delta-doped layer densities. Two coupled plasmon–longitudinal optical (LO) phonon modes (L− and L+) were observed in the micro-Raman spectra of the Si-delta-doped samples, and both their wave numbers and intensities were dependent on the silicon delta-doped layer density. There is evidence to suggest that the increase of the Si doping level results in the increase of exciton–phonon scattering which is mainly due to the incorporation of Si and the increase of the two-dimensional electron gas (2DEG) in the InAs/GaAs interface. From fitting the temperature-dependence of full width at half maximum (FWHM) of quantum well’s photoluminescence peak (P₁) by the exciton–photon coupling model, it was found that the interaction between exciton and phonon in Si-delta-doped quantum wells was higher than that in the undoped sample. This result was confirmed as resulting from the increase of plasmon–phonon scattering which is attributed to the increase of free carriers donated from implanted Si dopant. The self-consistent Poisson–Schrödinger model calculation results are in good agreement with the experimental results, where the 2DEG densities increase linearly with increasing the Si-delta-doped layer density.     

Chemical design of direct-gap light-emitting silicon

Quantum confinement effect has been the dominant approach guiding the search for light-emitting silicon. By first-principles total energy calculations of Si delta-doped with oxygen layers, however, we show that this generally accepted mechanism is ineffective. Instead, a different mechanism is proposed based on defect engineering where the oxygen atoms chemically shift the valence band edge of Si away from the zone center, resulting in the desired optical functionality. Our calculation suggests new design principles for light-emitting silicon as well as providing the microscopic origin for the observed strong luminescence and band gap increase in the SiO(001) multi-delta-layers.     

Half-metallic digital ferromagnetic heterostructure composed of a delta-doped layer of Mn in Si

We propose and investigate the properties of a digital ferromagnetic heterostructure consisting of a delta-doped layer of Mn in Si, using ab initio electronic-structure methods. We find that (i) ferromagnetic order of the Mn layer is energetically favorable relative to antiferromagnetic, and (ii) the heterostructure is a two-dimensional half-metallic system. The metallic behavior is contributed by three majority-spin bands originating from hybridized Mn-d and nearest-neighbor Si-p states, and the corresponding carriers are responsible for the ferromagnetic order in the Mn layer. The minority-spin channel has a calculated semiconducting gap of 0.25 eV. The band lineup is found to be favorable for retaining the half-metal character to near the Curie temperature. This kind of heterostructure may be of special interest for integration into mature Si technologies for spintronic applications.     

On some new effects in delta-doped QWs

Self-consistent calculation of Schrodinger, Poisson and electroneutrality equation with embedded impurity binding energy calculations of delta-doped SiGe/Si quantum well structures are performed. The influence of several parameters of the structure on the impurity binding energy is studied and discussed. On the basis of found phenomena the idea of an optical modulator controlled by a weak electric field is put forward.     

Delta-doped quantum wire tunnel junction for highly concentrated solar cells

We propose a novel structure for tunnel junction based on delta-doped AlGaAs/GaAs quantum wires. Higher spatial confinement of quantum wires alongside the increased effective doping concentration in the delta-doped regions extremely increase the peak tunneling current and enhance the performance of tunnel junction. The proposed structure can be used as tunnel junction in the multijunction solar cells under the highest possible thermodynamically limited solar concentration.The combination of the quantum wire with the delta-doped structure can be of benefit to the solar cells' advantages including higher number of sub-bands and high degeneracy. Simulation results show a voltage drop of 40 mV due to the proposed tunnel junction used in a multijunction solar cell which presents an extremely low resistance to the achieved peak tunneling current.     

Low temperature electron mobility in Ga0.5In0.5P/GaAs quantum well structures

We analyse the low temperature subband electron mobility in a Ga_0.5In_0.5P/GaAs quantum well structure where the side barriers are delta-doped with layers of Si. The electrons are transferred from both the sides into the well forming two dimensional electron gas (2DEG). We consider the interface roughness scattering in addition to ionised impurity scattering. The effect of screening of the scattering potentials by 2DEG on the electron mobility is analysed by changing well width. Although the ionized impurity scattering is a dominant mechanism, for small well width the interface roughness scattering happens to be appreciable. Our analysis can be utilized for low temperature device applications.      

Simulations of AlGaAs/GaAs heterojunction phototransistors

Heterojunction bipolar phototransistors, based on GaAs technology, are widely used in optoelectronic integrated circuits. One of the methods to improve phototransistor performance is applying a delta-doped thin base, which causes both a higher current gain and a better time response. There is a lack of information about this kind of device in the literature. Our work presents the results of computer simulations of AlGaAs/GaAs n-p-n phototransistors, with a bulk-doped and delta-doped base working as two- and threeterminal devices. The characteristics and device parameters obtained clearly show that phototransistors with delta-doped base have higher sensitivity and a better time response compared to the structures with a bulk-doped base. Based on simulation results, we modified the epitaxial phototransistor structure with a double delta-doped base that should improve device performance.     

Conductivity and persistent photoconductivity in GaAs epitaxial films containing single and double delta-doped layers

Electrophysical parameters of single and double delta-doped layers in GaAs epitaxial films grown by the metal-organic chemical vapor deposition have been systematically investigated in the temperature range of 4.2 to 300 K. The 2D electron gas density distribution is affected by the overlap of wave functions in neighboring quantum wells, as a result of which the peak on the curve of the Hall mobility in the 2D electron gas versus the separation between the quantum wells shifts. The persistent photoconductivity in delta-doped layers is due to the change in the surface potential caused by the neutralization of the negative charge of surface states by photoexcited holes. A method for comparing delta-doped layers grown under different conditions at different depths from the sample surface has been suggested. Zh. éksp. Teor. Fiz. 113, 693–702 (February 1998)     

Density-functional theory study of half-metallic heterostructures: interstitial Mn in Si

Using density-functional theory within the generalized gradient approximation, we show that Si-based heterostructures with 1/4 layer delta doping of interstitial Mn (Mn(int)) are half-metallic. For Mn(int) concentrations of 1/2 or 1 layer, the states induced in the band gap of delta-doped heterostructures still display high spin polarization, about 85% and 60%, respectively. The proposed heterostructures are more stable than previously assumed delta layers of substitutional Mn. Contrary to widespread belief, the present study demonstrates that interstitial Mn can be utilized to tune the magnetic properties of Si, and thus provides a new clue for Si-based spintronics materials.     

Effect of graded triple delta-doped sheets on the performance of GaAs based dual channel pseudomorphic high electron mobility transistors

The characteristics of InGaP/InGaAs/GaAs dual channel pseudomorphic high electron mobility transistors (DCPHEMTs) with different graded triple delta-doped sheets are investigated and experimentally demonstrated. Based on a two-dimensional simulator of ATLAS, the band diagrams, electron densities and DC characteristics of studied devices are comprehensively analyzed. Due to the use of properly graded triple delta-doped sheets, good pinch-off and saturation characteristics, improved transport properties and wide current swing are obtained. For comparison, a practical DCPHEMT with good device performances is fabricated as well. It is found that the simulated data are in good agreement with experimental results.     

On intersubband absorption of radiation in delta-doped QWs

The results of calculation of intersubband absorption coefficients for either center-, or edge-delta-doped with Phosphorus 10 nm and 20 nm-wide Si_0.8Ge_0.2/Si/Si_0.8Ge_0.2 quantum wells are presented. It is shown, that the absorption for delta-doped structures differs substantially from that of a pure rectangular or uniformly doped ones. There are two main features for delta-doped quantum wells. The first one is the blue-shift for optical transitions between first and others (more pronounced), and second and others (less pronounced) space quantized energy levels. The second one is that edge doping changes the symmetry of the quantum well and forbidden optical transitions for the rectangular structure become now allowed. The influences of temperature, quantum well width, and impurity concentration on the optical absorption are studied. It is shown that the most dramatic changes in comparison with rectangular quantum wells are for wider investigated edge-doped structures with bigger number of ionized impurities.     

Electric field tunability of nuclear and electronic spin dynamics due to the hyperfine interaction in semiconductor nanostructures

We present formulas for the nuclear and electronic spin relaxation times due to the hyperfine interaction for nanostructed systems and show that the times depend on the square of the local density of electronic states at the nuclear position. A drastic sensitivity (orders of magnitude) of the electronic and nuclear spin coherence times to small electric fields is predicted for both uniformly distributed nuclear spins and delta-doped layers of specific nuclei. This sensitivity is robust to nuclear spin diffusion.     

Annealing effect on the optical properties in Si delta-doped Al0.24Ga0.76As/In0.15Ga0.85As/GaAs pseudomorphic high electron mobility transistor structures

The optical properties of Si delta-doped Al_0.24Ga_0.76As/In_0.15Ga_0.85As/GaAs pseudomorphic high electron mobility transistor structure (PHEMTs) are estimated after the process of rapid thermal annealing (RTA) in the temperature range 500–750°C. After layer intermixing and decrease of 2DEG densities of PHEMTs just occurs around the annealing temperature of 650°C, the 12H transition peak at 1.354 eV above the annealing temperature of 650°C is newly observed from the photoluminescence (PL) and photoreflectance (PR) spectra. From the results of PL and PR measurements in the annealed PHEMTs, it is found that remarkable modification of band profile in InGaAs QW occur at annealing temperature above 650°C.     

Enhanced terahertz bistability in a nonlinear Fabry-Perot resonator with n-type quantum wells

The intrinsic bistable terahertz response of intersubband plasmons in wide n-type delta-doped quantum wells is predicted to be enhanced by a resonant Fabry-Perot cavity. With a simple low-Q resonator, the threshold for bistability is decreased by a factor of 2-3 compared with that for bare multiple quantum wells.     

The dynamic field effect in Mn delta-doped quantum wells and In(Ga)As/GaAs quantum dot heteronanostructures

The dynamic field effect in Mn delta-doped epitaxial layers and quantum dimensional heteronanostructures of the p type with quantum wells and quantum dots was investigated. It was shown that an embedded Mn delta layer leads to the considerable capture of injected carriers on traps associated with the delta layer.     

ZnO-based terahertz quantum cascade lasers

High-power terahertz sources operating at room-temperature are promising for many applications such as explosive materials detection, non-invasive medical imaging, and high speed telecommunication. Here we report the results of a simulation study, which shows the significantly improved performance of room-temperature terahertz quantum cascade lasers (THz QCLs) based on a ZnMgO/ZnO material system employing a 2-well design scheme with variable barrier heights and a delta-doped injector well. We found that by varying and optimizing constituent layer widths and doping level of the injector well, high power performance of THz QCLs can be achieved at room temperature: optical gain and radiation frequency is varied from 108 cm^?1 @ 2.18 THz to 300 cm^?1 @ 4.96 THz. These results show that among II–VI compounds the ZnMgO/ZnO material system is optimally suited for high-performance room-temperature THz QCLs.     

Effects of extreme disorder on electronic properties in δ-doped semiconductor microstructures—a realistic computer simulation

Impurity induced disorder is a key feature of strongly doped semiconductor microstructures. We present a theoretical approach which allows the realistic and efficient calculation of localized quantum states in layered, delta-doped systems and the resulting properties of the quasi-2D multisubband electron/hole gas. The random Coulomb potential is directly computed from the impurity distribution without any simplifying assumptions. Electron-electron interaction is treated self-consistently on the Hartree level. The extreme cases of the doping superlattice (strong disorder) and the modulation doped quantum well (weak disorder) are studied as example device structures. Intersubband absorption spectra are then calculated for both types of systems and studied as a function of the electron filling factor. Striking differences are found between the linewidths of potential fluctuations and absorption spectra. These results are explained on the basis of system geometry, nonlinear screening and intersubband correlations. Finally, we discuss possible future applications and extensions of the method.     

量子限制效应对δ掺杂GaAs/AlAs多量子阱中铍受主态寿命的影响

采用远红外时间分辨光谱,研究了量子限制效应对δ掺杂在GaAs/AlAs多量子阱中铍（Be）受主态寿命的影响.在低温下的远红外吸收谱中,清楚地观察到了三条主要吸收线,它们分别来源于铍受主从基态到它的三个奇宇称激发态的跃迁.实验结果表明：随着量子限制效应的增强,受主激发态寿命而减少,实验测得体材料中Be受主2p激发态的寿命是350 ps,而阱宽10 nm的多量子阱中的寿命是55 ps.量子限制效应对布里渊区折叠声学声子模的影响增强了受主带内空穴与声学声子相互作用,从而加快了受主带内空穴的弛豫过程. 关键词： 量子限制效应 受主态寿命 时间分辨光谱 δ掺杂')" href="#">δ掺杂     

Delta掺杂制备p-GaN薄膜及其电性能研究

采用Delta掺杂技术制备了p型氮化镓薄膜，并利用原子力显微镜、霍尔测试、X射线衍射、荧光光谱等测试手段对样品的形貌和电导性能进行了分析，发现Delta掺杂样品比均匀掺杂样品晶体质量和电导性能都有很大提高，说明Delta掺杂可有效抑制缺陷，并对缺陷抑制机理进行了讨论；最后，对掺杂前的预通氨过程作了深入的研究，结果发现，预通氨对掺杂不益. 关键词： 氮化镓 LEDs MOCVD Delta掺杂