聚偏氟乙烯的等离子体处理和ESR研究

在外部电极电容耦合反应装置中对聚偏氟乙烯(PVF₂)表面进行等离子体放电处理,测量了等离子体处理后PVF₂凝胶量、剪切强度和表面接触角等参量值的变化,另外,用ESR技术对等离子体处理生成的自由基进行研究,指出等离子体作用后表面分子不饱和链的增加和自由基引发的交联反应与表面粘接性能的改善有关.     

聚偏氟乙烯的等离子体处理和ESR研究

在外部电极电容耦合反应装置中对聚偏氟乙烯(PVF₂)表面进行等离子体放电处理,测量了等离子体处理后PVF₂凝胶量、剪切强度和表面接触角等参量值的变化,另外,用ESR技术对等离子体处理生成的自由基进行研究,指出等离子体作用后表面分子不饱和链的增加和自由基引发的交联反应与表面粘接性能的改善有关.     

分子发射光谱法测量微波等离子体气体温度

通过OH自由基A2Σ+→X2Π_r电子带系分子发射光谱测温法,实现了对氩气、氮气、空气三种大气压微波等离子体气体温度的测量。探究了不同微波功率、不同气体流量下气体温度的变化规律,测量了氮气、空气微波等离子体羽流的轴向温度分布。实验结果表明,不同工作条件下微波等离子体核心温度普遍超过2 000 K,空气微波等离子体可超过6 000 K;同样工作条件下三种微波等离子体气体温度满足：T_Ar<T_N2<T_Air;气体温度总体上随微波功率增加而小幅增加,随气体流量下降而小幅降低;氮气与空气等离子体羽流温度沿轴向迅速降低。为验证分子发射光谱测温法的准确性,以热电偶测温作为比对,对温度较低的介质阻挡放电氩气等离子体进行了温度测量,实验表明,分子发射光谱法与热电偶所测结果十分接近。     

低温等离子体分解N2/O2/NO气氛中NO试验研究

利用自行设计的介质阻挡放电型低温等离子体反应器,研究了NO初始浓度、O₂初始浓度、放电功率、电源频率等因素对NTP转化N₂/O₂/NO气氛中NO的影响规律。研究发现,NO去除率随功率增大而升高,到达一最大值后随功率增大而降低;NO去除率随O₂初始浓度增加而降低,随NO初始浓度增大而减小。相同放电功率下,同一组分中NO去除率随电源频率的增加而降低,因此相同放电功率下降低电源频率可提高NO去除率。O₂初始浓度不高于5%时,NO_x大部分为NO,NO₂和O₃浓度均随放电功率增大而降低,NO₂、O₃生成量随O₂初始浓度升高而增多。     

激光诱导AlO自由基B2∑+–X2∑+跃迁光谱研究

基于激光诱导击穿光谱技术, 利用Nd:YAG脉冲激光激发Al₂O₃ (含量为99%)陶瓷片产生等离子体, 获得了AlO自由基B²∑⁺–X²∑⁺跃迁的33条发射谱线. 就AlO自由基光谱的时间演化规律和激光能量对谱线的影响规律进行了研究与分析. 结果表明, AlO自由基光谱出现在Al原子和Al离子光谱之后, 且持续时间较长. 当激光的脉冲能量由10 mJ起不断增加时, AlO自由基光谱强度逐渐减小, 且最大值出现时间随激光能量的增加而后移. 在此基础上, 进行了陶瓷等离子体在空气和氩气环境下的对比试验, 发现从Al₂O₃陶瓷片中激发所产生的AlO自由基必须有空气中O₂参与反应. 关键词： 激光诱导击穿光谱 AlO自由基 B²∑⁺–X²∑⁺跃迁光谱')" href="#">B²∑⁺–X²∑⁺跃迁光谱     

不同初始温度下H2/O2混合物等离子体的演化

本文对不同初始温度下,H₂/O₂混合物等离子体中主要粒子随时间发展的演化规律进行了数值模拟,得到了放电后等离子体中主要带电粒子和中性粒子密度随时间的变化规律.计算结果表明,H₂/O₂混合物等离子体中主要活性粒子密度随时间的增加减小,化学反应达到平衡所需的时间随初始温度升高逐渐减少. 关键词： 等离子体 化学过程 数值模拟 演化     

多相氧载体CoO-MgO和氧分子作用的ESR研究

用ESK研究多相氧载体CoO-MgO表面上氧的吸附作用,发现在77-150K温度范围内表面Co²⁺离子和O₂的结合是可逆的,吸附产生Co³⁺-O₂^-自由基加合物有超精细结构的ESR谱;当温度增加,吸附态O₂^-自由基发生转移并稳定在Mg²⁺离子上形成Mg²⁺-O₂^-自由基,文中着重讨论Co³⁺-O₂^-自由基的电子结构和成键本质,认为自由基是通过自旋成对的方式形成的,由于σ-л键作用引起的自旋极化以及由于电子离域作用而引起的偶极作用与ESR制的超精细结构线产生有关。     

低压下直流电弧热等离子体射流电子密度的光谱法测量

采用原子发射光谱仪研究低压直流电弧热喷涂等离子体射流的特性。利用Stark展宽法采集H_β谱线,使用其Δλ_1/2来计算等离子射流中的电子密度,研究了氢气流量、输入功率和探测距离对等离子体射流中电子密度的影响。使用Saha方程计算热等离子体的电离程度,研究了功率/氢气流量与等离子体电离程度的关系。结果表明:电子密度和电离程度随着电流强度的增大而增加;氢气流量增加可以明显提高等离子体射流的能量,但对电离程度影响不大。     

等离子体化学气相沉积氮化镓薄膜中的N2/TMG等离子体发射光谱分析

对电子回旋共振低温等离子体化学气相沉积工艺(ECR-PECVD)沉积GaN薄膜过程中的氮气和三甲基镓有机金属气体(TMG)混合气体等离子体发射光谱进行分析。结果表明TMG 在等离子体自加热条件下就发生离解,N₂/TMG混合气体ECR等离子体主要以Ga气体粒子和亚稳态氮分子为主。发射光谱特征谱线随微波功率变化分析表明：当微波功率高于400 W时,亚稳态氮分子浓度随着微波功率的增加而增加,而高激发态氮分子以及氮分子离子浓度却随着减少。     

大气压低温氦等离子体射流的诊断研究

为了加快低温氦气等离子体射流的工程化进程,通过自主设计的同轴式介质阻挡放电等离子体射流发生器,在放电频率10 kHz,一个大气压条件下产生了稳定的氦气等离子体射流。通过分析不同工况下的电压电流波形可以发现单纯增加氦气体积流量只能小幅的增加电流脉冲幅值,而对放电时间、电流脉冲数的影响不大。增加放电峰值电压时电流脉冲幅值会得到较大幅度增加。通过发射光谱法对大气压氦气等离子射流的活性粒子种类、电子激发温度、电子密度进行了诊断。结果表明,大气压氦气等离子体射流中的主要活性粒子为He Ⅰ原子、N₂第二正带系、N+₂的第一负带系、羟基（OH）,H原子的巴尔末线系（H_α和H_β）与O原子,这表明虽然该试验中使用的氦气纯度已达99.99%,但其中仍残留有少量的空气,同时放电时大气中的空气会被卷吸到放电空间发生电离。还可以发现,主要活性粒子的相对光谱强度随氦气体积流量的增加及放电峰值电压的增大均呈现上涨的趋势。选用He Ⅰ原子的四条谱线对不同试验工况下的电子激发温度进行了计算,得到大气压氦气等离子体射流的电子激发温度在3 500~6 300 K之间,电子激发温度随放电峰值电压与氦气体积流量的增大总体上呈现上升的趋势。但由于反向电场的存在,某些峰值电压可能会出现电子激发温度下降的情况;根据Stark展宽原理对大气压氦气等离子体射流的电子密度进行了计算,发现电子密度的数量级可达1015 cm-3,同时增大峰值电压与氦气体积流量均可有效的提高射流中的电子密度。这些参数的研究对氦气等离子体射流在工程实际中的应用具有重要意义。     

辉光放电中处理聚四氟乙烯表面：Ⅱ,ESR研究PTFE膜自由基

在外部电极电容耦合式反应装置中,对聚四氟乙烯(PTFE)膜进行了辉光放电处理。通过电子自旋共振(ESR)谱研究了PTFE在处理过程中所产生的自由基,着重讨论了温度对ESR谱的影响。最后,以DPPH为内标,测定了处理后PTFE膜的自由基浓度,并考察了自由基在空气中的衰减情况。     

The effect of surface modification by nitrogen plasma on photocatalytic degradation of polyvinyl chloride films

The solid-phase photocatalytic degradation of poly(vinyl chloride) (PVC) films was investigated under the ambient air in order to assess the feasibility of developing photodegradable polymers. Nitrogen plasma was used to modify PVC films to enhance the photocatalytic degradation of PVC with nano-sized anatase TiO₂. The plasma parameter varied in this study is discharge power from 30 to 120 W for a constant treatment time of 60 s and a constant gas pressure of 10 Pa. The photodegradation of the plasma-treated PVC-TiO₂ films was compared with that of pure PVC films and PVC-TiO₂ films performing weight loss monitoring, scanning electron microscopy (SEM) analysis, contact angle measurements, electron spin resonance (ESR), Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). The wettability of the plasma-treated PVC is improved significantly. ESR revealed that the signal of radicals on the surface of the plasma-treated PVC film was enhanced after the treatment. Furthermore, the weight loss indicated that TiO₂ speeds up the photocatalytic degradation of PVC chains. The SEM image of the plasma-treated PVC-TiO₂ film showed a lot of crack on the film surface after irradiation. XPS indicated that the C and Cl atomic concentration reached minimum values on the surface of plasma-treated PVC-TiO₂ under identical photocatalytic condition. The experimental results reveal that plasma treatment can obviously enhance the photocatalytic degradation of PVC.     

HDPE、PC在冲击压缩下的表面化学变化

 对冲击高压作用下的HDPE、PC表面作ESCA、FT-IR分析,发现样片表面氧碳原子数比分别高达0.195∶1和0.266∶1,含氧基团明显增多。认为冲击作用造成的瞬间高温高压是材料发生化学反应的直接原因。在引起脱氢、炭化等反应的同时,分子链上生成大量具有反应活性的不饱和碳原子与自由基,并与空气中的氧就地反应,形成对样品表面材料的接枝或取代。     

BEHAVIOR OF Ar PLASMA FORMED IN A HIGH DENSITY PLASMA SOURCE-AN ECR REACTOR

In order to develop the ultra-large scale integration(ULSI), low pressure and high density plasma apparatus are required for etching and deposit of thin films. To understand critical parameters such as the pressure, temperature, electrostatic potential and energy distribution of ions impacting on the wafer, it is necessary to understand how these parameters are influenced by the power input and neutral gas pressure. In the present work, a 2-D hybrid electron fluid-particle ion model has been developed to simulate one of the high density plasma sources-an Electron Cyclotron Resonance (ECR) plasma system with various pressures and power inputs in a non-uniform magnetic field. By means of numerical simulation, the energy distributions of argon ion impacting on the wafer are obtained and the plasma density, electron temperature and plasma electrostatic potential are plotted in 3-D. It is concluded that the plasma density depends mainly on both the power input and neutral gas pressure. However, the plasma potential and electron temperature can hardly be affected by the power input, they seem to be primarily dependent on the neutral gas pressure. The comparison shows that the simulation results are qualitatively in good agreement with the experiment measurements.     

Surface modification of argon/oxygen plasma treated vulcanized ethylene propylene diene polymethylene surfaces for improved adhesion with natural rubber

Vulcanized ethylene propylene diene polymethylene (EPDM) rubber surface was treated in a radio frequency capacitatively coupled low pressure argon/oxygen plasma to improve adhesion with compounded natural rubber (NR) during co-vulcanization. The plasma modified surfaces were analyzed by means of contact angle measurement, surface energy, attenuated total reflection-infrared spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, energy dispersive X-ray sulfur mapping and atomic force microscopy. Several experimental variables such as plasma power, length of exposure time and composition of the argon-oxygen gas mixture were considered. It was delineated that plasma treatment changed both surface composition and roughness, and consequently increased peel strength. The change in surface composition was mainly ascribed to the formation of C-O and -CO functional groups on the vulcanized surfaces. A maximum of 98% improvement in peel strength was observed after plasma treatment.     

The sterilization of Escherichia coli by dielectric-barrier discharge plasma at atmospheric pressure

The sterilization of E. coli (ATCC8099) using an atmospheric pressure, air DBD plasma driven by 100 Hz high-voltage power supply was investigated in this paper. The results showed that germicidal efficiency was closely related to the plasma treatment time, the gap spacing, the initial cell density and the surface characters of substrate materials. The germicidal efficiency was 99.999% under the conditions of 5-min plasma treatment, 3-cm gap spacing and on PET films. After plasma exposure for 5 min, the temperature was observed below 43 °C which could not lead to inactivate E. coli. The observation of protein leakage and cell morphology alteration by transmission electron microscopy (TEM) techniques revealed that the etching action on cell membrane by electrons, ions and radicals was primary reason of DBD air plasma sterilization.     

表面凹陷对等离子体浸没离子注入均匀性的影响

利用二维流体模型和数值计算方法模拟了等离子体浸没离子注入（ＰⅢ）Ｋ ,具有圆弧凹槽的平面靶周围的鞘层扩展情况,计算了鞘层扩展过程中的电热分布、离子速度和离子密度变化获得了沿靶表面的离子入射角度和注入剂量的分布情况,为等离子体浸没离子注入处理复杂形状靶提供了理论基础。     

Low temperature argon plasma sterilization effect on Pseudomonas aeruginosa and its mechanisms

In the present work, low temperature argon plasma was used to sterilize Pseudomonas aeruginosa on PET sheets. The discharge conditions were as follows: power of 30 W and gas flux of 20 cm³/min, and the pressure in the reaction chamber was 6.2 Pa. In a self-designed plasma reaction equipment, active species (electron, ion, radical and UV light, etc.) were separated effectively, and the discharge zone, afterglow zone and remote zone were plotted out in the plasma field. For a treatment time of 60 s, the germicidal effects were 3.94, 3.86 and 2.93 respectively in the three zones. The results show that argon plasma can effectively sterilize P. aeruginosa in a short time. Before and after plasma treatment, cell morphology was studied via scanning electron microscopy (SEM). Cell wall or cell membrane cracking was tested to determine the content of nucleic acid in the bacteria suspensions using ultraviolet spectroscopy. To test the content of protein, a coomassie light blue technique was used. The results show that plasma activity cracks the cell wall and cell membrane, resulting in cellular content leakage. In addition, the results from electron spin resonance (ESR) spectroscopy and double Langmuir electron probe show that electrons, ions and argon free radicals play important roles in sterilization in the discharge zone, but only argon free radicals act to sterilize bacteria in the afterglow zone and the remote zone.