Selective growth of ag nanowires on Si(111) surfaces by electroless deposition

Electroless deposition of Ag on atomically flat H-terminated Si(111) surfaces in aqueous alkaline solutions containing Ag ions produced two different sizes of Ag nanowires along atomic step edges: (1) a narrow nanowire of 10 nm in width and 0.5 nm in height and (2) a wide nanowire of 35 nm in width and 11 nm in height. The narrow and wide nanowires were formed by immersion in the solutions containing less than 1 ppb and 8 ppm dissolved-oxygen concentrations, respectively. This result indicates that the dissolved oxygen initiates the formation of Ag nucleation sites and that the fabrication method has a possibility of controlling the size of Ag nanowires.     

Reactive coupling of 4-vinylaniline with hydrogen-terminated Si(100) surfaces for electroless metal and "synthetic metal" deposition

Pristine and resist-patterned Si(100) substrates were etched by aqueous HF to produce hydrogen-terminated silicon (H-Si(100)) surfaces. The H-Si(100) surface was then subjected to UV-induced reactive coupling of 4-vinylaniline (VAn) to produce the VAn monolayer-modified silicon (VAn-Si) surface. The VAn-Si surface was first functionalized with a "synthetic metal" by oxidative graft polymerization of aniline with the aniline moieties of the coupled VAn molecules. The composition and topography of the VAn-Si and polyaniline (PAn)-grafted VAn-Si (PAn-VAn-Si) surfaces were characterized by X-ray photoelectron spectroscopy and atomic force microscopy, respectively. The doping-undoping (protonation-deprotonation) and redox-coupling (metal reduction) behavior, as well as the electrical conductivity, of the surface-grafted PAn were found to be similar to those of the aniline homopolymer. The VAn-Si surface was also funtionalized by the electroless plating of copper. Not only did the VAn layer provide chemisorption sites for the palladium catalyst, in the absence of prior sensitization by SnCl2, during the electroless plating process, it also served as an adhesion promotion layer and a low-temperature diffusion barrier for the electrolessly deposited copper. Finally, micropatterning of the grafted PAn and of the electrolessly deposited copper were demonstrated on the resist-patterned VAn-Si surfaces.     

Multiredox tetrathiafulvalene-modified oxide-free hydrogen-terminated Si(100) surfaces

Tetrathiafulvalene (TTF) monolayers covalently bound to oxide-free hydrogen-terminated Si(100) surfaces have been prepared from the hydrosilylation reaction involving a TTF-terminated ethyne derivative. FTIR spectroscopy characterization using similarly modified porous Si(100) substrates revealed the presence of vibration bands assigned to the immobilized TTF rings and the Si-C═C- interfacial bonds. Cyclic voltammetry measurements showed the presence of two reversible one-electron systems ascribed to TTF/TTF(.+) and TTF(.+)/TTF(2+) redox couples at ca. 0.40 and 0.75 V vs SCE, respectively, which compare well with the values determined for the electroactive molecule in solution. The amount of immobilized TTF units could be varied in the range from 1.7 × 10(-10) to 5.2 × 10(-10) mol cm(-2) by diluting the TTF-terminated chains with inert n-decenyl chains. The highest coverage obtained for the single-component monolayer is consistent with a densely packed TTF monolayer.     

Morphology, structure, and magnetism of FeCo thin films electrodeposited on hydrogen-terminated Si(111) surfaces

In this work we describe the fabrication of FeCo alloy (less than 10 at% Co) thin films from aqueous ammonium sulfate solutions onto n-type Si(111) substrates using potentiostatic electrodeposition at room temperature. The incorporation of Co into the deposits tends to inhibit Fe silicide formation and to protect deposits against oxidation under air exposure. As the incorporation of Co was progressively increased, the sizes of nuclei consisting of FeCo alloy increased, leading to films with a highly oriented body-centered cubic structure with crystalline texture, where (110) planes remain preferentially oriented parallel to the film surface.     

Molecular modeling of alkyl and alkenyl monolayers on hydrogen-terminated Si(111)

On H-Si(111) surfaces monolayer formation with 1-alkenes results in alkyl monolayers with a Si-C-C linkage, while 1-alkynes yield alkenyl monolayers with a Si-C═C linkage. Recently, considerable structural differences between both types of monolayers were observed, including an increased thickness, improved packing, and higher surface coverage for the alkenyl monolayers. The precise origin thereof could experimentally not be clarified yet. Therefore, octadecyl and octadecenyl monolayers on Si(111) were studied in detail by molecular modeling via PCFF molecular mechanics calculations on periodically repeated slabs of modified surfaces. After energy minimization the packing energies, structural properties, close contacts, and deformations of the Si surfaces of monolayers structures with various substitution percentages and substitution patterns were analyzed. For the octadecyl monolayers all data pointed to a substitution percentage close to 50-55%, which is due the size of the CH(2) groups near the Si surface. This agrees with literature and the experimentally determined coverage of octadecyl monolayers. For the octadecenyl monolayers the minimum in packing energy per chain is calculated around 60% coverage, i.e., close to the experimentally observed value of 65% [Scheres et al. Langmuir 2010, 26, 4790], and this packing energy is less dependent on the substitution percentage than calculated for alkyl layers. Analysis of the chain conformations, close contacts, and Si surface deformation clarifies this, since even at coverages above 60% a relatively low number of close contacts and a negligible deformation of the Si was observed. In order to evaluate the thermodynamic feasibility of the monolayer structures, we estimated the binding energies of 1-alkenes and 1-alkynes to the hydrogen-terminated Si surface at a range of surface coverages by composite high-quality G3 calculations and determined the total energy of monolayer formation by adding the packing energies and the binding energies. It was shown that due to the significantly larger reaction exothermicity of the 1-alkynes, thermodynamically even a substitution percentage as high as 75% is possible for octadecenyl chains. However, because sterically (based on the van der Waals footprint) a coverage of 69% is the maximum for alkyl and alkenyl monolayers, the optimal substitution percentage of octadecenyl monolayers will be presumably close to this latter value, and the experimentally observed 65% is likely close to what is experimentally maximally obtainable with alkenyl monolayers.     

X-ray studies of self-assembled organic monolayers grown on hydrogen-terminated Si(111)

The structure of self-assembled monolayers (SAMs) of undecylenic acid methyl ester (SAM-1) and undec-10-enoic acid 2-bromo-ethyl ester (SAM-2) grown on hydrogen-passivated Si(111) were studied by X-ray reflectivity (XRR), X-ray standing waves (XSW), X-ray fluorescence (XRF), atomic force microscopy, and X-ray photoelectron spectroscopy (XPS). The two different SAMs were grown by immersion of H-Si(111) substrates into the two different concentrated esters. UV irradiation during immersion was used to create Si dangling bond sites that act as initiators of the surface free-radical addition process that leads to film growth. The XRR structural analysis reveals that the molecules of SAM-1 and SAM-2 respectively have area densities corresponding to 50% and 57% of the density of Si(111) surface dangling bonds and produce films with less than 4 angstroms root-mean-square roughness that have layer thicknesses of 12.2 and 13.2 angstroms. Considering the molecular lengths, these thicknesses correspond to a 38 degrees and 23 degrees tilt angle for the respective molecules. For SAM-2/Si(111) samples, XRF analysis reveals a 0.58 monolayer (ML) Br total coverage. Single-crystal Bragg diffraction XSW analysis reveals (unexpectedly) that 0.48 ML of these Br atoms are at a Si(111) lattice position height that is identical to the T1 site that was previously found by XSW analysis for Br adsorbed onto Si(111) from a methanol solution and from ultrahigh vacuum. From the combined XPS, XRR, XRF, and XSW evidence, it is concluded that Br abstraction by reactive surface dangling bonds competes with olefin addition to the surface.     

Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): an ex situ tool for the modification of semiconductor surfaces

Dehydrative cyclocondensation processes for semiconductor surface modification can be generally suggested on the basis of well-known condensation schemes; however, in practice this approach for organic functionalization of semiconductors has never been investigated. Here we report the modification of hydrogen-terminated silicon surfaces by cyclocondensation. The cyclocondensation reactions of nitrobenzene with hydrogen-terminated Si(100) and Si(111) surfaces are investigated and paralleled with selected cycloaddition reactions of nitro- and nitrosobenzene with Si(100)-2x1. Infrared spectroscopy is used to confirm the reactions and verify an intact phenyl ring and C-N bond in the reaction products as well as the depletion of surface hydrogen. High resolution N 1s X-ray photoelectron spectroscopy (XPS) suggests that the major product for both cyclocondensation reactions investigated is a nitrosobenzene adduct that can only be formed following water elimination. Both IR and XPS are augmented by density functional theory (DFT) calculations that are also used to investigate the feasibility of several surface reaction pathways, which are insightful in understanding the relative distribution of products found experimentally. This novel surface modification approach will be generally applicable for semiconductor functionalization in a highly selective and easily controlled manner.     

Thin films derived from giant, tripod-shaped oligophenylenes end-capped with triallylsilyl groups on hydrogen-terminated Si(111) surfaces

Monolayers of giant, tripod-shaped molecules 1 with each tripod leg composed of seven phenylene units end-capped with a triallylsilyl group were prepared on hydrogen-terminated silicon surfaces (H-Si(111)) via thermally induced surface hydrosilylation. The films were characterized by ellipsometry, contact-angle goniometry, and X-ray photoelectron spectroscopy (XPS). The measured ellipsometric thickness of 24 Angstrom of the films suggests anchoring of 1 on the substrate surface with a tripod orientation of high coverage. By measuring the contact angle hysteresis of a series of probe liquids with systematically varied sizes, the molecular pores present on the films consisting of the intercalated molecules of 1 are similar to the cross sectional areas of glycerol and decalin of 0.32-0.49 nm(2). Finally, as evidenced by XPS, excellent yields ( approximately 90%) of Suzuki coupling reactions with arylboronic acid derivatives on the films was achieved, suggesting that the desired tripod orientation of such giant molecules as 1 helps to eliminate the steric hindrance for the reaction.     

Protein-resistant monolayers prepared by hydrosilylation of alpha-oligo(ethylene glycol)-omega-alkenes on hydrogen-terminated silicon (111) surfaces

Atomically flat, homogeneous, and protein-resistant monolayers can be readily prepared on H-Si(111) surfaces by photo-induced hydrosilylation of alpha-oligo(ethylene glycol)-omega-alkenes.     

Mild methods to assemble and pattern organic monolayers on hydrogen-terminated Si(111)

Mild methods to assemble well-ordered organic monolayers of olefins on Si(111) using 2,2,6,6-tetramethyl-1-piperidinyloxy and to pattern these monolayers on the micrometer-size scale using soft lithography are reported.     

High density copper nanowire arrays deposition inside ordered titania pores by electrodeposition

Large area and free-standing TiO₂ films was prepared by ultrasonic splitting and a chemical etching step was used to open the closed bottom end of TiO₂ films and yields a high aspect-ratio anodic titanium oxide membrane open at both ends. Ordered Cu nanowire structures were fabricated by a simple electroplating method inside high aspect-ratio anodic titanium oxide membrane. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and the X-ray diffraction (XRD) were employed to characterize the resulting samples. Detailed results and the possible mechanism are presented.     

Mild and efficient functionalization of hydrogen-terminated Si(111) via sonochemical activated hydrosilylation

Efficient chemical functionalization of hydrogen-terminated Si(111) with simple and bifunctional 1-alkenes was achieved via novel sonochemical activated hydrosilylation, utilizing just a simple ultrasonic bath. It is an extremely mild method that allows the specific attachment of unprotected bifunctional alkenes such as undecenol, undecylenic acid, and even a heat/UV-sensitive alkene, bearing an activated leaving group (N-succinimidyl undecylenate), without suffering any degradation.     

Branched fluoropolymer-Si hybrids via surface-initiated ATRP of pentafluorostyrene on hydrogen-terminated Si(100) surfaces

Linear, branched, and arborescent fluoropolymer-Si hybrids were prepared via surface-initiated atom transfer radical polymerization (ATRP) from the 4-vinylbenzyl chloride (VBC) inimer and ClSO(3)H-modified VBC that were immobilized on hydrogen-terminated Si(100), or Si-H, surfaces. The simple approach of UV-induced coupling of VBC with the Si-H surface provided a stable, Si-C bonded monolayer of "monofunctional" ATRP initiators (the Si-VBC surface). The aromatic rings of the Si-VBC surface were then sulfonated by ClSO(3)H to introduce sulfonyl chloride (-SO(2)Cl) groups and to give rise to a monolayer of "bifunctional" ATRP initiators. Kinetics study indicated that the chain growth of poly(pentafluorostyrene) from the functionalized silicon surfaces was consistent with a "controlled" or "living" process. The chemical composition and functionality of the silicon surface were tailored by the well-defined linear and branched fluoropolymer brushes. Atomic force microscopy images revealed that the surface-initiated ATRP of pentafluorostyrene (PFS) had proceeded uniformly on the Si-VBC surface to give rise to a dense and molecularly flat surface coverage of the linear brushes. The uniformity of surfaces with branched brushes was controlled by varying the feed ratio of the monomer and inimer (VBC in the present case). The living chain ends on the functionalized silicon surfaces were used as the macroinitiators for the synthesis of diblock copolymer brushes, consisting of the PFS and methyl methacrylate polymer blocks.     

Vibrational characterization and electronic properties of long range-ordered, ideally hydrogen-terminated Si(111)

The use of a well defined, long range ordered surface is of fundamental interest for the determination of surface-specific intrinsic physical parameters. Ideally hydrogen terminated Si(111) surfaces are prepared by wet chemical treatment in basic HF solutions. The mechanism of formation is based on preferential etching of defects, leading to an ideal hydrogen terminaison of the (111) plane, without any reconstruction and with a high degree of perfection. Infrared spectroscopy is used to probe the quality of the surfaces by quantifying the extent of the perfect domains.

High resolution photoemission spectroscopy of such highly homogeneous surfaces shows exceptional narrow features in both the valence band and the core level regions. The valence band levels and their dispersion are well described by first-principles calculations using a quasi particle self-energy approach within the Heidin's GW approximation.

Two surfaces core level states are evidenced, arising from the silicon surface atoms and the backbonds. A crystal field effect splits the surface Si 2_p3/2 component. Their position and relative intensity find a satisfactory agreement with recent calculations using first principles perturbation theory.     

Competing mechanisms in the optically activated functionalization of the hydrogen-terminated Si(111) surface

Recent experiments have shown that organic monolayers on silicon surfaces can be formed through the optically activated surface reaction of H-terminated Si surfaces with terminally unsaturated organic molecules (Eves et al. J. Am. Chem. Soc. 2004, 126, 14318; Sun et al. J. Am. Chem. Soc. 2005, 127, 2514). Possible mechanisms for the formation of this monolayer involve the abstraction of a H atom either at the same attachment site of the molecule (Path A) or from a neighboring site (Path B). Using periodic Density Functional Theory calculations together with an efficient method for finding reaction pathways, we examine both optically activated reaction mechanisms for an alkene and an aldehyde reacting with H-Si(111). Our results show that while Path A is energetically more favorable its significant barrier is likely to limit its viability. Path B on the other hand encounters a much lower H atom abstraction barrier and appears to be more viable.     

Molecular beam investigation of hydrogen dissociation on Si(001) and Si(111) surfaces

The influence of molecular vibrations on the reaction dynamics of H2 on Si(001) as well as isotopic effects have been investigated by means of optical second-harmonic generation and molecular beam techniques. Enhanced dissociation of vibrationally excited H2 on Si(001)2 x 1 has been found corresponding to a reduction of the mean adsorption barrier to 390 meV and 180 meV for nu=1 and nu=2, respectively. The adsorption dynamics of the isotopes H2 and D2 show only small differences in the accessible range of beam energies between 50 meV and 350 meV. They are traced back to different degrees of vibrational excitation and do not point to an important influence of quantum tunneling in crossing the adsorption barrier. The sticking probability of H2 on the 7 x 7-reconstructed Si(111) surface was found to be activated both by H2 kinetic energy and surface temperature in a qualitatively similar fashion as H2/Si(001)2 x 1. Quantitatively, the overall sticking probabilities of H2 on the Si(111) surface are about one order of magnitude lower than on Si(001), the influence of surface temperature is generally stronger.     

Low-temperature STM images of methyl-terminated Si(111) surfaces

Low-temperature scanning tunneling microscopy (STM) has been used to image CH(3)-terminated Si(111) surfaces that were prepared through a chlorination/alkylation procedure. The STM data revealed a well-ordered structure commensurate with the atop sites of an unreconstructed 1 x 1 overlayer on the silicon (111) surface. Images collected at 4.7 K revealed bright spots, separated by 0.18 +/- 0.01 nm, which are assigned to adjacent H atoms on the same methyl group. The C-H bonds in each methyl group were observed to be rotated by 7 +/- 3 degrees away from the center of an adjacent methyl group and toward an underlying Si atom. Hence, the predominant interaction that determines the surface structure arises from repulsions between hydrogen atoms on neighboring methyl groups, and secondary interactions unique to the surface are also evident.     

Chemical force titrations of functionalized Si(111) surfaces

Chemical force titrations-plots of the adhesive force between an atomic force microscope tip and sample as a function of pH-were acquired on alkyl monolayer-derivatized Si(111) surfaces. Gold-coated AFM tips modified with thioalkanoic acid self-assembled monolayers (SAM) were employed. Alkyl monolayer-derivatized Si(111) surfaces terminated with methyl, carboxyl, and amine groups were produced via hydrosilylation reactions between 1-alkene reagents and H-terminated silicon. The functionalized surfaces were characterized using standard surface science techniques (AFM, FTIR, and XPS). Titration of the methyl-terminated surface using the modified (carboxyl-terminated) atomic force microscope tip resulted in a small pH-independent hydrophobic interaction. Titration of the amine-terminated surface using the same tip resulted in the determination of a surface pKa of 5.8 for the amine from the pH value from the maximum in the force titration curve. A pK(1/2) of 4.3 was determined for the carboxyl-terminated Si(111) in a similar way. These results will be discussed in relation to the modified Si(111) surface chemistry and organic layer structure, as well as with respect to existing results on Au surfaces modified with SAMs bearing the same functional groups.     

Bonding structure of phenylacetylene on hydrogen-terminated Si(111) and Si(100): surface photoelectron spectroscopy analysis and ab initio calculations

Interfaces between phenylacetylene (PA) monolayers and two silicon surfaces, Si(111) and Si(100), are probed by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy, and the results are analyzed using ab initio molecular orbital calculations. The monolayer systems are prepared via the surface hydrosilylation reaction between PA and hydrogen-terminated silicon surfaces. The following spectral features are obtained for both of the PA-Si(111) and PA-Si(100) systems: a broad π-π* shakeup peak at 292 eV (XPS), a broad first ionization peak at 3.8 eV (UPS), and a low-energy C 1s → π* resonance peak at 284.3 eV (NEXAFS). These findings are ascribed to a styrene-like π-conjugated molecular structure at the PA-Si interface by comparing the experimental data with theoretical analysis results. A conclusion is drawn that the vinyl group can keep its π-conjugation character on the hydrogen-terminated Si(100) [H:Si(100)] surface composed of the dihydride (SiH(2)) groups as well as on hydrogen-terminated Si(111) having the monohydride (SiH) group. The formation mechanism of the PA-Si(100) interface is investigated within cluster ab initio calculations, and the possible structure of the H:Si(100) surface is discussed based on available data.     

离子液体中Au(111)和Pt(111)表面Ge欠电位沉积的现场STM研究

本文研究BMIPF₆离子液体中Au(111)和Pt(111)表面Ge的电沉积行为. 循环伏安法测试结果表明,在含0.1 mol·L^-1 GeCl₄的BMIPF₆溶液Au(111)和Pt(111)表面均有两个与Ge沉积过程相关的还原峰. 第一个还原峰包含了Ge⁴⁺还原成Ge²⁺及Ge的欠电位沉积,第二个还原峰对应Ge的本体沉积. 现场扫描隧道显微镜研究结果表明,Ge在Au(111)和Pt(111)表面均有两层欠电位沉积. 第一层欠电位沉积厚度约为0.25 nm、形貌平整、带有缝隙的亚单层结构. 第二层欠电位沉积形貌相对粗糙的点状团簇结构. 该欠电位沉积过程伴随表面合金化.