共查询到20条相似文献,搜索用时 46 毫秒
1.
Yangjuan LiKai Huang Hongkai Lai Cheng LiSongyan Chen Junyong Kang 《Applied Surface Science》2011,257(24):10671-10673
Large-area, high-density silicon-based nanotips were fabricated using electrochemical lithography. The morphology and optical properties of the samples were characterized by atomic force microscopy and photoluminescence. The distribution and size of the silicon-based nanotips were uniform. Two photoluminescence peaks were observed at 585 and 620 nm. The peak centered at 585 nm exhibited a narrow full-width at half maximum. No evident peak energy shift was observed when the measurement temperature was increased from 10 K to room temperature, which suggested that the photoluminescence should be attributed to the interface states and/or defects in the silicon-based nanotips. 相似文献
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Seiichi Sato Takatoshi Ikeda Kengo Hamada Keisaku Kimura 《Solid State Communications》2009,149(21-22):862-865
A germanium (Ge) nanoparticle surface was etched in an aqueous solution under monochromatic light irradiation in the infrared-to-ultraviolet region. Since the bandgap widened up to the photon energy of the irradiating light, the average size of the nanoparticles was controlled and the size distribution narrowed. The quantum size effect explained the correlation between the resulting bandgap energy and the final size. The etched nanoparticles showed blue-green or red-infrared photoluminescence (PL) after the surfaces were terminated with organic molecules or hydrogen atoms. The PL peak energy was independent of size, indicating PL was due to radiative recombination via localized states at the Ge core surface. 相似文献
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采用常压金属有机物化学气相沉积技术(APMOCVD),以二乙基锌(DEZn)为Zn源,去离子水(H2O)为氧源,N2作载气,在外延ZnO薄膜的反应气氛中通入少量氢气,在cAl2O3衬底上生长出了ZnO∶H薄膜。用X射线双晶衍射和光致发光谱对ZnO∶H薄膜的结晶性能和光学性质进行表征。结果表明,ZnO∶H薄膜(002)和(102)面的Ω扫描半峰全宽分别为46.1 mrad和81.4 mrad,表明该薄膜具有良好的结晶性能;室温下,ZnO∶H薄膜具有较强的紫外光发射(380 nm),在低温10 K光致发光谱中观测到位于3.3630 eV处与氢相关的中性施主束缚激子峰(I4)及其位于3.331 eV处的双电子卫星峰(TES)。采用退火的方法,通过观测I4峰的强度变化,研究了氢在ZnO∶H薄膜中的热稳定性。发现随着退火温度的升高,I4峰的强度逐渐减弱,表明在高温下退火,氢会从ZnO薄膜中逸出。 相似文献
4.
Ammonia adsorbs without dissociation on clean Ag(110) with a binding energy of 11 kcal/mol. Coadsorption of ammonia and atomic oxygen at 105 K produces adsorbed hydroxyl groups and NHx species. Coadsorption of ammonia and molecular oxygen leads to the stabilization of molecular oxygen, as is shown by the increase in the desorption peak temperature of dioxygen from 180 to 210 K. The reaction of ammonia with both forms of adsorbed oxygen produces the same products at the same temperatures. Water desorbs in a series of peaks at 310, 340, and 400 K resulting from hydroxyl recombination and hydrogen transfer from NHx species to adsorbed oxygen atoms. NO and N2 desorb together at 530 K. Oxygen recombination at 590 K only occurs following small ammonia doses such that excess oxygen persists on the surface. No hydrogen was seen to desorb under any reaction conditions. Vibrational spectroscopy shows that NH groups persist on the surface at temperatures well into the water desorption peak at 310 K and possibly to significantly higher temperatures, indicative of the difficulty of N-H bond cleavage by metallic silver. 相似文献
5.
N2O为氧源金属有机化学气相沉积生长ZnO薄膜的光学性能研究 总被引:2,自引:0,他引:2
采用常压金属有机化学气相沉积(AP-MOCVD)技术、三步生长法,分别以H2O和N2O为氧源,DEZn为Zn源,N2作载气,在c-Al2O3衬底上生长出了晶体质量较好的ZnO薄膜。用X射线双晶衍射(DCXRD)和光致发光谱对ZnO薄膜的结晶性能和光学性质进行表征。结果显示,ZnO倾斜对称面(10-12)的ω扫描半峰全宽为350″,表明ZnO薄膜结晶性能良好;低温10 K光致发光谱结果表明,N2O为氧源生长的ZnO膜和H2O为氧源生长的ZnO膜的发光特性明显不同,没有观察到与氢有关的中性施主束缚激子对应的3.331 eV双电子卫星峰(TES)。这一结果表明,用N2O为氧源生长的ZnO薄膜中不易引进氢杂质。 相似文献
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YiKai Zhou Mohamed Almokhtar Hitoshi Kubo Nobuya Mori Shuichi Emura Shigehiko Hasegawa Hajime Asahi 《Solid State Communications》2012,152(14):1270-1273
Symmetric GaGdN/AlGaN (Gd concentration: 2%) and GaN/AlGaN double quantum well superlattices (DQW-SLs) were grown by radio-frequency plasma-assisted molecular-beam epitaxy on GaN (0001) templates. Atomic steps were observed on all the sample surfaces by atomic force microscope. X-ray diffraction θ/2θ scan curves exhibited well-defined satellite structures. Room temperature ferromagnetism was confirmed for the GaGdN/AlGaN DQW-SL samples by using alternating gradient magnetometer. Strong photoluminescence was observed from both GaGdN and GaN QWs at higher energy side of GaN excitonic peak. Magneto-photoluminescence spectra for GaGdN/AlGaN DQW-SL samples showed a large magnetic field dependence of the excitonic energy by applying a magnetic field up to 7 T. The observed strong redshift of excitonic PL indicated an enhancement of Zeeman splitting of the free carrier energy levels in magnetic GaGdN/AlGaN DQW-SL. Enhanced g-factor was estimated to be about 60 for GaGdN/AlGaN DQW-SL sample with QW thickness of 1 nm. 相似文献
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Do Young Kim Ji Sim Jung Young Rae Jang Kun Ho Yoo Jin Jang 《Physica E: Low-dimensional Systems and Nanostructures》2003,16(3-4):400
We studied the growth of nanocrystalline silicon (nc-Si) thin film exhibiting a strong room temperature photoluminescence (PL) at 1.81–2.003 eV. The amorphous silicon was crystallized by Ni silicide mediated crystallization (Ni SMC) and then Secco-etched to exhibit the PL. The PL peak energy and intensity increase with increasing the metal density on the a-Si because of the reduction in the grain size down to 2 nm. The photoluminescence energy and peak intensity depend strongly on the Secco etch time because the grain size is reduced by etching the grain boundaries. 相似文献
11.
用PLD法成功制备了一系列高质量的MgZnO薄膜。实验中发现高脉冲能量沉积薄膜的结构和发光特性随基片温度的变化规律与低脉冲能量下的结果不一样:基片在室温时高脉冲能量制备薄膜的XRD峰的半峰全宽比高基片温度时的结果相对更小;AFM显示其颗粒变大,柱状生长突出;PL谱紫峰与绿峰强度比最大,结晶质量反而提高。另一方面,与低脉冲能量时相反,增大氧气压强后高脉冲能量沉积的薄膜XRD半峰全宽变窄。结合实验现象和表征,合理解释了高脉冲能量沉积的机理。室温制备高质量MgZnO薄膜的PLD沉积机理对于以后在柔性衬底上沉积薄膜的研究有重要的参考价值。 相似文献
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We report the first observation of trions (charged excitons), three-particle bound states consisting of one electron and two holes, in hole-doped carbon nanotubes at room temperature. When p-type dopants are added to carbon nanotube solutions, the photoluminescence and absorption peaks of the trions appear far below the E11 bright exciton peak, regardless of the dopant species. The unexpectedly large energy separation between the bright excitons and the trions is attributed to the strong electron-hole exchange interaction in carbon nanotubes. 相似文献
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采用Nd:YAG纳秒脉冲激光对单晶硅在空气中进行辐照,研究了表面微结构在不同能量密度和扫描速度下的演化情况。扫描电子显微镜测量表明,激光在相对较低能量密度下辐照硅表面诱导出鱼鳞状波纹结构,激光能量密度相对较大时,诱导出絮状多孔的不规则微结构。光致荧光谱(PL)表明,激光扫描区域在710 nm附近有荧光发射。用氢氟酸腐蚀掉样品表面的SiOx后,荧光峰的强度显著降低,说明SiOx在光致发光增强上起重要作用。能量色散X射线谱(EDS)表明氧元素的含量随激光能量密度的增大而增加。研究表明:纳秒激光的能量密度和扫描速度对微结构形成起着决定性作用,改变了硅材料表面微结构尺寸,增大了光吸收面积; 氧元素在光致发光增强上起重要作用,微构造硅和SiOx对光致荧光的发射都有贡献。 相似文献
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Ultraviolet photoemission measurements of the (001) surface of WO3 show that after exposure to atomic hydrogen new states appear in the energy gap region at 2.3 and 0.9 eV below the Fermi energy. A peak at 2.2 eV was also produced by hydrogen ion bombardment. To investigate whether these surface effects were due to the formation of hydrogen tungsten bronze HxWO3, comparison was made with spectra from the electronically similar sodium bronze. The form of the spectra were different both in the valence band and energy gap regions indicating that hydrogen adsorption or loss of oxygen from the surface rather than formation of HxWO3 is the major effect. 相似文献
15.
Tsutomu Shimizu-Iwayama David E. Hole Peter D. Townsend 《Journal of luminescence》1998,80(1-4):235-239
A method for the fabrication of luminescent Si nanoclusters in an amorphous SiO2 matrix by ion implantation and annealing, and the detailed mechanisms for the photoluminescence are reported. We have measured the implanted ion dose, annealing time and excitation energy dependence of the photoluminescence from implanted layers. The samples were fabricated by Si ion implantation into SiO2 and subsequent high-temperature annealing. After annealing, a photoluminescence band below 1.7 eV has been observed. The peak energy of the photoluminescence is found to be independent of annealing time and excitation energy, while the intensity of the luminescence increases as the annealing time and excitation energy increase. Moreover, we found that the peak energy of the luminescence is strongly affected by the dose of implanted Si ions especially in the high dose range. These results indicate that the photons are absorbed by Si nanoclusters, for which the band-gap energy is modified by the quantum confinement effects, and the emission is not simply due to direct electron–hole recombination inside Si nanoclusters, but is related to defects probably at the interface between Si nanoclusters and SiO2, for which the energy state is affected by Si cluster–cluster interactions. It seems that Si nanoclusters react via a thin oxide interface and the local concentrations of Si nanoclusters play an important role in the peak energy of the photoluminescence. 相似文献
16.
氢在GaAs和InP表面上的吸附可以用高分辨率电子能量损失谱(HREELS)来探测。Ga—H,As—H,In—H和P—H键的伸缩振动各自对应于不同的能量损失。但是As—H振动极容易和Ga—H振动追加声子损失相混淆,只有从损失峰的相对强度比较上来区别。实验得到吸附的氢与表面原子的成键情况取决于表面的原子结构及电子分布。对于GaAs(111)面,低暴露量时只形成Ga—H键,而高暴露量时还可以形成As—H键。而InP(111)表面由于是经过磷气氛退火处理的,在低暴露量下In—H与P—H键均可形成。InP(Ⅲ)面上只看到P—H损失峰,说明这个表面是完全以P原子结尾的。在(Ⅲ)面上出现小面的情形,则表面Ⅲ族和Ⅴ族原子均可同氢成键。
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17.
Structural and optical investigation of nonpolar α-plane GaN grown by metalben organic chemical vapour deposition on r-plane sapphire by neutron irradiation
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Nonpolar (1120) α-plane GaN films are grown by metal-organic chemical vapour deposition (MOCVD) on r-plane (1102) sapphire. The samples are irradiated with neutrons under a dose of 1 × 1015 cm-2. The surface morphology, the crystal defects and the optical properties of the samples before and after irradiation are analysed using atomic force microscopy (AFM), high resolution X-ray diffraction (HRXRD) and photoluminescence (PL). The AFM result shows deteriorated sample surface after the irradiation. Careful fitting of the XRD rocking curve is carried out to obtain the Lorentzian weight fraction. Broadening due to Lorentzian type is more obvious in the as-grown sample compared with that of the irradiated sample, indicating that more point defects appear in the irradiated sample. The variations of line width and intensity of the PL band edge emission peak are consistent with the XRD results. The activation energy decreases from 82.5 meV to 29.9 meV after irradiation by neutron. 相似文献
18.
In this work, ZnO thin films covered by TiO2 nanoparticles (labeled as TiO2-ZnO thin films) were prepared by electron beam evaporation. The influence of annealing temperature on the photoluminescence property of the samples was studied. The structures and surface morphologies of the samples were analyzed by X-ray diffraction (XRD) and atomic force microscope, respectively. The photoluminescence was used to investigate the fluorescent properties of the samples. The measurement results show that the ultraviolet emission of ZnO thin films is largely enhanced after they are covered by TiO2 nanoparticles, while the green emission is suppressed. However, when the annealing temperature is relatively high (≥500 °C), the intensity of ultraviolet emission drops off and a violet emission peak along with a blue emission peak appears. This is probably connected with the atomic interdiffusion between TiO2 nanoparticles and ZnO thin film. Therefore, selecting a suitable annealing temperature is a key factor for obtaining the most efficient ultraviolet emission from TiO2-ZnO thin films. 相似文献
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氢在GaAs, 和InP 表面上的吸附可以用高分辨率电子能量损失谱(HREELS) 来探测.Ga-H侧, As-H , In-H 和P-H 键的伸缩振动各自对应于不同的能量损失. 但是A-H 振动极容易和Ga-H 振动追加声子损失相混淆, 只有从损失峰的相对强度比较上来区别。实验得到吸附的氢与表面原子的成键情况取决于表面的原子结构及电子分布. 对于GaAs (1 1 1)面, 低暴露量时只形成Ga-H 键, 而高暴露量时还可以形成As-H 键.而InP(1 1 1 ) 表面由于是经过磷气氛退火处理的, 在低暴露量下In 一H 与P一H 键均可形成. InP (III) 面上只看到P-H 损失峰, 说明这个表面是完全以P 原子结尾的. 在(1 1 1 ) 面上出现小面的情形, 则表面III族和V族原子均可同氢成键.
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