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1.
采用放射源241Am59.6keVγ射线分别激发金属Cr、Cr2O3和K2CrO4,用Si(Li)谱仪比较测量其Kx射线的能量。实验表明K2CrO4中CrKβ能峰相对于金属Cr有2.12±0.27eV的位移。 相似文献
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从名义组份Bi2.4Sr2PrCu2Oy生长出一种新的Bi2222相单晶,其实际组份测定为Bi2Sr1.5Pr2.5Cu2Oy.用X射线衍射对单晶的结构进行了表征,并且研究了该单晶生长中Bi2201和Bi2212相的交生等相关问题.另外,如果从名义组份为Bi2.4Sr1.5Pr2.5Cu2Oy出发,得到的却是Pr2CuO4单晶. 相似文献
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Ni/Al2O3催化剂上CH4/CO2重整反应积碳的研究 总被引:1,自引:0,他引:1
采用X光电子能谱(XPS)和脉冲反应技术考察了973K下经不同方法处理后的Ni/Al2O3催化剂表面的积碳,单独用CH4或CO处理后的催化剂在283.6eV左右出现了一个新的Cls峰,可归属为金属碳化物,对CH4,CO处理过的催化剂用CO2处理后发现,结合能约为283.6eV的Cls峰强度明显降低,但由CO处理的催化剂的积碳的活性不如由甲烷生成的积碳活性好,CO歧化反应可能是导致镍催化剂失活的主要 相似文献
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MOCVD法在金属基体上制备YBCO超导带 总被引:2,自引:0,他引:2
本报道了用MOCVD静态和动态沉积两种工艺制备YBCO超导带的实验结果。以Y(TMHD)3、Ba(TMHD)2和Cu(TMHD)2为挥发源,O2气为反应剂,高纯Ar气为载流气体,在静止和以10-15cm/h带速移动的金属银基体上,制出了有强烈c-轴取向的YBCO超导带。静态沉积样品的Jc达到1.04×10^4A/cm^2,动态沉积样品的Jc达到1.4×10^4A/cm^2(78K,0T)。对改… 相似文献
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本文报道了6种取代苯胺基亚胺二茂铁类化合物R-N=CH-Fe(-Fe为二茂铁基,R为-C6H4X,(X=H,4-Br,4-OH,2-CH3,4-COOH)及4-NHC6H4NO2)的Mossbauer谱数据,其化学位移分别为(mm.s^-1):0.323,0.332,0.338,0.324,0.315和0.310。其四极矩分裂值分别为(mm.s^-1):2.263,2.285,2.287,2.21 相似文献
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在活塞圆筒式P~V关系测量装置上,研究了KH_2PO_4(KDP)和(CH_3NHCH_2CO-OH)_3CaCI_2[Tris-sarcosinecalciumchloride(TSCC)]在室温下、4.5GPa内的p~V关系。实验结果表明:KDP在2.1GPa左右有一个相变;TSCC在0.8GPa和3.2GPa左右各有一个相变。本工作还给出了它们在相变前后的状态方程,以及它们的格临爱森参数γO、体积模量B_o和B_o的压力导数B_o。 相似文献
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本文用280nm脉冲激光光解被Ar和Xe基体隔离的Fe(CO)5以产生配位不饱和的Fe(CO)3。用傅里衰变换红外光谱仪实时监察光解停止后Fe(CO)3和CD的复合,并以Smoluchowski扩散控制反应动力学理论模型求得Fe(CO)3与CO的反应半径为4.0×10^-10m,CO在10K的Ar和Xe基体中的扩散系数分别为2.2×10^-23m^2/s和4.5×±∩^-23m^2/s。 相似文献
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We investigated the physical properties of Cr ions in half-metallic CrO(2) using 53Cr nuclear magnetic resonance (NMR). The 53Cr NMR spectra showed two peaks with a similar intensity instead of the single peak anticipated from a uniform single valence Cr(+4). Both Cr peaks exhibited a strong anisotropy in the hyperfine field and similar values in the enhancement factor and T2 relaxation time. These results suggest the coexistence of two different Cr ions (provisionally, Cr(+4 +/- 1/3)) by a self-doping effect, which is a likely origin of the metallic ferromagnetism in CrO(2). 相似文献
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Based on first principles calculations we find that CrO2(001) will form a relaxed structure at its surface, at which each surface Cr atom is surrounded by four oxygen atoms in a distorted tetrahedral configuration. This tetrahedral environment has important effects on the electronic structure, leading to an inversion of the t2g-eg splitting of Cr 3d orbitals. Two 3d electrons of the surface Cr ion will fully occupy the doublet eg, which becomes lower in energy than the t2g, leaving the t2g orbitals empty. The consequence is that the Fermi level lies in a gap between the eg and t2g for a local electronic structure at the surface. This finding is consistent with and explains the extremely low photoemission intensity near EF at CrO2(001) [K?mper et al., Phys. Rev. Lett. 59, 2788 (1987)]. 相似文献
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Goering E Bayer A Gold S Schütz G Rabe M Rüdiger U Güntherodt G 《Physical review letters》2002,88(20):207203
Soft x-ray magnetic circular dichroism (XMCD) spectra have been investigated for different crystallographic projections of CrO2. Strong anisotropic orbital Cr 3d contributions and a change of sign of the XMCD signal is observed and attributed to t(2g) majority states near the Fermi level. Additionally, moment analysis exhibits anisotropic behavior in the projected spin contributions of CrO2 assigned to a strong magnetic dipole term T(z), consistent with an intrinsic magnetic easy axis behavior along the CrO2 [001] axis. A reduced projected isotropic Cr 3d spin moment has been interpreted in terms of hybridization with oxygen. 相似文献
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氧化石墨烯负载纳米零价铁(rGO-nZⅥ)去除地下水中Cr(Ⅵ)的XPS谱学表征 总被引:1,自引:0,他引:1
纳米铁广泛用于水中重金属离子的去除,但由于其易团聚的特性,在地下水中迁移性差,使其修复效果降低。氧化石墨烯具有吸附重金属的作用,但由于其表面带有负电荷,对带负电的高价铬(Cr_2O_7~(2-),CrO_4~(2-))吸附作用较弱。以氧化石墨烯(GO)为载体,采用液相还原法制备的氧化石墨烯负载纳米铁(rGO-nZⅥ),在改善纳米铁的分散性的同时,利用nZⅥ将带负电的高价铬(Cr_2O_7~(2-),CrO_4~(2-))还原为带正电的三价铬(Cr~(3+)),增强了氧化石墨烯对其吸附的性能。利用XRD和TEM对制备的rGO-nZⅥ进行表征,表明制备的rGO-nZⅥ近似球形,粒径为20~100nm;零价铁负载在GO表面。应用rGO-nZⅥ处理Cr(Ⅵ)污染的地下水,Cr(Ⅵ)的去除效率可达到100%,材料的最佳投加量与Cr(Ⅵ)浓度呈线性正相关。采用X光电子能谱(XPS)分析铬和铁的存在形态,并通过XPAPEAK41分峰后证实,Cr(Ⅵ)首先被还原为Cr(Ⅲ),进而生成Cr(OH)3吸附到材料表面。由XPS图看出,经24h反应,69.8%的Cr(Ⅵ)转化为Cr(Ⅲ)吸附到材料表面,此时仍具有Fe0的峰,证实材料具有很强的还原吸附铬的能力,且仍具有缓慢释放电子的能力,有利于后续长时间的修复。该结果对于利用rGO-nZⅥ处理地下水Cr(Ⅵ)污染具有重要的理论意义和实用价值。 相似文献
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FTIR和XPS对含低价Cr混合物物相分析的应用研究 总被引:2,自引:2,他引:0
因Cr的可变价态较多,且在制备低价Cr氧化物过程中,经常出现不同价态的中间体过渡产物,这些过渡产物的性质各异,往往对最终产物的形貌特征产生显著影响。以KCrO2为原料制备低价Cr化合物的过程中出现了组成比较复杂的中间产物,为探讨反应机理并优化工艺流程,文章结合光电子能谱(XPS),傅里叶变换红外光谱(FTIR),X射线衍射(XRD),电感耦合等离子发射光谱(ICP-AES)元素分析和化学滴定分析对KCrO2的还原中间产物进行了物相分析。XPS能谱分析表明, 还原中间产物中Cr元素是以三价形态存在的;对不同还原温度所得的中间产物的FTIR与其他方法所得的水合氧化Cr的FTIR进行比较, 并结合XRD测试,元素分析,化学分析结果可以得出下面结论:中间产物主要组成为Cr(OH)3·nH2O,CrOOH。还有少量的KOH或KCrO2。在对中间物相分析的基础上, 对还原过程可能发生的反应进行了推测。 相似文献
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Wilcox B.P. Chrysostom E.T.H. McIlroy A. Daily J.W. Kennedy I.M. 《Applied physics. B, Lasers and optics》2003,77(5):535-540
CrO is an important intermediate in the high temperature oxidation chemistry of chromium containing species. This work reports the first detection of CrO in a flame. The B5-X5 electronic transition was probed by cavity ringdown spectroscopy (CRDS) in a lean (=0.38), low-pressure, flat, laminar hydrogen-oxygen-argon flame seeded with Cr(CO)6. The previous B5-X5 CrO spectrum of Hocking et al. (605.0 nm-606.5 nm) is extended from the band head located at 605.6 nm to 614.4 nm. The temperature profiles of the doped and undoped flames were obtained from measurements of OH laser- induced fluorescence. Seeding the flame with Cr(CO)6 increased the flame temperature by approximately 150 K. The concentration profile of CrO was measured as a function of height above the burner. CrO absorption signals were converted to concentration using the measured temperature profile and absorption cross-section calculated from lifetimes by Hedgecock et al. A lower limit peak CrO concentration of 1.6 ppb was found in the flame. Some uncertainty in the cross-section remains. Comparisons to calculations using STANJAN indicate that CrO is present in flames at super equilibrium concentrations. PACS 82.33.Vx; 42.62.Fi 相似文献
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Hirofumi Shimizu Shintarou Nagase Masanori Ikeda 《Applied Physics A: Materials Science & Processing》2011,104(3):929-934
We investigated a variation of frequency-dependent alternating current (AC) surface photovoltages (SPVs) in thermally oxidized,
chromium-contaminated, n-type silicon (Si) wafers. As previously reported, immediately after rinsing in Cr-contaminated solution,
a Cr(OH)3–Si contact causes a Schottky-barrier-type AC SPV on n-type Si. Upon oxidation at 373 K for 10 min, the Schottky barrier collapses
and, with further oxidation, a metal-induced negative oxide charge, due to atomic bridging of (CrOSi)− and/or CrO2-\mathrm{CrO}_{2}^{-} networks, definitely grows over time in SiO2. For samples oxidized at temperatures between 823 and 1023 K for 30 min, the observed AC SPV gives evidence that the metal-induced
negative oxide charge causes a strongly inverted state of the Si surface. At oxidation temperatures higher than 1023 K and
/or for an oxidation time longer than 60 min, the level height of the AC SPV is reduced, implying that the strongly inverted
state changes into a less depleted state, whilst, finally, the AC SPV disappears. In this case, the collapse of the (CrOSi)− and/or CrO2-\mathrm{CrO}_{2}^{-} networks is anticipated, with a possible change into Cr2O3. The existence of the (CrOSi)− and/or CrO2-\mathrm{CrO}_{2}^{-} networks has also been confirmed in p-type Si wafers. 相似文献
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Chemical shift and full widths at half maximum (FWHM) intensity of chromium Kα and Kβ1, 3 lines were examined for 12 kinds of materials containing chromium (CH3CO2)7Cr3(OH)2, CrK(SO4)2.12H2O, Cr(NO3)3.9H2O, Cr2O3, CrF2, CrF3.4H2O, CrCl2, CrCl3, CrCl3.6H2O, [CrCl2(H2O)4]Cl.2H2O, Cr2(SO4)3.15H2O, CrO and Cr metal by wavelength‐dispersive X‐ray fluorescence (WDXRF) spectrometry. The chemical shifts, asymmetry index and the half‐widths of both the X‐ray emission lines show interesting trends with the oxidation state of chromium. It was observed that the chemical shifts for F compounds are higher than Cl compounds. It was also found larger chemical shifts and FWHM for Kβ1, 3 lines than Kα ones. It should be noted that the magnitude of chemical shifts increases with increase in the number of ligand atoms. Copyright © 2009 John Wiley & Sons, Ltd. 相似文献