Communication: Revised electron affinity of SF6 from kinetic data

Previously determined experimental data for thermal attachment of electrons to SF(6) and thermal detachment from SF(6)(-) over the range 590-670 K are reevaluated by a third-law analysis. Recent high precision calculations of SF(6)(-) harmonic frequences and anharmonicities (for several of the modes) lead to considerable changes in modeled vibrational partition functions which then have to be accommodated for by a smaller value of the derived adiabatic electron affinity EA of SF(6). The previously estimated value of EA = 1.20 (±0.05) eV in this way is reduced to a value of EA = 1.03 (±0.05) eV. In addition, the bond dissociation energy E(0,dis) for SF(6)(-) → SF(5)(-) + F is reduced to E(0,dis) = 1.44 (±0.05) eV. Finally, the consequences for modeled specific rate constants k(det)(E,J) of electron detachment from SF(6)(-) are discussed.     

Low-energy electron attachment to SF6. II. Temperature and pressure dependences of dissociative attachment

Low-energy electron-molecule collisions, leading to dissociative attachment through metastable anionic states, are kinetically modeled within the framework of statistical unimolecular rate theory. The reaction e(-)+SF(6)-->SF(5)(-)+F is used as an illustrative example. The modeling is applied to new measurements of branching fractions for SF(5)(-) formation in the bath gas He between 360 and 670 K at 1 and 2 Torr, and between 490 and 620 K over the range of 0.3-9 Torr. The analysis of the data follows the previous kinetic modeling of the nondissociative electron attachment, e(-)+SF(6)-->SF(6)(-), from Part I of this series. Experimental results from the present work and the literature on branching fractions and total cross sections for anion formation as functions of electron energies, bath gas temperatures and pressures, as well as observation times are analyzed. The assumption of a participation of the electronic ground state of SF(6)(-) alone suffices to model the available experimental data. A value of the dissociation energy of SF(6)(-) into SF(5)(-)+F of E(0,dis)=1.61(+/-0.05) eV is determined, which may be compared to the electron affinity of SF(6), EA=1.20(+/-0.05) eV, such as derived in Part III of this series.     

Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN- and C6F5(-)

The additions of two sulfur fluoride derivatives (SF(3)C(6)F(5) and SF(3)CN) to a flowing afterglow were studied by variable electron and neutral density mass spectrometry. Data collection and analysis were complicated by the high reactivity of the neutral species. Both species readily dissociatively attach thermal electrons at 300 K to yield SF(3) + X(-) (X = C(6)F(5), CN). Attachment to SF(3)C(6)F(5) also results in SF(3)(-) + C(6)F(5) as a minor product channel. The determined electron attachment rate constants were 1(-0.6) (+1) × 10(-7) cm(3) s(-1) for SF(3)C(6)F(5), a lower limit of 1 × 10(-8) cm(3) s(-1) for SF(3)CN, and 4 ± 3 × 10(-9) cm(3) s(-1) for SF(3). Mutual neutralization rate constants of C(6)F(5)(-) and CN(-) with Ar(+) at 300 K were determined to be 5.5(-1.6) (+1.0) × 10(-8) and 3.0 ± 1 × 10(-8) cm(3) s(-1), respectively.     

Kinetics following addition of sulfur fluorides to a weakly ionized plasma from 300 to 500 K: rate constants and product determinations for ion-ion mutual neutralization and thermal electron attachment to SF5, SF3, and SF2

Rate constants for several processes including electron attachment to SF(2), SF(3), and SF(5) and individual product channels of ion-ion mutual neutralization between SF(6)(-), SF(5)(-), and SF(4)(-) with Ar(+) were determined by variable electron and neutral density attachment mass spectrometry. The experiments were conducted with a series of related neutral precursors (SF(6), SF(4), SF(5)Cl, SF(5)C(6)H(5), and SF(3)C(6)F(5)) over a temperature range of 300-500 K. Mutual neutralization rate constants for SF(6)(-), SF(5)(-), and SF(4)(-) with Ar(+) are reported with uncertainties of 10-25% and show temperature dependencies in agreement with the theoretical value of T(-0.5). Product branching in the mutual neutralizations is temperature independent and dependent on the electron binding energy of the anion. A larger fraction of product neutrals from the SF(6)(-) mutual neutralization (0.9 ± 0.1) are dissociated than in the SF(5)(-) mutual neutralization (0.65 ± 0.2), with the SF(4)(-) (0.7 ± 0.3) likely lying in between. Electron attachment to SF(5) (k = 2.0 × 10(-8) ±(1)(2) cm(3) s(-1) at 300 K) and SF(3) (4 ± 3 × 10(-9) cm(3) s(-1) at 300 K) show little temperature dependence. Rate constants of electron attachment to closed-shell SF(n) species decrease as the complexity of the neutral decreases.     

Fragmentation of metastable SF(6)(-*) ions with microsecond lifetimes in competition with autodetachment

Fragmentation of metastable SF(6)(-*) ions formed in low energy electron attachment to SF(6) has been investigated. The dissociation reaction SF(6)(-*)-->SF(5) (-)+F has been observed approximately 1.5-3.4 micros and approximately 17-32 micros after electron attachment in a time-of-flight and a double focusing two sector field mass spectrometer, respectively. Metastable dissociation is observed with maximum intensity at approximately 0.3 eV between the SF(6)(-*) peak at zero and the SF(5)(-) peak at approximately 0.4 eV. The kinetic energy released in dissociation is low, with a most probable value of 18 meV. The lifetime of SF(6)(-*) decreases as the electron energy increases, but it is not possible to fit this decrease with statistical Rice-Ramsperger-Kassel/quasiequilibrium theory. Metastable dissociation of SF(6)(-*) appears to compete with autodetachment of the electron at all electron energies.     

Rydberg electron transfer to SF6: product ion lifetimes

The lifetimes of SF6- ions produced by Rydberg electron transfer in K(np)SF6 collisions at high n, n greater or similar to 30, are examined using a Penning ion trap. The data point to the formation of ions with a range of lifetimes that extends from approximately 1 to greater or similar to 10 ms. Sizable numbers of ions remain in the trap even 40 ms after initial injection and at least part of this signal can be attributed to radiative stabilization. Measurements of free low-energy electron attachment to SF6 in the trap show that the product ions have lifetimes similar to those of SF6- ions formed by electron transfer in high-n collisions.     

Electron attachment and detachment, and the electron affinities of C5F5N and C5HF4N

Rate constants have been measured for electron attachment to C5F5N (297-433 K) and to 2, 3, 5, 6-C5HF4N (303 K) using a flowing-afterglow Langmuir-probe apparatus (at a He gas pressure of 133 Pa). In both cases only the parent anion was formed in the attachment process. The attachment rate constants measured at room temperature are 1.8 +/- 0.5 X 10(-7) and 7 +/- 3 X 10(-10) cm(-3) s(-1), respectively. Rate constants were also measured for thermal electron detachment from the parent anions of these molecules. For C5F5N- detachment is negligible at room temperature, but increases to 2530 +/- 890 s(-1) at 433 K. For 2, 3, 5, 6-C5HF4N-, the detachment rate at 303 K was 520 +/- 180 s(-1). The attachment/detachment equilibrium yielded experimental electron affinities EA(C5F5N)=0.70 +/- 0.05 eV and EA(2, 3, 5, 6-C5HF4N)=0.40 +/- 0.08 eV. Electronic structure calculations were carried out for these molecules and related C5HxF5-xN using density-functional theory and the G3(MP2)//B3LYP compound method. The EAs are found to decrease by 0.25 eV, on average, with each F substitution by H. The calculated EAs are in good agreement with the present experimental results.     

Electron attachment to SF5X compounds: SF5C6H5, SF5C2H3, S2F10, and SF5Br, 300-550 K

Rate constants and ion product channels have been measured for electron attachment to four SF5 compounds, SF5C6H5, SF5C2H3, S2F10, and SF5Br, and these data are compared to earlier results for SF6, SF5Cl, and SF5CF3. The present rate constants range over a factor of 600 in magnitude. Rate constants measured in this work at 300 K are 9.9+/-3.0x10(-8) (SF5C6H5), 7.3+/-1.8x10(-9) (SF5C2H3), 6.5+/-2.5x10(-10) (S2F10), and 3.8+/-2.0x10(-10) (SF5Br), all in cm3 s-1 units. SF5- was the sole ionic product observed for 300-550 K, though in the case of S2F10 it cannot be ascertained whether the minor SF4- and SF6- products observed in the mass spectra are due to attachment to S2F10 or to impurities. G3(MP2) electronic structure calculations (G2 for SF5Br) have been carried out for the neutrals and anions of these species, primarily to determine electron affinities and the energetics of possible attachment reaction channels. Electron affinities were calculated to be 0.88 (SF5C6H5), 0.70 (SF5C2H3), 2.95 (S2F10), and 2.73 eV (SF5Br). An anticorrelation is found for the Arrhenius A-factor with exothermicity for SF5- production for the seven molecules listed above. The Arrhenius activation energy was found to be anticorrelated with the bond strength of the parent ion.     

Electron attachment and detachment and the electron affinity of cyclo-C4F8

New measurements have been made of rate constants for electron attachment to c-C(4)F(8) (octafluorocyclobutane) and thermal electron detachment from the parent anion, c-C(4)F(8) (-), over the temperature range 298-400 K in 133 Pa of He gas in a flowing-afterglow Langmuir-probe apparatus. From these data the electron affinity for c-C(4)F(8) was determined, EA(c-C(4)F(8))=0.63+/-0.05 eV. The motivation was to resolve a discrepancy between our earlier EA estimate and a higher value (EA=1.05+/-0.10 eV) reported from a recent experiment of Hiraoka et al. [J. Chem. Phys. 116, 7574 (2002)]. The electron attachment rate constant is 9.3+/-3.0x10(-9) cm(3) s(-1) at 298 K. The electron detachment rate constant is negligible at room temperature but climbs to 1945+/-680 s(-1) at 400 K. G3(MP2) calculations were carried out for the neutral (D(2d), (1)A(1)) and anion (D(4h), (2)A(2u)) and yielded EA(c-C(4)F(8) (-))=0.595 eV. Bond energies were also calculated for loss of F from c-C(4)F(8) and loss of F or F(-) from c-C(4)F(8) (-). From these, dissociative electron attachment is found to be endothermic by at least 1.55 eV.     

Vacuum-UV negative photoion spectroscopy of SF5CF3

Ion pair formation, generically described as AB-->A(+)+B(-), from vacuum-UV photoexcitation of trifluoromethyl sulfur pentafluoride, SF(5)CF(3), has been studied by anion mass spectrometry using synchrotron radiation in the photon energy range of 10-35 eV. The anions F(-), F(2)(-), and SF(x)(-) (x=1-5) are observed. With the exception of SF(5)(-), the anions observed show a linear dependence of signal with pressure, showing that they arise from ion pair formation. SF(5)(-) arises from dissociative electron attachment, following photoionization of SF(5)CF(3) as the source of low-energy electrons. Cross sections for anion production are put on to an absolute scale by calibration of the signal strengths with those of F(-) from both SF(6) and CF(4). Quantum yields for anion production from SF(5)CF(3), spanning the range of 10(-7)-10(-4), are obtained using vacuum-UV absorption cross sections. Unlike SF(6) and CF(4), the quantum yield for F(-) production from SF(5)CF(3) increases above the onset of photoionization.     

Experimental and theoretical investigation of electron attachment to SF(5)Cl

Thermal electron attachment to SF(5)Cl has been studied with the flowing afterglow Langmuir probe technique. The rate coefficient is moderate, 4.8(+/-1.2)x10(-8) cm(3) s(-1), and invariant with temperature over the temperature range of 300-550 K. The reaction is dissociative, forming mainly SF(5) (-)+Cl. Minor yields of Cl(-) and FCl(-) were also found. The yields of the minor channels increase slightly with temperature. Statistical unimolecular rate modeling is employed to elucidate the character of the dissociation pathways and to support the assumption that the dissociations involve the formation of metastable anionic SF(5)Cl(-).     

The dependence of low-energy electron attachment to CF3Br on electron and vibrational energy

In a joint experimental and theoretical effort, we have studied dissociative electron attachment (DEA) to the CF3Br molecule at electron energies below 2 eV. Using two variants of the laser photoelectron attachment method with a thermal gas target (T(G) = 300 K), we measured the energy dependent yield for Br- formation over the range E = 3-1200 meV with resolutions of about 3 meV (E < 200 meV) and 35 meV. At the onsets for excitation of one and two quanta for the C-Br stretching mode nu3, downward cusps are detected. With reference to the recommended thermal (300 K) attachment rate coefficient k(A)(CF3Br) = 1.4 x 10(-8) cm3 s(-1), absolute cross sections have been determined for Br- formation. In addition, we studied Br- and (CF3Br)Br- formations with a seeded supersonic target beam (10% CF3Br in helium carrier gas, with a stagnation pressure of 1-4 bars and nozzle temperatures of 300 and 600 K) and found prominent structure in the anion yields due to cluster formation. Using the microwave pulse radiolysis swarm technique, allowing for controlled variation of the electron temperature by microwave heating, we studied the dependence of the absolute DEA rate coefficient on the mean electron energy E over the range of 0.04-2 eV at gas temperatures T(G) ranging from 173 to 600 K. For comparison with the experimental results, semiempirical resonance R-matrix calculations have been carried out. The input for the theory includes the known energetic and structural parameters of the neutral molecule and its anion; the parameters of the resonant anion curves are chosen with reference to the known thermal rate coefficient for the DEA process. For the gas temperature T(G) = 300 K, good overall agreement of the theoretical DEA cross section with the experimental results is observed; moreover, rate coefficients for Br- formation due to Rydberg electron transfer, calculated with both the experimental and the theoretical DEA cross sections, are found to agree with the previously reported absolute experimental values. At T(G) = 300 K, satisfactory agreement is also found between the calculated and experimental attachment rate coefficients for mean electron energies E = 0.04-2 eV. The strong increase of the measured rate coefficients with rising gas temperature, however, could be only partially recovered by the R-matrix results. The differences may result from the influence of thermal excitations of other vibrational modes not included in the theory.     

Electron attachment to POCl3: measurement and theoretical analysis of rate constants and branching ratios as a function of gas pressure and temperature, electron temperature, and electron energy

Two experimental techniques, electron swarm and electron beam, have been applied to the problem of electron attachment to POCl3, with results indicating that there is a competition between dissociation of the resonant POCl3-* state and collisional stabilization of the parent anion. In the electron beam experiment at zero electron energy, the fragment ion POCl2- is the dominant ion product of attachment (96%), under single-collision conditions. Small amounts (approximately 2% each) of POCl3- and Cl- were observed. POCl3- and POCl2- ion products were observed only at zero electron energy, but higher-energy resonances were recorded for POCl-, Cl-, and Cl2- ion products. In the electron swarm experiment, which was carried out in 0.4-7 Torr of He buffer gas, the parent anion branching ratio increased significantly with pressure and decreased with temperature. The electron attachment rate constant at 297 K was measured to be (2.5+/-0.6)x10(-7) cm3 s(-1), with ion products POCl2- (71%) and POCl3- (29%) in 1 Torr of He gas. The rate constant decreased as the electron temperature was increased above 1500 K. Theory is developed for (a) the unimolecular dissociation of the nascent POCl3-* and (b) a stepladder collisional stabilization mechanism using the average energy transferred per collision as a parameter. These ideas were then used to model the experimental data. The modeling showed that D0 o(Cl-POCl2-) and EA(POCl3) must be the same within +/-0.03 eV.     

Electron attachment to POCl3. III. Measurement and kinetic modeling of branching fractions

Electron attachment to POCl(3) was studied in the bath gas He over the pressure range 0.4-3.1 Torr and the temperature range 300-1210 K. Branching fractions of POCl(3)(-), POCl(2)(-), Cl(-), and Cl(2)(-) were measured. The results are analyzed by kinetic modeling, using electron attachment theory for the characterization of the nonthermal energy distribution of the excited POCl(3)(-?) anions formed and chemical activation-type unimolecular rate theory for the subsequent competition between collisional stabilization of POCl(3)(-?) and its dissociation to various dissociation products. Primary and secondary dissociations and∕or thermal dissociations of the anions are identified. The measured branching fractions are found to be consistent with the modeling results based on molecular parameters obtained from quantum-chemical calculations.     

Electron attachment to MoF6, ReF6, and WF6; reaction of MoF6(-) with ReF6 and reaction of Ar+ with MoF6

Rate constants were measured for electron attachment to MoF(6), ReF(6), and WF(6) in 133 Pa of helium gas using a flowing-afterglow Langmuir-probe apparatus. The experiment is a thorny one because the molecules tend to form oxide impurities on feedline surfaces and because of thermal decomposition of MoF(6) on surfaces as the gas temperature is increased. The electron attachment rate constant for MoF(6) is (2.3+/-0.8)x10(-9) cm(3) s(-1) at 297 K; only MoF(6) (-) is formed in the temperature range of 297-385 K. The rate constant increases with temperature up to the point where decomposition becomes apparent. Electron attachment to ReF(6) occurs with a rate constant of (2.4+/-0.8)x10(-9) cm(3) s(-1) at 297 K; only ReF(6) (-) is produced. MoF(6) (-) reacts with ReF(6) to form ReF(6) (-) on essentially every collision, showing definitively that the electron affinity of ReF(6) is greater than that of MoF(6). A rate constant of (5.0+/-1.3)x10(-10) cm(3) s(-1) was measured for this ion-molecule reaction at 304 K. The reverse reaction is not observed. The reaction of Ar(+) with MoF(6) was found to produce MoF(5) (+)+F, with a rate constant of (1.8+/-0.5)x10(-9) cm(3) s(-1). WF(6) attaches electrons so slowly at room temperature that the attachment rate was below detection level (< or =10(-12) cm(3) s(-1)). By 552 K, the attachment rate constant reaches a value of (2+/-1)x10(-10) cm(3) s(-1).     

Coupling of a Rydberg electron capture ion source with a quadrupole mass filter

The coupling of a Rydberg electron capture ion source with a Nermag R10-10H quadrupole mass filter is described. Details are given of the addition to this instrument of a creation cell for atoms excited in Rydberg states. Within the Nermag ion source, such atoms allow attachment of electrons of well-defined thermal energy. SF(6) was used for optimization of the main experimental parameters (gas pressures and voltages applied to the electrodes). The procedure by which Rydberg electron attachment was confirmed is described. A polychlorobiphenyl compound was used to illustrate the performance of this ionization technique. Ion formation was observed in the absence of fragmentation.     

Electron distribution functions for electron attachment to SF6 and model systems

The steady electron distribution function in attaching gases can be strongly perturbed from the thermal Maxwellian or Davydov distributions. For particular cross sections, concentrations and electric fields, the steady electron distribution can be localized at high energies. A very efficient methodology for the calculation of the electron distribution as the lowest eigenfunction of the appropriate Fokker-Planck equation (or equivalent Schrödinger equation) has been developed. Results are presented for a model system, and for SF₆ in He and Xe. The eigenvalue spectrum of the Fokker-Planck equation determines the time evolution of electron properties, and the extent to which the attachment and thermalization processes are coupled.     

Silicon hydride clusters Si5Hn (n = 3-12) and their anions: structures, thermochemistry, and electron affinities

The molecular structures, electron affinities, and dissociation energies of the Si(5)H(n)/Si(5)H(n)(-) (n = 3-12) species have been calculated by means of three density functional theory (DFT) methods. The basis set used in this work is of double-zeta plus polarization quality with additional diffuse s- and p-type functions, denoted DZP++. The geometries are fully optimized with each DFT method independently. Three different types of the neutral-anion energy separations presented in this work are the adiabatic electron affinity (EA(ad)), the vertical electron affinity (EA(vert)), and the vertical detachment energy (VDE). The first Si-H dissociation energies for neutral Si(5)H(n) and its anion have also been reported.     

Kinetics and thermochemistry of electron attachment to SF6

Thermochemical analysis of the electron capture process of SF₆ leads to a rate constant for the reverse process \documentclass{article}\pagestyle{empty}\begin{document}$ {\rm SF}_6^ - \mathop \to \limits^2 {\rm SF}_6 + e^ -,k_2 = 1.5 \times 10^{13 - 31.4/\theta } {\rm s}^{{\rm - 1}} $\end{document}, where θ = 2.303RT, in kcal/mol. The electron affinity of 32±3 kcal/mol is deduced from the observed bimolecularity of the capture process down to 0.1 torr Ar bath gas and estimated entropies of SF₆ and SF. The capture process is discussed from the view point of the formation of a metastable SF electron (SF₆·e) Langevin complex which appears to have a lifetime of about 2 × 10^?13 s. Curve crossing from the SF₆·e complex to vibrationally excited (SF)* appears to have a normal rate and A factor. This is interpreted to indicate near-resonant coupling between the orbiting electron and the vibronic motions of SF₆, together with similarity in structure of SF₆ and SF. It is shown that the apparent slowness of thermal electron ejection from SF is a result of an unfavorable equilibrium constant rather than a slow rate.     

Electron attachment and detachment: electron affinities of isomers of trifluoromethylbenzonitrile

Rate constants for electron attachment to the three isomers of trifluoromethylbenzonitrile [(CF(3))(CN)C(6)H(4), or TFMBN] were measured over the temperature range of 303-463 K in a 133-Pa He buffer gas, using a flowing-afterglow Langmuir-probe apparatus. At 303 K, the measured attachment rate constants are 9.0 x 10(-8) (o-TFMBN), 5.5 x 10(-8) (m-TFMBN), and 8.9 x 10(-8) cm(3) s(-1) (p-TFMBN), estimated accurate to +/-25%. The attachment process formed only the parent anion in all three cases. Thermal electron detachment was observed for all three anion isomers, and rate constants for this reverse process were also measured. From the attachment and detachment results, the electron affinities of the three isomers of TFMBN were determined to be 0.70(o-TFMBN), 0.67(m-TFMBN), and 0.83 eV (p-TFMBN), all +/-0.05 eV. G3(MP2) [Gaussian-3 calculations with reduced M?ller-Plesset orders (MP2)] calculations were carried out for the neutrals and anions. Electron affinities derived from these calculations are in good agreement with the experimental values.