Synthesis of silicon carbide films by combined implantation with sputtering techniques

Silicon carbide (SiC) films were synthesized by combined metal vapor vacuum arc (MEVVA) ion implantation with ion beam assisted deposition (IBAD) techniques. Carbon ions with 40 keV energy were implanted into Si(1 0 0) substrates at ion fluence of 5 × 10¹⁶ ions/cm². Then silicon and carbon atoms were co-sputtered on the Si(1 0 0) substrate surface, at the same time the samples underwent assistant Ar-ion irradiation at 20 keV energy. A group of samples with substrate temperatures ranging from 400 to 600 °C were used to analyze the effect of temperature on formation of the SiC film. Influence of the assistant Ar-ion irradiation was also investigated. The structure, morphology and mechanical properties of the deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and nanoindentation, respectively. The bond configurations were obtained from IR absorption and Raman spectroscopy. The experimental results indicate that microcrystalline SiC films were synthesized at 600 °C. The substrate temperature and assistant Ar-ion irradiation played a key role in the process. The assistant Ar-ion irradiation also helps increasing the nanohardness and bulk modulus of the SiC films. The best values of nanohardness and bulk modulus were 24.1 and 282.6 GPa, respectively.     

Mechanism of Cu transport along clean Si surfaces

Cu diffusion along clean Si(111), (110) and (100) surfaces are investigated by Auger electron spectroscopy and low energy electron diffraction. The effective diffusion coefficients of copper are measured in the temperature range from 500 to 650°C. It is shown that the Cu transport along silicon surface occurs by the diffusion of Cu atoms through Si bulk and the segregation of Cu atoms to the surface during the diffusion process. It is found that the segregation coefficients of Cu to silicon surface during the diffusion process depend on surface orientation.     

Surface processing with partially ionized plasmas

Partially ionized plasmas are used extensively to process surfaces in many areas of technology. Surface processing in this discussion includes deposition of thin films, etching of the surface itself, and modification of the existing surface by oxidation, nitriding, or texturing. Unique materials can be synthesized in reactive gas glow discharges. The development and optimization of plasma processes is impeded by both a lack of understanding of the mechanistic details and by the formidable parameter space associated with plasma equipment. The complexity of the reactive gas plasma environment coupled with the large parameter space causes difficulty in process development and optimization, but offers opportunities for discovery and invention. The ability of partially ionized plasmas to generate uniform fluxes over wide areas of energetic ions and/or reactive neutral atoms or radicals can be expected to ensure continued widespread applications for the plasma processing of surfaces     

Surfactant sputtering

Sputter erosion of materials is among the most important techniques for fabricating advanced thin film coatings. Sputter processes are also of considerable relevance for surface polishing down to an atomic scale, nano-structuring of surfaces as dot and ripple patterns and micro-machining of materials using focused ion beams or reactive ion etching. We present a new, versatile sputter technique utilizing the steady state coverage of a substrate surface with up to 10¹⁶ cm⁻² of foreign or self atoms simultaneously during sputter erosion by combined ion irradiation and atom deposition. These surfactant atoms (surface active agents) strongly modify the substrate sputter yield on atomic to macroscopic length scales. Depending on the surfactant–substrate combination, the novel technique allows enhanced smoothing of surfaces, the generation of novel surface patterns and nanostructures and the controlled shaping of surfaces on the nanometer scale. We present selected examples of surface morphology evolution, smoothing of surfaces and shaping of surfaces to demonstrate the capabilities of the new surfactant sputtering technique.     

Surface diffusion of tungsten adatoms induced by low-energy bombardment with He atoms

Using low-temperature field ion microscope techniques, we studied at the atomic level the elementary events of radiation-induced surface diffusion of tungsten adatoms on the ideally pristine surface. The experiments on surface-damage formation and adatom displacements have been performed in situ with a source of neutral helium atoms with an energy of 5?keV. It was demonstrated that the low-energy He atomic bombardment at grazing incidence was able to induce a substantial surface mobility of adatoms. Most of the radiation-induced adatom displacements were oriented along the direction of irradiation. The long impact-induced jumps of adatoms, spanning more than a nearest-neighbor distance, were revealed. Performed molecular dynamics simulations reproduce the general experimental trends and conclusions.     

High-energy heavy-ion induced physical and surface-chemical modifications in polycrystalline cadmium sulfide thin films

The effect of high electronic energy deposition on the structure, surface topography, optical properties, and electronic structure of cadmium sulfide (CdS) thin films have been investigated by irradiating the films with 100 MeV Ag⁺⁷ ions at different ion fluences in the range of 10¹²–10¹³ ions/cm². The CdS films were deposited on glass substrate by thermal evaporation, and the films studied in the present work are polycrystalline with crystallites preferentially oriented along (002)-H direction. It is shown that swift heavy ion (SHI) irradiation leads to grain agglomeration and hence an increase in the grain size at low ion fluences. The observed lattice compaction was related to irradiation induced polygonization. The optical band gap energy decreased after irradiation, possibly due to the combined effect of change in the grain size and in the creation of intermediate energy levels. Enhanced nonradiative recombination via additional deep levels, introduced by SHI irradiation was noticed from photoluminescence (PL) analysis. A shift in the core levels associated with the change in Fermi level position was realized from XPS analysis. The chemistry of CdS film surface was studied which showed profound chemisorption of oxygen on the surface of CdS.     

异质原子在Cu（001）表面扩散的分子动力学模拟

采用分子动力学方法模拟单个增原子Ag,Pd和Cu在Cu（001）表面上的扩散过程.通过对自扩散和异质扩散过程中扩散机制的观察,统计三种不同的增原子在不同温度下的扩散频率,拟合给出扩散势垒和扩散频率的指前因子,并与扩散势垒的静力学计算结果进行比较.结果表明：在800 K以下时,三种增原子均以简单跳跃机制为主扩散,与衬底不互溶的Ag增原子的跳跃频率最大,与衬底互溶的Pd增原子的跳跃频率最小.同质增原子与异质增原子的扩散频率和温度的关系均较好地符合Arrhenius公式,由Arrhenius公式拟合给出的三种不同增原子的扩散势垒与表面结构和增原子表面结合能有关.Pd和Cu增原子从跳跃机制为主向交换机制为主的转换温度分别在825和937 K左右. 关键词： 表面扩散 分子动力学模拟     

Chemical and catalytic effects of ion implantation

Energetic particles are used for inducing chemical reactions as well as for modifying the properties of materials with regard to their bulk and surface chemical behavior. The effects are partly caused by radiation damage or phase intermixing, partly by the chemical properties of the individual bombarding particles. In this contribution a survey of relevant applications of these techniques is presented:

1) Chemical reactions of implanted and recoil atoms and their use for syntheses, doping and labeling of compounds.

2) The formation of thin films by decomposing chemical compounds with ion beams.

3) Catalytic effects on substrates treated by sputtering or ion implantation. Recent results with nonmetallic substrates are reviewed. Mainly hydrogenation reactions at a solid/gas interface or redox reactions at an electrified solid/liquid interface are mentioned.

The present status and future prospects of these kinds of investigations will be discussed.     

In situ identification of organic components of ink used in books from the 1900s by atmospheric pressure matrix assisted laser desorption ionization mass spectrometry

Transport of N, O, and Ti during dc magnetron sputtering deposition of nanoscopic TiN/Ti and TiN structures on plasma nitrided M2 tool steel, as well as transport of metallic species composing the plasma nitrided steel substrates were investigated. N and O depth distributions were determined with subnanometric resolution using narrow resonant nuclear reaction profiling, whereas Ti was profiled, also with subnanometric depth resolution, by medium energy ion scattering. The surface elementary compositions of the TiN/Ti/nitrided steel and TiN/nitrided steel structures were determined by low energy ion scattering. The chemical compounds formed during deposition were accessed by X-ray photoelectron spectroscopy, indicating the presence of TiN, TiO₂, Ti oxynitrides, as well as other metallic nitrides and oxynitrides, but no metallic Ti was observed. Owing to the observed intensive atom mobility, the compositions of the deposited films on plasma nitrided steel structures varied continuously on a nanoscopic scale, from the core of the steel substrate to the bulk of the stoichiometric TiN films. The Ti interlayer assists interdiffusion of all species, in contrast to the TiN film layer, which is known to be a diffusion barrier. The improved adhesion of TiN hard coatings to plasma nitrided steel under working conditions is discussed in terms of the gradual compositional change around the interfaces and the atomic mobility during their formation.     

Surface self-diffusion of a Pt adatom on cuboctahedral and truncated decahedral clusters,size dependence

The self-diffusion of single Pt adatom on the surface of cuboctahedral and truncated decahedral clusters with 561–10 179 atoms are studied within the context of the many-body potentials obtained via the embedded atom method. The minimum energy diffusion path and the corresponding energy barrier for adatom diffusion on the cuboctahedral and truncated decahedral clusters surfaces are determined through a combination of the quenched molecular dynamics and the nudged elastic band method. The calculated energy barriers are consistent with the available experimental data. The dependence of energy barrier for adatom diffusion across the step edge on the cluster size is found. For the larger cuboctahedral and truncated decahedral clusters, the simulations show that the movement of the adatom is confined to a central region, and the adatom may escape from the center region only at elevated temperatures. In addition, we also find that the truncated decahedral structure is more favorable over the cuboctahedral structure for smaller clusters. The cluster growth experiments support our results.     

Surface diffusion of carbon atom and carbon dimer on Si(0 0 1) surface

Carbon (C) atom and carbon dimer (C2) are known to be the main projectiles in the deposition of diamond-like carbon (DLC) films. The adsorption and diffusion of the C adatom and addimer (C2) on the fully relaxed Si(0 0 1)-(2 × 1) surface was studied by a combination of the molecular dynamics (MD) and Monte Carlo (MC) simulation. The adsorption sites of the C and C2 on the surface and the potential barriers between these sites were first determined using the semi-empirical many-body Brenner and Tersoff potential. We then estimated their hopping rates and traced their pathways. It is found that the diffusion of both C and C2 is strongly anisotropic in nature. In addition, the C adatom can diffuse a long distance on the surface while the adsorbed C2 is more likely to be confined in a local region. Thus we can expect that smoother films will be formed on the Si(0 0 1) surface with single C atoms as projectile at moderate temperature, while with C2 the films will grow in two-dimensional islands. In addition, relatively higher kinetic energy of the projectile, say, a few tens of eV, is needed to grow DLC films of higher quality. This is consistent with experimental findings.     

Multilayer growth of BaTiO3 thin films via pulsed laser deposition: An energy-dependent kinetic Monte Carlo simulation

An energy-dependent kinetic Monte Carlo approach was proposed to simulate the multilayer growth of BaTiO₃ thin films via pulsed laser deposition, in which the four steps, such as the deposition of atoms, the diffusion of adatoms, the bonding of adatoms, and the surface migration of adatoms, were considered. Distinguishing with the traditional solid-on-solid (SOS) model, the adatom bonding and the overhanging of atoms, according to the perovskite structure, were specially adopted to describe the ferroelectric thin film growth. The activation energy was considered from the interactions between the ions, which were calculated by Born-Mayer-Huggins (BMH) potential. From the simulation the relative curves of the each layer coverage and roughness vs total coverage were obtained by varying the parameter values of the incident kinetic energy, laser repetition rate and mean deposition rate. The relationship between growth modes and the different parameters was also acquired.     

Noncanonical localized orbitals and chemisorption

A localization scheme is applied to the Hückel N-atom linear chain in the limit that the chain becomes semi-infinite. It is shown that eigenvalues which arise from the localization procedure serve to separate a set of orbitals localized near the surface from a set of bulk orbitals. The effect of localization on the binding energy of an adatom is also reported where the adatom is assumed to be identical to the bulk atoms. Approximate binding energies are computed by taking combinations of the adatom orbital plus localized orbitals. Agreement to within 10% with the exact energy is found for the case of localization to two end atoms.     

Mechanism of low-temperature ion-bombardment-activated surface self-diffusion

Elementary events of low-temperature surface erosion induced by the bombardment with accelerated helium atoms and ions were studied at the atomic level. It is established that the regular arrangement of surface atoms is disturbed due to the release of energy of formation of interstitial atoms emerging at the surface and to the expenditure of part of this energy on the formation of surface defects in excited states. The adatom excitation energy allowing the short-range diffusion processes was determined experimentally.     

An AES investigation of aluminum,Al oxide and Al nitride thin films

The aluminum-L₂₃VV Auger spectra for elemental Al, Al oxide and Al nitride have been measured in an assessment of the utility of Auger spectroscopy in characterizing thin oxidized Al films used in model supported-metal catalyst studies. Clearly distinct spectra were found for the three surface chemical states. The oxide spectrum was shown to be similar to published spectra from bulk, single-crystalline Al₂O₃. Complete oxidation of Al films required exposure to O₂ at temperatures above room temperature. Room temperature exposure to hydrazine resulted in the complete nitriding of Al films. The spectrum for the nitride is similar in shape to published spectra from films produced by two alternative methods of nitriding. The hydrazine-exposure method of producing Al nitride films was found to offer an alternative, easily prepared support material for future model catalyst studies.     

Electrical transport study of structural phase transitions in C60 films and the effect of swift heavy ion irradiation

Three phase transitions (face centered to simple cubic, surface rearrangement from (2×2) to (1×1) and glass transition) in fullerene thin films and the effect of 150 MeV Ti ion irradiation on these transitions have been studied, using temperature dependence of electrical resistivity measurements. The structural properties of the C₆₀ thin films are studied by X-ray diffraction, atomic force microscopy and UV-vis spectroscopy. It is observed that defect creation by ion irradiation in the films lead to quenching and broadening of structural phase transitions but the transition temperatures did not show significant shifting under ion irradiation.     

Oxidation and thermal annealing effects on native and ion-irradiated PbTe films grown by molecular beam deposition

Investigations are reported into the effect of low-pressure oxygen exposure and thermal annealing on the carrier transport properties of native and 350 eV Ar⁺ bombarded PbTe films. The electrical measurements were madein situ on MBD-grown PbTe films without breaking vacuum. On native surfaces, oxidation was initially sustained by diffusion of a donor species from the film bulk to the surface, where reaction with oxygen occured. This diffusion process was apparently inhibited on ion irradiated films and direct doping of the film surface effected a gradual reduction in the ion-induced electron accumulation resident at the film surface. The native properties and behavioural characteristics of the films could be recovered by thermal annealing of the ion-irradiated and/or oxidized films at 300–350 °C.     

Atomic diffusion inside a STM junction: simulations by kinetic Monte Carlo coupled to tunneling current calculations

The influence of a static scanning tunneling microscope (STM) tip on the diffusion of xenon atoms adsorbed on a Cu(1 1 0) stepped surface is studied. Semi-empirical potentials for the Xe-surface interaction and a N-body energy based method for the Xe-tip contribution are used to calculate the adsorption energy of adsorbates in the STM junction. First, we analyse the variation of this energy when the adatom is placed near a step edge and for different tip positions. When the tip is situated in the neighbourhood of the step edge, the Ehrlich-Schwoebel barrier experienced by the adatom is lowered. This opens a specific diffusion channel, allowing a possible crossing of the step edge. Second, through a kinetic Monte Carlo approach coupled to the elastic scattering quantum chemistry method, the noisy tunneling current created by the random motion of diffusing atoms in the vicinity of the tip can be analyzed. We show that, by counting the number of diffusion events, we can determine effective barriers related to the most dominant processes contributing to the diffusion at a particular temperature. We also demonstrate that the interaction mode of the tip (attractive or imaging) greatly modifies the diffusion processes.     

Influence of Pb adatom on adsorption of oxygen molecules on Pb(111) surface: a first-principles study

Using first-principles calculations, we systematically study the influence of Pb adatom on the adsorption and the dissociation of oxygen molecules on Pb(111) surface, to explore the effect of a point defect on the oxidation of the Pb(111) surface. We find that when an oxygen molecule is adsorbed near an adatom on the Pb surface, the molecule will be dissociated without any obvious barriers, and the dissociated O atoms bond with both the adatom and the surface Pb atoms. The adsorption energy in this situation is much larger than that on a clean Pb surface. Besides, for an adsorbed oxygen molecule on a clean Pb surface, a diffusing Pb adatom can also change its adsorption state and enlarge the adsorption energy for O, but it does not make the oxygen molecule dissociated. And in this situation, there is a molecule-like PbO2 cluster formed on the Pb surface.     

First–principles study of potassium adsorption and diffusion on graphene

Potassium–ion batteries (KIBs) are a new–type of energy storage devices that have attracted increasing attention due to their low cost and the abundant resource of K in the Earth’s crust. Monolayer and multilayer graphene are promising electrode materials for KIBs. Herein, the adsorption and diffusion of potassium atoms on the surface of graphene were studied using the first–principles calculations including the van der Waals interaction. It was determined that K atoms can stably adsorb on the surface of graphene. The climbing image nudged elastic band method was employed to calculate the diffusion barriers of a single K atom and two K atoms on the surface of graphene. The results demonstrated that the diffusion barrier of a single K atom on graphene was low. The interaction between K atoms was considered and it facilitates the K atom diffusion to the second and third nearest–neighbour site of the K adatom, but prevents the K atom diffusion to the far nearest–neighbour site of the K adatom. Moreover, the difference in charge density demonstrates that there was a significant charge transfer from two K adatoms to its nearest–neighbour carbon atoms.