高气压均匀直流辉光放电等离子体的光学特性

在高气压(大于100 Torr, 1 Torr=1.33322×10² Pa)平板位形的均匀直流辉光放电中, 一定条件下观察到平行排列的明暗相间的等离子体辉纹. 结合等离子体的光发射谱诊断, 研究了气体组分对等离子体光学特性的影响. 研究发现, 随着甲烷浓度的增加, 辉纹间距减小, 相应的电子激发温度降低. 当甲烷浓度增加时, 等离子体中低电离能的粒种增加, 粒子平均电离能减小, 这种情况下, 电子被电场加速较短的距离所获得的能量就可以激发粒子, 产生可见的光发射, 表现为辉纹间距缩短. 随着氩气的引入, 能够观察到明显的辉纹, 且增大氩气含量, 辉纹间距增加, 这与氩的较高电离能有关, 而相应的电子激发温度增加. 研究结果表明, 随着工作气体的改变, 等离子体辉纹间距呈现出一种对电子温度的响应.     

Experimental study on parameters of dust plasma in SiH4/C2H4/Ar discharges

Measurements of dust plasma parameters were carried out in the discharges of （SiH4/C2H4/Ar） mixtures. Dust particles were formed in the capacitively coupled radio-frequency discharge of these reactive mixtures in a cylindrical chamber. Langmuir probe was employed for diagnosing and measuring the important plasma parameters such as electron density and electron temperature. The results showed that the electron density dropped, and in contrast the electron temperature rose when the dust particles formed. The curves of the electron density and temperature versus the RF power and pressure were presented and analysed. Further, it was found that the wriations of electron temperature and the size of dust void with the RF power followed the similar trends. These trends might be useful for understanding more about the characteristics of dusty voids.     

Effects of relativistic and ponderomotive nonlinearities on the interaction of high-power laser beam with an inhomogeneous warm plasma

The influence of relativistic-ponderomotive nonlinearities and the plasma inhomogeneity on the nonlinear interaction between a high-power laser beam and a warm underdense plasma are studied. It is clear that the relativistic ponderomotive force and the electron temperature modify the electron density distribution and consequently change the dielectric permittivity of the plasma. Therefore, by presenting the modified electron density and the nonlinear dielectric permittivity of the warm plasma, the electromagnetic wave equation for the propagation of intense laser beam through the plasma is derived. This nonlinear equation is numerically solved and the distributions of electromagnetic fields in the plasma, the variations of electron density, and plasma refractive index are investigated for two different background electron density profiles. The results show that the amplitude of the electric field and electron density oscillations gradually increase and decrease, during propagation in the inhomogeneous warm plasma with linear and exponential density profiles, respectively, and the distribution of electron density becomes extremely sharp in the presence of intense laser beam. It is also indicated that the electron temperature and initial electron density have an impact on the propagation of the laser beam in the plasma and change the plasma refractive index and the oscillations' amplitude and frequency. The obtained results indicate the importance of a proper choice of laser and plasma parameters on the electromagnetic field distributions, density steepening, and plasma refractive index variations in the interaction of an intense laser beam with an inhomogeneous warm plasma.     

射频容性耦合等离子体放电特性的光谱诊断

利用流体模型模拟和发射光谱实验诊断相结合的方法,研究了中等气压、中等功率下射频容性耦合等离子体的放电特性。理论上,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar气为工作气体,研究了不同气压以及不同射频输入功率下等离子体电子温度和电子密度的分布规律。实验上,依据仿真模型设计制作了相同尺寸的密闭玻璃腔体和平板电极,采用13.56 MHz射频放电技术电离腔体内的工作气体Ar气,测量了不同气压、不同射频输入功率时放电等离子体的发射光谱。通过分析和选择适当的Ar Ⅰ和Ar Ⅱ的特征谱线,分别利用玻尔兹曼斜率法以及沙哈-玻尔兹曼方程计算了等离子体的电子温度与电子密度,并结合模拟仿真结果对光谱诊断结果进行了修正。结果表明：当气体压强为300~400 Pa、输入功率为600~800 W时,等离子体近似服从玻尔兹曼分布,此时利用光谱法得到的等离子体参数与仿真结果相符合。仿真模拟与光谱实验诊断相结合的方法可初步诊断出中等气压下等离子体的放电参数,增加了玻尔兹曼斜率法和沙哈-玻尔兹曼方程在等离子体放电中的使用范围,扩大了光谱法在低电子密度容性耦合等离子体参数诊断的应用场合,为中等气压容性耦合等离子体在工业与军事上的应用研究提供了重要物理状态的分析手段。     

CT-6B托卡马克装置上电流上升阶段电子温度的光谱测量

在CT-6B托卡马克装置上,用一米掠入射真空紫外单色仪测量了氧杂质各阶离子OII-OVI的谱线辐射的时间变化,用HCN远红外激光干涉仪测量了电子密度的时间变化。利用谱线时间史的方法,由谱线起始时间估算了放电初期电流上升阶段电子温度的时间变化。用数值计算分别考察了氧杂质进入通量和约束时间对谱线峰值强度和起始时间的影响。估算得到的电子温度在放电开始后0.36,0.56,0.66,0.90和1.4ms,分别为3.6,5.6,7.3,10.8和21eV,它们反映了放电初期等离子体中心区电子温度的变化。 关键词：     

Untersuchungen der kontrahierten Edelgassäule bei mittleren Drücken II. Meßergebnisse in Argon

In this work plasma parameters of the constricted argon discharge have been determined by an iterative method. For the conditions 20 ? Rp ? 300 cm Torr and 0,05 ? i/R ? 2,5 A/cm the electron density, the electron temperature, and the gas temperature are obtained. These results are compared with measurements and calculated values of other authors. With the exception of the determination of gas temperatures at 2,5 A/cm the agreement between our results and the measurements of some other authors is satisfactory.     

样品温度对纳秒激光诱导Cu等离子体特征参数的影响

为了研究样品温度对激光诱导击穿Cu等离子体特征参数的影响,以黄铜为研究对象,在优化的实验条件下采用波长为532 nm的Nd∶YAG纳秒脉冲激光诱导激发不同温度下的块状黄铜,测量了Cu等离子体的特征谱线强度和信噪比;同时在局部热平衡条件下利用Boltzmann斜线法和Stark展宽法分析计算了不同的样品温度条件下等离子体电子温度和电子密度。实验结果表明,在激光功率为60 mW时,随着样品温度的升高,Cu的特征谱线强度和信噪比逐渐增加,样品温度为130 ℃时达到最大值,然后趋于饱和。计算表明,黄铜样品中Cu元素Cu Ⅰ 329.05 nm,Cu Ⅰ 427.51 nm,Cu Ⅰ 458.71 nm,Cu Ⅰ 510.55 nm,Cu Ⅰ 515.32 nm,Cu Ⅰ 521.82 nm, Cu Ⅰ 529.25 nm,Cu Ⅰ 578.21 nm八条谱线在130℃的相对强度相较于室温（18 ℃）下分别提高了11.55倍、4.53倍、4.72倍,3.31倍、4.47倍、4.60倍、4.25倍、4.55倍,光谱信噪比分别增大了1.35倍,2.29倍、1.76倍、2.50倍、2.45倍、2.28倍、2.50倍,2.53倍。分析认为,升高样品温度会增大样品的烧蚀质量,相对于温度较低状态增加了等离子体中样品粒子浓度,进而提高等离子体发射光谱强度。所以,适当升高样品温度能够提高谱线强度和信噪比,从而增强LIBS技术检测分析光谱微弱信号的测量精度,改善痕量元素的检测灵敏度。同时研究了改变样品温度时等离子体电子温度和电子密度的变化趋势。计算表明,当样品温度从室温上升到130 ℃的过程中,等离子体的电子温度由4 723 K上升到7 121 K时基本不再变化。这种变化规律与发射谱线强度和信噪比变化趋势一致。分析认为,这主要是由于在升高样品温度的初始阶段,激光烧蚀量增大,等离子体内能增大,从而导致等离子体电子温度升高。当激光烧蚀样品的量达到一定值后不再变化,激光能量被激发溅射出来的样品蒸发物以及尘粒的吸收、散射和反射,导致激光能量密度降低,电子温度趋于饱和,达到某种动态平衡。选用一条Cu原子谱线（324.75 nm）的Stark展宽系数计算激光等离子体的电子密度,同时研究改变样品温度时等离子电子密度的变化趋势,计算表明在样品温度为130 ℃时,Cu Ⅰ 324.75 nm对应的等离子电子密度相较于室温（18 ℃）条件下增大了1.74×1017 cm-3。该变化趋势与电子温度的变化趋势一致。适当升高样品温度使得电子密度增大,从而提高电子和原子的碰撞几率,激发更多的原子,这是增强光谱谱线强度的原因之一。由此可见,升高样品温度是一种便捷的提高LIBS检测灵敏度的有效手段。     

Ionization wave as an Instability — Evolution and Nonlinear Effect

Evolution from the linear growth to the nonlinearly saturated state of ionization waves (moving striations) is investigated from a viewpoint of an instability which appears in a plasma. The experiments were performed observing backward waves excited below the upper critical current I_c in xenon, argon, and argon-mercury gases at pressures of the order of Torr. It is found that (1) the behavior of the evolution obeys the Landau amplitude equation; (2) the saturated amplitude does not depend on an initial value, but only on plasma parameters; (3) the linear growth and squared saturation level are proportional to the excess over I_c, and when frequency-controlled, they have a parabolic dependence on the frequency; and (4) nonuniform axial changes in the dc state due to the nonlinear effects appear in a form of enhanced ionization in the plasma where the electron temperature and density are increased. The way of these behavior can be applied to a large number of spatially or temporally unstable modes.     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明：当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

Experimental Study of Planar Langmuir Probe Characteristics in Electron Current-Carrying Magnetized Plasma

Experimental study of planar Langmuir probe characteristics in a magnetized plasma with an electron current along the direction of the magnetic field shows that the usual procedure for determination of the electron temperature and plasma density, which is applicable in a current-free magnetized plasma, gives erroneous results for these plasma parameters. When this procedure is applied on the characteristics measured at two opposite orientations of the probe collecting surface with respect to the direction of the electron drift, different values of the electron temperature are obtained. These virtual electron temperatures and corresponding plasma densities calculated from the measured ion saturation currents are higher and/or smaller than the exact local electron temperature and plasma density. Calculation of particular averages of these quantities is proposed as a possible way to obtain correct results for the local electron temperature and plasma density. These averages are used in the approximate evaluation of the electron drift velocity from the electron saturation currents measured at the two orientations of the probe collecting surface.     

Self-oscillations and bunching of striations in ionospheric modifications

Based on the theory of stationary striations created in ionospheric modifications by powerful radio waves, as developed by Gurevich et al. [Phys. Lett. A 206 (1995) 247], the existence of self-oscillations of striations and of a large scale nonlinear structuring in a modified region is predicted. The theory is shown to be in agreement with existing observational data. Direct in situ rocket measurements of the electron temperature inside the striations, analogous to the recent plasma density measurements [M.C. Kelley et al., J. Geophys. Res. 100 (1995) 17 367], are desirable.     

Microwave propagation through modulated air plasma

When a microwave propagates through a plasma in which electron density and electron collision frequency periodically vary, the propagating wave is modulated in amplitude and phase. An approximate theory is derived to suit the laboratory experimental conditions. Introducing the amplitude and phase difference, the dependence of electron density and electron collision frequency has been derived for different radio frequency modulation and frequency parameter. A scanning double probe technique is used to measure the exact time variation in the plasma parameters at any fixed position during a single cycle of the applied field. Theoretical values agree with those of experiment.     

空心阴极放电条纹特性的光谱诊断

利用发射光谱法,研究了圆柱型空心阴极放电条纹的特性.测量了条纹区的发射光谱,在此基础E计算得到r电子激发温度、相对电子密度和电子平均能量的空间分布特性.结果表明条纹区的光强、电子激发温度和电子密度均呈非等幅的周期性变化.与暗纹中心处相比,明纹中心具有较高的电子激发温度和较低的电子密度.由阴极向阳极,明纹中心处的电子激发温度幅值逐渐减小.此外,条纹区的电子激发温度随着电流的增加而增加.     

真空弧Ti-H等离子体热力学参数的原子发射光谱双温度研究北大核心CSCD

金属氢化物作阴极的真空弧离子源,假设其放电产生双温度的非平衡态Ti-H等离子体,其内部的气体解离过程和粒子电离过程分别由Culdberg-Waage解离方程和Saha电离方程进行描述,结合原子发射光谱以及电荷准中性条件,求出Ti-H等离子体的电子温度Te、重粒子温度Th和粒子数密度之后,可更进一步对等离子体的质量密度、焓、比热容等热力学参数进行描述。在不同的电子数密度下,研究各参数随变量θ(电子温度Te与重粒子温度Th的比值)变化的情况。计算结果显示:电子数密度已知,随θ值升高,除氢气分子数密度外,等离子体温度和单原子粒子数密度的计算结果均变化甚微。高电子数密度时,等离子体中单原子粒子占绝对优势,热力学参数由其控制;低电子数密度下,随θ值的升高,等离子体逐步由单原子粒子占优势转为氢气分子占绝对优势,热力学参数的变化情况表现出相同的规律。     

真空弧Ti-H等离子体热力学参数的原子发射光谱双温度研究

金属氢化物作阴极的真空弧离子源, 假设其放电产生双温度的非平衡态Ti-H等离子体, 其内部的气体解离过程和粒子电离过程分别由Culdberg-Waage解离方程和Saha电离方程进行描述, 结合原子发射光谱以及电荷准中性条件, 求出Ti-H等离子体的电子温度Te、重粒子温度Th和粒子数密度之后, 可更进一步对等离子体的质量密度、焓、比热容等热力学参数进行描述。在不同的电子数密度下, 研究各参数随变量（电子温度Te与重粒子温度Th的比值）变化的情况。计算结果显示：电子数密度已知, 随值升高, 除氢气分子数密度外, 等离子体温度和单原子粒子数密度的计算结果均变化甚微。高电子数密度时, 等离子体中单原子粒子占绝对优势, 热力学参数由其控制;低电子数密度下, 随值的升高, 等离子体逐步由单原子粒子占优势转为氢气分子占绝对优势, 热力学参数的变化情况表现出相同的规律。     

Zur Mikrowellendiagnostik der Rauschtemperatur und der Trägerdichte eines Neonplasmas im Übergangsbereich zwischen der Freifall- und diffusionsbestimmten Säule

This paper deals with the experimental determination of the noise temperature and electron density. These plasma parameters were determined in the pressure region between diffusion and free-fall conditions with the aid of the microwave resonator method. In most cases the calculations of noise temperature and electron density were made using the energy distribution functions following from the electron Boltzmann equation. Great differences occur between calculated and measured values when the mean free path length of electrons becomes comparable with the dimensions of the discharge tube. These differences may be caused by a greater radial decrease of the noise temperature and/or by an increased interaction between boundary layer oscillations and plasma.     

空气中YAG激光诱导Cu等离子体空间特性的研究

在空气中利用Nd: YAG脉冲激光诱导金属Cu靶,产生激光等离子体羽,并获得等离子体羽的空间谱;研究了空间谱线结构;分析了不同空间位置处电子温度和电子密度的空间演化规律;并对等离子体光谱的特性和产生机制进行了讨论. 结果表明：谱线结构、谱线强度和等离子体的电子温度及电子密度都与空间位置变化密切相关,特征谱强度最大值出现在距靶面0.75-1.0mm的空间位置处,此处CuⅠ谱线相对强度最强,在1.25 mm空间位置处电子温度比周边的电子温度偏低,但此处电子密度反而升高,这种现象可以由级联效应得到解释。     

Electrical discharge in the Teflon cavity of a coaxial pulsedplasma thruster

In this work, we analyze the physical processes of a pulsed discharge in a dielectric (Teflon) cavity. This type of discharge is generated in a coaxial pulsed plasma thruster (PPT) having a central Teflon cavity to produce a high-pressure cloud of ablation products during the discharge pulse. The primary intended role of this model is to provide upstream boundary conditions for particle simulation codes used to study the exhaust plume. The main features of the electrical discharge in the dielectric cavity include Joule heating of the plasma, heat transfer to the dielectric, decomposition of the dielectric followed by partial ionization, and acceleration of the plasma up to the sound speed at the cavity exit. We consider a diffuse type of discharge assuming that all plasma parameters are uniform in the cavity. The system of equations is based on the plasma energy balance, thermal conductivity, dielectric ablation, and mass balance. It is found that most of the energy of the plasma column is carried off by particle convection to the dielectric and by radiation. It is found that during the pulse, the electron density peaks at about 10²⁴ m^-3 and decreases to 10²¹ m^-3 toward the end of the pulse, whereas the electron temperature peaks at about 2.2 eV and decays to 1.5 eV. Teflon surface temperature peaks at about 650 K. Predicted plasma temperature and ablated mass are found to be in agreement with available experimental data     

Reduced pore diameter fluctuations of macroporous silicon fabricated from neutron‐transmutation‐doped material

The precision of photo‐electrochemical etching of perfectly‐ordered macropores in single‐crystalline silicon is limited by pore diameter fluctuations due to doping variations of the starting wafer (striations). The doping variation originates from the rotation during crystal growth in the float‐zone or Czochralski process, respectively. Experimentally, variations of the pore diameter up to 7% can occur. These so‐called striations limit performance of possible applications of macroporous silicon. As doping inhomogeneities are the reason for the striations, uniformly doped silicon wafers by neutron transmutation doping were used for the first time. Photoelectrochemical etching of neutron transmutated silicon has been carried out and the pore diameter fluctuation has been reduced by about 40% compared to standard doped float‐zone wafers. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Theoretical and Experimental Investigations of the Suitability of Low‐Current Z‐Pinch Plasma as an Absorption Medium for Laser Radiation

In this study the electron density of z‐pinch plasmas driven at relatively low currents (ca. 2‐5 kA) was determined using only emission spectroscopy. The suitability of a hollow‐cathode‐triggered z‐pinch plasma as an absorption medium for laser radiation was investigated. The temporal and spatial behaviors of electron temperature and density profiles were estimated using magnetohydrodynamic (MHD) simulations to evaluate the experimental results. Temperature measurements were performed according to the Boltzmann plot method in the visible spectrum range, using the fact that, in low‐current z‐pinch plasma, a local thermodynamic equilibrium prevails for states at high principal quantum numbers (partial local thermodynamic equilibrium). In this case, the Saha equation can be used to determine the electron density. The results demonstrate that this method of determining the electron temperature and density of z‐pinch plasmas is only applicable during the pinching phase. However, in this case the experimentally determined values are in fairly good agreement with the values determined using the MHD model. A user‐oriented 1‐D radiation MHD code was used to simulate the dynamic evolution of the plasma. The experimentally determined maximum electron temperature of approximately 12 eV is in fairly good agreement with the simulated value. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)