Milliampere He2+ beam generator using a compact GHz ECRIS

Multi-charged helium ion beam He2+ is useful for helium accelerator to obtain a higher energy with lower cost and for deuterium accelerator to avoid neutron activation during machine commissioning.An attempt to generate milliampere multi-charged helium He2+ion beam with a 2.45 GHz electron cyclotron resonance ion source(ECRIS) was tested recently.A design using a specfic permanent magnet 2.45 GHz ECRIS(PMECRIS) source(ERCIS) is reported and the He2+beam production ability is described.With this source,we produced a total helium beam of 40 mA at 40 kV with 180 W of net microwave power and a gas flow of less than 0.5 sccm.At steady state the He2+beam intensity is 4.4 mA,that being the fraction of multi-charged helium ion beam is at approximately 11%.     

Simulation of electron behavior in PIG ion source for 9 MeV cyclotron

In this paper, we focus on a PIG source for producing intense H-ions inside a 9 MeV cyclotron. The properties of the PIG ion source were simulated for a variety of electric field distributions and magnetic field strengths using a CST particle studio. After analyzing the secondary electron emission (SEE) as a function of both magnetic and electric field strengths, we found that for the modeled PIG geometry, a magnetic field strength of 0.2 T provided the best results in terms of the number of secondary electrons. Furthermore, at 0.2 T, the number of secondary electrons proved to be greatest regardless of the cathode potential. Also, the modified PIG ion source with quartz insulation tubes was tested in a KIRAMS-13 cyclotron by varying the gas flow rate and arc current, respectively. The capacity of the designed ion source was also demonstrated by producing plasma inside the constructed 9 MeV cyclotron. As a result, the ion source is verified as being capable of producing an intense H^- beam and high ion beam current for the desired 9 MeV cyclotron. The simulation results provide experimental constraints for optimizing the strength of the plasma and final ion beam current at a target inside a cyclotron.     

A miniaturized 2.45 GHz ECR ion source at Peking University

A miniaturized 2.45 GHz permanent magnet electron cyclotron resonance(PMECR) ion source, which has the ability of producing a tens-m A H+beam, has been built and tested at Peking University(PKU). Its plasma chamber dimension is Φ30 mm×40 mm and the whole size of the ion source is Φ180 mm×130 mm. This source has a unique structure with the whole source body embedded into the extraction system. It can be operated in both continuous wave(CW) mode and pulse mode. In the CW mode, more than 20 m A hydrogen ion beam at 40 k V can be obtained with the microwave power of 180 W and about 1 m A hydrogen ion beam is produced with a microwave power of 10 W. In the pulse mode, more than50 m A hydrogen ion beam with a duty factor of 10% can be extracted when the peak microwave power is 1800 W.     

Kei2 ECR离子源C4+、C5+束流的最佳结果

With the prototype ECR ion source for the next carbon therapy facility in Japan a new series of measurements has been performed in order(a)to find the highest beam currents of C~(4 ) ions,and(b)to study the effect of"special"gas-mixing by using a chemical compound as a feed gas.An isotopic effect has been found in a previous experiment:with deuterated methane(CD_4 gas) the C~(5 ) beam currents are about 10% higher than with regular methane(CH_4 gas).For butane gases(C_4D_(10) and C_4H_(10) respectively)the isotopic effect for C~(5 ) production is even stronger(>15%).For production of C~(4 ) ions the isotopic effect appears to be absent.It turns out that the relative amount of carbon is much more important:acetylene gives 15% higher C~(4 ) current than butane,which in turn gives about 10% higher C~(4 ) ion currents than methane.     

ORNL-HRIBF 6GHzECR离子源的最新结果

Experimental studies were conducted to characterize and improve the performance of the flat-B ECR ion source.The emittance of the source was investigated for the first time.The output beam currents of high-charge-states of Ar(q>8)were nearly doubled by increasing the plasma electrode aperture from 4mm to 6mm in diameter.To investigate possible enhancements with broadband microwave radiation,a"white"Gaussian noise generator was employed with a TWT amplifier to generate microwave radiation with a bandwidth of～200MHz.The performance of the flat-B ECR ion source was found to be much better with narrow bandwidth radiation when the source was operated in the flat-B region.However,the ion beam intensities and charge state distributions were improved with the broadband radiation when the source was tuned off the flat-B region.     

Arc Power Limit and Distribution on the Large Negative Ion Source Based on JT-60 NNBI

The target of the large negative ion source based on neutral beam injection (N-NBI) is to produce neutral beam current of 22 A and beam power of 10 MW at 500 keV with duration time of 10 s. Since it was successfully operated in 1996, the 5.3 MW neutral beam power at 380 keV with duration time of 3 s has been achieved. In recent years improving and enhancing the beam power are going on. Several reasons such as plasma non-uniformity, higher beam density at the upper region in the beam profile,     

Preparation of Diamond—Like carbon Films in methane by Electron Cyclotron Resonance Microwave Plasma Source Ion Implantation

Diamond-like carbon(DLC)films were prepared on Si(100) substrates by ion implantation from an electron cyclotron resonance microwave plasma source.During the implantation,650W microwave power was used to produce discharge plasma with methane as working gas,and-20KV voltage pulses were applied to the substrate holder to accelerate ions in the plasma.Confocal Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared characterization indicates that the DLC films were composed of sp^3 and sp^2 carbonbonded hydrogen.The hardness of the films was evaluated with a Nano Indenter-XP System.The result shows that the highest hardness valus was 14.6 GPa.The surface rms roughness of the films was as low as 0.104nm measured with an atomic force microscope.The friction coeffcient of the films was checked using a ball-on-disk microtribometer.The average friction coefficient is approximately 0.122.     

High-Power Ion Beam Characteristics of a Magnetic Multi-Pole Line-Cusp Ion Source for the HL-2A Tokomak

A circular magnetic multi-pole line-cusp ion source with a nominal 45 keV 25 A hydrogen ion beam is developed for the neutraJ beam injector of the HL-2A tokomak. At present, this bucket ion source can produce a 40 keV 20 A hydrogen ion beam for less than lOOms on a test bed, and a 35 ke V 13A ion beam for 300ms on the injector of the HL-2A tokomak. The 1/e half-width of the ion beam power profile is about 6.0 ± 0.2 em at the positionof 3.26m downstream from ion source, and the corresponding divergence degree is nearly 1.1. The optimum perveance matched conditions were obtained experimentally, and were in good agreement with the values from experiential equation of Uhlemann et al. The maximum of optimum perveance reached 2.2 × 10^-6 A/V^1.5 for 38 keV beam energy. An ion beam with above 60% H^＋ species fraction can be achieved, which was measured by Ha light Doppler shift spectroscopy. According to research results, a neutral beam with a total power of more than 0.6 MW was successfully injected into the plasma of the HL-2A Tokomak in 2008.     

DECRIS-4离子源的初步测试结果

The ECR ion source DECRIS-4 has been designed and constructed at the FLNR JINR to be used as a second injector of heavy multiply charged ions for the U-400 cyclotron.The design of the magnetic structure of the source was based on the idea of the so-called"magnetic plateau".The axial magnetic field is formed by three independent solenoids enclosed in separated iron yokes.As a result the superposition of the coils and hexapole magnetic fields creates the enlarged resonance volume.The first experiments showed that the source was able to produce more than 300eμA of Ar~(8 ) when only 100W of microwave power was used. During the last experiment almost 500eμA of Ar~(8 ) was extracted with the same power.In this paper we will present the preliminary results with other gaseous ions,such as oxygen,krypton and xenon.     

SECRAL在18GHz频率下产生强流高电荷态离子束的初步结果

A Superconducting ECR ion source with Advanced design in Lanzhou (SECRAL) was successfully built to produce intense beams of highly charged ions for Heavy Ion Research Facility in Lanzhou (HIRFL).The ion source has been optimized to be operated at 28GHz for its maximum performance.The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping.For 28GHz operation,the magnet assembly can produce peak mirror fields on axis 3.6T at injection,2.2T at extraction and a radial sextupole field of 2.0T at plasma chamber wall.A unique feature of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. During the ongoing commissioning phase at 18GHz with a stainless steel chamber,tests with various gases and some metals have been conducted with microwave power less than 3.2kW and it turned out the performance is very promising.Some record ion beam intensities have been produced,for instance,810eμA of O~(7 ),505eμA of Xe~(20 ),306eμA of Xe~(27 ),21eμA of Xe~(34 ),2.4eμA of Xe~(38 ) and so on.To reach better results for highly charged ion beams,further modifications such as an aluminium chamber with better cooling,higher microwave power and a movable extraction system will be done,and also emittance measurements are being prepared.     

不同磁路电子回旋共振离子源引出实验

空间推进所用的电子回旋共振离子源(ECRIS)应具有体积小、效率高的特点. 本文研究的ECRIS使用永磁体环产生磁场, 有效减小了体积, 该离子源利用微波在磁场中加热电子, 电子与中性气体发生电离碰撞产生等离子体. 磁场在微波加热电子的过程中起关键作用, 同时影响离子源内等离子体的约束和输运. 通过比较四种磁路结构离子源的离子电流引出特性来研究磁场对10 cm ECRIS性能的影响. 实验发现: 在使用氩气的条件下, 特定结构的离子源可引出160 mA的离子电流, 最高推进剂利用率达60%, 最小放电损耗为120 W·A^-1; 所有离子源均存在多个工作状态, 工作状态在微波功率、气体流量、引出电压变化时会发生突变. 离子源发生状态突变时的微波功率、气体流量的大小与离子源内磁体的位置有关. 通过比较不同离子源的引出离子束流、放电损耗、气体利用率、工作稳定性的差异, 归纳了磁场结构对此种ECRIS引出特性的影响规律, 分析了其中的机理. 实验结果表明: 保持输入微波功率、气体流量、引出电压不变时, 增大共振区的范围、减小共振区到栅极的距离, 离子源能引出更大的离子电流; 减小共振区到微波功率入口、气体入口的距离能降低维持离子源高状态所需的最小微波功率和最小气体流量, 提高气体利用率, 但会导致放电损耗增大. 研究结果有助于深化对此类离子源工作过程的认识, 为其设计和性能优化提供参考.     

ECR离子源中的微波功率在线测量

 在中子发生器中采用ECR离子源是一种新技术。由于受结构的限制,ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态,所以在运行中调节状态非常困难。解决这个问题的方法是：用定向耦合器加微波小功率计的方法在线测量ECR离子源的微波入射功率,通过微波入射功率可以直接得到ECR离子源引出离子束流的大小,从而推断微波信号源的放电过程是否正常,然后调整ECR离子源,最终使中子发生器工作在最佳状态。从ECR离子源后面的引出电极测得的最大束流为20 mA,且工作长时间稳定,当微波功率在160 W~500 W之间时,放电效果较好,离子束流随微波功率的增加而增加。     

5MW中性束弧电源DC/DC变换器的设计与实现

中性束离子源弧放电具有气体放电等离子体的非线性特性,工作时还会受到气体压强、外磁场、阴极状态等因素的影响,采用晶闸管相控调压技术的弧电源很难实现对这种大功率电弧的稳定的闭环控制。为此,提出了一种多相多重的大电流DC/DC变换器,具有响应速度快、电流上升时间短、电流纹波小等特点,大幅提高了离子源弧放电闭环控制的稳定性。设计了滤波电感能量回馈电路,弧电源可以根据中性束系统的需要使弧电流快速减小0%~100%(可调),然后根据控制信号迅速恢复正常弧电流输出,形成一个弧电流凹坑。电源还采用超级电容储能技术,使电源体积减小了2/3,电网容量小于10kV·A。离子源放电时不会受到电网波动的影响,弧放电更加稳定。实验数据显示:该电源最大输出为220kW/1500A,电流纹波在1%以内,电流上升时间约100μs,最大超调量小于3%,可以满足5 MW中性束离子源及系统的要求。     

微型电子回旋共振离子推力器离子源结构优化实验研究

微型电子回旋共振(ECR)离子推力器可满足微小航天器空间探测的推进需求. 为此, 本文开展直径20 mm的微型ECR离子源结构优化实验研究. 根据放电室内静磁场和ECR谐振区的分布特点, 研究不同微波耦合输入位置对离子源性能的影响, 结果表明环形天线处在高于ECR谐振强度的强磁场区域时, 微波与等离子体实现无损耦合, 电子共振加热效果显著, 引出离子束流较大. 根据放电室电磁截止特性, 结合微波电场计算, 研究放电容积对离子源性能的影响, 实验表明过长或过短的腔体长度会导致引出离子束流下降甚至等离子体熄灭. 经优化后离子源性能测试表明, 在入射微波功率2.1 W、氩气流量14.9 μg/s下, 可引出离子束流5.4 mA, 气体放电损耗和利用率分别为389 W/A和15%.     

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The generation and control of microwave electron cyclotron resonance (ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75mA at gas pressure of 7×10⁻⁴Pa, and the energy of the electron beam can reach 9keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20mm to 13mm and the electron beam current keeps the value unchanged.     

微波电子回旋共振等离子体阴极电子束的实验研究

介绍了实验室研制的微波电子回旋共振(ECR)等离子体阴极电子束系统及初步研究结果，该系统包括微波ECR 等离子体源、电子束引出极、聚焦线圈等。通过测量水冷靶电流和靶上的束斑尺寸，实验研究了微波ECR 等离子体阴极电子束的流强、聚束性能等随电子束系统工作条件的变化。结果表明：微波输入功率越高、引出电压越高，引出电子束流强越大；工作气压对电子束流强的影响较复杂，随气压增加呈现出先降低后升高的特点；在7×10⁻⁴Pa 的极低气压下电子束流强可达75mA，引出电压9kV；能量利用率可达0.6；调整聚焦线圈的驱动电流，电子束的束斑直径从20mm 减小到13mm，电子束流强未有明显变化。     

HL-2A装置中性束离子源引出系统束流分析

在中性束离子源引出过程中,详细分析了引出束流的产生,这有利于得到更准确的引出功率和引出电极表面的热功率沉积情况。根据HL-2A装置中性束离子源引出电极的电连接方式和束流引出的物理过程,对离子源束流引出过程进行了分析,给出抑制极电流产生的主要来源。通过分析放电气压扫描实验中的结果发现:随着放电气压的增加,不同弧放电电流情况下抑制极电流均逐渐增加,且抑制极电流与引出电流的比值近似线性增加。针对引出离子束流经过引出电极的过程建立了物理模型。计算了抑制极电流与引出电流的比值与放电气压的依赖关系,计算结果与实验结果一致,验证了引出束流分析结果的合理性。     

HL-2A装置NBI加热束线束光学特性

中性束离子源束光学特性直接影响中性束注入功率。通过理论计算和实验扫描的方式对引出束半宽度随导流系数的变化进行了研究。理论上, 采用IGUN程序对HL-2A装置的三电极引出加速器进行了束元轨迹模拟, 采用束几何光学计算程序对高斯束元进行叠加, 得到了在束线量热靶处引出束的1/e半宽度。实验上, 在放电气体为氘气, 弧放电电流分别为200, 300, 400 A时, 对引出高压进行扫描, 利用量热靶上的热偶测量了不同位置处的温升, 用高斯函数拟合得到引出束的分布和1/e半宽度。理论计算和实验结果都表明, 束半宽随着导流系数的增加先减少后逐渐增加。理论计算结果表明不同离子束流下的最佳导流系数值基本不变, 而实验上, 弧流为200, 300, 400 A时, 对应的最佳导流系数分别为1.6, 1.7, 1.85 P。     

测量离子束横向截面的闪烁体屏的热分析

针对基于闪烁屏-CCD(电荷耦合元件)相机的氘离子束横向强度分布测量系统,利用ANSYS软件模拟计算了在直流及脉冲模式下,能量100 keV、束斑直径3 mm氘离子轰击造成的Al₂O₃, SiO₂以及锗酸铋(BGO)三种候选闪烁体材料的表面温度变化。结果表明,在30 μA的直流氘离子束轰击下,闪烁体表面温度随辐照时间急剧地升高。持续时间10 min的氘离子束轰击将使三种材料前表面的温度分别升高131,234和649 ℃。对于峰值流强30 μA、重复频率1 Hz、脉宽5 μs的重复频率脉冲氘离子束,每个脉冲引起的三种闪烁屏表面的温度升高均小于0.05 ℃,且长时间的离子辐照基本不会造成闪烁屏的表面温度有明显的升高。对于脉宽5 μs的单脉冲氘离子束,三种材料的表面温度均随离子流强近似呈线性地增加。在单脉冲模式下,Al₂O₃,SiO₂以及BGO闪烁屏能允许的最高离子流强分别为2.32,1.08和0.72 A,超过此流强其表面温度将达到熔点。